51 results about "Ion deposition" patented technology

The invention relates to the technical field of coatings, and discloses a product wear-resistant and corrosion-resistant remanufacturing process method based on laser deposition, which comprises the following steps: surface pretreatment: pretreating the substrate surface of a product to remove a surface oxide layer, oil stains and other impurities so as to improve the adhesive force of the coating; laser cladding coating preparation: a first wear-resistant coating is deposited on the surface of the pretreated matrix through a laser cladding process, and the wear-resistant coating is Fe-based or Co-based multi-component alloy powder; an ion deposition coating is prepared, specifically, a second corrosion-resistant coating is formed on the first coating through the ion deposition technology, and the corrosion-resistant coating is made of a ceramic material. Through the design of the functional gradient coating, the combination of the toughness of the inner layer and the hardness of the outer layer is realized, the wear resistance and the corrosion resistance are improved, the adhesive force is enhanced through metallurgical bonding, cracking and peeling are avoided, the residual stress is eliminated through low-temperature annealing and polishing, and the stability and the service life of the coating in a high-wear and high-corrosion environment are ensured.

The invention relates to a mixed cathode for ion plasma deposition systems and methods. A cathode (200) for use in an ion deposition process includes a body (202) defining a working surface (204) of the cathode; and at least one insert (218) coupled to the body. The body comprises a first deposited material, and the at least one insert comprises a second deposited material that is incompatible with the first deposited material. The at least one insert is at least partially exposed at the working cathode surface. The first deposition material and the second deposition material are capable of evaporating in response to an arc generated at the working cathode surface for depositing a coating comprising the first deposition material and the second deposition material on a substrate.

The invention belongs to the technical field of mass spectrum analyzers, and particularly relates to an ion soft landing device for preparing a mass spectrometer through soft landing, an ion funnel, a grid mesh and a deposition target are all arranged in an ion deposition cavity and are sequentially arranged from left to right in the X direction, the ion funnel comprises eight or more than eight ion transmission electrodes, and the grid mesh is arranged in the ion deposition cavity. Each ion transmission electrode is of a flat plate structure with a through hole in the middle, the part, closest to the grid mesh, of the ion transmission electrodes is a small-hole electrode, and the through holes in the ion transmission electrodes form a horizontally and coaxially placed funnel-shaped ion transmission cavity; the ions entering the ion deposition cavity pass through the ion transmission cavity and can only pass through the through holes in the small-hole electrode to reach the grid mesh, and the ions decelerated by the grid mesh are deposited on the deposition target. According to the invention, the soft landing part of the soft landing preparative mass spectrum is reasonably designed, so that the purposes of large ion flow, efficient ion transmission and complete ion structure are achieved.

The invention belongs to the field of light modulators, and provides an electrochromic device based on reversible double electrodeposition and application of the electrochromic device. The electrochromic device sequentially comprises a first transparent substrate, a first conductive layer, an electrolyte layer, a second conductive layer and a second transparent substrate; the electrolyte layer comprises a solvent and an electrolyte additive, and the electrolyte additive comprises a manganese salt, a zinc salt and a redox medium. And the charge change in the manganese ion deposition / dissolution process is compensated through the reversible deposition / dissolution reaction of zinc ions in the electrolyte. In the coloring process, manganese ions are subjected to oxidation reaction on the surface of the first transparent conductive substrate to form manganese dioxide sediment; meanwhile, the zinc ions are subjected to reduction reaction on the surface of the second transparent conductive substrate to form metal zinc. And in the fading process, the sediment is dissolved, so that the device is recovered to the initial transparent state. In addition, dissolution of manganese dioxide and metal zinc can be accelerated by adding the oxidation-reduction medium, and the reaction kinetics of the device is improved.

The invention relates to a photocatalytic fuel cell based on a cadmium sulfide titanium dioxide composite photo-anode and application, and relates to the technical field of preparation of novel photo-electrode materials, the cell adopts a continuous ion deposition method to prepare a CdS quantum dot modified TiO2 photo-anode with a specific layer number, and the CdS quantum dot modified TiO2 photo-anode, a platinum cathode and an ion exchange membrane form a synergistic system. The layer number and the particle size of CdS quantum dots in the photo-anode are accurately controlled, an efficient heterojunction structure is constructed, and the visible light utilization and charge separation efficiency is improved to the maximum extent; a chemical bonding effect is formed on the surface of the photo-anode by using carboxyl-containing organic fuel, so that an electron transmission path is obviously accelerated; the dual functions of organic wastewater degradation and electric energy synchronous output are achieved, and long-term operation stability is kept. The technology provides an efficient and low-consumption solution for resourceful treatment of industrial organic wastewater.

