830 results about "Silver film" patented technology

There is provided a electronic parts packaging structure that includes a mounted body on which an electronic parts is mounted, the electronic parts having a connection pad, which has an etching stopper film (a copper film, a gold film, a silver film, or a conductive past film) as an uppermost film, and mounted on the mounted body to direct the connection pad upward, an interlayer insulating film for covering the electronic parts, a via hole formed in the insulating film on the connection pad of the electronic parts, and a wiring pattern connected to the connection pad via the via hole.

A method for forming a semiconductor device including a resistive memory cell includes providing a substrate having an upper surface. A first conductive layer is formed over the upper surface of the substrate. An amorphous silicon layer is formed over the first conductive layer. A surface of the amorphous silicon layer is cleaned to remove native oxide formed on the surface of the amorphous silicon layer. A silver layer is deposited over the amorphous silicon layer after removing the native oxide by performing the cleaning step. The resistive memory cell includes the first conductive layer, the amorphous silicon layer, and the second conductive layer. The surface of the amorphous silicon layer is cleaned to prevent silver agglomeration on the native oxide.

In an organic electroluminescence display device which includes: a display region DR in which a plurality of pixels are arranged; and a power source part CC which is arranged outside the display region, each of the plurality of pixels includes: a lower electrode An; a light emitting layer stacked above the lower electrode; and an upper electrode which includes a thin silver film AG and is formed by a layer shared in common by other pixels above the light emitting layer, the upper electrode extends to the power source part for electrically connection, the thin silver film has a portion arranged between the display region and the power source part, and a background layer containing an electron pair donor is arranged as a background of at least a portion of the thin silver film between the display region and the power source part.

A method for forming a semiconductor device including a resistive memory cell includes providing a substrate having an upper surface. A first conductive layer is formed over the upper surface of the substrate. An amorphous silicon layer is formed over the first conductive layer. A surface of the amorphous silicon layer is cleaned to remove native oxide formed on the surface of the amorphous silicon layer. A silver layer is deposited over the amorphous silicon layer after removing the native oxide by performing the cleaning step. The resistive memory cell includes the first conductive layer, the amorphous silicon layer, and the second conductive layer. The surface of the amorphous silicon layer is cleaned to prevent silver agglomeration on the native oxide.

The invention discloses a graphene film sensitized D-shaped optical fiber surface plasmon resonance (SPR) sensor. The sensor comprises a D-shaped optical fiber, wherein a silver film layer is arranged on the polished surface of the D-shaped optical fiber; and a graphene film layer is arranged on the surface of the silver film layer. A preparation method comprises the following steps of: (1) preparing the D-shaped optical fiber, and preparing the silver film layer on the polished surface of the D-shaped optical fiber; and (2) preparing the graphene film layer on the surface of the silver film layer. The D-shaped optical fiber is used as a light transmission medium, an SPR structure is formed by plating a silver film on the surface of the D-shaped optical fiber, the sensitivity of the SPR sensing structure is increased by depositing or growing a graphene film material on the surface of the silver film, and the sensor has the prominent advantages of small volume, light weight, high sensitivity, quick response and the like, and has wide application prospects in the aspect of detecting trace gas, liquid, chemical elements, deoxyribonucleic acid (DNA) and the like in the fields of biology, chemistry, medicine and the like.

The invention belongs to chemical silvering technique field, concretely a non-metallic materials surface self-assembly chemical silvering method. The method steps are as follows: using silicane like molecule with amino end as self-assembly decorating layer at the non-metallic material surface; using gold or silver nanometer sol grain as the catalysis center of the chemical plating to quickly form silver coating. The binding force of the silver coating and substrate is strong. The control of the coating depositing speed is easy. The operation is simple; the cost is low; it is fit for large-scale production, and plating silver film at many substrates surface.

