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576results about "Spark gaps" patented technology

Spark plug and its manufacturing method

Noble metallic tips, made of a Pt alloy or an Ir alloy, are fixed to electrode base materials. The electrode base materials are an alloy containing a chief element selected from the group consisting of Ni, Fe, and Co and a plurality of additive elements. At least two kinds of additive elements contained in this alloy have a standard free energy of formation smaller than that of the chief element.
Owner:DENSO CORP

Spark plug and method for manufacturing the spark plug

InactiveUS7084558B2OptimizationJoining process can be facilitatedSpark gapsSparking plugs manufactureIn planeAlloy
A ground-electrode spark portion 32 is formed from a noble metal which contains Pt as a main component, and is joined to a main metal portion of the ground electrode 4 via an alloy layer which has a thickness ranging from 0.5 μm to 100 μm and in which the noble metal that constitutes the ground-electrode spark portion 32 and the metal that constitutes the main metal portion of the ground electrode 4 are alloyed with each other. The ground-electrode spark portion 32 is configured such that a distal end surface 32t facing a spark discharge gap g is smaller in diameter than a bottom surface 32u joined to the ground electrode 4; and the distal end surface 32t is protrusively located beyond the side surface 4s of the ground electrode 4. When the ground-electrode spark portion 32 is viewed in plane from the distal end surface 32t, a portion of the surface of the ground-electrode spark portion 32 is viewed as a peripheral exposed-region surface 32p which is exposed on the side surface 4s of the ground electrode 4 so as to surround the distal end surface 32t.
Owner:NGK SPARK PLUG CO LTD

Electrode rod for spark deposition, process for the production thereof, and process for covering with superabrasive-containing layer

An aspect of this invention is an electrode rod for spark alloying, comprising a compact of a first powder of a first component which comprises a metal selected from a group of Fe, Co, Ni, metals of 4a, 5a and 6a of the periodic table and Si, and a second powder of a second component which is capable of self-propagating high temperature synthesis to form with said first component carbide, nitride, boride, silicide or intermetallic compound, said first and second powders being mixed intimately with each other and formed into an axial rod. Another aspect is a method for the production of the electrospark alloying rod, comprising: mixing intimately a first powder of first component and a second powder of second component, said first component comprising at least one selected from Fe, Co, Ni, metals of groups 4a, 5a and 6a, Sn, Zn, Pb, Al and Cu, said second component comprising materials capable of SHS process to form a refractory (or intermetallic) compound, compressing said mixture, followed or not by further firing, and thereby forming an axial body with a bulk density 0.50 to 0.86 time the theoretical values for the corresponding substances. Still another aspect is a method for the deposition of a coating on a work by causing and holding an electric spark between said electrode rod and work, whereby transferring the materials of said first and second components to the surface of said work, and depositing thereon as a layer or more layers of such compound.
Owner:2 KANAGAWA +3

Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film

A gas barrier film comprising a resin substrate provided thereon at least one layer of a ceramic film, wherein the density ratio Y (=ρf / ρb) satisfies 1≧Y≧0.95 and the ceramic film has a residual stress being a compression stress of 0.01 MPa or more and 100 Mpa or less, wherein ρf is the density of the ceramic film and ρb is the density of a comparative ceramic film being formed by thermal oxidation or thermal nitridation of a metal as a mother material of the ceramic film so as to being the same composition ratio of the ceramic film.
Owner:KONICA MINOLTA INC

Sputtering apparatus and manufacturing method of electronic device

InactiveUS20120164354A1Efficiently laminate thin films in a short timeWithout lowering throughputSpark gapsLiquid surface applicatorsRotational axisEngineering
The present invention provides a sputtering apparatus that can efficiently laminate thin films in a short time without lowering throughputs, and a manufacturing method of an electronic device. The sputtering apparatus according to an embodiment of the present invention includes a rotatable substrate holder, four target holders obliquely arranged with respect to the substrate holder, and a first shutter and a second shutter that each are provided between the target holders and the substrate holder and have two holes arranged two-fold symmetrical with respect to a rotational axis X. Two of the four target holders are first group target holders arranged two-fold symmetrical with respect to the rotational axis X, and the other two target holders are second group target holders arranged between the first group target holders and two-fold symmetrical with respect to the rotational axis X.
Owner:CANON ANELVA CORP
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