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223 results about "Pellicle membrane" patented technology
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Pellicle (biology), a thin layer supporting the cell membrane in various protozoa. Pellicle mirror, a thin plastic membrane which may be used as a beam splitter or protective cover in optical systems.
Transparent film with laser eavesdropping prevention performance and preparation method thereof
The invention relates to the field of optical protection materials, and provides a transparent film with laser eavesdropping prevention performance and a preparation method thereof.The transparent film is composed of surface-modified doped tungsten oxide nanosheets, amino-isocyanate bifunctional lithium niobate nanowires, urethane acrylate, an ultraviolet light absorber, a silane coupling agent, a dispersing agent and a flatting agent; the molybdenum-doped tungsten oxide nanosheets are obtained through silane coupling modification after hydrothermal synthesis, and the lithium niobate nanowires are prepared through a gradient modification process of hydrothermal synthesis-silane coupling-isocyanate grafting-phenol end capping. A modified nano material is uniformly dispersed in a resin matrix through an ultrasonic dispersion composite technology, and through blade coating forming, ultraviolet curing and constant-temperature and constant-humidity post-treatment, compared with the prior art, the scheme overcomes the problems that a traditional protective film is insufficient in optical transparency, laser eavesdropping prevention function and dynamic viscoelasticity, and is suitable for the field of high-end security and protection.
Owner:HEFEI AIJIA RADIATION PROTECTION TECH CO LTD
Pellicle structure
A pellicle structure may include a membrane border and a pellicle membrane. The membrane border defines an open region. The membrane is in contact with the membrane border and extending over the open region. Thus, the membrane is capable of maintaining a thin film having a uniform thickness to prevent pattern errors.
Owner:SK HYNIX INC
Carbon-containing diffusion barrier layer for protection of CNT EUV pellicle
A pellicle including a pellicle membrane with improved stability to hydrogen plasma is provided. The pellicle membrane includes a plurality of carbon nanotubes (CNTs), where at least one carbon nanotube (CNT) of the plurality of CNTs is coated by a protection coating. The protection coating includes a plurality of nanostructures that includes a transition metal or an oxide, nitride, silicide or carbide thereof on a surface of the at least one CNT of the plurality of CNTs, a carbon-based diffusion barrier layer over at least the plurality of nanostructures, and a capping layer over at least the carbon-based diffusion barrier layer. The pellicle further includes a pellicle border attached to the pellicle membrane along a peripheral region of the pellicle membrane and a pellicle frame attached to the pellicle border.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle for EUV applications
PendingUS20250237941A1Semiconductor/solid-state device manufacturingOriginals for photomechanical treatmentCarbon nitrideThin membrane
A pellicle membrane is formed from a core layer and two capping layers of specified structure. In some embodiments, the core layer includes a high percentage of the Mo3Si crystal phase. In other embodiments, the capping layers comprise silicon oxynitride or silicon carbon nitride. The resulting pellicle membrane has a combination of high transmittance for EUV light and low reflectivity of both EUV and DUV light.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle membrane
PendingUS20250004362A1Photomechanical apparatusOriginals for photomechanical treatmentMetal silicideEngineering
A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.
Owner:ASML NETHERLANDS BV
Clamping device for fixing glass cover plate
The utility model relates to the technical field of clamping devices, in particular to a clamping device for fixing a glass cover plate. According to the technical scheme, the device comprises a suction cup, a bottom plate, a mounting plate, a screw rod, a negative pressure pump and a mounting pipe, the mounting plate is arranged above the bottom plate, a crossed adjusting groove and symmetrically-distributed stroke grooves are formed in the mounting plate, a first motor is arranged on the rear side of the mounting plate, and the screw rod is arranged at the output end of the first motor; the two ends of the screw are rotationally sleeved with nuts, clamping blocks are arranged at the upper ends of the nuts, a connecting box is arranged at the lower end of the mounting plate, a negative pressure pump is installed at the lower end of the connecting box in a communicating mode, a mounting pipe is arranged in the adjusting groove, and a suction cup is arranged at the upper end of the mounting pipe. According to the utility model, through the clamping blocks for clamping the side edges and the sucking discs for adsorbing and fixing, the problems that the clamping and fixing of the glass cover plate can hinder the processing, the processing cannot be effectively carried out and the limitation exists during optical film coating or protective film coating are solved.
