A memory device of embodiments includes a
memory cell including a switching layer between a first conductive layer and a third conductive layer and a
variable resistance layer between the third conductive layer and a second conductive layer. The switching layer contains a first
oxide of a first element selected from Mg, Y, La, Ce, Zr, Hf, Al, Ti, and Si, a second element selected from Zn, Ga, In, Sn, and Bi, a third element selected from P, As, Sb, Bi, S, Se, and Te, and a fourth element selected from V, Nb, Ta, Cr, B, Ga, and Si. The switching layer includes a first region, a second region, and a third region, and the first region is provided between the second region and the third region. The first region contains the first
oxide, and the second region and the third region contains a fourth
oxide of the fourth element.