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914results about "Thyristor" patented technology

Nanotube-based switching elements

Nanotube-based switching elements and logic circuits. Under one embodiment of the invention, a switching element includes an input node, an output node, a nanotube channel element having at least one electrically conductive nanotube, and a control electrode. The control electrode is disposed in relation to the nanotube channel element to controllably form an electrically conductive channel between the input node and the output node. The channel at least includes said nanotube channel element. The output node is constructed and arranged so that channel formation is substantially unaffected by the electrical state of the output node. Under another embodiment of the invention, the control electrode is arranged in relation to the nanotube channel element to form said conductive channel by causing electromechanical deflection of said nanotube channel element. Under another embodiment of the invention, the output node includes an isolation structure disposed in relation to the nanotube channel element so that channel formation is substantially invariant from the state of the output node. Under another embodiment of the invention, the isolation structure includes electrodes disposed on opposite sides of the nanotube channel element and said electrodes produce substantially the same electric field. Under another embodiment of the invention, a Boolean logic circuit includes at least one input terminal and an output terminal, and a network of nanotube switching elements electrically disposed between said at least one input terminal and said output terminal. The network of nanotube switching elements effectuates a Boolean function transformation of Boolean signals on said at least one input terminal. The Boolean function transformation includes a Boolean inversion within the function, such as a NOT or NOR function.
Owner:NANTERO

Low triggering voltage SOI silicon-control-rectifier (SCR) structure

A low triggering voltage PD-SOI (Partially-Depleted Silicon-on-Insulator) electrostatic discharge (ESD) protection structure is disclosed. In one embodiment, the protection structure includes: A semiconductor substrate; a thin film layer separated from a bulk silicon substrate by an insulator inside the semiconductor substrate; a first isolation region formed in the thin film layer; a second isolation region formed in the thin film layer; a first region having a first conductivity type formed in between the first and second isolation region; a second region formed in between the first region and the second isolation region, the second region being of a second conductivity type; a third region formed in between the first isolation region and the first region, the third region being of the first conductivity type; a fourth region formed in between the second isolation region and the second region, the fourth region being of the first conductivity type; a fifth region having an exposed upper surface formed in the first region, the fifth region being of the second conductivity type; a sixth region having an exposed surface formed in the second region, the sixth region being of the second conductivity type; and a seventh region having an exposed upper surface formed in the second region and overlapping the first region, moreover, the seventh region being between the fifth and sixth region and the seventh region being of the first conductivity type. Another embodiment of the present invention is very similar to the previous one, which is also extracted in the present specification.
Owner:UNITED MICROELECTRONICS CORP
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