The invention relates to a high-storage-density medium buffer layer sandwich structure
phase change storage thin
film material and a preparation method and application thereof.The
phase change storage thin
film material is of a sandwich structure, and the
phase change storage thin
film material is prepared by alternately arranging two different phase change layer materials and medium layer materials through a magnetron
sputtering method; and a similar
superlattice structure is formed. The structural general formula of the multilayer
film structure is [M (a nm)-A (b nm)-N (c nm)] n, M and N are two different phase change layer materials, and A is a
dielectric layer material.Compared with the prior art, the multilayer
film structure has the advantages that the
dielectric layer with the nanoscale thickness is introduced into the multilayer
film structure, the interface stress between adjacent film
layers can be effectively relieved, the
lattice mismatch phenomenon is reduced, and therefore the stability of the multilayer film structure is remarkably improved. In addition, the introduction of the
dielectric layer can also regulate and control the electrical characteristics of the thin film in the phase change process, enhance the distinction degree of multi-stage resistance states, further improve the storage density, and solve the problem that the storage capacity of a traditional
phase change memory is limited.