Patents
Literature
142 results about "Pellicle membrane" patented technology
Efficacy Topic
Property
Owner
Technical Advancement
Application Domain
Technology Topic
Technology Field Word
Patent Country/Region
Patent Type
Patent Status
Application Year
Inventor
Pellicle (biology), a thin layer supporting the cell membrane in various protozoa. Pellicle mirror, a thin plastic membrane which may be used as a beam splitter or protective cover in optical systems.
Pellicle for EUV applications
PendingUS20250237941A1Semiconductor/solid-state device manufacturingOriginals for photomechanical treatmentCarbon nitrideThin membrane
A pellicle membrane is formed from a core layer and two capping layers of specified structure. In some embodiments, the core layer includes a high percentage of the Mo3Si crystal phase. In other embodiments, the capping layers comprise silicon oxynitride or silicon carbon nitride. The resulting pellicle membrane has a combination of high transmittance for EUV light and low reflectivity of both EUV and DUV light.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
A mine-used pouring seal and intrinsic safety type image processing camera with display screen and battery
ActiveCN224319429UGet rid of dependenceAvoid monitoring interruptionsImaging processingElectrical battery
The utility model discloses a mine is poured and is sealed and is with display screen and battery's image processing camera of is safe type, including camera housing, the front end both sides symmetry of camera housing are equipped with the casing, the inside rotation -connected of two casing has the film winding drum, and the transparent protective film is wound between two film winding drums, through the cooperation of transparent protective film and replacement mechanism, the problem of secondary pollution, lens scratch caused by traditional cleaning brush is solved thoroughly. The protective film is always accurate to cover the lens area through the double restraint of guide roller and limiting groove on the limiting plate, and the continuous tension of the clockwork box is matched, so that the film body is flat and wrinkle-free, and the light transmission is stable. The integrated display screen and the key can display the shooting image, the equipment state and the parameter in real time, the operator can judge the shooting effect on site without exporting data, and invalid operation is reduced.
Owner:徐州众图智控通信科技有限公司
Tracing label
The utility model relates to the technical field of traceability labels, and discloses a traceability label which comprises a traceability label mechanism, the top side of the traceability label mechanism is fixedly connected with a transparent protective film, the bottom side of the traceability label mechanism is fixedly connected with a protective film, and the left end and the right end of the protective film are both fixedly connected with auxiliary films. The left end of the traceability label mechanism is fixedly connected with a pattern sticker, the right end of the traceability label mechanism is fixedly connected with a two-dimensional code sticker, the middle part of the front end of the traceability label mechanism is fixedly connected with a display assembly, the traceability label mechanism comprises a wear-resistant layer, and the exterior of the wear-resistant layer is fixedly connected with the traceability label mechanism. According to the traceability label mechanism, the auxiliary film can drive the protective film to be taken from the base layer by swinging the auxiliary film, so that the base layer can be quickly adhered to a required position, the step of tearing the protective film is reduced, and then the adhesion efficiency of the traceability label mechanism is improved.
Owner:WEST ANHUI UNIV
Manufacturing method of large-aperture and high-board-thickness plug-in blind hole and PCB (Printed Circuit Board)
PendingCN121751522AConductive pattern formationPrinted circuit secondary treatmentPrinted circuit boardPellicle membrane
The invention discloses a large-aperture and high-board-thickness plug-in blind hole manufacturing method and a PCB, and the manufacturing method comprises the steps: providing a first optical core board and a substrate with a through hole A, enabling the first optical core board to be laminated and fixed on one side of the substrate, machining a through hole B in the first optical core board, and enabling the through hole B and the through hole A to be aligned and communicated to form a blind hole base hole; plating a conducting copper layer on the inner wall of the base hole of the blind hole; sealing one port, back on to the first optical core plate, of the blind hole base hole by using a protective film, and filling the blind hole base hole with resin; removing the protective film after the resin is cured or semi-cured, and laminating and fixing a second optical core plate on one side, back to the first optical core plate, of the substrate; and cutting the resin for multiple times until the conductive copper layer arranged on the inner wall of the blind hole base hole is completely exposed, and cutting the conductive copper layer into a set thickness to obtain the plug-in blind hole. The manufacturing method is reasonable, simple and easy to operate and implement, and the obtained plug-in blind hole has the advantages of being high in size precision, good in structural stability, good in conduction performance and the like.