The invention provides an ion measurement device with high-resolution mass spectrum detection and charge state measurement functions, and the device comprises a deflection system which is used for introducing solar wind ions into a geometric factor control system; the geometric factor control system is used for introducing the solar wind ions into the hemispherical electrostatic analyzer and adjusting the flux measurement range by adjusting the voltage; the electrostatic analyzer is used for performing energy analysis on the solar wind ions through voltage; the flight time system is used for recording an initial charge signal and a termination charge signal of ion flight and measuring ion deposition energy; the pre-amplification system multiplies and amplifies weak signals of ions and electrons, identifies and processes the signals and outputs digital signals; and the electronic processing unit is used for processing a signal output by the pre-amplification system, obtaining information of components, charge states, directions, energy and flux of solar wind ions, and providing multiple paths of high voltage required by the device. The device has the advantage that mass spectrum detection and charge state measurement are simultaneously realized on one device.

The invention discloses a plasma deposition and laser remelting composite additive manufacturing method, and belongs to the technical field of additive manufacturing. The manufacturing method comprises the processes of plasma deposition, laser densification treatment, laser cutting and the like. Firstly, ceramic, metal or a mixed raw material of ceramic and metal is heated to a molten or semi-molten state through plasma deposition, the molten or semi-molten state is deposited on a substrate through plasma airflow, a forming layer is formed, and in the step, the uniformity and adhesive force of the forming layer are ensured through efficient heat energy transfer and material conveying capacity of the plasma deposition technology. And densifying the forming layer by adopting a selective laser melting mode, and cutting the contour of the forming piece by utilizing a laser cutting process. According to the method, the plasma deposition technology and the laser direct additive manufacturing technology are fused, the method has the advantages of multi-material implementation of the deposition technology and high-precision forming of the laser sintering technology, the material utilization rate and the component performance are improved, and the component manufacturing period is shortened.

The invention discloses a preparation method of a low-temperature plasma plating and permeating modified layer on the surface of a metal mold. The preparation method comprises the following steps: S1, precise pretreatment of a base body: sequentially carrying out mechanical grinding and polishing and ultrasonic cleaning on the base body, and then drying and putting the base body in a vacuum chamber; s2, plasma activation: after vacuumizing, introducing mixed gas of argon and hydrogen, generating glow discharge under the action of a pulse power supply, and performing sputtering activation on the surface of the substrate; s3, gradient transition layer plasma deposition is conducted, specifically, a pulse direct-current plasma source is adopted, a Ti target and a Cr target serve as sputtering sources, and a transition layer with components changing in a gradient mode is prepared; s4, plating and permeating a multi-element synergistic functional layer: preparing the functional layer by adopting a radio frequency-pulse direct-current composite plasma source, namely a Ti target, a Cr target, a Si-Al alloy target and a rare earth element target through synergistic sputtering; and S5, post-treatment optimization: performing vacuum cooling to room temperature after low-temperature annealing treatment to obtain a final modified layer. The permeation modified layer prepared by the method has high binding force, high hardness, high wear resistance and salt spray corrosion resistance.

The invention provides a nano-diamond high-strength supporting composite material and a preparation method and application thereof, the nano-diamond high-strength supporting composite material comprises a substrate, a polymer layer and a porous layer which are arranged in sequence; the porous layer comprises a nano-diamond array and an electrode active material layer; the nano-diamond array is arranged on the polymer layer and is embedded by the electrode active material layer. The surface porous layer can dredge ion deposition and improve ion deposition sites; the nano-diamond array serves as a buffer framework and can restrain volume expansion in the aluminum alloying process, the integrity of the overall structure is kept, and electrode pulverization is effectively relieved. The surface of the diamond array is coated with an electrode active material layer, and a continuous electronic path is provided; and the two layers also form a compact interlayer bonding structure, so that stress can be effectively dispersed, the adhesive force of the porous surface layer is improved, interface fracture and stripping of the porous surface layer are avoided, and the performance is improved.

