45results about How to "Minimized impurity" patented technology

The disclosure relates to a method and apparatus for enhancing copper film quality with a two-step deposition. The two step deposition may include depositing a first copper film by electrochemical plating, annealing the first copper film at a desired temperature for a duration of time to remove any impurities, depositing a second copper film and annealing the second copper film for a duration of time to remove impurities. The second copper film can be deposited by electrochemical plating without HCl / C-based additive. The second copper film can also be deposited by sputtering to avoid impurities including C, Cl and S.

A Group IIIA element fluoride-containing coating comprising a Group IIIA element fluoride phase which contains at least 50% of a crystalline phase of the orthorhombic system belonging to space group Pnma is formed on a member for imparting corrosion resistance so that the member may be used in a corrosive halogen species-containing atmosphere. When the state of a crystalline phase is properly controlled, the coating experiences only a little color change by corrosion. A Group IIIA element fluoride-containing coating having a micro-Vickers hardness Hv of at least 100 is minimized in weight loss by-corrosion.

A semiconductor device includes first and second transistor devices. The first device includes a first substrate region, a first gate electrode, and a first gate dielectric. The first gate dielectric is located between the first substrate region and the first gate electrode. The second device includes a second substrate region, a second gate electrode, and a second gate dielectric. The second gate dielectric is located between the second substrate region and the second gate electrode. The first gate dielectric includes a first high-k layer having a dielectric constant of 8 or more. Likewise, the second gate dielectric includes a second high-k layer having a dielectric constant of 8 or more. The second high-k layer has a different material composition than the first high-k layer.

A method for manufacturing a high pressure mercury lamp having a high pressure resistance strength includes an electric field application step of applying an electric field to at least a light emitting part while keeping the high pressure mercury lamp at a high temperature. As a result of the electric field application step, impurities such as hydrogen and an alkali metal existing in a discharge space and in glass used for forming the light emitting part (1) and sealing parts (2) can be reduced, with it being possible to suppress blackening and devitrification during lighting.

A process for alumina and carbonate production from aluminium rich materials with integrated CO2 utilization, comprising: comminuting and leaching Al-rich materials in concentrated HCl; separating unreacted material from metal chloride solution; separating Al3+ from solution by crystallization of AlCl3.6H2O; calcination of AlCl3.6H2O with HCl recovery; precipitation of metal carbonates from CO2; regeneration of HCl and extractive amines; the Al3+ separation the facilitated by increasing HCl concentration; the calcination being performed in two steps, one in the range 400 and 600° C. to generate a HCl-rich gas and one above 600° C. to produce Al2O3; for precipitating metal carbonates, mixing the metal chloride solution with an organic solution containing a selected amine and contacting the mixture with a CO2-containing gas, thereby also extracting HCl by formation of an ammonium chloride salt complex; processing thermally or chemically the organic solution to regenerate the amine for recirculation.

The present invention relates to a process for the preparation of 4-[1-(4-cyano phenyl)-1-(1,2,4-triazol-1-yl)methyl]benzonitrile (letrozole), substantially free from its isomeric impurity. The preparation involves reaction of 4-[1-(1H-1,2,4-triazol-1-yl)methylene benzonitrile with 4-fluorobenzonitrile in the presence of an organic solvent and a silicon amine. The present invention also relates to a process for the preparation of 4-[1-(1H-1,2,4-triazol-1-yl)methylene benzonitrile which involves: (a) the reaction of a 4-halomethyl benzonitrile with 1,2,4-triazole in the presence of cesium carbonate and an organic solvent to obtain a reaction mass comprising 4-[1-(1,2,4-triazole-1-yl)methyl]benzonitrile of formula II; and (b) precipitation of 4-[1-(1,2,4-triazole-1-yl)methyl]benzonitrile (II) from the reaction mass using a suitable organic solvent.

A stabilizer link apparatus may include ball studs having balls at terminals thereof, a link having ball sockets at upper and lower ends thereof, the balls being rotatably accommodated in the ball sockets, dust covers assembled between circumferences of the ball sockets and middle sections of the ball studs, the dust covers preventing impurities from invading the ball sockets, and friction-providing unit engaged between the ball stud and the link, wherein the friction-providing unit provide predetermined amounts of rotating frictional resistance to the ball studs when the ball studs rotate with respect to the link such that the rotating frictional resistance of the ball stud at the lower end of the link is greater than the rotating frictional resistance of the ball stud at the upper end of the link.

Disclosed is an apparatus for attaching a seed. The apparatus for attaching the seed includes a holder fixing part to fix a seed holder; a pressing part to apply a pressure to the seed holder; and a seed fixing part provided under the seed holder to fix the seed.

The invention relates to a method for producing three-dimensionally layered shaped bodies by means of layer-by-layer construction using a resin component which contains at least one furane resin, and more than 5% by weight and less than 50% by weight monomer furfuryl alcohol, and an acid. The shaped bodies produced in this manner are suitable inter alia as casting molds and casting cores for metal casting.

Provided are a process for preparation of darunavir or solvates or a pharmaceutically acceptable salt thereof substantially free of bisfuranyl impurities and a process for preparation of amorphous darunavir using the darunavir propionate solvate.