The invention discloses a two-dimensional
transistor and a preparation method thereof.The two bottom bias gates are arranged on the upper surface of an insulating substrate in a spaced mode, the upper surfaces of the bottom bias gates are completely covered with a
dielectric layer, the upper surface of the
dielectric layer is completely covered with a two-dimensional
semiconductor material, and the two-dimensional
semiconductor material is arranged on the upper surface of the insulating substrate. The drain
electrode and the source
electrode are arranged on the upper surface of the two-dimensional
semiconductor material in a spaced mode. When the device works, the drain
electrode, the source electrode and the
bottom gate form a three-terminal
field effect transistor; when positive and
negative bias voltages are applied to the drain-source electrode, a reverse
potential difference is formed between the bias gate and the channel, so that a differentiated
doping effect is generated on the channel, and the
transistor presents different polarities. In addition, by applying specific
wavelength light intensity,
photon-generated
carrier modulation is carried out on the channel, and polarity switching can also be achieved. Through the designed reconfigurable transistor, various reconfigurable
logic gate circuits can be realized.