The invention discloses a preparation method and application of a
silicon-based spiny nanocone ordered array. The preparation method comprises the steps: preparing a tightly-arranged single-layer ordered PS sphere array on a
silicon wafer substrate; heating the single-layer ordered PS sphere array on the
silicon wafer substrate; then, carrying out
etching by using a
reactive ion etching method, and regulating an
etching current at least once in the
etching process; and then, after finishing the etching, removing the single-layer ordered PS sphere array on the silicon
wafer substrate to preparethe silicon-based spiny nanocone ordered array. A layer of
gold film is deposited on the surface of the silicon-based spiny nanocone ordered array serving as a template by using a physical depositionmethod to prepare a silicon-based spiny nanocone ordered array on which the
gold film is deposited, and the silicon-based spiny nanocone ordered array can be directly used as a substrate material with surface-enhanced Raman effect. The preparation method is simple, convenient to operate, low in cost, economic and environment-friendly; and the prepared silicon-based spiny nanocone ordered array islarge in structure area, good in uniformity, clean in surface, high in sensitivity and good in detection property.