825 results about "Diamond thin film" patented technology

The present invention relates generally to methods for the synthesis of various solids such as diamonds, diamonds films, boron nitride and other similar materials. This invention specifically relates to utilizing novel sources of reaction species (e.g., in the case of diamond formation, novel sources of carbon and/or hydrogen and/or seeds) for the manufacture of various materials and the use of such materials for various commercial purposes.

A diamond-coated member includes a basal material such as aluminum nitride, and a diamond thin film coating at least one part of a surface of the basal material, being adhered thereto, and has corrosion-erosion resistance. Adhesion strength between the thin film and the basal material is 15 MPa or more. Or, in diamond thin film, degree of orientation of diamond {220} plane present in faces parallel to the basal material is expressed by following formula: [Im220/(Im220+Im111)]/[Ip220/(Ip220+Ip111)]<1. The diamond-coated corrosion-erosion resistant member has excellent corrosion-erosion resistance, and is used mainly for a semiconductor producing apparatus; being preferably applied as a member inside a reaction chamber where a substrate, represented by silicon wafer, is exposed to plasma, corrosion gas or the like, inclusive of rings, a chamber inner lining, a gas shower plate, nozzles, a susceptor, an electrostatic chuck, a heater, or the like.

A protector for the leading edge of a rotor blade to provide enhanced erosion protection thereof. In an embodiment, the protector includes an energy absorption member attached to the rotor blade by a first adhesive bond layer and an erosion resistant member attached to the energy absorption member by a second adhesive bond layer. The erosion resistant member is operative to protect the leading edge of the rotor blade from erosion due to impacts from particulate matter, such as sand and rain. The energy absorption member is operative to absorb and disburse energy from impacts to the erosion protection member so that forces from the impacts are diminished or not transferred to the rotor blade. In another embodiment, the erosion resistant member is coated with a diamond film. As the diamond film is harder than sand, excellent resistance to wear from particulate matter and impacts rain is obtained. Other advantages provided by use of the diamond film include: 1) an ultra-smooth surface that reduces drag on the rotor blade whereby flight performance may be improved, and 2) by being ultra-smooth and chemically inert de-icing equipment may not be needed.

The invention provides a lithium ion battery negative electrode comprising a diamond-like thin film layer. The negative electrode comprises a conductive current collector, a negative electrode active material layer arranged on the conductive current collector and a diamond-like thin film layer deposited on the surface of the negative electrode active material layer; and the diamond-like thin film layer comprises doped elements, wherein the doped elements comprises one or more of Si, B, N, P, Al, Be, Mg, Ti, Cr, W, Fe, Zr, Pt, Mo, Co, Ni and Sb. According to the lithium ion battery negative electrode, the diamond-like thin film layer is deposited on the surface of the negative electrode active material layer, and the diamond-like thin film layer has excellent electrochemical inertness and conductivity and high mechanical strength, so that occurrence of an unstable SEI layer on the surface of the negative electrode active material is avoided, and the cycling stability of the electrode is greatly improved. The invention also provides a preparation method for the lithium ion battery negative electrode, and the lithium ion battery.

The invention discloses a homogeneous epitaxial lateral growth method for diamond. The method comprises the following steps: 1, depositing a mask layer on the bottom surface of a monocrystal diamond substrate; 2, patterning the surface, deposited with the mask layer, of the substrate, thus forming the substrate with a patterned surface, wherein the patterned surface of the substrate is divided into a homogeneous epitaxial growth area and a lateral growth area; and 3, carrying out homogeneous epitaxial diamond growth in the homogeneous epitaxial growth area, and carrying out lateral diamond growth in the lateral growth area. By combining with the lateral growth method, an existing homogeneous epitaxial growth technique of monocrystal diamond is improved; a monocrystal diamond film which is low in dislocation density, high in quality and smooth in surface can effectively grow; the difficulty in epitaxial growth of the monocrystal diamond film for an electronic device is reduced; the film quality is improved; and meanwhile, the technique can be applied to control over the growth structure of the monocrystal diamond film, so as to obtain a monocrystal diamond micro-structure required by MEMS and the like.

