The invention provides a design method and a preparation method of a 1.8-4 [mu] m
silicon-based lens anti-reflection film. The design method of the 1.8-4 [mu] m
silicon-based lens anti-reflection film comprises the steps that Sa, a film
system is designed with 550 nm as the reference
wavelength of
optical film design, a film stack formula Sub / 0.3 M 0.8 N (HL) 3K / AIR is used, the two faces of Sub are plated with the same film
system, Sub is a
silicon substrate, AIR represents air, in the film stack formula, H represents a high-refractive-index material ZnS with the 1 / 4
wavelength thickness, L represents a low-refractive-index material YbF3 with the 1 / 4
wavelength thickness, and in the film stack formula, Z represents a high-refractive-index material ZnS with the 1 / 4 wavelength thickness; m represents a base layer material SiO with the thickness of 1 / 4 wavelength, N represents a connecting layer material Ge with the thickness of 1 / 4 wavelength, K represents protective layer materials Al2O3 (aluminum
oxide) and Sb with the thickness of 1 / 4 wavelength, and a film layer structure of Sub / SiO / Ge / ZnS / YbF3 / Al2O3 / Air is generated through an input film stack formula; sc, the thickness of the film layer is optimized through thin film
design software, the optimal thickness of the film layer is obtained, and the
transmittance of the 1.8-4-micron
wave band of the optimized film layer structure meets the requirement; and Sd, the optimized film
layer thickness is input into a control computer of the
coating machine.