The present disclosure relates to a
memory cell, a memory structure, and a method for preparing the same. The
memory cell comprises: a write
transistor comprising a write word line, a write
gate dielectric layer, and a write channel layer, wherein the write word line extends in a first direction, the write
gate dielectric layer is located on the sidewall of the write word line, and the write channel layer is located on the sidewall of the write
gate dielectric layer; a shared wire extending in a third direction; a first
electrode arranged along the first direction with the shared wire, the first
electrode and the shared wire being located on the same side of the write channel layer; a read
transistor comprising a read gate
dielectric layer, a read channel layer, and a
read bit line, the read gate
dielectric layer being located between the shared wire and the first
electrode and extending to the sidewall of the first electrode, the read channel layer comprising a read channel portion, the read channel portion being located on the sidewall of the read gate
dielectric layer, and one end of the read channel portion being connected to the shared wire and the other end being connected to the
read bit line. The present disclosure can effectively improve storage density in an embodiment.