Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device

A vacuum arc and magnetic filtration technology, applied in circuits, discharge tubes, electrical components, etc., can solve the problems of high cost, complex equipment, affecting the quality of the film layer, etc., to achieve uniform distribution of elements, stable performance, and good repeatability Effect

Inactive Publication Date: 2016-02-03
BEIJING NORMAL UNIVERSITY
View PDF5 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For the scheme of using alloy targets, since the ratio of each element in the alloy target is fixed, to realize the regulation of the ratio of elements in the film layer, it is necessary to use alloy targets with different element compositions, and the production of alloy targets is difficult and the cost is high
For the scheme of using multiple sets of arc sources and magnetic filter systems, since they are drawn out from different outlets in different directions, not only the equipment is complicated, but also the composition ratio of the elements in the film layer varies with the angle and position due to the different angles and positions of the deposition surface. Changes and uneven distribution, affecting the quality of the film layer

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device
  • Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device
  • Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] figure 1 The schematic diagram of the tree-shaped magnetic filter device shown is a schematic diagram of a feasible scheme of the present invention. The invention is composed of a plurality of magnetic filter branch pipes and a magnetic filter trunk pipe through reasonable matching and assembly. The magnetic filter branch line pipe and main line pipe can be straight pipe or bent pipe or a combination of various forms. The connection between the pipes can be a flange connection or a welded connection or other sealed connections. The length and angle of the pipeline should be selected to ensure that the outlet of the main pipe is outside the line of sight of the entrance of the branch pipe; the magnetic field direction of the magnetic filter branch pipe and the main pipe is along the pipeline axis, and the magnetic field strength is reasonably matched.

[0017] exist figure 1 Among them, the tree-shaped magnetic filter device is composed of a straight tube type magneti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
lengthaaaaaaaaaa
Login to view more

Abstract

The invention provided with a tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device which is formed by rationally combining and assembling two or more magnetic filtration branch pipes and a magnetic filtration main pipe, and then a tree-shaped structure is formed. In order to overcome the defects that the proportion of elementary components of a film layer of a multi-component laminated film prepared through an existing magnetic filtration cathode vacuum arc plasma deposition technology is hard to adjust and control and is not uniform along with changes of the position, the magnetic filtration device is provided; two or more arc sources can be assembled simultaneously, and therefore plasmas of two or more kinds of elements can be produced; the large particles of plasmas are filtered out through the magnetic filtration branch pipes and the plasmas are magnetized and guided into a vacuum target chamber through a magnetic field of the magnetic filtration main pipe, and then a multi-component deposition coating film is obtained. The tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device can adjust and control components of the prepared film by adjusting the arc currents of different vacuum arc sources, the multi-component laminated film which is consistent in component proportion, compact in texture and smooth in surface is prepared.

Description

Technical field [0001] The invention relates to a magnetic filter device for preparing multiple composite thin films by magnetic filter cathode vacuum arc plasma deposition. It is characterized in that the device is composed of more than two magnetic filter branch pipes and one magnetic filter trunk pipe, and the inlet ports of more than two magnetic filter branch pipes are respectively connected with vacuum arc sources of different cathode materials, and the plasma generated by the cathode vacuum arc sources is After the body is filtered and guided into the magnetic filter main line tube, it is filtered and guided by the magnetic filter main line tube and enters the vacuum target chamber together. The device can simultaneously deposit a variety of different elements, and can regulate the components of the prepared film by adjusting the arc currents of different vacuum arc sources respectively, so as to prepare a multi-component composite film with uniform composition, dense s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32H01J37/32H01J37/34
Inventor 吴先映廖斌黄杰史学伟张旭彭建华
Owner BEIJING NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products