The invention discloses a high-beam ion soft landing device based on a multistage difference technology, and belongs to the technical field of surface scientific sample preparation. The device comprises an electrospray ionization source, an ion transmission device, an ion deposition device and a sample transfer device which are connected in sequence. The ionization source couples high voltage to the solution through the spray needle fixing mechanism integrating the three-dimensional displacement table and the metal conductive connecting piece, and electrified micro-droplets are generated. The transmission device adopts a combination of a four-stage differential air exhaust cavity and a replaceable ion lens with a gradually increased aperture, so that efficient focusing and transmission of ions are realized, and desolvation is completed through a heating capillary tube. The deposition device drives a multi-clamping-groove vertical sample frame through a magnetic coupling sample transfer rod, and applies a deceleration electric field to a sample support by using an external bias power supply, so that ions are softly landed on a substrate with low kinetic energy. According to the invention, an expensive mass spectrum assembly is abandoned, and through linkage of all parts, high-flux and high-integrity clean deposition of macromolecules and heat-sensitive samples is realized while the cost is remarkably reduced.

The embodiment of the invention discloses a preparation method of a metal bipolar plate coating and a metal bipolar plate. The method comprises the following steps: providing the metal bipolar plate; performing magnetron sputtering ion deposition on the metal bipolar plate to obtain a metal bipolar plate with a magnetron sputtering ion deposition layer; sequentially carrying out magnetron sputtering ion deposition and arc ion deposition on the metal bipolar plate with the magnetron sputtering ion deposition layer to obtain a metal bipolar plate with an intermediate layer; and performing arc ion deposition on the metal bipolar plate with the intermediate layer to obtain the metal bipolar plate with the coating structure. According to the preparation method of the metal bipolar plate coating, through the coating preparation method combining the magnetron sputtering deposition process and the arc deposition process, interface matching between the coatings is guaranteed, the overall structure of the coating is optimized, so that the prepared coating has high compactness and uniformity, and the service life of the metal bipolar plate is prolonged.

The application discloses a high-ionic-conductivity diaphragm and a preparation method thereof. The diaphragm is prepared by using an ultrahigh molecular weight polyethylene as a matrix and a covalent organic framework material as a functional filler through a thermal phase separation method. The introduction of the COF material significantly improves the ionic conductivity, thermal dimensional stability and mechanical strength of the diaphragm, and the diaphragm can be endowed with the characteristics of adsorbing polysulfides and guiding uniform ion deposition through COF channel functionalization. The preparation method is mature in process and easy to scale up production, and the prepared diaphragm is suitable for next-generation high-energy-density and high-safety electrochemical energy storage devices with high performance requirements.

The present application belongs to the technical field of powder material testing and analysis method, and discloses a testing method for testing the carrier separation efficiency of photocatalyst powder particles under fixed light excitation. The method uses silver nitrate, chloroplatinic acid and other reagents which are easily reduced by photo-generated electrons as hole sacrificial reagents to react with photo-generated electrons separated to the surface; uses methanol, formic acid, ethanol, triethanolamine, H2O2 and other small molecules which are easily oxidized by holes as electron sacrificial reagents to react with photo-generated holes separated to the surface; under a single-wavelength calibration light source, irradiation is carried out for a fixed length of time of photocatalytic reaction, the total amount of photo-generated electrons participating in the surface metal deposition reaction is quantitatively separated and determined by measuring the deposition amount of Ag or Pt particles deposited on the photocatalytic particles, and the charge separation efficiency value of the photocatalyst powder material is calculated by assuming that the noble metal ion deposition reaction efficiency is 100%.

A method for in situ construction of a wide-band visible / ultraviolet dual heterostructure of titanium dioxide @ sodium titanate and titanium dioxide @ tungsten trioxide on a titanium surface, relating to methods for constructing dual heterostructures. The present invention addresses the problem of existing TiO2 photocatalysts having poor degradation capabilities for organic dye wastewater and being non-recyclable. The method includes: 1. micro-arc oxidation treatment; 2. microwave hydrothermal treatment; 3. ion deposition exchange treatment; and 4. de-crystallization treatment. The present invention is used to in situ construct a wide-band visible / ultraviolet dual heterostructure of titanium dioxide @ sodium titanate and titanium dioxide @ tungsten trioxide on a titanium surface.

