207 results about "Back bias" patented technology

A semiconductor memory cell includes a floating body region configured to be charged to a level indicative of a state of the memory cell; a first region in electrical contact with said floating body region; a second region in electrical contact with said floating body region and spaced apart from said first region; a gate positioned between said first and second regions; and a back-bias region configured to inject charge into or extract charge out of said floating body region to maintain said state of the memory cell. Application of back bias to the back bias region offsets charge leakage out of the floating body and performs a holding operation on the cell. The cell may be a multi-level cell. Arrays of memory cells are disclosed for making a memory device.

A nonvolatile memory and a method of operating the same are proposed. The nonvolatile memory has single-gate memory cells, wherein a structure of a transistor and a capacitor is embedded in a semiconductor substrate. The transistor comprises a first conducting gate stacked on the surface of a dielectric with doped regions formed at two sides thereof as a source and a drain. The capacitor comprises a doped region, a dielectric stacked thereon, and a second conducting gate. The conducting gates of the capacitor and the transistor are electrically connected together to form a single floating gate of the memory cell. The semiconductor substrate is p-type or n-type. Besides, a back-bias program write-in and related erase and readout operation ways are proposed for the single-gate memory cells.

Methods and apparatus for varying one or more internally generated voltages of a memory device based on the temperature of the memory device are provided. The device temperature may be measured directly, for example, via an on-chip temperature sensor, or may be supplied as bits in a mode register containing temperature information.

Methods of maintaining a state of a memory cell without interrupting access to the memory cell are provided, including applying a back bias to the cell to offset charge leakage out of a floating body of the cell, wherein a charge level of the floating body indicates a state of the memory cell; and accessing the cell.

Disclosed herein is a back-bias voltage regulator circuit for regulating a back-bias voltage used to control leakage current in at least one transistor within a primary circuit. In one embodiment, the back-bias voltage regulator circuit includes a voltage divider circuit configured to receive a back-bias voltage from a charge pump, and to generate a divided voltage signal by dividing the back-bias voltage based on a ratio of resistances of resistive elements within the voltage divider. In addition, the regulator circuit includes an output circuit configured to receive the back-bias voltage from the charge pump and having an output node for outputting the back-bias voltage, as well as a reference voltage circuit configured to generate a reference voltage signal based on a threshold voltage of the at least one transistor in the primary circuit. Also in such an embodiment, the regulator circuit includes a comparison circuit configured to compare the divided voltage signal to the reference voltage signal and to operate the output circuit to regulate the back-bias voltage level based on the comparison. Also disclosed is a related method of regulating a back-bias voltage to control leakage current in at least one transistor within a primary circuit.

A semiconductor device includes at least two stacked SOI levels or configurations, each of which may include transistor elements formed on the basis of a given technology node. At least the uppermost device level may include a back bias mechanism for providing superior controllability of the respective transistor elements. In some illustrative embodiments, at least two of the stacked SOI configurations may have implemented therein a back bias mechanism, wherein an appropriate contact regime is provided so as to connect to the respective conductive regions or layers below the corresponding buried insulating layers for each stacked device level. Consequently, increased lateral packing density may be accomplished on the basis of a given technology node.