The invention relates to a transparent conductive film consisting of metal silver / metal oxide and a preparation method thereof. The transparent conductive film consists of a substrate, a film buffer layer, a film conductive layer and a transparent conductive film protective layer which are arranged layer by layer from bottom to top. The conductive layer is a metal silver film of which the thickness is between 3 and 10 nanometers; the thickness of the film buffer layer is between 10 and 30 nanometers; and the thickness of the transparent conductive film protective layer is between 20 and 50 nanometers. In the preparation method, the magnetron sputtering coating technology is adopted, a conveyor belt drives the substrate to move in vacuum cavities, and the buffer layer, the conductive layer and the transparent conductive film protective layer are coated layer by layer on the substrate layer in turn in three vacuum cavities respectively. The film prepared by the method has the optical transmittance in a visible light area over 80 percent, and the surface resistance less than 10 ohms. The thicknesses of the conductive layer and the transparent conductive film protective layer are all thin, materials are saved, the required coating time is short, and high production efficiency is achieved in industrial mass production.

The present invention relates to a method of producing silver films having large nanoparticles caused by cracking during anaerobic annealing to provide surfaces that exhibit increased metal enhanced fluorescence. Preferably the annealing process is conducted on a silver film having a thickness from about 14 to 17 nm for about an hour at a temperature of approximately 190° C. to about 210° C. resulting in the conversion of the just-continuous films into large particulate films, not readily assessable by other chemical deposition techniques.

The invention relates to a golden low radiation film coating glass, and the single surface of the glass is coated with a composite film, and the outermost layer of the composite film is provided with a protective film, and the composite film comprises three metal films, wherein, one metal film is a copper film, one is a silver film and one metal layer which clings to the protective film is a nichrome film or a titanium film. The making method comprises washing, drying and coating, and the coating is vacuum magnetron coating, and the dried glass which is put into a target material chamber of the vacuum magnetron equipment is coated with composite films layer by layer. The golden low radiation film coating glass of the invention chooses specific target material, atmosphere and combination to replace gold target materials to make the golden color low radiation film coating glasses, and the golden low radiation film coating glass is characterized by excellent performance, brilliant color, easy regulation, stable quality, high making efficiency, low cost and easy popularization, which can obtain various golden low radiation film coating glasses with different transmittances, transmission colors, reflectivities, reflective colors, sunshade coefficiencies and emissivities by changing the thicknesses of each film, thus being adaptable to different needs of the market.

The invention provides a method for surface-enhanced Raman scattering spectrum detection by using a silver-surface molecularly imprinted polymer, and relates to the method for the surface-enhanced Raman scattering spectrum detection by using a molecularly imprinted polymer. The invention aims at solving intricate process and poor detection effect problems caused by poor combination between the molecularly imprinted polymer and a metal film in an existing method which needs to mix the molecularly imprinted polymer and other substances such as silver colloid or coat the molecularly imprinted polymer on other metal films such as a silver film. The method provided by the invention comprises the following steps of: I preparing silver particles of 500 nanometers to 5 microns; II, modifying the surface of the silver particles; III, preparing pre-assembled solution of target molecules and functional monomers; IV, preparing pre-polymerized solution of the molecularly imprinted polymer of the silver; V, preparing the particles of silver-core molecularly imprinted membrane shells; VI, preparing the silver-surface molecularly imprinted polymer; and VII, performing the Raman detection. The method provided by the invention is applied to the field such as clinical medicine analysis, quantitative analysis, trace analysis and single-molecule level.

The invention discloses a method for manufacturing a solar battery photoanode and a product thereof. The method comprises the following steps of: firstly, coating a photoresist on a monocrystalline silicon wafer and transferring a micro-scale design on a mask through photoetching; secondly, plating a silver film through a film plating process; thirdly, cleaning to remove the photoresist; fourthly, carrying out metal catalytic etching by adopting mixed solution of hydrogen fluoride and H2O2 as an etchant to form a microcolumn or micropore structure; fifthly, cleaning the metallic silver film remained on the monocrystalline silicon wafer; sixthly, carrying out metal catalytic etching again by adopting mixed solution of hydrogen fluoride and AgNO3 as an etchant to form a nanometer line structure; and seventhly, cleaning the silicon wafer, removing silver formed and remained on the surface of the silicon wafer during the second etching process. According to the invention, a micro-nanometer structure combined with a manometer line and a micropore or a microcolumn array can be obtained; and the method disclosed by the invention has the characteristics of high efficiency and low cost andis suitable for the batch production of solar batteries.