The utility model relates to the technical field of electroplating feeding, in particular to an adjustable feeding device for mobile phone middle plate surface treatment, which comprises an electroplating tank, a plurality of fixing frames arranged on one side of the electroplating tank and an adjusting feeding mechanism, the adjusting feeding mechanism used for improving the electroplating effect of electronic elements is arranged on one side of the electroplating tank, and the adjusting feeding mechanism is arranged on the other side of the electroplating tank. The adjusting feeding mechanism comprises a movable rod arranged at the top of the electroplating pool, and a feeding assembly is arranged on one side of the movable rod. According to the electronic component electroplating device, the electroplating mode can be adjusted during feeding and discharging electroplating through the feeding assembly, so that an electronic component continuously shakes when making contact with an electroplating solution, more uniform metal ion deposition is achieved when the electronic component is electroplated, the conditions of different thicknesses and non-uniform coverage are reduced, and the electroplating efficiency is improved. The positioning assembly can quickly take down the movable rod, and the distance between the multiple fixing frames can be adjusted or the movable rod can be overhauled and replaced more conveniently.

Provided is a plasma processing method for a mask pattern that includes an inorganic resist, the plasma processing method making it possible to achieve a low roughness while suppressing thinning of the mask pattern. According to the present invention, a plasma processing method for reducing the roughness of a mask pattern that includes an EUV-exposed tin oxide inorganic resist includes a step for selectively etching protrusions at a side wall of the inorganic resist in the film thickness direction of the inorganic resist using plasma generated using pulse-modulated high-frequency power and BCl3 gas. The duration of the plasma processing and the duty ratio of the pulse modulation are determined on the basis of the roughness as acquired in advance and the correlation between the duration of the plasma processing and the duty ratio of the pulse modulation. The off duration of the pulse is set to the duration that an upper surface of the inorganic resist is to be selectively irradiated with depositable radicals with respect to ions.

The present invention relates to the technical field of compound characterization, and particularly to an ion soft deposition device. The device includes a soft deposition cavity, an ion collimating lens group and a transmission base which are arranged in the soft deposition cavity from top to bottom. A through hole coaxial with the collimating lens group is provided at the top of the soft deposition cavity, and the through hole is used for introducing deposited ions. The transmission base can move horizontally, and a soft deposition target and an MCP fluorescence screen are arranged on the transmission base. The MCP fluorescence screen is used for beam spot imaging of deposited ions, and the soft deposition target is used for deposition of deposited ions. The present invention controls the ion deposition energy through ion deceleration, performs ion visualization imaging through the MCP fluorescence screen, reduces the beam spot and improves the deposition efficiency per unit area, and can assist in preparing a mass spectrometer to achieve more efficient sample preparation.

The invention relates to the field of reversible electro-deposition dot matrix display, in particular to a reversible electro-deposition dot matrix display device assisted by high-valence metal ions and a method of the reversible electro-deposition dot matrix display device. The high-valence metal ions serve as electrolyte additives, and the deposition behavior process of the metal ions is assisted by the high-valence metal ions. By adopting the technical scheme, the electric bilayer and ion adsorption behaviors are regulated and controlled through introduction of high-valence metal ions, metal deposition is improved, and the optical regulation and control performance is improved.

Apparatus and methods are described for preparing samples for examination by cryo-electron microscopy. Molecules of interest, such as protein molecules in a solution, are electrosprayed and converted to singly-charged gas-phase ions. Particular conformation(s) of the protein ions are selected by means of an ion mobility filter and deposited onto a cryo-EM grid at sub-eV kinetic energy for the purpose of preserving the molecule's higher order structure.

The utility model discloses a bias voltage sample table adopting microwave plasma deposition, and belongs to the technical field of diamond preparation. Comprising a microwave plasma chemical vapor deposition equipment reaction chamber, a water-cooling deposition table, a bias electrode lifting table, a quartz cylinder and a tungsten annular bias electrode, and a bias sample table is arranged at the bottom of the microwave plasma chemical vapor deposition equipment reaction chamber; and a quartz microwave window is arranged at the top of the reaction chamber of the microwave plasma chemical vapor deposition equipment. According to the utility model, the bias electrode for directly applying bias voltage to the plasma and the water-cooling deposition table are integrated, and the high and low positions of the bias electrode and the water-cooling deposition table can be independently adjusted, so that the most suitable real-time relative positions of the electrode, the sample table and the plasma can be easily found, and the stable, uniform and efficient bias voltage enhanced nucleation process is realized; and uniform nucleation and growth of the diamond on the deposition substrate are facilitated.

