The invention belongs to the technical field of
semiconductor photoelectric device manufacturing, and particularly relates to an epitaxial growth method of a P-type Bragg reflection layer, a
vertical cavity surface emitting laser and an epitaxial growth method of the
vertical cavity surface emitting laser. The P-type Bragg reflection layer provided by the invention is grown by adopting a
metal organic compound chemical vapor deposition-in-situ reflection monitoring method, and comprises multiple
layers of unit structures which are arranged in a laminated manner, each layer of
unit structure sequentially comprises a carbon-doped GaAs layer, a first carbon-doped AlGaAs layer, a
delta-doped layer and a second carbon-doped AlGaAs layer from bottom to top, the
delta-doped layer is located at an optical
standing wave node, and the second carbon-doped AlGaAs layer is located at an optical
standing wave node. And the
delta-doped layer is a third carbon-doped AlGaAs layer. According to the P-type Bragg reflection layer provided by the invention, the resistance of a P-DBR device can be remarkably reduced while
high reflectivity is maintained, and the optimal balance of photoelectric properties is achieved through accurate control of a
doping position.