The invention relates to a method for preparing a nano silver film with an enhanced Raman scattering substrate based on a microwave technique, which comprises the following steps: adding 50.0-90.0mg of silver nitrate, 100.0-140.0mg of polyvinyl alcohol and 10.0-30.0mg of sodium citrate to 200mL of ultrapure water to be dissolved and poured into a container; placing a glass slice which is cleaned by concentrated sulfuric acid into the 200mL of mixed liquid containing ammonia water and hydrogen peroxide to be soaked for 5-15 hours; cleaning the glass slice for 2-4 times respectively by tap water and the ultrapure water; tightly fixing the processed glass slice in the container and enabling one surface of the processed glass slice to be in contact with the mixed liquid containing the silver nitrate, the polyvinyl alcohol and the sodium citrate; placing the container which is filled with the glass slice and the mixed liquid into a microwave oven to be heated for 10-30 minutes; enabling the electropositive nano silver particles which are prepared by microwave heating to be absorbed on the glass slice, wherein the surface of the glass slice is electropositive; and taking out the glass slice out of the reaction solution to be dried, thereby obtaining the nano silver film with the infrared surface enhanced Raman scattering substrate. The method provided by the invention is simple and has the advantage of low cost, and the obtained nano silver film is stable and efficient and has the biological compatibility.

The invention relates to solar cell silver-backed slurry ultralow in silver content. The slurry is composed of, by weight, 5-10% of starlike multi-branch silver powder, 10-15% of schistose silver powder, 15-25% of spherical or ball-like silver powder, 1-8% of glass powder, 10-15% of organic binder, 22-59% of solvent and 1-5% of auxiliaries, wherein the sum of weight percentage of components is 100%, and the sum of the weight percentage of the starlike multi-branch silver powder, the schistose silver powder and the spherical silver powder is 30-50%. Compared with the prior art, a mixture of the starlike multi-branch silver powder, the schistose silver powder and the spherical silver powder is adopted as a conductive part, so that the silver content is low, cost is low, and an electrode after sintering is in a compact silver-film structure, high in adhesion force with a silicon substrate, excellent in welding resistance and weldability and capable of forming well ohmic contact with the silicon substrate.

The invention discloses a method for preparing a high-sensitivity surface enhanced raman scattering (SERS) substrate and belongs to the technical fields of analysis and detection. The method particularly comprises the step of constructing a suspended nanometer antenna structure array on a silicon substrate, wherein the vibration mode of a metal nanostructure can be controlled through the thickness of evaporation silver; the shape and the vibration mode of a suspended nanometer antenna can mutate with the increase of the thickness of an evaporation silver film; through the mutation, the strength of a hotspot is increased and the hotspot can be moved from the bottom of the nanometer antenna to the top of the nanometer antenna. On the basis, by means of the molecule confinement effect caused by the hydrophobicity of the surface of silver, the possibility that the hotspot comes into contact with a to-be-detected molecule is increased and the detection sensitivity of the SERS substrate is increased; the optimized suspended nanometer antenna structure array has high SERS sensitivity, the maximum SERS enhancement factor is 9.8*10<9> and the minimum detectable concentration is 10<-12>mol / L.

The invention discloses an electrochemical deposition method for preparing a super-hydrophobic and super-oleophilic surface, and belongs to the technical field of function materials. The method comprises the following steps of: forming a micro / nano-structured silver film on the surface of a copper or copper alloy substrate by electrochemical deposition, and modifying by using 12-hydroxy stearic acid to obtain a surface with super-hydrophobicity and super-oleophilicity. The contact angle of the super-hydrophobic and super-oleophilic surface prepared by the method to water is 154 to 159 degrees, the rolling angle of the surface is less than 5 degrees, the contact angle of the surface to oil is 0 to 5 degrees, and the surface has a good hydrophobic effect and a high oleophylic speed; and the film has uniform thickness and is difficult to fall, the property of the film is kept basically unchanged after being placed in air for a long time, and the surface can be used for oil-water separation to purify water in oil, and has a wide application prospect in fields of mining industry, petrochemical industry, environmental protection industry and the like.