The invention discloses a method for in-situ construction of a wide-range wavelength visible / ultraviolet titanium dioxide-sodium titanate and titanium dioxide-tungsten trioxide dual heterostructure on the surface of titanium, and relates to a method for constructing the dual heterostructure. The invention aims to solve the problems that the existing TiO2 photocatalyst is poor in organic dye sewage degradation capability and cannot be recycled. The method comprises the following steps: 1, micro-arc oxidation treatment; 2, microwave hydrothermal treatment; 3, ion deposition exchange treatment; and 4, decrystallization and crystallization treatment. The method is used for in-situ construction of a wide-range wavelength visible / ultraviolet titanium dioxide-sodium titanate and titanium dioxide-tungsten trioxide dual heterostructure on the surface of titanium.

A deposition system has an ion deposition apparatus configured to direct a deposition species toward a workpiece along a path. The workpiece has one or more features having a gap defined by the one or more features. A workpiece support holds the workpiece to receive the deposition species at a predetermined tilt angle with respect to the path. The ion deposition apparatus deposits the deposition species on the one or more features, the workpiece support rotates the workpiece with respect to the path, growing a deposition film of the deposition species on the one or more features in a predetermined manner. The deposition film can seal the gap to define a sealed cavity. Alternatively, the one or more features can be a mask that is augmented by the deposition film to increase one or more dimensions of the mask.

The embodiment of the invention provides a semiconductor structure and a forming method thereof, and the forming method of the semiconductor structure comprises the steps: providing a substrate which is provided with a plurality of discrete gate oxide layers and gate structures located above the gate oxide layers, and a groove is formed between every two adjacent gate structures; forming an interlayer dielectric layer covering the gate structure and filling the trench on the substrate, wherein the interlayer dielectric layer has a set thickness; wherein the step of forming the interlayer dielectric layer comprises the following steps of: forming a first interlayer dielectric layer which covers the gate structure and fills the groove on the substrate by adopting an ion deposition process; forming a second interlayer dielectric layer on the first interlayer dielectric layer, wherein the groove in the first interlayer dielectric layer is filled with the second interlayer dielectric layer; wherein in the normal direction of the surface of the substrate, the first interlayer dielectric layer has a first preset thickness, and the second interlayer dielectric layer has a second preset thickness. By adopting the technical scheme, the performance of the semiconductor structure can be improved.

This invention relates to a photothermal-driven ion separation device, its preparation method, and its application. The device includes a porous substrate with a photothermal layer disposed on a first surface of the substrate. The photothermal layer absorbs light and generates heat. An ion separation membrane is disposed on a second surface of the porous substrate, selectively allowing ions from a solution to permeate. The pore structure within the porous substrate connects the first and second surfaces. In use, the ion separation membrane is in contact with the solution. Capillary force generated by a water transport channel drives water and permeable ions in the solution through the ion separation membrane to the pore structure of the porous substrate. Water evaporates in the photothermal layer, and ions are deposited within the pore structure of the porous substrate. It can be used to separate ions with different charges in a solution, such as lithium ions and magnesium ions.

Sleeves that can be disposed on either end of a bushing to improve the wear characteristics and usable lifetime of the bushing is disclosed. During the use of the bushing, such as when a machine including the bushing is operated, the sleeves may be in primary contact with abrasive elements (e.g., other parts of the machine, dirt, rock, etc.) and wear, while the underlying bushing is protected, at least in part, from wear and tear. The sleeves may include a bulk material, such as steel, with a hard coating thereon, such as hard chromium, tungsten carbide, or the like. The hard coating may be formed by any variety of processes, such as electroplating, plasma deposition, thermal deposition, or the like. In some cases, the sleeves, after being worn from use, may be replaced or refurbished to further extend the lifetime of the bushing.