The invention relates to a tool coating material and a preparation method thereof, and belongs to the technical field of material preparation and application. The material is a diamond/diamond-like composite laminated coating material with super-hard self-lubricating property. The method for preparing the diamond/diamond-like composite laminated coating material is characterized by comprising the following steps of: firstly, pretreating a matrix by using mixed solution of acid and alkali respectively; secondly, synthesizing diamond with ultrahigh hardness and good crystalline form on the matrix, which serves as the main body of the composite coating, by adopting hot filament chemical vapor deposition; and finally, depositing a high-hardness diamond-like thin film on the main body of the diamond, which serves as a self-lubricating surface layer, by using magnetic filtration cathodic vacuum arc. In order to improve the binding force between the diamond thin film and the matrix and between the diamond-like thin film and the diamond thin film, a transition layer is coated between adjacent layers respectively. The method has the advantages of simple process, precise and controllable synthesis conditions, high film-forming quality, high product yield, low cost, and the like. The obtained diamond/diamond-like composite laminated coating material has ultrahigh hardness, extremely low friction factor and extremely low wear rate, shows excellent self-lubricating friction and wear resistance, and has significance for application of tools or molds under rigorous service conditions.

The invention discloses a preparation method of a boron-doped diamond (BDD) film electrode taking porous titanium as a matrix. The preparation method is characterized in that the titanium matrix is a porous titanium material with the porosity of 20-50%, hot filament chemical vapor deposition equipment is adopted, and a porous titanium base BDD electrode is prepared through chemical vapor deposition by using a second-order boron concentration control mode. By adopting the method, the generation capacity of TiC is controlled by adjusting boron source concentrations of different stages during chemical vapor deposition, namely the formation of TiC is inhibited by using high boron doping at the initial stage to improve the bonding force between a base and a film, and the boron source concentration is reduced in the later period of reaction to perform low boron doping. The porous titanium base BDD electrode prepared by the method disclosed by the invention is uniform and compact in diamond grain, and the porous titanium matrix is completely covered by a diamond film, so that the electrode has good stability and a relatively wide potential window.

The invention discloses a preparation method of a multilayer diamond-like film with high hardness, which comprises the following steps: a substrate is sputter cleaned, the diamond-like film is deposited by a depositing method with magnetic filtering and cathode vacuum arc, and the depositing method comprises steps of closing a vacuum chamber, vacuumizing the vacuum chamber to the pressure of 10<-3> Pa, turning on a pot lead cathode arc source, exerting negative bias voltage from minus 50 V to minus 200 V on the substrate and simultaneously and periodically letting in argon of 99.99 percent; furthermore, a control period lasts for 120 to 600 seconds, the time for letting in the argon is 10 to 50 percent of the control period, and the argon pressure in the vacuum chamber during argon inletting is 0.01 to 0.1 Pa; time for shutting off the argon is 90 to 50 percent of the control period, and the vacuum degree of the vacuum chamber at the time is 10<-4> to 10<-3> Pa; the number of the control periods is 3 to 50. The preparation method of the multilayer diamond-like film with high hardness has simple technique, low cost, produced films with strong bonding force, high hardness, large thickness, small stress and excellent mechanical and tribology performance; as well as wide application space in the industrial application field.

A thin diamond film layer is formed on a substrate with good adherence. A heatsink includes a substrate of a sintered compact including Cu and W, and a thin diamond film layer formed on the surface of the substrate. The Cu content in the substrate is at least 5% by weight. In an X-ray diffraction chart obtained by irradiating the thin diamond film layer with an X-ray, the diffraction peak intensity of the (110) plane of W is at least 100 times the diffraction peak intensity of the (200) plane of Cu.