Owner:KUNSHAN SUHANG CIRCUIT BOARD
Pellicle, pellicle support, and method for manufacturing pellicle
The present invention addresses the problem of providing a pellicle capable of improving impact resistance and suppressing generation of foreign matter. A pellicle assembly (100) is provided with a pellicle (10), a support body (30) having a frame section (31) and an opening section (32), and a first reinforcing layer (40) which is a region where the pellicle (10) overlaps the support body (30) when the pellicle (10) supported by the support body (30) is viewed in plan, and which is disposed between the pellicle (10) and the support body (30). And a first reinforcing layer (40) that contains one or more materials selected from the group consisting of carbon nanotubes, graphene, silicon carbide, silicon nitride, and boron nitride, and that, when the first reinforcing layer (40) contains carbon nanotubes, the carbon nanotubes are oriented in the vertical direction with respect to the support surface (34).
Owner:LINTEC CORP
Self-adapting curved flexible protective film and production process thereof
ActiveCN118288648BSynthetic resin layered productsOptical elementsStructural engineeringPellicle membrane
The application discloses a self-adaptive bending flexible protective film and a production process thereof, and belongs to the technical field of flexible protective films, which comprises a substrate layer, an optical adhesive layer and a flexible film layer, wherein the optical adhesive layer is arranged on the substrate layer, and the flexible film layer is arranged on the optical adhesive layer. The application can solve the problem of poor use effect of the existing flexible protective film due to the fact that the flexible protective film cannot be self-adaptively bent according to use requirements. The upper elastic layer, the elastic deformation layer and the lower elastic layer are elastically connected by arranging the upper elastic bump into the upper buffer groove and arranging the lower elastic bump into the lower buffer groove, the traction force borne by the flexible protective film can be buffered to a certain extent by the staggered arrangement of the upper elastic bump and the lower elastic bump, the flexible protective film is good in flexibility and strong in elastic force during use, can be self-adaptively bent according to use requirements, the self-adaptive bending degree of the flexible protective film is improved, and the use effect of the flexible protective film is improved.
Owner:MAAN SHANDONG YIXIN MATERIAL TECH CO LTD
Industrial lens protection cover
Owner:SHENZHEN YUNSI VISION CO LTD
Lithography system having three-dimensional scaffold pellicle structure and related methods
A method is provided. The method includes: generating light by a plasma of a light source of a semiconductor processing tool; generating patterned light by a mask assembly, the patterned light including the light reflected by a pattern of the mask assembly; during generating the patterned light, protecting the mask assembly by a pellicle assembly including a pellicle membrane, the pellicle membrane including a nanotube-based scaffold structure having nanotubes bound together by a capping layer; and performing a semiconductor process on a semiconductor wafer by the patterned light.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle, pellicle removal tool, and method of utilizing pellicle and pellicle removal tool
A dis-pellicle tool or pellicle removal tool that includes one or more clamp structures that each include a respective group of pins. The respective pins of the groups of pins of the one or more clamp structures are configured to, in operation, be inserted into holes that are present within a pellicle frame of a pellicle. Once the respective pins of the groups of pins are inserted into the holes of the pellicle frame, a removal force may be applied to the pellicle frame to remove the pellicle from a photomask to which the pellicle is coupled to by an adhesive, glue, or some other similar type of coupling material.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Protective film and protective film assembly
PendingCN120836009ACarbon nanotubesOriginals for photomechanical treatmentCarbon nanotubePellicle membrane
A pellicle film (10) having a porous structure, the pellicle film (10) containing carbon nanotubes, the coefficient of variation in the diameter of voids measured on the surface of the porous structure being 0.7 or less, and the coefficient of variation in the distance between the most adjacent centers of gravity between the voids being 0.6 or less.
Owner:LINTEC CORP
Pellicle for extreme ultraviolet lithography
ActiveUS12379654B2Photomechanical apparatusOriginals for photomechanical treatmentLithography processExtreme ultraviolet
This application relates to a pellicle for extreme ultraviolet lithography used in a lithography process using extreme ultraviolet rays. In one aspect, the pellicle includes a pellicle layer formed of an M-α material in which M is combined with α. Here, M is one of Si, Zr, Mo, Ru, Y, W, Ti, Ir, or Nb, and α is at least two of B, N, C, O, or F.
