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Self assembly chemical silver plating method on non metal material surface

A non-metallic material, chemical silver plating technology, applied in the direction of metal material coating process, liquid chemical plating, coating, etc., can solve the problems of troublesome operation and difficult reaction, and achieve low cost, simple method and strong binding force high effect

Inactive Publication Date: 2006-06-14
FUDAN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The problem with this type of method is that there is no pretreatment activation step before electroless plating. In the absence of an activation center, it is difficult to induce the next step by simply relying on the new ecological silver formed by electroless plating.
In addition, chemical silver plating using mercaptosilane molecules requires repeated solvent extraction on glass sheets, which is cumbersome to operate
[0007] It should be emphasized that so far no reports of electroless silver plating on silicon using self-assembly methods have been found in domestic and foreign literature.

Method used

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  • Self assembly chemical silver plating method on non metal material surface
  • Self assembly chemical silver plating method on non metal material surface
  • Self assembly chemical silver plating method on non metal material surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Embodiment 1. Electroless silver plating on silicon wafer

[0019] The monocrystalline silicon wafer (5-10Ωcm -1 ) after surface cleaning, carry out surface hydroxylation (30 minutes) in sulfuric acid hydrogen peroxide (volume ratio is 7: 3) mixed solution, then put into 1-10% APTMS (aminopropyltrimethoxysilane) aqueous solution and soak 1- 10h, after rinsing, immerse in gold or silver sol with a particle size of about 2-30nm for 1-10h, and finally perform electroless plating in the mixed plating solution.

[0020] Preparation of gold or silver sol: 1mL mass (g) volume (ml) fraction of 1% AuCl 3 ·HCl or AgNO 3 The aqueous solution was added to 100 mL of ultrapure water, and 1 mL of an aqueous solution of trisodium citrate with a mass volume fraction of 1% was added dropwise under continuous magnetic stirring. Then slowly add 1 mL of an aqueous solution containing 0.07-0.09% sodium borohydride and 1% trisodium citrate dropwise, and then stir for 1 hour after completio...

Embodiment 2

[0022] Embodiment 2 Electroless silver plating on titanium dioxide sheet

[0023] Clean the titanium dioxide sheet (or the titanium sheet with the titanium dioxide oxide film on its surface) and calcinate it in a muffler furnace at 600-800°C for 0.5-1 hour, then soak it in 1-10% APTMS aqueous solution for 1-10 hours After rinsing, put the silver sol with a particle size of 10-30nm for 1-10 hours, and finally perform electroless plating in the mixed plating solution. Wherein, the preparation of silver sol and electroless plating solution is the same as Example 1.

[0024] The silver film obtained by the two embodiments has very strong binding force to the substrate, good electrochemical properties, and has image 3 properties shown.

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Abstract

The invention belongs to chemical silvering technique field, concretely a non-metallic materials surface self-assembly chemical silvering method. The method steps are as follows: using silicane like molecule with amino end as self-assembly decorating layer at the non-metallic material surface; using gold or silver nanometer sol grain as the catalysis center of the chemical plating to quickly form silver coating. The binding force of the silver coating and substrate is strong. The control of the coating depositing speed is easy. The operation is simple; the cost is low; it is fit for large-scale production, and plating silver film at many substrates surface.

Description

technical field [0001] The invention belongs to the technical field of chemical silver plating, and in particular relates to a method for carrying out chemical silver plating on the surface of non-metallic materials such as silicon, glass, quartz, ceramics and titanium dioxide. Background technique [0002] Silver has many excellent physical properties. It is the most conductive metal element, with good thermal conductivity, reflectivity, and ductility; and the chemical properties of silver are stable. In addition, silver has good bactericidal properties and water purification effects , has an important health care function, the silver layer is bright and even, and can be used for exquisite craft decoration. Forming a silver coating on non-metallic surfaces such as silicon and glass will greatly improve the properties of such materials, including electrical contact, light reflection, etc., and will greatly expand the application field. This surface processing technology und...

Claims

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Application Information

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IPC IPC(8): C23C18/44C23C18/18
Inventor 蔡文斌霍胜娟王金意
Owner FUDAN UNIV
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