Preparation of high-hardness diamond-like multi-layer film
A diamond thin film and multi-layer thin film technology, applied in metal material coating process, coating, ion implantation plating and other directions, can solve the problems of reducing the hardness of the film, reducing the hardness and elastic modulus of the diamond-like carbon (DLC) film, etc. Achieve the effect of excellent tribological performance and wide application space
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Embodiment 1-7
[0020] The concrete steps of embodiment 1-7 of the present invention are:
[0021] The invention discloses a method for preparing a high-hardness diamond-like multilayer film, the steps of which are as follows: firstly cleaning a base body by sputtering, and then depositing a diamond-like film. The method for depositing a diamond-like carbon film is a magnetic filter cathodic vacuum arc deposition method, and its specific method is:
[0022] Close the vacuum chamber of the magnetically filtered cathodic vacuum arc deposition equipment and pump down to 10 -3 Pa, turn on the graphite cathode arc source, and apply a negative bias voltage of -50V to -200V on the substrate material to deposit a diamond-like carbon film on the substrate surface; 99.99% high-purity argon gas, the control cycle is 120-600 seconds, the time for feeding high-purity argon gas is 10%-50% of the control cycle, and the argon pressure in the vacuum chamber is 0.01-0.1Pa during ventilation; close the high-pu...
Embodiment 8
[0026] This embodiment is basically the same as Embodiment 1, the only difference is that after the sputtering cleaning is completed, a titanium transition layer with a thickness of 120-150 nm is deposited on the base material by the magnetic filter cathodic vacuum arc deposition method, and then a diamond-like carbon film is deposited. .
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