Owner:KOREA ELECTRONICS TECH INST
Pellicle membrane, pellicle, and method of making same
PendingCN121399541APhotomechanical apparatusOriginals for photomechanical treatmentNiobiumMetal silicide
A pellicle membrane for a lithographic apparatus is provided, the pellicle membrane comprising a core comprising a metallic silicon carbonitride. Also described is a pellicle comprising such a pellicle membrane, and a lithographic apparatus comprising such a pellicle membrane or pellicle. A method of making a pellicle membrane is also provided, the method comprising sputtering a metal silicide target and a silicon carbide target in a gas stream comprising nitrogen to form a metal silicon carbonitride core, optionally wherein the metal is selected from one or more of niobium, molybdenum, titanium, tungsten, platinum, cobalt, tantalum, palladium, or vanadium. The use of such pellicle membranes, pellicles, lithographic apparatuses or methods in lithographic methods or apparatuses is also described.
Owner:ASML NETHERLANDS BV
Protective film frame, protective film assembly, and application of protective film assembly
The present invention provides a pellicle frame, a pellicle assembly, and its application, a method for inspecting the pellicle assembly, an exposure original plate with the pellicle assembly, an exposure method, and a method for manufacturing a semiconductor or liquid crystal display panel. The pellicle frame is a frame-shaped pellicle frame (1) having an upper end surface (13) on which a pellicle is provided and a lower end surface (14) facing a photomask, and the minimum reflectivity of at least the inner surface (11) of the pellicle frame (1) at a light source wavelength of 500 nm to 1000 nm is 20% or less. In the pellicle assembly and the inspection method using the pellicle frame, the pellicle frame can suppress scattered light from the frame as much as possible by reducing the reflectivity of the inner surface (11) of the pellicle frame for the inspection light, thereby improving the foreign matter inspection performance. Furthermore, by reducing the reflectivity only for the wavelength of the inspection light, there are fewer restrictions on the coloring of the pellicle frame.
Owner:SHIN ETSU CHEMICAL CO LTD
Laser plastic welding apparatus
The application discloses laser plastic welding equipment and belongs to the field of laser welding, and comprises a lower cabinet and an upper cabinet fixed on the lower cabinet, a support and a Z-axis platform are fixed on the lower cabinet, a displacement sensor is fixed on the support, a laser generating part is fixed on one side of a moving part of the Z-axis platform, a rotating part is rotatably connected to the lower cabinet, a jacking part is movably connected in the rotating part, and a jacking unit for jacking up the jacking part is fixed in the lower cabinet; a protective film is arranged below the transparent glass, the protective film can form a flexible buffer layer between the workpiece and the transparent glass, the sharp edges or tiny particles on the surface of the workpiece cannot directly contact the glass, and thus the surface of the transparent glass is protected; even if scratches occur, the replaceable protective film can be replaced, and the transparent glass does not need to be repaired, the cost of the protective film is much lower than that of the transparent glass, production cost is reduced, and the maintenance cycle is shortened.
Owner:SHENZHEN NAISITE AUTOMATION EQUIPMENT CO LTD
Pellicle membrane with improved properties
PendingUS20250362587A1NanotechnologyOriginals for photomechanical treatmentThin membraneConformal coating
A pellicle assembly includes a pellicle membrane with a nanotube layer formed from thick nanotube bundles. The pellicle membrane can be formed with multiple layers and has a combination of long lifetime, high transmittance, low deflection, and small pore size. A conformal coating may applied to an outer surface of the pellicle membrane. The conformal coating protects the pellicle membrane from damage that can occur due to heat and hydrogen plasma created during EUV exposure.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle membrane with improved properties
ActiveUS12461440B2NanotechnologyOriginals for photomechanical treatmentThin membraneConformal coating
A pellicle assembly includes a pellicle membrane with a nanotube layer formed from thick nanotube bundles. The pellicle membrane can be formed with multiple layers and has a combination of long lifetime, high transmittance, low deflection, and small pore size. A conformal coating may applied to an outer surface of the pellicle membrane. The conformal coating protects the pellicle membrane from damage that can occur due to heat and hydrogen plasma created during EUV exposure.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle structure for EUV lithography and methods of manufacturing thereof
A method of manufacturing a semiconductor device includes heating a pellicle disposed over a photomask. Actinic radiation is passed through the pellicle to selectively expose a photoresist layer on a substrate. The selectively exposed photoresist layer is developed to form a pattern in the photoresist layer.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Pellicle membrane for a lithographic apparatus
PendingUS20250264795A1Vacuum evaporation coatingPhotomechanical apparatusBond-dissociation energyMaterials science
A pellicle membrane including emissive crystals in a matrix containing at least one element which forms a chemical bond with silicon having a bond dissociation energy of at least 447 kJ mol−1. A method of manufacturing such a pellicle membrane, a pellicle assembly including such a pellicle membrane and a lithographic apparatus including such a pellicle assembly or pellicle membrane. Also the use of molybdenum silicon sulphide, oxide, selenide, or fluoride in a pellicle membrane. The use of such a pellicle membrane, pellicle assembly or lithographic apparatus in a lithographic apparatus or method.
