16 results about "Plasma channel" patented technology

A plasma nuclear fusion reactor comprises a reactor, a plasma channel is arranged in the reactor, an inlet of the plasma channel is communicated with an outlet of an electromagnetic acceleration channel of a plasma electromagnetic acceleration device, the inner end of the plasma channel is communicated with a plasma nuclear fusion chamber, and the inner wall of the plasma nuclear fusion chamber is an arc-shaped surface; the plasma electromagnetic acceleration device comprises a machine shell, a positive excitation conductor and a negative excitation conductor are arranged in the machine shell in parallel, the positive excitation conductor is connected with a positive pole of an excitation power supply, the negative excitation conductor is connected with a negative pole of the excitation power supply, and an electromagnetic acceleration channel capable of being vacuumized is arranged between the positive excitation conductor and the negative excitation conductor. The invention aims to provide the plasma nuclear fusion reactor which can rapidly accelerate plasmas, enables the plasmas to move at a high speed and have huge kinetic energy, and further enables the plasmas to enter the plasma nuclear fusion chamber and generate a nuclear fusion reaction.

The application discloses a sustained combustion type plasma nuclear fusion chamber. The chamber comprises a shell, a plasma channel is arranged in the shell, the plasma channel is a tapered pipeline from an inlet end to an outlet end, the inlet of the plasma channel is communicated with the outlet of an electromagnetic acceleration channel of a plasma electromagnetic acceleration device, the inner end of the plasma channel is communicated with a plasma nuclear fusion cavity, the inner wall of the plasma nuclear fusion cavity is an arc surface, a nuclear fusion sustained combustion cavity is arranged on the inner wall of the plasma nuclear fusion cavity, and the nuclear fusion sustained combustion cavity is filled with nuclear fusion fuel. The sustained combustion type plasma nuclear fusion chamber can make plasma enter the plasma nuclear fusion chamber and generate primary nuclear fusion, and the primary nuclear fusion can transmit heat to the nuclear fusion fuel in the nuclear fusion sustained combustion cavity, thereby triggering secondary nuclear fusion.

The utility model relates to vacuum coating equipment technical field especially is concerned about a kind of device of high-frequency oscillation auxiliary magnetron sputtering preparation DLC film, including vacuum sputtering cavity, vacuum system and gas delivery system, the vacuum system and gas delivery system are communicated with the inner chamber of vacuum sputtering cavity respectively, the inside of vacuum sputtering cavity is equipped with magnetron sputtering assembly, high-frequency oscillation auxiliary assembly and substrate turret assembly, plasma channel is formed between the magnetron sputtering assembly and substrate turret assembly, the high-frequency oscillation auxiliary assembly includes oscillation coil and the high-frequency oscillation power supply of oscillation coil electrical connection, the oscillation coil is set to the region corresponding plasma channel in vacuum sputtering cavity inside, the utility model breaks through the ionization limit of traditional magnetic field by introducing high-frequency oscillation field to strengthen the collision excitation of electron and particle, provides feasible path for preparing high-performance DLC film, and its technical research and development and application have important significance to break through industry bottleneck.

A semiconductor processing system is provided. The system may have: a processing chamber defining an interior volume; a foreline in fluid connection with the internal volume and configured to receive process gas from the internal volume, the foreline having a foreline network and a foreline outlet conduit downstream of the foreline network; a throttle valve within the foreline outlet conduit, including a movable gate having an orifice, and configured to control gas flow through the foreline; and a gas injector in the foreline network and configured to direct a buffer gas into a conduit of the foreline network. The system may have a remote plasma source interface fluidly connected to the foreline outlet conduit, downstream of the interior volume, and having a plasma channel configured to direct a remote plasma flow into the foreline outlet conduit.

A kind of synchronous timing control system for strong laser plasma interaction experiment, including a femtosecond laser device, a square wave signal generator, a jet signal synchronizer, three delay timers, a 12-way signal synchronizer, two shutter controllers, a YAG laser, a jet controller, multiple experimental acquisition instruments including an electron spectrometer, a rear imaging CCD, a spectrometer CCD.The present application is mainly applied to the field of strong laser plasma interaction, which can accurately control the interaction time of femtosecond laser pulse and nanosecond gate plasma channel, and accurately control the start acquisition time and acquisition duration of various experimental data, improve the signal-to-noise ratio, and the whole timing system is very easy to adjust.The present application also has strong expansibility, when ionized gas is not needed to form plasma channel, the 1Hz pulse signal timing of the right half of the dashed line can be removed, so that the interaction time of femtosecond laser pulse and millisecond gate jet gas can be accurately controlled.The expansibility of the present application is also reflected in that enough output ports have been reserved, and suitable functional elements can be connected subsequently.

