195results about How to "Improved resistance characteristics" patented technology

An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.

A method for copying information from a first storage subsystem to a second storage subsystem is disclosed. The first and second storage subsystems are provided in a data storage system. The method comprises transmitting first data block from the first storage subsystem to the second storage subsystem, the first storage subsystem being associated with a first host computer and the second storage subsystem being associated with a second host computer; and transmitting first attribute information from the first storage subsystem to the second storage subsystem without intervention from the first host computer.

A light emitting element of the invention includes n pieces of light emitting layers (n is a natural number) between first and second electrodes. A first layer and a second layer are provided between the mth light emitting layer (m is a natural number of 1≦m≦n) and the m+1th light emitting layer. The first and second layers are contacted to each other. The first layer contains a substance that transports holes easily and a substance with an electron accepting property. The second layer contains a substance that transports electrons easily and a substance with an electron donating property. Molybdenum oxide is used as the substance with the electron accepting property.

The invention relates to a process for the manufacture of a waterborne multistage polymer dispersion that has ethylenically unsaturated functional groups for crosslinking. The process comprises the steps of;a. making an aqueous emulsion or solution of a first stage polymer comprising carboxylic acid functionalized monomers to an amount sufficient to make the first stage polymer water soluble or dispersible,b. at least partially neutralizing the first stage polymer with a base,c. forming a two-stage polymer dispersion by adding to the at least partially neutralized first stage polymer a second stage monomer mixture and emulsion polymerizing said second stage monomer mixture to a second stage polymer which is less hydrophilic than the first stage polymer,d. reacting with the obtained two-stage polymer dispersion a bi-functional compound comprising an ethylenically unsaturated group and a group reactive towards the carboxylic acid in the two-stage polymer.The invention further relates to a water-borne curable multistage polymer dispersion, to coating compositions.

A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.

Glass-ceramics include SiO2, Al2O3 and Li2O on oxide basis. In the glass-ceramics, total amount in mass % of SiO2 and Al2O3 is less than 77% and Li2O / (SiO2+Al2O3) which is the ratio in mass % of the amount of Li2O to the total amount of SiO2 and Al2O3 is 0.064 or over. The glass-ceramics include at least one crystal phase selected from the group consisting of β-quartz, β-quartz solid solution, β-eucryptite, β-eucryptite solid solution, β-spodumene and β-spodumene solid solution.

An opening in a building wall is closed by a building closure such as a window or door. A mounting part of the closure arrangement is received in a space between two countersupport surfaces formed by a U-channel or opposite L-members that protrude perpendicularly from the sill or jamb surface of the wall bounding the opening. Mounting brackets secure the U-channel or L-members to the wall. On one or both sides, a respective damping element is interposed between the mounting part and the respective adjacent countersupport surface. The damping element may be a plastically deformable metal strip. When an explosion force acts on the closure arrangement, the damping element is first plastically deformed to absorb energy, before the remaining force is transmitted into the building wall. The two damping elements on opposite sides damp forces from the positive and negative pressure waves of the explosion.