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1297 results about "Application specific" patented technology

Application Specific. Products developed for specific applications. These include alternative/renewable energy and lighting applications. Connectors in this category include photovoltaic and those used in LED and solid state lighting.

Method, system and computer program product for assessing information security

A method, system and computer program product for assessing information security interviews users regarding technical and non-technical issues. In an embodiment, users are interviewed based on areas of expertise. In an embodiment, information security assessments are performed on domains within an enterprise, the results of which are rolled-up to perform an information security assessment across the enterprise. The invention optionally includes application specific questions and vulnerabilities and/or industry specific questions and vulnerabilities. The invention optionally permits users to query a repository of expert knowledge. The invention optionally provides users with working aids. The invention optionally permits users to execute third party testing/diagnostic applications. The invention, optionally combines results of executed third party testing/diagnostic applications with user responses to interview questions, to assess information security. A system in accordance with the invention includes an inference engine, which may include a logic based inference engine, a knowledge based inference engine, and/or an artificial intelligence inference engine. In an embodiment, the invention includes an application specific tailoring tool that allows a user to tailor the system to assess security of information handled by a third party application program.
Owner:SAFEOPERATIONS

System and method for lithography simulation

There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.
Owner:ASML NETHERLANDS BV
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