Owner:KUNSHAN SANKAI OPTOELECTRONICS TECH CO LTD
Method for manufacturing pellicle for forming metal silicide capping layer and pellicle manufactured therefrom
PendingUS20250199396A1Originals for photomechanical treatmentChemical vapor deposition coatingEmissivityMetal silicide
The present invention provides a method for manufacturing a pellicle and a pellicle for extreme ultraviolet exposure manufactured by the method, the method comprising a step of forming a metal silicide capping layer by using a silicon precursor and a metal precursor, wherein the pellicle can exhibit excellent performance in terms of transmittance and thermal emissivity.
Owner:DNF
Optical assembly with coating and methods of use
Coated nanotubes and bundles of nanotubes are formed into membranes useful in optical assemblies in EUV photolithography systems. These optical assemblies are useful in methods for patterning materials on a semiconductor substrate. Such methods involve generating, in a UV lithography system, UV radiation. The UV radiation is passed through a coating layer of the optical assembly, e.g., a pellicle assembly. The UV radiation that has passed through the coating layer is passed through a matrix of individual nanotubes or matrix of nanotube bundles. UV radiation that passes through the matrix of individual nanotubes or matrix of nanotube bundles is reflected from a mask and received at a semiconductor substrate.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
A mine-used pouring seal and intrinsic safety type image processing camera with display screen and battery
ActiveCN224319429UGet rid of dependenceAvoid monitoring interruptionsImaging processingElectrical battery
The utility model discloses a mine is poured and is sealed and is with display screen and battery's image processing camera of is safe type, including camera housing, the front end both sides symmetry of camera housing are equipped with the casing, the inside rotation -connected of two casing has the film winding drum, and the transparent protective film is wound between two film winding drums, through the cooperation of transparent protective film and replacement mechanism, the problem of secondary pollution, lens scratch caused by traditional cleaning brush is solved thoroughly. The protective film is always accurate to cover the lens area through the double restraint of guide roller and limiting groove on the limiting plate, and the continuous tension of the clockwork box is matched, so that the film body is flat and wrinkle-free, and the light transmission is stable. The integrated display screen and the key can display the shooting image, the equipment state and the parameter in real time, the operator can judge the shooting effect on site without exporting data, and invalid operation is reduced.
Owner:徐州众图智控通信科技有限公司
Tracing label
The utility model relates to the technical field of traceability labels, and discloses a traceability label which comprises a traceability label mechanism, the top side of the traceability label mechanism is fixedly connected with a transparent protective film, the bottom side of the traceability label mechanism is fixedly connected with a protective film, and the left end and the right end of the protective film are both fixedly connected with auxiliary films. The left end of the traceability label mechanism is fixedly connected with a pattern sticker, the right end of the traceability label mechanism is fixedly connected with a two-dimensional code sticker, the middle part of the front end of the traceability label mechanism is fixedly connected with a display assembly, the traceability label mechanism comprises a wear-resistant layer, and the exterior of the wear-resistant layer is fixedly connected with the traceability label mechanism. According to the traceability label mechanism, the auxiliary film can drive the protective film to be taken from the base layer by swinging the auxiliary film, so that the base layer can be quickly adhered to a required position, the step of tearing the protective film is reduced, and then the adhesion efficiency of the traceability label mechanism is improved.
Owner:WEST ANHUI UNIV
Protective film coating and slitting integrated device
The invention relates to the technical field of PVC adhesive tape film processing devices, and discloses a protective film coating and slitting integrated device which comprises a supporting frame, supporting plates are fixedly connected to the front side and the rear side of the supporting frame correspondingly, a first motor is fixedly connected to the exterior of the supporting plate on the front side, and a first gear is fixedly connected to the driving end of the first motor; a second gear is rotatably connected to the interior of the supporting plate on the front side, a third gear is rotatably connected to the interior of the supporting plate on the front side, a rotating plate is fixedly connected to the exterior of the third gear, a convex column is fixedly connected to the exterior of the rotating plate, and a rotating wheel is rotatably connected to the interior of the supporting plate on the front side. According to the intermittent conveying device, the effect of intermittent conveying of the protective film is achieved, by means of the intermittent conveying mode, the protective film can have sufficient time to make full contact with the coating roller in the coating process, it is guaranteed that coating is evenly attached, and the slitting requirements of the protective films of various specifications can be met.
