Golden low radiation film coating glass and manufacturing method thereof
A technology of low radiation coating and manufacturing method, which is applied to the field of golden low radiation coating glass and its manufacturing, can solve the problems of high price and limited market promotion, and achieve the effects of high manufacturing efficiency, easy promotion and stable quality
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specific Embodiment approach 1
[0040] Embodiment 1: A golden low-emissivity coated glass with five layers of composite film
[0041] The vacuum magnetron sputtering coating machine produced by the American BOC company is adopted, and the output power of the target is 0kw~120kw. The process parameters are shown in Table 1.
[0042] Table 1
[0043] target
Sputtering pressure (mtor)
Film thickness (nm)
Titanium target
3
a layer 22
copper target
pure argon
4
b-layer 10
silver target
pure argon
4
c-layer 13
Nichrome target
pure argon
4
d layer 3
Silicon target
3
e-layer 105
[0044] Layer a in Table 1 is titanium oxide (TiO 2 ) dielectric film layer, b layer, c layer, d layer are respectively copper film layer, silver film layer, nickel-chromium film layer, e layer is silicon nitrid...
specific Embodiment approach 2
[0048] Specific implementation mode 2: A golden low-emissivity coated glass with four layers of composite film
[0049] The equipment used is the same as that of the specific embodiment one.
[0050] The process parameters are shown in Table 2.
[0051] Table 2
[0052] target
Sputtering pressure (mtor)
Film thickness (nm)
-
-
-
-
copper target
pure argon
3
b layer 7
silver target
pure argon
3
c-layer 4
Nichrome target
pure argon
4
d layer 4
Silicon target
3
e-layer 113
[0053] In Table 2, layer b, layer c and layer d are copper film layer, silver film layer and nickel-chromium film layer respectively, and layer e is silicon nitride (Si 3 N 4 ) protective film layer.
[0054] The performance parameter of gained product is as follows:
[0055]Trans...
specific Embodiment approach 3
[0057] Specific implementation mode three: Another kind of composite film layer is five-layer golden low-emissivity coated glass
[0058] The equipment used is the same as that of the specific embodiment one.
[0059] The process parameters are shown in Table 3.
[0060] table 3
[0061] target
Sputtering pressure (mtor)
Film thickness (nm)
Titanium Oxide Ceramic Leather
Oxygen: Argon = 8.0%
3
a layer 20
copper target
pure argon
4
b-layer 9
silver target
pure argon
4
c-layer 14
Nichrome target
pure argon
4
d layer 4
Silicon target
Argon: Nitrogen = 33.3%
4
e-layer 100
[0062] Layer a in Table 3 is titanium oxide (TiO 2 ) dielectric film layer, b layer, c layer, d layer are respectively copper film layer, silver film layer, nickel-chromium film layer, e layer is si...
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