Arc evaporation source actively controlling arc spot and equipment using same

An arc evaporation and active control technology, applied in vacuum evaporation plating, ion implantation plating, metal material coating process, etc. Number of particles, good adhesion and stable performance

Inactive Publication Date: 2010-12-29
姜文
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

CN200610045720129 discloses an arc evaporation source using two sets of coils, but it has no control over arc spots and does not solve the problem of large particle generation, but only intercepts non-linearly moving large particles through the large coil length

Method used

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  • Arc evaporation source actively controlling arc spot and equipment using same
  • Arc evaporation source actively controlling arc spot and equipment using same
  • Arc evaporation source actively controlling arc spot and equipment using same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Embodiment 1: use the equipment of the present invention to plate titanium nitride coating on stainless steel mirror panel parts

[0053] The inner cavity of the target base 5 is equipped with a water-cooled jacket 10 made of a magnetically conductive material (in this embodiment, when not specially marked, it is a non-magnetically conductive material), the water-cooled jacket 10 is fixed with the small magnetic field pole axis 9, and the target base 5 and A water-cooling cavity is formed between the water-cooling jackets 10, and a water outlet is arranged on the upper part of the water-cooling jacket 10, and a water inlet is arranged on the lower part. A small coil 3 is placed between the small magnetic field pole axis 9 and the water cooling jacket 10 . Place the small coil pole piece 12 made of magnetically conductive material outside the water cooling jacket 10, and tighten it with nuts, so that the small coil pole piece 12, the small magnetic field pole shaft 9, ...

Embodiment 2

[0065] Embodiment 2: comparative test

[0066] Experimental equipment used to prepare the coating: the vacuum arc ion coating equipment of the present invention; the comparative test uses the ion coating equipment sold under the trade name TG-4 by Beijing Great Wall Titanium Co., Ltd. commonly used in the present technology.

[0067] The sample used in the test is a 304 stainless steel 8K mirror panel with a size of 20×20mm.

[0068] The sample coating (the sample of the present invention) was prepared by using the vacuum arc ion coating equipment of the present invention by the method described in Example 1 of the present invention.

[0069] The above-mentioned prior art ion coating equipment was used to prepare the sample coating (comparative sample) by the method described in the equipment manual.

[0070] The coating prepared by the method of the present invention and the prior art is titanium nitride.

[0071] Use the scanning electron microscope microscope to magnify...

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Abstract

The invention relates to an arc evaporation source actively controlling an arc spot and vacuum arc ion deposition equipment using the same. The arc evaporation source comprises an arc initiating mechanism, a target fixed link, a small coil, an outer insulating sleeve, a target seat, a big coil, a target material, a small magnetic field polar axis and the like. The vacuum arc ion deposition equipment comprises a rack, a vacuum chamber, the arc evaporation source and a vacuum acquisition system. By using the arc evaporation source and the vacuum arc ion deposition equipment, the number of large particles in a coat can be greatly reduced, and the diameter of the largest particle can be greatly reduced. Therefore, by using the equipment, the service life of manufacture workpieces can be improved by 3 to 10 times, the production cost is remarkably reduced, and the production efficiency and the product quality are improved.

Description

【Technical field】 [0001] The invention belongs to the technical field of vacuum arc ion plating. More specifically, the present invention relates to an arc evaporation source for actively controlling arc spots, and also relates to a vacuum arc ion plating device using the arc evaporation source. 【Background technique】 [0002] Vacuum arc ion plating is an ion plating technology that uses arc discharge to deposit reactants on a substrate in a vacuum environment. The principle of vacuum arc ion plating is to use the cathode target as the evaporation source, and through the arc discharge between the target and the anode shell, the target material is evaporated, and plasma is formed in the space, thereby depositing on the substrate. Vacuum arc ion plating equipment consists of arc evaporation source, vacuum chamber and substrate. In the arc evaporation source, the material is used as the cathode target, the anode is connected to the vacuum chamber, and the cathode and the anod...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32
Inventor 姜文任大海
Owner 姜文
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