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2281 results about "Line structure" patented technology

Line structure definition, line structure meaning | English dictionary. [. a any straight one-dimensional geometrical element whose identity is determined by two points. a a white or coloured band indicating a boundary or division on a field, track, etc.

Fabrication of sub-50 nm solid-state nanostructures based on nanolithography

Combination of nanolithography and wet chemical etching including the fabrication of nanoarrays of sub-50 nm gold dots and line structures with deliberately designed approximately 12-100 nm gaps. These structures were made by initially using direct write nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid (MHA), on Au/Ti/SiOx/Si substrates and then wet chemical etching to remove the exposed gold. These are the smallest Au structures prepared by a wet chemical etching strategy. Also, Dip-Pen Nanolithography (DPN) has been used to generate resist layers on Au, Ag, and Pd that when combined with wet chemical etching can lead to nanostructures with deliberately designed shapes and sizes. Monolayers of mercaptohexadecanoic acid (MHA) or octadecanethiol (ODT), patterned by DPN, were explored as etch resists. They work comparably well on Au and Ag, but ODT is the superior material for Pd. MHA seems to attract the FeCl3 etchant and results in nonuniform etching of the underlying Pd substrate. Dots, lines, triangles and circles, ranging in size from sub-100 to several hundred nm have been fabricated on these substrates. These results show how one can use DPN as an alternative to more complex and costly procedures like electron beam lithography to generate nanostructures from inorganic materials.
Owner:NORTHWESTERN UNIV

Binocular stereo vision three-dimensional measurement method based on line structured light scanning

The invention discloses a binocular stereo vision three-dimensional measurement method based on line structured light scanning, which comprises the steps of performing stereo calibration on binocularindustrial cameras, projecting laser light bars by using a line laser, respectively acquiring left and right laser light bar images, extracting light bar center coordinates with sub-pixel accuracy based on a Hessian matrix method, performing light bar matching according to an epipolar constraint principle, and calculating a laser plane equation; secondly, acquiring a line laser scanning image of aworkpiece to be measured, extracting coordinates of the image of the workpiece to be measured, calculating world coordinates of the workpiece to be measured by combining binocular camera calibrationparameters and the laser plane equation, and recovering the three-dimensional surface topography of the workpiece to be measured. Compared with a common three-dimensional measurement system combininga monocular camera and line structured light, the binocular stereo vision three-dimensional measurement method avoids complicated laser plane calibration. Compared with the traditional stereo vision method, the binocular stereo vision three-dimensional measurement method reduces the difficulty of stereo matching in binocular stereo vision while ensuring the measurement accuracy, and improves the robustness and the usability of a visual three-dimensional measurement system.
Owner:CHANGSHA XIANGJI HAIDUN TECH CO LTD

Fabrication of sub-50 nm solid-state nanostructures based on nanolithography

InactiveUS7291284B2Material nanotechnologyDecorative surface effectsDip-pen nanolithographyResist
Combination of nanolithography and wet chemical etching including the fabrication of nanoarrays of sub-50 nm gold dots and line structures with deliberately designed approximately 12-100 nm gaps. These structures were made by initially using direct write nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid (MHA), on Au / Ti / SiOx / Si substrates and then wet chemical etching to remove the exposed gold. These are the smallest Au structures prepared by a wet chemical etching strategy. Also, Dip-Pen Nanolithography (DPN) has been used to generate resist layers on Au, Ag, and Pd that when combined with wet chemical etching can lead to nanostructures with deliberately designed shapes and sizes. Monolayers of mercaptohexadecanoic acid (MHA) or octadecanethiol (ODT), patterned by DPN, were explored as etch resists. They work comparably well on Au and Ag, but ODT is the superior material for Pd. MHA seems to attract the FeCl3 etchant and results in nonuniform etching of the underlying Pd substrate. Dots, lines, triangles and circles, ranging in size from sub-100 to several hundred nm have been fabricated on these substrates. These results show how one can use DPN as an alternative to more complex and costly procedures like electron beam lithography to generate nanostructures from inorganic materials.
Owner:NORTHWESTERN UNIV

Systematic calibration method of welding robot guided by line structured light vision sensor

The invention relates to a systematic calibration method of a welding robot guided by a line structured light vision sensor, which comprises the following steps: firstly, controlling a mechanical arm to change pose, obtaining a round target image through a camera, accomplishing the matching of the round target image and a world coordinate, and then obtaining an internal parameter matrix and an external parameter matrix RT of the camera; secondly, solving a line equation of a line laser bar by Hough transformation, and using the external parameter matrix RT obtained in the first step to obtain a plane equation of the plane of the line laser bar under a coordinate system of the camera; thirdly, calculating to obtain a transformation matrix of a tail end coordinate system of the mechanical arm and a base coordinate system of the mechanical arm by utilizing a quaternion method; and fourthly, calculating a coordinate value of a tail end point of a welding workpiece under the coordinate of the mechanical arm, and then calculating an offset value of the workpiece in the pose combined with the pose of the mechanical arm. The systematic calibration method of the welding robot guided by the line structured light vision sensor is flexible, simple and fast, and is high in precision and generality, good in stability and timeliness and small in calculation amount.
Owner:JIANGNAN UNIV +1