A beam accelerator system comprises an ion accelerator that generates a high-energy ion beam, a low-pressure chamber, an anode adjacent and fluidly connected to the low-pressure chamber, a plasma window adjacent and fluidly connected to the anode, and a cathode housing block adjacent and fluidly connected to the plasma window. The plasma window comprises a plurality of cooling plates, each cooling plate comprising an aperture that is aligned with an aperture in one or more adjacent cooling plate to form a plasma channel. The cathode housing block comprises a cathode target region and a cooling portion. The cooling portion comprises a fluid inlet, a fluid outlet, a cooling channel fluidly coupling the fluid inlet and the fluid outlet, and an opening adjacent to the plasma window and aligned with a longitudinal axis of the plasma channel.

The invention discloses an underwater pulse discharge plasma channel time-varying resistance prediction method based on a PINN, and belongs to the technical field of calculation. The method comprises the following steps: firstly, collecting discharge experiment data under various initial conditions, and performing preprocessing according to model training requirements; and secondly, a PINN neural network is constructed according to the requirement of an underwater pulse discharge actual task, a discharge equivalent loop and the Kirchhoff's law are combined to improve a PINN loss function, and the PINN loss function is made to be suitable for prediction of the plasma channel time-varying resistance. Thirdly, minimizing a loss function, optimizing model parameters, and training a PINN neural network to find optimal parameters; and finally, a corresponding time-varying resistance value can be obtained by inputting underwater pulse discharge time data. According to the method, the physical law and the neural network are combined for predicting the time-varying resistance of the underwater pulse discharge plasma channel for the first time, and the mapping relation of the time-varying resistance can be effectively constructed by combining physical information and the neural network.

This invention discloses an energy control method for high-energy electrohydraulic detonation, belonging to the field of pulse power technology. It includes: control of the electrical and chemical energy of a metal wire, utilizing the high amplitude component of a composite pulse power to rapidly deposit electrical energy into the metal wire and completely release its chemical energy; control of plasma channel deposition energy, adjusting the channel deposition energy and external radiated heat through the long pulse width component of the composite pulse power, enabling the metal powder to react with the liquid medium and release energy; control of metal powder release energy, adjusting the reaction rate between the metal powder and the liquid medium to achieve self-sustaining reaction and improve the energy release efficiency of the metal powder; and control of shock wave energy, adjusting the composite pulse power, metal wire size, and metal powder parameters to improve the conversion efficiency of the deposited energy into shock wave energy, meeting application requirements. This invention achieves precise energy control during electrohydraulic detonation through the matching of multiple stages.

An extraction chamber includes a main channel, a plasma channel, and a plurality of side channels fluidly connecting the main channel to the plasma channel. Each of the plurality of side channels has an average diameter of at most 200 μm at a narrowest cross section, and the extraction chamber has a separation efficiency of at least 95%. A multilevel extraction chamber, includes a main channel, a secondary channel fluidly connected to the main channel, a plasma channel fluidly connected to the secondary channel, a first set of a plurality of side channels fluidly connecting the main channel to the secondary channel, and a second set of a plurality of side channels fluidly connecting the secondary channel to the plasma channel. Each of the first set of side channels has an average diameter that is greater than the average diameter of each of the second set of side channels, and the extraction chamber has a separation efficiency of at least 95%.

The invention provides a front feeding PEALD coating system, and relates to the technical field of semiconductor equipment. Comprising a process chamber assembly, and a plasma assembly, an air inlet assembly and a vacuum assembly which are connected to the process chamber assembly, and the process chamber assembly at least comprises two process chambers; plasma channels are arranged on the back sides of the two process chambers so as to be connected with the plasma assembly; feeding openings are formed in the front sides of the two process chambers, side sliding door assemblies are arranged at the feeding openings, and the side sliding door assemblies are configured to be capable of closing or opening the two process chambers through transverse movement; a first air passage and a second air passage which are respectively used for communicating the two process cavities are symmetrically formed in the cavity door main body, and the first air passage and the second air passage are communicated to the vacuum assembly so as to exhaust air from the two process cavities at the same time. According to the scheme, the equipment depth volume can be reduced, and the reaction uniformity is improved.

