5318 results about "Visual inspection" patented technology

The present device relates to a laparoscopic medical instrument, particularly those used for minimally invasive surgery. The instrument has a movable and a stationary handle portion and an extended shaft assembly with a removable actuating rod. An opening on the side of the stationary handle portion allows a user to visually confirm the removable actuating rod is locked into place within the movable handle portion. An opening in the back of the stationary handle portion allows for cleaning and visual inspection of the interior of the shaft assembly portion once the rod is removed. The actuating rod has a grasping mechanism for performing work during surgery. A flush port is located near the distal end of the stationary handle portion.

An object is authenticated by transmitting a random number to the object. The object has an integrated circuit chip including a memory and encryption circuitry. The memory stores information defining an encryption scheme preassigned to the object. The encryption circuitry reads the memory, and encrypts the random number according to the encryption scheme defined by the information read from the memory to produce encrypted data. The memory cannot be read from any output of the integrated chip, and the chip is constructed so that it is virtually impossible to recover the information contained in the memory by visual inspection, probing, or disassembly of the chip. The object is authenticated by checking whether the encrypted data is a correct result of encrypting the data using the encryption scheme pressigned to the object. The method can be used in a data processing system to authenticate each message transmitted by a host processor to a data processing device. For example, when a host logs into the data processing device, the data processing device transmits a series of random numbers to the host. The host encrypts the random numbers to produce a series of encrypted data, and the data processing device concurrently encrypts the random numbers to produce a series of encrypted values. The host inserts respective encrypted data into each message, and the data processing device authenticates each message by comparing the encrypted data in the message to a corresponding encrypted value.

A bubble detector utilizes an ultrasonic transducer to sample bubbles as they pass the transducer. The envelope of the return signal is analyzed to determine the volume of each sampled bubble. If the total volume of bubbles sampled within a certain period of time exceeds a desired maximum volume, the bubble detector may initiate a system shut down. A bubble detector can be evaluated or calibrated by introducing bubbles into a conduit, detecting the bubbles introduced into the conduit using visual inspection or a bubble detector of known resolution and comparing the results with the examination of a bubble detector under evaluation.

A surface cleaning head includes an openable agitator chamber to provide access to an agitator, such as a brush roll, for purposes of removing debris and / or removing the agitator. The openable agitator chamber is covered by an external cover that is movable between an open position and a closed position. A sealing member may be located between the external cover and a surface cleaning head housing and around a perimeter of the agitator chamber. A surface cleaning head includes a removable rotatable agitator, such as a brush roll, which is driven by a drive mechanism that axially engages the driven end. At least one end of the removable agitator may be secured in the agitator chamber by the external cover. The surface cleaning head may also include one or more transparent regions (e.g., on the openable cover) to allow visual inspection of the agitator during use.

A method and apparatus for inspecting a photolithography mask for defects is provided. The inspection method comprises providing a defect area image to an image simulator wherein the defect area image is an image of a portion of a photolithography mask, and providing a set of lithography parameters as a second input to the image simulator. The defect area image may be provided by an inspection tool which scans the photolithography mask for defects using a high resolution microscope and captures images of areas of the mask around identified potential defects. The image simulator generates a first simulated image in response to the defect area image and the set of lithography parameters. The first simulated image is a simulation of an image which would be printed on a wafer if the wafer were to be exposed to an illumination source directed through the portion of the mask. The method may also include providing a second simulated image which is a simulation of the wafer print of the portion of the design mask which corresponds to the portion represented by the defect area image. The method also provides for the comparison of the first and second simulated images in order to determine the printability of any identified potential defects on the photolithography mask. A method of determining the process window effect of any identified potential defects is also provided for.