High-speed scanning and overall imaging three-dimensional (3D) measurement method

InactiveCN102589476AFast measurementLittle effect on reflectivityUsing optical meansThree dimensional measurementPrism
The invention relates to a visual inspection technology. In order to meet the requirements of fast and high-accurate surface three-dimensional (3D) topography online measurement and the detection requirements of a production line on intelligence, fastness, high accuracy and low cost, the invention adopts the technical scheme that: a high-speed scanning and overall imaging 3D measurement method comprises the following steps of: carrying out external modulation on a driving power supply by using a laser so as to control the output of a word line laser; rotating a multifaceted prism under the drive of a high-speed motor, wherein line-structured light outputted by the laser is reflected and projected to the surface of a measured object by the multifaceted prism; and placing a photoelectric detector at a position which is the limit position projected by the line-structured light during the rotating process of the multifaceted prism, carrying out exposure on an area-array CCD (Charge-Coupled Device) camera during the process that the line-structured light scans the whole area, and establishing a measurement model, wherein the 3D coordinate (xp, yp, zp) of the surface feature point of the measured object is obtained according to a formula by using an image coordinate (u[theta]p, v[theta]p) formed by the area-array CCD camera and [theta]p. The high-speed scanning and overall imaging 3D measurement method is mainly applied to the fast and high-accurate surface 3D topography online measurement.
Owner:TIANJIN UNIV

Thermomagnetically assisted spin-momentum-transfer switching memory

A ferromagnetic thin-film based digital memory having a substrate supporting bit structures that are electrically interconnected with information storage and retrieval circuitry and having first and second oppositely oriented relatively fixed magnetization layers and a ferromagnetic material film in which a characteristic magnetic property is substantially maintained below an associated critical temperature above which such magnetic property is not maintained. This ferromagnetic material film is separated from the first and second fixed magnetization films by corresponding layers of a nonmagnetic materials one being electrically insulative and that one remaining being electrically conductive. Each bit structure has an interconnection structure providing electrical contact thereto at a contact surface thereof substantially parallel to the intermediate layer positioned between the first contact surface and the substrate. A plurality of word line structures located across from a corresponding one of the bit structures on an opposite side. Electrical current selectively drawn through each of these bit structures and its interconnection structure can cause substantial heating of that bit structure to raise temperatures thereof while being above temperatures of at least an adjacent said bit structure because of sufficient thermal isolation.
Owner:NVE CORP

Thermally operated switch control memory cell

A ferromagnetic thin-film based digital memory having a substrate supporting bit structures that are electrically interconnected with information storage and retrieval circuitry and having magnetic material films in which a characteristic magnetic property is substantially maintained below an associated critical temperature above which such magnetic property is not maintained separated by at least one layer of a nonmagnetic material with each bit structure having an interconnection structure providing electrical contact thereto at a contact surface thereof substantially parallel to the intermediate layer positioned between the first contact surface and the substrate. A plurality of word line structures located across from a corresponding one of the bit structures on an opposite side of the intermediate layer of a corresponding one of said bit structures from its interconnection structure provides electrical contact thereto. Sufficient electrical current selectively drawn through each of these bit structures and its interconnection structure can cause substantial heating of that bit structure to raise temperatures thereof to have at least one of the magnetic material films therein at least approach its corresponding associated critical temperature while being substantially above temperatures of at least an adjacent said bit structure because of sufficient thermal isolation.
Owner:NVE CORP

Low-cost microwave- and millimeter-wave polarized antenna of multi-layer PCB (Printed circuit board) process

The invention discloses a low-cost microwave- and millimeter-wave polarized antenna of the multi-layer PCB (Printed circuit board) process. The polarized antenna is of a multi-layer structure and comprises a quadrate radiating metal patch, an upper dielectric substrate, a metal floor equipped with an H-shaped coupling gap, a medium dielectric substrate, a feed metal plate with power division network, a lower dielectric substrate and a bottom metal floor; the quadrate radiating metal patch is coupled with the floor equipped with the H-shaped coupling gap to realize feed; the feed network of a microstrip line structure is positioned below the floor; the metal floor equipped with the H-shaped coupling gap is connected with the bottom metal floor through a metal through hole; the feed metal plate with the power division network is connected with the bottom metal floor through a second metal through hole to form a coaxial microstrip line conversion structure by which feeding from the bottom part of the antenna is realized. The antenna has the characteristics that the frequency band is wide, the size is small, the cost is low, the manufacturing and processing are simple, and the axial ratio feature is great.
Owner:SOUTHEAST UNIV

Visual welding seam surface quality detection sensor based on line structure light