The invention relates to a conductive film with high optical reflection, which can be used in the atmosphere environmental with the temperature ranging from room temperature to 550 DEG C, and a preparation method of the conductive film. The conductive film provided by the invention comprises a basic piece, a film damping layer, a film conductive layer, a film protection layer, all of which are arranged layer by layer from bottom to top. The conductive layer is metal silver film with the thickness ranging from 150 nm to 300 nm; the lower surface of the conductive layer is the film damping layer with the thickness ranging from 10 nm to 40nm; the upper surface of the film conductive layer is a film protection layer with the thickness ranging from 5nm to 15nm. The preparation method is that plating technology is adopted; the damping layer, the conductive layer and the protection layer are sequentially plated on the basic piece layer, and finally the heat disposal is carried out by virtue of a muffle. By taking metal and metal oxide as the damping layer and the protection layer of the silver film, the invention can effectively restrict the agglomeration and coacervation of the silver film under high temperature, and implements that the prepared film can remain excellent conductive performance and high optical reflection performance under high temperature.

The invention discloses a method for preparing a high-adhesion micro-nano array structure film through wet etching and reverse transfer printing. The method comprises the following steps: with a silver nitrate / hydrofluoric acid solution as a silver deposition solution, depositing a layer of porous silver film on a silicon chip so as to obtain an etching catalytic metal and etching a desired micro-nano array structure in a hydrofluoric acid / hydrogen peroxide solution or potassium hydroxide / isopropanol solution; carrying out soaking with concentrated nitric acid so as to remove the silver film, carrying out air drying and using the treated silicon chip as a template silicon chip; uniformly coating the template silicon chip with organic matter colloid and standing the template silicon chip for a period of time; and placing the template silicon chip on a heating plate after precipitation and uniform distribution of bubbles, heating the template silicon chip at a certain temperature for a period of time, stripping off a colloid film when the colloid completely solidifies and printing a reversed structure of the prepared micro-nano array structure on the colloid film through transfer printing so as to realize preparation of the high-adhesion micro-nano array structure film. The method is simple to operate, has low cost, is not restricted by a preparation area and can be extensively applied to the field of bionic adhesion.

The invention provides a plasmon enhancement type Raman spectrum detection chip as well as a detection device applying the same. The plasmon enhancement type Raman spectrum detection chip comprises a bearing element and an alloy film, wherein the bearing element is made from a transparent material; the alloy film is formed on one surface of the bearing element; linearly polarized light passing through the bearing element is subjected to total reflection on an interface between the bearing element and the alloy film; an evanescent field generated along with the total reflection penetrates through the alloy film, and excites plasmon on the surface, which is far away from a transparent substrate, of the ally film so as to enhance a Raman spectrum. According to the chip and the detection device, the plasmon enhancement type Raman spectrum detection chip is made from the alloy film which replaces commonly used pure gold films and pure silver films, so that a Raman enhancement factor is higher than that when the pure gold film is adopted and the relatively low cost can be leaded.

A high reflectance mirror having a high reflectance in a visible-light region, being excellent in durability such as a moisture resistance, a saltwater resistance, etc. and having small dependence on incident angle (i.e., the fluctuation of the reflectance depending on an incident angle of light is little) is provided. The high reflectance mirror comprises a substrate and a silver film, a low refractive index film and a high refractive index film laminated on the substrate in this order wherein an adhesion improving film is formed on the silver film surface on the opposite side of the substrate, the extinction coefficient of the low refractive index film is at most 0.01, the extinction coefficient of the high refractive index film is at most 0.01, the adhesion improving film is an oxide film and the extinction coefficient of the adhesion improving film is at most 0.1.

