Au-Au dimer array structure as well as preparation method and application thereof

An array structure and dimer technology, which is applied in measuring devices, instruments, and material analysis through optical means, can solve the problems of poor repeatability of test results, complicated methods, and difficulty in controlling repeatability, and achieve Raman signal Stable, simple process, enhanced effect of plasmon resonance

Active Publication Date: 2020-04-10
JIANGSU HINOVAIC TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The existing Chinese patent document CN105954253B discloses a glucose SERS detection substrate based on an Ag@Ag nano-dot hierarchical galaxy array and its preparation method, including a silicon substrate and a surface-deposited silver nano-dot master particle array and a sub-particle array. Structure, the diameter of the silver nano-dot mother particle is 91-97nm, the diameter of the silver nano-dot particle particles distributed on the surface of the silver nano-dot mother particle and its surroundings is 3-12nm, the galaxy structure is highly coupled, and the Raman signal is significantly enhanced. The preparation method includes The method of adjusting the aperture twice successively is complex and difficult to control the repeatability, resulting in poor repeatability of the test results

Method used

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  • Au-Au dimer array structure as well as preparation method and application thereof
  • Au-Au dimer array structure as well as preparation method and application thereof
  • Au-Au dimer array structure as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] This example discloses an embodiment of the construction of the first gold particles, which is specifically described as follows:

[0059] Cut out two silicon wafers with a thickness of 0.2mm and a size of 2cm×2cm, marked as No. 1 and No. 2 silicon wafers. Put the two silicon wafers into deionized water, anhydrous ethanol, acetone, and 1.84g / ml concentration in turn. Sulfuric acid, 1.1g / m hydrogen peroxide water, deionized water were ultrasonically cleaned, ultrasonic frequency was 20KHz, ultrasonic power was 500W, each liquid was ultrasonically cleaned for 20min, and then placed in an oven for drying at 100°C until the water on the silicon wafer was completely After evaporation, the silicon wafer was placed in an ultraviolet-ozone cleaning machine for irradiation for 30 minutes to obtain a silicon wafer with a hydrophilic surface;

[0060] Take 10 μL of the suspension of polystyrene microspheres with a content of 2.5 wt% and diameters of 300 nm and 500 nm respectively,...

Embodiment 2

[0066] This embodiment discloses an implementation of the Au-Au dimer array structure, which is specifically described as follows:

[0067] Cut out 3 silicon wafers with a thickness of 0.2mm and a size of 2cm×2cm, marked as silicon wafers No. 1, 2 and 3, and then put these silicon wafers into deionized water, absolute ethanol, acetone, 1.84g / ml concentrated sulfuric acid, 1.1g / ml hydrogen peroxide, deionized water, ultrasonic cleaning, ultrasonic frequency 20KHz, ultrasonic power 1000W, ultrasonic cleaning for each liquid for 40min, and then put it in an oven to dry at 90 ℃, until the water on the silicon wafer is completely evaporated After that, the silicon wafer was placed in an ultraviolet-ozone cleaning machine for irradiation for 30 minutes to obtain a silicon wafer with a hydrophilic surface;

[0068] Take 20 μL of the polystyrene microsphere suspension with a content of 2.5wt% and a diameter of 300nm, mix it with an equal volume of absolute ethanol, and then perform u...

Embodiment 3

[0080] This embodiment discloses an implementation of the Au-Au dimer array structure, which is specifically described as follows:

[0081]Cut out 3 silicon wafers with a thickness of 0.2mm and a size of 2cm×2cm. Put the wafers into deionized water, anhydrous ethanol, acetone, 1.84g / ml concentrated sulfuric acid, 1.1g / ml hydrogen peroxide, Ultrasonic cleaning was carried out in ionized water, ultrasonic frequency 20KHz, ultrasonic power 500W, each liquid was ultrasonically cleaned for 40min, and then placed in an oven to dry at 110°C. After the water on the silicon wafer was completely evaporated, the silicon wafer was placed in an ultraviolet ozone cleaning machine. Irradiate for 30min to obtain a silicon wafer with hydrophilic surface;

[0082] Take 10 μL of the polystyrene microsphere suspension with a content of 2.5wt% and a diameter of 500nm, mix it with an equal volume of absolute ethanol, and then perform ultrasonic vibration for 15min to obtain a uniformly dispersed po...

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Abstract

The invention relates to the technical field of surface enhanced Raman scattering active substrates, in particular to an Au-Au dimer array structure and a preparation method and application thereof. The invention discloses an Au-Au dimer array structure, which comprises a substrate and an Au-Au columnar dimer structure arranged on the substrate in an array; the Au-Au dimer array structure is characterized by comprising first gold particles, a silicon dioxide interlayer and second gold particles, wherein the three parts sequentially extend upwards from the substrate. When the Au-Au dimer arraystructure is used for an SERS substrate, a Raman signal is stable, and the repeatability is good; adjacent particles generate coupling of localized surface plasmas, so that plasma resonance is enhanced; and a stronger SERS effect is generated by being compared with single particles.

Description

technical field [0001] The invention relates to the technical field of surface-enhanced Raman scattering active substrates, in particular to an Au-Au dimer array structure and a preparation method and application thereof. Background technique [0002] Surface-enhanced Raman scattering (SERS) technology overcomes the inherent weak signal of traditional Raman spectroscopy, and can increase the Raman intensity by several orders of magnitude, enough to detect the Raman signal of a single molecule, which can be used for Trace material analysis, flow cytometry, and other applications, where the sensitivity and measurement speed of traditional Raman are insufficient, have attracted much attention for their wide-ranging applications in chemical, catalysis, biomedical, and environmental fields . [0003] Raman enhancement requires a metal surface with nanoscale roughness as a substrate, that is, an activity-enhancing substrate. Molecules adsorbed on such a surface will produce Raman...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65
CPCG01N21/658
Inventor 杨绍松刘广强毛海央陈大鹏
Owner JIANGSU HINOVAIC TECH CO LTD
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