The invention discloses a visual welding seam surface quality real-time on-line detection sensor based on line structure light, comprising sensing units and an image processing unit, wherein two sensing units are respectively vertically installed at two sides of the upper and lower surfaces of the welding seam and connected with the image processing unit; the sensing units comprise a video camera for receiving the welding seam surface gray scale image including laser stripe formed on the welding work piece; a straight linear laser for generating laser structure light stripe on the welding work piece; an optical filter in front of the video camera lens; and an LED annular light source coaxially provided with the video camera and positioned in front of the optical filter. The invention uses the straight linear laser to project onto the upper and lower surfaces of the welding seam to generate the laser stripes; the camera collects the welding seam surface gray scale image including laser stripes to finally realize automatic quality detection of the upper and lower surfaces of the welding seam; and the precision of surface quality detection of the welding seam is improved. The sensor can be widely applied to the fields such as robot automatic welding.
Owner:SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI

Fast calibration method of multiple line structured light visual sensor

InactiveCN103411553AEasy to completeSuitable for on-site calibrationUsing optical meansVirtual spaceBack calculation
The invention belongs to the technical field of visual detection, and provides a calibration method which is convenient and fast to use and accurate. The fast calibration method aims to make full use of characteristics of the multiple line structured light visual sensor in the aspect of three-dimensional shape measurement so as to be applied to on-line three-dimensional detection of industrial products. According to the technical scheme, the fast calibration method of the multiple line structured light visual sensor comprises the steps that a three-dimensional measurement model of the multiple line structured light visual sensor is built, wherein a measurement coordinate system is set in a world coordinate system where virtual space feature points are calibrated through the three-dimensional measurement model; according to the measurement model, due to the adoption of the Zhang calibration method that visual angles are not determined, a plurality of coplanar positions are placed through the visual sensor (namely, a plane target) to acquire virtual space feature point arrays so as to carry out camera calibration; three-dimensional point arrays on each light plane are acquired according to camera calibration results and the cross ration invariability theory to finish light plane calibration; the three-dimensional shape of a measured object is worked out in a back calculation mode through the measurement model. The fast calibration method of the multiple line structured light visual sensor is mainly used for visual detection.
Owner:TIANJIN UNIV

Method for assessing lightning flashover risks of regional power grid lines

ActiveCN102854415AComprehensive and detailed evaluation resultsElectrical testingFailure rateLightning strike
The invention discloses a method for assessing the lightning flashover risks of regional power grid lines, which comprises the following steps that: through calculating the lightning-resistant level of each base rod tower and combining with a probability distribution function of lightning current amplitudes of a region, the lightning trip-out rate of each rod tower is obtained, and the average lightning trip-out rate of a line is calculated; then, through combining with an automatic reclosing failure rate and a failure rate of manual forced energization, a permanent failure rate of the line is obtained; and through considering the weight coefficient of the line in a power grid structure, the permanent failure load loss coefficient of the line at the specific time of a power grid and in an specific operation mode of the power grid, and the risk occurrence probability of other influencing factors, a lightning flashover risk assessment model of a regional power transmission grid is established. According to the invention, the shortcoming that the absolute numerical value of the lightning trip-out rate can not really reflect the lightning disaster risk level of each line is overcome, and the lightning flashover risk level of each rod tower of lines is assessed through comprehensively considering the differences among the lightning motions, topographical features, line structures, insulation configuration, lightning protection measures and the like of each line corridor in the power grid, so that more comprehensive and thorough assessment results are obtained.
Owner:GUANGDONG POWER GRID CO LTD DONGGUAN POWER SUPPLY BUREAU +1

Evaluation method of lightning disturbance risk of power transmission line section

ActiveCN102411105AImprove the mine risk assessment systemImprove lightning protection levelElectrical testingRisk levelLightning strokes
The invention relates to an evaluation method of a lightning disturbance risk of a power transmission line section. Line basic information, line geographic information, line structure characteristic information, and line insulation characteristic information are employed; a lightning parameter statistics analysis program is employed to obtain a lightning parameter of a line corridor within a designated time slot and the obtained lightning parameter are used as an evaluation parameter; a lightning protection simulation calculating program is used to carry out calculation to obtain lightning stroke trip-out rates of all towers; a whole line average lightning stroke trip-out rate value that is obtained by calculation is used as a reference value to carry out comparison, so that lightning disturbance risk levels of all the towers relative to the whole line within a designated time slot are obtained; on the basis of a hierarchical structure model, an improved hierarchical analysis calculation program is used to carry out calculation to obtain weight vectors of all lightning disturbance risk level tower percentages by all sections; with regard to different influence degrees of towers with different lightning disturbance risk levels on a lightning disturbance risk, the improved hierarchical analysis calculation program is continued to be used to carry out calculation so as to obtain weight vectors of the towers with the different lightning disturbance risk levels; and then a computer is used to carry out combination on the weight vectors of all the layers from top to bottom to obtain lightning disturbance risk evaluation results of all the sections.
Owner:WUHAN NARI LIABILITY OF STATE GRID ELECTRIC POWER RES INST
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