The invention relates to a method for a titanium doped diamond-like composite coating with good abrasion proof and self lubricating properties on the surface of magnesium alloy. The method comprises the following steps that: firstly, a ceramic transition layer, which has a porous structure and is high in bonding strength and hardness, is formed on the surface of magnesium alloy by the micro arc oxidation treatment process; secondly, a titanium doped diamond-like film surface layer with solid lubricating property is deposited by the magnetic control sputtering method; and finally the micro arcoxidation/diamond-like composite coating is obtained on the surface of magnesium alloy. The coating can be used in oil-free lubrication fields such as magnesium alloy parts of an automobile, aviation/aerospace and the like, and the application range of the coating on moving parts is widened.

The invention provides a diamond coated tool having an excellent cutting performance, wear resistance, adhesion resistance and work surface roughness in combination and a method of producing such a tool. A diamond coated tool comprising a substrate and a diamond coating formed on the surface of the substrate, wherein said substrate is made of a cemented carbide or a cermet, diamond grains constituting a growth surface of said diamond coating has an average grain size of about 1.5 micrometers or below, said diamond coating has a thickness ranging from about 0.1 micrometer to 20 micrometers, and said diamond coating has an average surface roughness Ra ranging from about 0.01 micrometer to 0.2 micrometer. Such a diamond coated tool can be obtained by carburizing the substrate consisting of a cemented carbide or a cermet, and growing up a diamond coating thereon.

The invention discloses an in-situ electrical measuring electrode that is used in diamond-pair anvil cells and a manufacturing method thereof, and belongs to the technical field of high-temperature and high-voltage devices. Four electrodes (1) are deposited on the surface of a diamond anvil cell (8) and distribute from an anvil surface to a lateral surface of the diamond anvil cell (8); the electrodes (1) are diamond films doped with boron; a diamond insulating layer (2) covers the anvil surface and the lateral surface of the diamond anvil cell (8) as well as the electrodes (1) thereof; the electrodes (1) are exposed at one end of the anvil surface, the exposed position lies inside a sample cavity (9), and the electrodes (1) are exposed at one end of the lateral surface and connected with an electrode lead (5). A diamond film microcircuit and the diamond insulating layer are simultaneously integrated onto the surface of the diamond anvil cell by utilizing the film deposition technique, the nanometer seeding technique, the masking technique and the photolithographic method. The manufacturing method of the in-situ electrical measuring electrode prevents the electrode from being destroyed by transverse shearing force and overcomes the electrode corrosion by samples under the high-voltage condition, thus widening the research field of electrical in-situ measurement under high voltage.

A diamond composite heat spreader having a variable thermal conductivity gradient can improve control of heat transfer based on a specific application. A diamond-containing region of the heat spreader can contain diamond particles such that the diamond concentration and/or the diamond particle size a varied to produce a desired thermal conductivity gradient. Regions proximate to a heat source can have a higher thermal conductivity than regions further away from the heat source. Thin diamond films can also be used in conjunction with the particulate diamond in order to provide a region of maximum thermal conductivity adjacent a heat source. By providing a variable thermal conductivity gradient, more expensive materials such as diamond film and larger diamond particles can be selectively used in regions closer to a heat source, while allowing for cheaper smaller diamond particles and materials to be used farther away from the heat source where thermal conductivity can be lower without sacrificing overall performance.

A novel method for fabricating diamond shells is introduced. The fabrication of such shells is a multi-step process, which involves diamond chemical vapor deposition on predetermined mandrels followed by polishing, microfabrication of holes, and removal of the mandrel by an etch process. The resultant shells of the present invention can be configured with a surface roughness at the nanometer level (e.g., on the order of down to about 10 nm RMS) on a mm length scale, and exhibit excellent hardness/strength, and good transparency in the both the infra-red and visible. Specifically, a novel process is disclosed herein, which allows coating of spherical substrates with optical-quality diamond films or nanocrystalline diamond films.

The present invention is directed to a method for fabricating a thermal management substrate having a Silicon (Si) layer on a polycrystalline diamond film, or on a diamond-like-carbon (DLC) film. The method comprises acts of fabricating a separation by implantation of oxygen (SIMOX) wafer; depositing a polycrystalline diamond film onto the SIMOX wafer; and removing various layers of the SIMOX wafer to leave a Si overlay layer that is epitaxially fused with the polycrystalline diamond film. In the case of the DLC film, the method comprises acts of ion-implanting a Si wafer; depositing an amorphous DLC film onto the Si wafer; and removing various layers of the Si wafer to leave a Si overlay structure epitaxially fused with the DLC film.