This disclosure relates to a coating apparatus and a coating system. The coating apparatus includes a cavity, an evaporation unit, and an ionization unit. Both the evaporation unit and the ionization unit are disposed within the cavity. The ionization unit includes a cathode terminal, an anode terminal, and an arc power source, wherein the anode of the arc power source is coupled to the anode terminal, and the cathode of the arc power source is coupled to the cathode terminal. The ionization unit is configured to form a plasma channel between the active surface of the anode terminal and the cathode terminal, the plasma channel passing through the radiation region of the evaporation unit; and the anode terminal includes an anode cover plate configured to expose a portion of the active surface.

The invention discloses an anode surface material etching simulation method based on a plasma discharge channel, and belongs to the field of thermal plasma simulation modeling. The problems that existing material etching simulation depends on a hypothetical heat source, the influence of the transient evolution process of a plasma channel on material etching cannot be fully considered, and the simulation prediction precision is low are solved. By considering multi-physical field coupling and a transient process, high-precision key data of anode surface pressure distribution and heat flux density distribution can be provided, errors caused by a traditional assumed heat source model are overcome, and the corrosion removal process of an anode surface material is accurately simulated. The simulation result not only can accurately reflect the anode surface temperature field distribution, but also can predict the geometric contour, diameter and depth of the anode surface pit in detail. The method is mainly applied to material etching simulation of the plasma discharge channel.

The application provides an open magnetic plasma thermoelectric conversion and kinetic energy conversion regulation device, which is composed of a magnetic plasma channel, a front-stage regulation coil, a plasma probe group, a magnet array, a thermoelectric conversion channel, a magnetic shield plate, an acceleration coil and a rear-stage regulation coil. The device generates a dynamic magnetic field to transport high-temperature magnetic plasma through an excitation coil array, carries out plasma distribution regulation based on the measurement results of the plasma probe, obtains a magnetic plasma induced electromotive force by using a horizontal magnetic field and a tilted electrode, and realizes thermoelectric conversion with the magnetic plasma as a working medium. Meanwhile, the high-temperature magnetic plasma is accelerated by using a magnetic mirror structure to realize secondary conversion of the magnetic plasma heat energy, and a high-speed plasma jet flow is generated to produce a reaction thrust, thereby providing space power for a spacecraft. The application has the advantages of simple thermoelectric conversion process, no mechanical pump conveying structure and integration of the thermoelectric conversion and the space propulsion device.

The invention discloses a device for generating an orbital angular momentum-adjustable broadband terahertz vortex beam, and the device comprises a vacuum target chamber which is used for providing a vacuum environment for the interaction of laser and a substance; the laser system is used for providing driving light pulses; the gas target generation device is arranged in the vacuum target chamber, provides a plasma channel along the propagation direction of the driving light pulse, guides the driving light pulse to be transmitted in the plasma channel and generates a broadband terahertz vortex light beam; the light path adjusting element is used for adjusting the position and angle of the driving light pulse when the driving light pulse enters the plasma channel, so that the driving light pulse is transmitted in the plasma channel along a spiral linear track after entering the plasma channel, and then the transverse net current is driven on each section of the plasma channel; and broadband terahertz radiation is generated at different positions of a spiral linear track in the plasma channel, so that a broadband terahertz vortex beam with adjustable orbital angular momentum is formed. The device obtains the broadband terahertz vortex beam with the adjustable orbital angular momentum.

The invention discloses a plasma channel generation system and method capable of controlling a transmission track, and relates to the field of femtosecond laser filamentation regulation, and the system comprises a femtosecond laser amplifier, an energy control device, a phase regulation device, a light beam zooming device, a plasma channel generation device and a computer control system which are connected in sequence. Wherein the phase regulation and control device is connected with the computer control system; generating a phase modulation light beam with a controllable transmission track according to a preset transmission track; the phase modulation light beam scaled by the light beam scaling device causes a nonlinear effect in the optical medium, and a plasma channel along a transmission track of the phase modulation light beam is generated, namely, a plasma channel with a controllable transmission track is formed; according to the invention, a plasma channel with a controllable transmission track can be realized in an optical medium.

The present invention relates to a modular cascaded thermal spray plasma gun comprising one or more cathodes, a modular neutrode stack, an anode, a gun body, an interface to a configurable nozzle and a configurable nozzle. The interface is coaxially aligned with the anode and comprises feedthroughs for cooling water. A configurable nozzle for a modular cascaded thermal spray plasma gun comprises cooling water inlet and outlets matching in form and location to corresponding feedthroughs of the interface. The configurable nozzle comprises an annular recess for coaxial alignment with an axial protrusion of an anode and a central plasma channel further comprising a transition zone for shaping the cross section of a plasma jet, a deflection zone for deflection the plasma jet and a plasma jet outlet.