Owner:浙江明士达股份有限公司
Manufacturing method of large-aperture and high-board-thickness plug-in blind hole and PCB (Printed Circuit Board)
PendingCN121751522AConductive pattern formationPrinted circuit secondary treatmentPrinted circuit boardPellicle membrane
The invention discloses a large-aperture and high-board-thickness plug-in blind hole manufacturing method and a PCB, and the manufacturing method comprises the steps: providing a first optical core board and a substrate with a through hole A, enabling the first optical core board to be laminated and fixed on one side of the substrate, machining a through hole B in the first optical core board, and enabling the through hole B and the through hole A to be aligned and communicated to form a blind hole base hole; plating a conducting copper layer on the inner wall of the base hole of the blind hole; sealing one port, back on to the first optical core plate, of the blind hole base hole by using a protective film, and filling the blind hole base hole with resin; removing the protective film after the resin is cured or semi-cured, and laminating and fixing a second optical core plate on one side, back to the first optical core plate, of the substrate; and cutting the resin for multiple times until the conductive copper layer arranged on the inner wall of the blind hole base hole is completely exposed, and cutting the conductive copper layer into a set thickness to obtain the plug-in blind hole. The manufacturing method is reasonable, simple and easy to operate and implement, and the obtained plug-in blind hole has the advantages of being high in size precision, good in structural stability, good in conduction performance and the like.
Owner:KUNSHAN SUHANG CIRCUIT BOARD
Pellicle for extreme ultraviolet lithography based on metal carbide nanotubes and method for manufacturing the same
Proposed is a pellicle for extreme ultraviolet (EUV) lithography based on metal carbide nanotubes having excellent optical properties, such as EUV transmittance, as well as chemical durability required in the EUV lithography environment. The pellicle may include a frame having an opening formed in a central portion thereof, and a porous pellicle layer supported by the frame, covering the opening, and formed with a mesh structure based on metal carbide nanotubes. A method for manufacturing the pellicle is also proposed.
Owner:KOREA ELECTRONICS TECH INST
Pellicle, pellicle support, and method for manufacturing pellicle
The present invention addresses the problem of providing a pellicle capable of improving impact resistance and suppressing generation of foreign matter. A pellicle assembly (100) is provided with a pellicle (10), a support body (30) having a frame section (31) and an opening section (32), and a first reinforcing layer (40) which is a region where the pellicle (10) overlaps the support body (30) when the pellicle (10) supported by the support body (30) is viewed in plan, and which is disposed between the pellicle (10) and the support body (30). And a first reinforcing layer (40) that contains one or more materials selected from the group consisting of carbon nanotubes, graphene, silicon carbide, silicon nitride, and boron nitride, and that, when the first reinforcing layer (40) contains carbon nanotubes, the carbon nanotubes are oriented in the vertical direction with respect to the support surface (34).
Owner:LINTEC CORP
Self-adapting curved flexible protective film and production process thereof
ActiveCN118288648BSynthetic resin layered productsOptical elementsStructural engineeringPellicle membrane
The application discloses a self-adaptive bending flexible protective film and a production process thereof, and belongs to the technical field of flexible protective films, which comprises a substrate layer, an optical adhesive layer and a flexible film layer, wherein the optical adhesive layer is arranged on the substrate layer, and the flexible film layer is arranged on the optical adhesive layer. The application can solve the problem of poor use effect of the existing flexible protective film due to the fact that the flexible protective film cannot be self-adaptively bent according to use requirements. The upper elastic layer, the elastic deformation layer and the lower elastic layer are elastically connected by arranging the upper elastic bump into the upper buffer groove and arranging the lower elastic bump into the lower buffer groove, the traction force borne by the flexible protective film can be buffered to a certain extent by the staggered arrangement of the upper elastic bump and the lower elastic bump, the flexible protective film is good in flexibility and strong in elastic force during use, can be self-adaptively bent according to use requirements, the self-adaptive bending degree of the flexible protective film is improved, and the use effect of the flexible protective film is improved.
Owner:MAAN SHANDONG YIXIN MATERIAL TECH CO LTD
Industrial lens protection cover
Owner:SHENZHEN YUNSI VISION CO LTD
Lithography system having three-dimensional scaffold pellicle structure and related methods
A method is provided. The method includes: generating light by a plasma of a light source of a semiconductor processing tool; generating patterned light by a mask assembly, the patterned light including the light reflected by a pattern of the mask assembly; during generating the patterned light, protecting the mask assembly by a pellicle assembly including a pellicle membrane, the pellicle membrane including a nanotube-based scaffold structure having nanotubes bound together by a capping layer; and performing a semiconductor process on a semiconductor wafer by the patterned light.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Apparatus and method for a lithographic apparatus
An apparatus for adjusting the transmissivity of a pellicle membrane, the apparatus including an etching unit configured to etch material from the pellicle membrane, and a controller configured to control the etching unit to etch the pellicle membrane based on a predicted and / or observed wear pattern of the pellicle membrane. Also a method of adjusting the transmissivity of a pellicle membrane as well as a pellicle membrane, a pellicle assembly, and the use of the same.