A plasma deposition apparatus includes a vacuum chamber, and a workpiece assembly that includes a frame that can hold a plurality of workpieces, and gas channels formed in between the workpieces and the frames. The gas channels can transport gas from a gas source to the plurality of workpieces to produce material deposition on the workpieces. The workpiece assembly can form a cylinder in the vacuum chamber.

The application belongs to the technical field of mass spectrometers, in particular to an ion soft landing device for a soft landing preparation mass spectrometer, wherein an ion funnel, a grid and a deposition target are arranged in an ion deposition cavity in sequence from left to right along an X direction, the ion funnel comprises eight or more ion transmission electrodes, each ion transmission electrode is a flat plate structure with a through hole in the middle, the ion transmission electrode closest to the grid is a small hole electrode, and the through holes on each ion transmission electrode form an ion transmission cavity in the shape of a horizontally coaxial funnel; ions entering the ion deposition cavity pass through the ion transmission cavity and can only reach the grid through the through hole on the small hole electrode, and the ions decelerated by the grid are deposited on the deposition target. The soft landing part of the soft landing preparation mass spectrometer is reasonably designed, so as to achieve the purposes of large ion flow, efficient ion transmission and guaranteeing the integrity of ion structure.

The utility model belongs to the technical field of plasma deposition, and discloses an auxiliary device utilizing a microwave deposition plasma source, which comprises a vacuum furnace body and an auxiliary plasma source, the inner cavity of the vacuum furnace body is cylindrical, a rotating stand for placing a workpiece is arranged in the vacuum furnace body, the auxiliary plasma source is connected with the vacuum furnace body, and the rotating stand is connected with the vacuum furnace body. The auxiliary plasma source comprises a waveguide tube, energy of the waveguide tube is injected from the left side, the right side of the waveguide tube is connected with the reflection matching network, quartz glass for isolating the normal-pressure waveguide and the vacuum cavity is arranged above the waveguide tube, and perturbators for adjusting the size of the microwave waveguide are arranged on the inner side of the waveguide tube and the position of a quartz glass window. By arranging the auxiliary plasma source and the perturbator, the scattering proportion and the scattering direction of waveguide energy to the vacuum cavity can be increased, and the uniformity of the whole coating can be ensured by matching with the rotating stand in the vacuum furnace body.

This invention relates to the field of electronic circuit materials technology, and particularly to an electrolyte for preparing high-tensile-strength microporous copper foil, its preparation method, and its application. The electrolyte of this invention comprises 70-100 g / L copper ions, 80-120 g / L sulfuric acid, 20-40 mg / L chloride ions, 10-20 mg / L brightener, 5-15 mg / L wetting agent, and 5-15 mg / L leveling agent. It is prepared by premixing the basic electrolyte with the wetting agent, then sequentially adding the chloride ion source, brightener, and leveling agent, followed by constant-temperature curing. This electrolyte is specifically designed for the electrodeposition preparation of array-type microporous copper foil. The synergistic effect of the three specific additives precisely controls the copper ion deposition behavior in the special current density region at the edge of the micropores, thereby ensuring that the copper foil substrate achieves extremely high mechanical strength while forming a regular microporous structure, solving the technical problem of simultaneously achieving high porosity and high strength.

The utility model relates to the technical field of plasma deposition, in particular to plasma deposition equipment. Plasma deposition equipment is characterized in that a radio frequency power supply access port and a vacuum extraction opening are fixedly connected to the two sides of a vacuum chamber respectively, a raw material gas access port is rotationally connected to the top of the vacuum chamber, a driving mechanism is arranged at the top of the raw material gas access port, and a gas distribution disc is fixedly connected to the bottom end of the raw material gas access port; a plurality of exhaust holes are evenly formed in the bottom face of the gas distribution disc, a plurality of baking lamps are arranged in the middle of the inner wall of the vacuum chamber in a surrounding mode, an opening is formed in the front side of the vacuum chamber, a sealing plate is arranged on the opening in a matched mode, and a containing plate is arranged in the vacuum chamber. According to the utility model, the gas distribution disc is arranged and can rotate at a constant speed under the action of the driving mechanism, so that raw material gas can be uniformly distributed in the vacuum chamber and can be uniformly deposited on a base material after being converted into plasma under the action of the radio frequency power supply.