The invention discloses a leadless electrode silver paste for lightning protection ZnO piezoresistor and a preparation method thereof. The leadless electrode silver paste is mainly prepared by mixing and grinding conductive silver micropowder, inorganic additive, leadless glass powder and organic carrier according to a certain mass ratio. Strong interface binding force is formed by using Bi2O3-B2O3-Co2O3-ZnO-V2O5 system glass and lightning protection ZnO piezoresistor base body so as to realize lead free material. Adhesion force and weldability of the base body and the electrode are improved by adding inorganic bonder to the silver paste, so that the problem that silver film glass of below 30um overflows from electrode surface is solved. The preparation method is simple, and the product has the advantages of strong adhesion force, good weldability, high conductivity and stable electric performance and the like.

The invention provides a zoom liquid crystal lens, which comprises a single-layer or multi-layer liquid crystal lens unit. The liquid crystal lens unit utilizes at least two pieces of glass substratesin a scheduled thickness; an aluminium film, a silver film or other translucent metal films are arranged on one side or double sides of each glass substrate respectively in an etching mode to form asurface alignment electrode which can be controlled independently; and then the glass substrates are arranged in parallel at intervals, so that a layer of accommodating space in a predetermined thickness is arranged between two adjacent glass substrates to seal liquid crystals so as to form a layer of liquid crystal lens unit. The arrangement direction and the optical properties such as the refractive index and the like of liquid crystal molecules in each liquid crystal lens unit are independently controlled by voltage so as to improve the imaging quality, accelerate zoom switching, improve the convenience of assembling the zoom liquid crystal lens and reduce the overall lens thickness and the manufacturing cost.

The invention relates to solar cell silver-backed slurry with a wide sintering process window. The slurry is composed of, by weight, 45-55% of silver powder, 3-7% of lead-free silicon-free glass powder, 10-15% of organic binder, 20-40% of solvent, 0.1-5% of sintering promoter and balance of auxiliaries, wherein, the sliver powder is composed of, by weight, 50-80% of spherical silver powder and 20-50% of schistose silver powder. The silver-backed slurry adopts the silver powder with different sintering activities to be used with the lead-free silicon-free glass powder, and small amount of the sintering promoter is added, so that the silver powder of different sintering activities can realize forming of a compact silver-film structure within a wider sintering temperature range; the lead-free silicon-free glass powder is low in crystallization degree, so that dissolving, of the sliver powder, in a glass phase, within the wide sintering temperature range is promoted; and adding of certain amount of the sintering promoter can effectively avoid the sliver powder from self-coagulation to form silver bar, so that the silver-backed slurry has the wide sintering process window.

A superstructure fiber Bragg gratings (FBG) by laser-assisted direct writing of on-fiber metallic films. A laser direct write method is used to fabricate periodic films of silver nanoparticles on the non-planar surface of as-fabricated FBGs. Silver films with a thickness of about 9 [mu]m are fabricated around a Bragg grating optical fiber. The performance of the superstructure FBG is studied by applying temperature and tensile stress on the fiber. An opto-mechanical model is also developed to predict the optical response of the synthesized superstructure FBG under thermal and structural loadings. The reflectivity of sidebands in the reflection spectrum can be tuned up to 20% and 37% under thermal and structural loadings, respectively. In addition, the developed superstructure FBG is used for simultaneous measurement of multiple criteria such as force and temperature to eliminate the inherent limitation of regular FBGs in multi- parameter sensing.

The invention provides an inner wall-silver plated and liquid crystal-filled hollow optical fiber surface plasmon resonance temperature sensor and belongs to the optical fiber sensing technical field. According to the structure of the sensor, the interior of a hollow glass optical fiber is plated with silver, and the silver-plated hollow glass optical fiber is filled with liquid crystal; the inner diameter of the hollow glass optical fiber ranges from 300 microns to 500 microns, the numerical aperture of the hollow glass optical fiber is not lower than 0.27, and the length of the hollow glass optical fiber ranges from 30 mm to 50 mm; sensitization treatment is performed on the inner wall of the hollow glass optical fiber, and a 45nm-to 80nm uniform silver film is formed in the optical fiber through adopting a liquid phase chemical deposition method, and therefore, a sensing layer of surface plasmon resonance can be formed; and the hollow optical fiber is filled with thermotropic nematic liquid crystal, and plastic-clad multimode optical fibers are coupled to the ports of the optical fiber respectively, and end sealing processing is realized. With the inner wall-silver plated and liquid crystal-filled hollow optical fiber surface plasmon resonance temperature sensor adopted, subtle temperature changes can be dynamically monitored in real time. The inner wall-silver plated and liquid crystal-filled hollow optical fiber surface plasmon resonance temperature sensor is suitable for long-distance transmission. According to the inner wall-silver plated and liquid crystal-filled hollow optical fiber surface plasmon resonance temperature sensor, special inner wall silver plating technology is adopted, and the hollow optical fiber is filled with the thermotropic liquid crystal, and therefore, the oxidation of the external silver layer of the solid optical fiber surface plasma resonance sensor can be avoided.