Owner:ASML NETHERLANDS BV
Pellicle, pellicle removal tool, and method of utilizing pellicle and pellicle removal tool
A dis-pellicle tool or pellicle removal tool that includes one or more clamp structures that each include a respective group of pins. The respective pins of the groups of pins of the one or more clamp structures are configured to, in operation, be inserted into holes that are present within a pellicle frame of a pellicle. Once the respective pins of the groups of pins are inserted into the holes of the pellicle frame, a removal force may be applied to the pellicle frame to remove the pellicle from a photomask to which the pellicle is coupled to by an adhesive, glue, or some other similar type of coupling material.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Protective film and protective film assembly
PendingCN120836009ACarbon nanotubesOriginals for photomechanical treatmentCarbon nanotubePellicle membrane
A pellicle film (10) having a porous structure, the pellicle film (10) containing carbon nanotubes, the coefficient of variation in the diameter of voids measured on the surface of the porous structure being 0.7 or less, and the coefficient of variation in the distance between the most adjacent centers of gravity between the voids being 0.6 or less.
Owner:LINTEC CORP
Pellicle for extreme ultraviolet lithography
ActiveUS12379654B2Photomechanical apparatusOriginals for photomechanical treatmentLithography processExtreme ultraviolet
This application relates to a pellicle for extreme ultraviolet lithography used in a lithography process using extreme ultraviolet rays. In one aspect, the pellicle includes a pellicle layer formed of an M-α material in which M is combined with α. Here, M is one of Si, Zr, Mo, Ru, Y, W, Ti, Ir, or Nb, and α is at least two of B, N, C, O, or F.
Owner:KOREA ELECTRONICS TECH INST
Pellicle for flat panel display photomask
ActiveUS12282257B2Photomechanical exposure apparatusOriginals for photomechanical treatmentEngineeringFlat panel display
A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and / or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.
Owner:PHOTRONICS INC
Glass display panel protective film, preparation method therefor, and product comprising glass display panel protective film
PCT designated stage expiredWO2025139376A1Vacuum evaporation coatingSputtering coatingContact layerWear resistance
Embodiments of the present invention provide a glass display panel protective film, a preparation method therefor, and a product comprising the glass display panel protective film. The glass display panel protective film comprises an anti-reflection layer, a DLC layer, a doped transition layer, and an anti-fingerprint layer which are sequentially stacked; the anti-reflection layer is in contact with a glass display panel; the DLC layer is formed by a first hydrocarbon gas by means of a PECVD process; and the doped transition layer is formed by a doped element gas source or the doped element gas source and a second hydrocarbon gas by means of a PECVD process. The embodiments of the present application can provide a glass display panel protective film with improved surface hardness, scratch resistance and wear resistance, and good anti-reflectivity and contamination resistance, and the like.
Owner:JIANGSU FAVORED NANOTECHNOLOGY CO LTD
Pellicle membrane, pellicle, and method of making same
PendingCN121399541APhotomechanical apparatusOriginals for photomechanical treatmentNiobiumMetal silicide
A pellicle membrane for a lithographic apparatus is provided, the pellicle membrane comprising a core comprising a metallic silicon carbonitride. Also described is a pellicle comprising such a pellicle membrane, and a lithographic apparatus comprising such a pellicle membrane or pellicle. A method of making a pellicle membrane is also provided, the method comprising sputtering a metal silicide target and a silicon carbide target in a gas stream comprising nitrogen to form a metal silicon carbonitride core, optionally wherein the metal is selected from one or more of niobium, molybdenum, titanium, tungsten, platinum, cobalt, tantalum, palladium, or vanadium. The use of such pellicle membranes, pellicles, lithographic apparatuses or methods in lithographic methods or apparatuses is also described.