Owner:ASML NETHERLANDS BV
Modified high anti-reflection optical film
The utility model discloses a modified high anti-reflection optical film, which belongs to the technical field of optical films, and is characterized by comprising an optical film main body, the optical film main body comprises a base layer, the top of the base layer is provided with an anti-reflection film layer structure, and the top of the anti-reflection film layer structure is provided with a protective film layer structure; the anti-reflection film layer structure comprises a first anti-reflection film layer and a second anti-reflection film layer, the first anti-reflection film layer is arranged on the top of the base layer, the second anti-reflection film layer is arranged on the top of the first anti-reflection film layer, the protective film layer structure comprises an anti-interference layer and a protective layer, the anti-interference layer is arranged on the top of the first anti-reflection film layer, and the protective layer is arranged on the top of the second anti-reflection film layer. According to the optical element, the antireflection film layer structure is arranged, antireflection is carried out on light with different specific wavelengths, the optical film body can achieve the efficient antireflection effect in a wider wavelength range, the transmittance of the optical element in the multi-wavelength light environment is improved, and therefore the imaging quality, the optical communication efficiency and the like are improved.
Owner:JIANGSU DONGTAI SHILI IND MATERIALS CO LTD
Full-automatic film sticking machine
The utility model discloses a full-automatic film sticking machine, and relates to the technical field of film sticking machines, the full-automatic film sticking machine comprises a control console, a portal frame is fixed on the control console, a lifting cylinder is fixed on the portal frame, and a U-shaped frame is fixed at the end part of a cylinder rod of the lifting cylinder; a film pasting roller is movably connected into the U-shaped frame; according to the film pasting device, during film pasting, a cylinder rod of the lifting air cylinder extends out, so that the U-shaped frame provided with the film pasting roller moves downwards until a protective film is pasted on the upper surface of a product, and the protective film is pasted on the product through proper pressure; through the arrangement of a lifting air cylinder, the film pasting device can well adapt to film pasting of products with different thicknesses, and it is guaranteed that the products have the good pasting effect during film pasting; and the rodless cylinder can drive the rectangular frame to move left and right, so that the design is beneficial to film pasting of products with different widths, the products can be better matched with protective films, and the protective films can be neatly pasted on the products.
Owner:DONGGUAN WEIFENG NEW MATERIALS TECH CO LTD
Frame assembly used for mounting pellicle on photomask
A frame assembly for mounting a pellicle on a photomask is disclosed. The frame assembly includes a frame to which the pellicle is attached, a stud attached to the photomask, and a fixture that is inserted into the lower side of the frame. The stud and the fixture are magnetically bonded to each other, and a gap of a certain height is created between the photomask and the frame by the stud under the fixture. This eliminates the need for precise alignment of the frame during the mounting process on the photomask, and facilitates the separation of the frame from the photomask for reuse. The formation of the gap eliminates the need for a separate process to create vent holes in the frame.
Owner:S & S TECH
Method of manufacturing a membrane assembly
PendingCN120540001APhotomechanical exposure apparatusOriginals for photomechanical treatmentMechanical engineeringMaterials science
A method of manufacturing a membrane assembly for EUV lithography is provided in which a layer forming at least a portion of a pellicle membrane is provided after one or more etching steps defining a pellicle boundary retaining the pellicle membrane. Also provided is a pellicle substrate comprising a stack having a front side and a back side, where one or more layers on the back side of the stack have been selectively removed to define a pellicle boundary region for holding the pellicle membrane before a layer forming at least a portion of the pellicle membrane has been disposed.
Owner:ASML NETHERLANDS BV
Self-cleaning aspheric monolithic field lens
The utility model discloses a self-cleaning aspheric monolithic field lens, which relates to the technical field of field lenses and comprises an aspheric mirror and a protection assembly, the aspheric mirror is of an integrated structure, and the protection assembly is arranged on the surface of the aspheric mirror. The protection assembly comprises an ITO anti-static film, an elastic protection film, a dustproof diaphragm, a nanoscale ultrathin film and a reinforcing protection ring, the ITO anti-static film is arranged on the lower surface of the aspherical mirror, the elastic protection film is arranged on the upper surface of the aspherical mirror, the dustproof diaphragm is connected to the upper surface of the elastic protection film, and the nanoscale ultrathin film is arranged on the lower surface of the aspherical mirror. And a nanoscale ultrathin film is arranged on the upper surface of the dustproof diaphragm. According to the self-cleaning aspheric monolithic field lens, the self-cleaning performance of the device can be achieved by preventing dirt from adhering to the surface through the protection assembly, the surface does not need to be frequently cleaned, the practicability of the device is improved, the device can be integrally and rapidly installed through the elastic sealing gasket and the installation assembly, and installation is stable and not prone to loosening.