The invention discloses a mercapto-beta-cyclodextrin modified silver nano-rod array, its preparation method and its use. The array is a silver nano-rod array with the surface modified by mercapto-beta-cyclodextrin, wherein the lengths of silver nano-rods are 150-600nm, the diameters of the silver nano-rods are 60-90nm, the space between each two silver nano-rods is 10-40nm, and the substrate of the array is formed by superposing one or more than two of a silver film, a gold film, a copper film and a nickel film which have the thicknesses of 20-50mum. The preparation method comprises the following steps: obtaining a through hole alumina template through using a secondary anode oxidation method, sputtering a metal conductive film on one surface of the through hole alumina template through using an ion sputtering method to obtain an alumina template with the metal conductive film, carrying out electric deposition through placing the alumina template with the metal conductive film in a silver electrolyte to obtain an alumina template with holes provided with the silver nano-rods and one surface coated with the metal conductive film, etching off the alumina template through putting the resultant alumina template in an acidic or strongly alkaline solution, and immersing the resultant material in an aqueous solution of the mercapto-beta-cyclodextrin for at least 1h to prepare the mercapto-beta-cyclodextrin modified silver nano-rod array. The mercapto-beta-cyclodextrin modified silver nano-rod array can be used for rapidly detecting trace PCB77 or PCB101.

The invention provides a method for preparing a gelatin / nano-silver / chitosan derivative composite film. The composite film is prepared by the following steps: by taking gelatin as a main raw material, heating to raise the temperature for dissolving gelatin particles, preparing gelatin / nano-silver sol through an in-situ reduction method, and preparing a gelatin / nano-silver film by adopting a self-assembling method in the solution; assembling a chitosan derivative macromolecule on the surface of the gelatin / nano-silver film by further adopting an electrostatic self-assembling method, and thus preparing the gelatin / nano-silver / chitosan derivative antibacterial composite film. The composite film has high biocompatibility and high antibacterial and bactericidal performance and is environment-friendly. Moreover, because the main raw material is gelatin, the composite film is rich in source, low in price, and good in film-forming property and has wide application prospects in aspects such as human skin, medical antibiosis and hemostatic materials. Meanwhile, the composite film is simple in preparation process and low in equipment requirement.

The invention discloses a silver nanowire array electrode, a preparation method and application thereof. The electrodes are silver nanowires forming an array with a diameter of 50-70nm and a wire length of 250-350nm. The bottom of the array is a silver film of 130-170nm and a copper film of 0.5-1mm; the method is to use a secondary anode on the aluminum sheet first Oxidation method to obtain a through-hole alumina template with a pore diameter of 50-70nm, and then use the ion sputtering method to vapor-deposit a silver film on one side of the alumina template, and then place the alumina template with a silver film on one side in a silver electrolysis solution, use the electrodeposition method to electrodeposit at a constant voltage of 0.08 to 0.12V for 1 to 5 minutes, then place it in the copper electrolyte, use the electrodeposition method to electrodeposit 2.5 to 3.5 at a current of 8 to 12mA / cm2 h, after that, put the aluminum oxide template with silver nanowires in the hole, one side covered with silver film and copper film in sequence, in acid solution or strong alkali solution to corrode the aluminum oxide template, and make silver nanowire array electrode. Array electrodes can be used as sensitive elements for trace detection or reduction of halogenated organic compounds.