Owner:ASML NETHERLANDS BV
Protective film frame, protective film assembly, and application of protective film assembly
The present invention provides a pellicle frame, a pellicle assembly, and its application, a method for inspecting the pellicle assembly, an exposure original plate with the pellicle assembly, an exposure method, and a method for manufacturing a semiconductor or liquid crystal display panel. The pellicle frame is a frame-shaped pellicle frame (1) having an upper end surface (13) on which a pellicle is provided and a lower end surface (14) facing a photomask, and the minimum reflectivity of at least the inner surface (11) of the pellicle frame (1) at a light source wavelength of 500 nm to 1000 nm is 20% or less. In the pellicle assembly and the inspection method using the pellicle frame, the pellicle frame can suppress scattered light from the frame as much as possible by reducing the reflectivity of the inner surface (11) of the pellicle frame for the inspection light, thereby improving the foreign matter inspection performance. Furthermore, by reducing the reflectivity only for the wavelength of the inspection light, there are fewer restrictions on the coloring of the pellicle frame.
Owner:SHIN ETSU CHEMICAL CO LTD
Laser plastic welding apparatus
The application discloses laser plastic welding equipment and belongs to the field of laser welding, and comprises a lower cabinet and an upper cabinet fixed on the lower cabinet, a support and a Z-axis platform are fixed on the lower cabinet, a displacement sensor is fixed on the support, a laser generating part is fixed on one side of a moving part of the Z-axis platform, a rotating part is rotatably connected to the lower cabinet, a jacking part is movably connected in the rotating part, and a jacking unit for jacking up the jacking part is fixed in the lower cabinet; a protective film is arranged below the transparent glass, the protective film can form a flexible buffer layer between the workpiece and the transparent glass, the sharp edges or tiny particles on the surface of the workpiece cannot directly contact the glass, and thus the surface of the transparent glass is protected; even if scratches occur, the replaceable protective film can be replaced, and the transparent glass does not need to be repaired, the cost of the protective film is much lower than that of the transparent glass, production cost is reduced, and the maintenance cycle is shortened.
Owner:SHENZHEN NAISITE AUTOMATION EQUIPMENT CO LTD
Pellicle membrane with improved properties
PendingUS20250362587A1NanotechnologyOriginals for photomechanical treatmentThin membraneConformal coating
A pellicle assembly includes a pellicle membrane with a nanotube layer formed from thick nanotube bundles. The pellicle membrane can be formed with multiple layers and has a combination of long lifetime, high transmittance, low deflection, and small pore size. A conformal coating may applied to an outer surface of the pellicle membrane. The conformal coating protects the pellicle membrane from damage that can occur due to heat and hydrogen plasma created during EUV exposure.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle membrane with improved properties
ActiveUS12461440B2NanotechnologyOriginals for photomechanical treatmentThin membraneConformal coating
A pellicle assembly includes a pellicle membrane with a nanotube layer formed from thick nanotube bundles. The pellicle membrane can be formed with multiple layers and has a combination of long lifetime, high transmittance, low deflection, and small pore size. A conformal coating may applied to an outer surface of the pellicle membrane. The conformal coating protects the pellicle membrane from damage that can occur due to heat and hydrogen plasma created during EUV exposure.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle structure for EUV lithography and methods of manufacturing thereof
A method of manufacturing a semiconductor device includes heating a pellicle disposed over a photomask. Actinic radiation is passed through the pellicle to selectively expose a photoresist layer on a substrate. The selectively exposed photoresist layer is developed to form a pattern in the photoresist layer.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
A collecting device for preparing reflective film
The present invention discloses a collection device for preparing reflective film, which belongs to the field of preparing and collecting reflective beaded film, and includes a collection table, a laminating and hot pressing unit is arranged on the top of the collection table, which is used to coat a colloid layer on the surface of the reflective beaded film and hot press and laminate a protective film and a release film to its surface, and a multi-layer winding adjustment mechanism is arranged on the right side of the laminating and hot pressing mechanism, which is used to adjust the tension between each layer of the reflective beaded film after laminating. The present invention is provided with a multi-roll winding adjustment mechanism with a winding adjustment component, which can change the diameter of each layer of the reflective beaded film and the tension of each layer during winding to adapt to the change of winding tension occurring during the winding process of the reflective beaded film, thereby achieving the effect of buffering and adjusting the winding tension between each layer after winding, protecting the reflective beaded film, and through a colloid uniform support, the colloid layer between each film layer can be reciprocated and driven to make it uniform, thereby improving the finished product quality of the beaded layer of the reflective beaded film.
Owner:JIANGSU MINGTU NEW MATERIAL TECH CO LTD