Owner:PIXEL OPTICS (SHENZHEN) CO LTD
Optical film structure
The embodiment of the utility model belongs to the technical field of optical films. The utility model further relates to an optical film structure which comprises an optical film assembly, one face of the optical film assembly is provided with a first protective film layer, the other face of the optical film assembly is provided with a second protective film layer, and the second protective film layer and the first protective film layer are matched to be used for protection in the machining process of the optical film assembly. The second protective film layer and the first protective film layer are arranged on the two faces of the optical film assembly respectively, the second protective film layer and the first protective film layer are matched for protection in the machining process of the optical film assembly, the situation that dust, woolen yarn and other impurities adhere to the optical film assembly is reduced, the cleanliness of the optical film assembly is remarkably improved, and the service life of the optical film assembly is prolonged. And the reject ratio of downstream TP 100-grade laminating workshops is greatly reduced, and rework and material waste are greatly reduced.
Owner:TRULY OPTO ELECTRONICS
Forge piece machining table with protection mechanism
The forge piece machining table comprises a machine table, a protection plate is installed on the top of the machine table, movable protection doors are symmetrically arranged on one side of the protection plate, an opening and closing mechanism is installed at the bottom end of each protection door, and the protection mechanism is installed on the side, facing the protection plate, of each protection door. The protection mechanism comprises sliding grooves symmetrically fixed to the back end of the protection door, and supporting frames are slidably connected into the sliding grooves. By arranging the protection mechanism, a supporting frame can be installed on the back of the protection door through a sliding groove, a protection film is fixed in the supporting frame, chippings generated in the workpiece machining process can be sputtered to the protection film, a visual plate on the protection door is protected through the protection film, scratches generated on the visual plate due to sputtering of the chippings are avoided, and the machining quality of the workpiece is improved. And the protective film is of a detachable structure, so that the protective film can be conveniently and regularly replaced by the worker.
Owner:NINGBO TAIWEI METAL PRODUCTS CO LTD
Protective film, protective film assembly, exposure original plate, and exposure device
The present invention provides a pellicle film in which the in-plane thickness is easily uniform, and as a result, the uniformity of the transmittance of EUV light is easily achieved. A pellicle film (12) for use in EUV lithography, the pellicle film (12) having a bundle (21) comprising a plurality of carbon nanotubes (CNTs) (23). Here, when the beam (21) is cut in a plane intersecting the direction in which the CNTs extend, the protective film (12) includes the beam (21) in which the flatness ratio {(t1-t2) / t1} calculated from the long diameter (t1) and the short diameter (t2) of the beam (wq) is 0.10-0.90.
Owner:MITSUI CHEMICALS INC
Pellicle membrane for a lithographic apparatus
A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
Owner:ASML NETHERLANDS BV
Pellicle pasting device, pellicle pasting method, pellicle transfer printing device, and pellicle transfer printing method
PendingCN121989438AAdhesive processes with surface pretreatmentOriginals for photomechanical treatmentBiomedical engineeringNanotechnology
Owner:LINTEC CORP
Methods for dry printing carbon nanotube membranes
ActiveUS12557609B2Material nanotechnologySemiconductor/solid-state device manufacturingFiberThin membrane
Methods for preparing a nanotube membrane for use in a pellicle membrane using dry printing are disclosed. Nanotube fibers are produced in a reaction vessel and dry sprayed onto a filter to form the nanotube membrane. The thickness of the nanotube membrane can be controlled by moving the reaction vessel and the filter relative to each other, or by further processing to reduce the thickness of the layer deposited onto the filter. This method reduces the number of process steps, reducing overall production time, and can also be used to produce larger membranes. The pellicle membrane can be formed with multiple layers and has a combination of high transmittance, low deflection, and small pore size. A conformal coating may applied to an outer surface of the pellicle membrane to protect the pellicle membrane from damage that can occur due to heat and hydrogen plasma created during EUV exposure.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD