The invention relates to the technical field of conductive glass, in particular to high-
transmittance ITO conductive glass and a preparation method thereof.The high-
transmittance ITO conductive glass is prepared by firstly cleaning a glass substrate, then
sputtering a first SiO2 film on the surface of the glass substrate through the magnetron
sputtering technology and then
sputtering an ITO film on the surface of the first SiO2 film; and sequentially sputtering a second SiO2 thin film, a first Ag thin film, a third SiO2 thin film, a second Ag thin film, a fourth SiO2 thin film, a third Ag thin film and a fifth SiO2 thin film on the surface of the ITO thin film to finally obtain the high-
transmittance ITO conductive glass. The method is simple and convenient in process and high in
controllability, the used materials are cheap and easy to obtain, and the method has a good industrial application prospect. In the constructed structure, SiO2 and ITO cooperate to form a three-layer antireflection film
system, and the visible light transmittance of the
composite film layer can be remarkably improved. Meanwhile, by introducing multiple
layers of ultrathin silver (Ag) films into the top layer SiO2, a composite nano conductive path is formed, and effective cross-layer transmission of carriers can be realized, so that the
surface layer SiO2 is endowed with good
surface conductivity.