An improved gas phase synthesized diamond, CBN, BCN, or CN thin film having a modified region in which strain, defects, color and the like are reduced and/or eliminated. The thin film can be formed on a substrate or be a free-standing thin film from which the substrate has been removed. The thin film can be stably and reproducibly modified to have an oriented polycrystal structure or a single crystal structure. The thin film is modified by being subjected to and heated by microwave irradiation in a controlled atmosphere. The thin film has a modified region in which a line width of the diamond spectrum evaluated by Raman spectroscopy of 0.1 microns or greater is substantially constant along a film thickness direction of the thin film, and the line width of the modified region is 85% or less of a maximum line width of the residual portion of the film thickness.

The invention provides a nano-diamond film with Si-V luminescence and a preparation method thereof. The nano-diamond film is prepared on a single crystal silicon substrate by use of a hot filament chemical vapor deposition method; heat preservation is performed on the film for 5-150 minutes in air at a temperature ranging from 500 to 700 DEG C, and then the nano-diamond film with Si-V luminescence is obtained. The nano-diamond film prepared has relatively high Si-V luminescence intensity which has very important scientific significance and engineering value for the application of the nano-diamond film in the fields such as single photon sources, quantum information processing, photoelectric devices, biomarkers, semiconductor devices and field emission displays.

The invention discloses a surface-enhanced Raman substrate based on a diamond-like carbon film modified metal nano structure and a preparation method thereof. The surface-enhanced Raman substrate consists of a substrate in a metal nano structure and a diamond-like carbon film deposited on the substrate in a metal nano structure. In the invention, when nano metal Ag is used as the substrate material and after the diamond-like carbon film is deposited, the nano material metal Ag can not be oxidized, thereby enhancing the chemical stability of the nano structure substrate which takes Ag as the material, and enhancing the Raman effect of the substrate; the preparation method for the surface-enhanced Raman substrate based on the diamond-like carbon film modified metal nano structure, which is provided by the invention, has mature super-thin ta-C film technology and low cost, thereby being capable of realizing industrialized production.

The present invention provides a base substrate for epitaxial diamond film capable of epitaxially growing a large area of high quality diamond, having a diameter of 1 inch (2.5 cm) or more, on an iridium base by using the CVD method, a method for producing the base substrate for epitaxial diamond film, an epitaxial diamond film produced with the base substrate for epitaxial diamond film and a method for producing the epitaxial diamond film. An iridium (Ir) film is formed by epitaxial growth on a single crystal magnesium oxide (MgO) substrate or a single crystal sapphire (α-Al₂O₃) substrate by means of a vacuum deposition method or a sputtering method, and a bias nucleus generation process of forming epitaxial diamond nuclei is applied to the surface of the iridium (Ir) base formed as a film by exposing an ion-containing direct current plasma to the surface of the iridium (Ir) base formed as a film.

The invention relates to a diamond compact for drilling to cover a CVD diamond coating and a preparing method thereof. The novel diamond compact is prepared from a new material by depositing a layer of diamond film on the surface of the prior diamond compact through chemical vapor deposition methods. The preparing method is disclosed as figure 1, a CVD diamond film 3 with the thickness of between 0. 01 and 2 mm is deposited and covered on the PCD surface 2 of a PDC sheet. The method for preparing the diamond compact adopts the vapor deposition methods of a microwave plasma method, a direct current glow-discharged plasma method, a plasma injection method, a heat wire method, an arc discharge method, a multiple laser beam assistance decomposition method, and the like. Carbon-containing gas or carbon-containing liquid is decomposed, and a CVD diamond film with the thickness of bwteen 0.01 and 2mm is deposited on the PCD surface which is treated. The obtained new material greatly improves the temperature resistance and the wearability of the prior diamond compact, thereby the service life of a drill bit made of the new material is prolonged greatly. The diamond compact can be widely used in drilling industry, construction industry and machining operation industry.

This invention discloses a diamond film containing Cr and its preparation method. Said film is a H-free film containing Cr deposited in gas phase on a matrix surface having the alternative condensed multi-layer gradient structure of Cr, CrNx, CryCz, Cr, CrNx, CryCz layers orderly from inside to outside along the vertical direction of the matrix surface, the film thickness is not less than 2 mum, which has a fine film/matrix binding force and good wearability. The preparation method includes utilizing the magnet control sputtering system to coat, the magnet control targets are a pair of unbalanced magnet controlled Cr targets and 1-4 pairs of un-balanced magnet controlled C targets, the supply of which is 20-250KHz IF AC supply, a pulse matrix negative bias voltage is applied on the armed coating matrix by single-level pulse DC supply, the sputtering gas is Ar.

The invention discloses a metal inner surface modification device and method and belongs to the technical field of plasma surface modification. The method is characterized by comprising the following steps: generating plasmas on a metal inner surface by utilizing the principle of hollow-cathode discharge, and nitriding or depositing diamond like carbon, so as to improve the hardness, the wear resistance and the corrosion resistance of the metal inner surface; by taking a treated piece as a cathode, arranging the cathode inside, adjusting the distance and the vacuum degree between a workpiece and the cathode to reach the discharge condition, arranging an anode at the periphery of a cathode cavity, and adding a direct current pulse power supply between the anode and the cathode, wherein reaction gas is nitrogen or ammonia gas and carrier gas is argon gas during the nitriding, and the reaction gas is methane or acetylene and the carrier gas is argon gas in the process of depositing a hard carbon film. The method has the effects and advantages of simple process, low cost and high efficiency and is particularly suitable for treating the metal inner surface and pipe fittings of large draw ratios.

A method of depositing a stable diamond film on a metal substrate includes pretreating a surface of the substrate and depositing a diamond film on the substrate by way of a multi-stage chemical vapor deposition, in which each subsequent stage is performed at progressively higher temperature. The deposited diamond may be doped with boron. The substrate may be titanium, a titanium alloy, iron, an iron alloy, or any other valve metal. The diamond deposition may be a high temperature chemical vapor deposition. The first deposition stage may optionally create a carbide of diamond and substrate, and an optional mixture of diamond and amorphous carbon may be deposited to bond this carbide layer to a subsequently applied layer. The resulting product may be used as an electrode, as a tooth or blade in a cutting tool, or may have many other uses.

The invention relates to a radiating substrate based on a diamond film, comprising a silicon substrate, the diamond film and a transition layer, wherein the diamond film prepared on the silicon substrate has a diamond-on-silicon (DOS) structure; after an end-sealing top layer is removed and surface planarization is carried out, the roughness of the surface of the diamond film is at the nano orderand surface modification is carried out; and the transition layer is a Ti film, and is firstly deposited on the diamond film with a modified surface before metal bumps are prepared. The radiating substrate has the advantages that the diamond film with highest heat conductivity is adopted as a radiating layer of the LED (light-emitting diode) base to form the DOS structure, so that the radiating efficiency is greatly improved; simultaneously, the metal bumps for welding are directly manufactured on a radiating sink, so that the heat transfer distance is shortened; the thermochemical and mechanical planarization is utilized for carrying out surface modification and planarization on the surface of a diamond, so that the roughness of the surface is improved, and the valence bonds of the surface are activated, so that the adhesion among the diamond film and the metal bumps is improved, and the defects of generating air bubbles in the middle of a contact interface and the like are prevented; and due to the formed good contact interface, the heating resistance can be reduced and the radiating efficiency can be improved.

The present invention provides films and substrates coated with films that comprise a nano-crystalline diamond matrix that is substantially free of graphite inclusions. The present invention also provides a method of chemical vapor deposition to prepare the films. The method of chemical vapor deposition operates at a DC bias voltage that substantially precludes the formation of a plasma ion capable of causing a region of a nano-crystalline diamond matrix within a forming film to allotrope when the plasma ion collides with the film.