The invention relates to a preparation method for a black-
silicon poly-
silicon PERC 
cell structure with a selective emitter. The preparation method is characterized by comprising the following steps of (1) forming a nanometer texturing surface on a front surface of a 
silicon wafer, wherein a back surface is a 
polishing surface; (2) performing front-
surface diffusion of the silicon 
wafer to form anN-type layer, and removing front-surface phosphorosilicate glass and a back-surface pn junction; (3) depositing a 
silicon nitride anti-reflection film layer on the front surface of the silicon 
wafer,and depositing a 
passivation dielectric layer on the back surface; (4) dotting or routing the back surface of the silicon wafer, and printing a 
silver electrode and 
aluminum paste; (5) performing low-temperature 
sintering to form a local aluminum back field; (6) spraying a 
mixed solution of 
phosphoric acid and 
alcohol on the front surface of the silicon wafer, and forming a main grid line regionand a secondary grid line region after heavy 
doping by 
laser; and (7) immersing the front surface of the silicon wafer in an 
electroplating solution, 
electroplating the front surface of the silicon wafer under an illumination condition, and annealing after 
electroplating. By the preparation method, the defects that a high-quality fine grid line is difficult to form by silk-
screen printing and thegrid line and a selective emitter cannot be enabled to be accurately aligned are overcome, and shielding and leakage current caused by an 
electrode are minimum.