81 results about "Magnetic mirror" patented technology

The invention discloses a high-temperature superconductive magnet system for a magnetically confined plasma propeller, which comprises two magnetic mirror units in the same structure, wherein each magnetic mirror unit comprises a Dewar barrel and two high-temperature superconductive magnets; and a refrigerator is used for cooling the two high-temperature superconductive magnets in each magnetic mirror unit. mode by a conductive cooling mode and uses the refrigerator to cool the two superconductive magnets in a conductive manner, so that the high-temperature superconductive magnet system for the magnetically confined plasma propeller greatly simplifies the structure, realizes high vacuum, reduces dependence on liquid nitrogen and high-cost operations, avoids a large-size low-temperature system and equipment used in the low-temperature liquid cooling mode, eliminates risks caused by the evaporation of a low-temperature liquid, cools the magnet to a temperature below 77 K and realizes a high field by increasing the critical current of the magnets, thus a superconductive low-temperature system is compact, efficient, safe and convenient, and is beneficial for integrating a superconductive apparatus with a low-temperature device.

The invention discloses a plasma device with a double-hollow cathode and a double-hollow cathode and applications. The device comprises filaments, a hot cathode, an anode, a double-hollow cathode, a cold cathode, a vacuum chamber and a magnet, wherein the double-hollow cathode comprises an outer wall and a lining layer and is of a double-layer structure. Due to the double-layer hollow cathode structure, the lining layer is easy to disassemble and change, so that the lining layer can be observed and analyzed properly, and simultaneously, the demand that single or multiple types of metal plasma is/are generated by a sputtering cathode in an arc chamber. On one hand, according to the plasma device, a double-hollow cathode plasma sputtering mode controlled by a magnetic mirror field is adopted for generating high-density plasma with the single or multi-element metal and plasma flow with high efficiency, and the plasma device is used for the modification on the surface of irradiation material of the metal plasma and research on the high-purity high-flow metal ion beam; and on the other hand, the plasma device is combined with various surface analyzing technologies to observe and analyze the inner surface of the double-hollow cathode, and used for researching the mutual action between the plasma and a machine wall in magnetic confinement fusion.

The invention relates to an electric thruster, in particular to a multistage cusped magnetic field plasma thruster with a channel magnetic field guide structure, so as to solve the problems that magnetic field configuration of an existing thruster and the position of a magnetic mirror tip cannot be adjusted conveniently according to section changes of a discharge channel, the angle of a magnetic interface at the magnetic mirror tip is not easy to adjust, and a samarium cobalt permanent magnet material for variable cross-section experiments is long in processing cycle and high in cost. The plasma thruster comprises a ceramic bushing, an engine casing, four permanent magnets, five magnetic-conducting rings and five non-magnetic-conducting matching rings, the permanent magnets are round permanent magnets and arranged sequentially from top to bottom, the ceramic bushing is arranged among the four permanent magnets, the large-diameter port of the ceramic bushing faces upwards, the four permanent magnets are clamped together through the engine casing; the five magnetic-conducting rings are a first magnetic-conducting ring, a second magnetic-conducting ring, a third magnetic-conducting ring, a fourth magnetic-conducting ring and a fifth magnetic-conducting ring respectively. The plasma thruster is applied to the field of spaceflight.

Process and device for depositing, by electron cyclotron resonance plasma, a web of carbon nanofibres or nanotubes, on a substrate without a catalyst, by injection of a microwave power into a deposition chamber including a magnetic structure with a highly unbalanced magnetic mirror and at least one electron cyclotron resonance zone within the interior of the deposition chamber itself and opposite the substrate. Under a pressure of less than 10<-4 >mbar, ionization and/or dissociation of a gas containing carbon is induced in the magnetic mirror in the center of the deposition chamber, thus producing species that deposit on the substrate, which is heated. A resulting film, which may be on a substrate, can be formed from a web or a network of interconnected carbon nanofibres or nanotubes, like a spider's web, the film being exempt of a catalyst and a structure of several layers-a multi-layer structure-including at least two layers of a web of carbon nanofibres or nanotubes, as well as filters, electron accelerating or decelerating nanogrids and flat screens including such films or structures.

The invention discloses a large-area, high-energy and high-current metal ion source which can work under two modes of direct current and pulse. The invention is characterized in that an magnetic field is adopted to control a cathode arc to discharge electricity to produce a direct current metal plasma; the direct current metal plasma is transported to an ion leading-out area by a magnetic-mirror field and then is accelerated by a grid to obtain a high-energy ion beam; an reversal magnetic island formed by a solenoid is additionally arranged at the middle of a plasma transporting area, can improve the uniformity of the output plasmas, prevents large particles from entering the ion leading-out area and improves the uniformity and the stability of the ion beam; the ion beam leading out and accelerating modes adopt a direct current or a pulse mode so as to obtain pure ion beams or the plasmas/the ion beams; and an air feed pipe is utilized to fill working gas into a plasma generating area to lead the working gas to participate in plasma discharging to obtain metal-gas mixed ion beams. The device of the invention can be used for injecting and depositing high-quality reacting film on a workpiece, filling ions, carrying out ion plating and the like.

The invention discloses a three-dimensional optical fiber acceleration sensor with strong electromagnetic interference-resistant capability. The sensor comprises a sensor housing, a vibrator structure and a sensor light path. The vibrator structure is composed of three pairs of elastic sensitive elements and a mass block; the elastic sensitive elements are distributed orthogonally in pairs by using the mass block as the center along the three-dimensional axial direction of the mass block; for two corresponding elastic sensitive elements in each one-dimensional direction, one elastic sensitive element is wound with a sensing fiber, one end of the sensing fiber is connected with an external fiber by a first fiber coupler and the other end is connected with a Faraday magnetic mirror by a second fiber coupler, and thus three sensing paths are formed. The sensor housing and the vibrator structure are made of non-metallic materials; the Faraday magnetic mirror is arranged outside the sensor housing beyond a measured strong electromagnetic environment. The sensor provided by the invention is capable of detecting vibration signals in a three-dimensional direction; and a problem of high precision vibration monitoring in high-voltage, heavy-current, high-temperature, and strong-electromagnetism power industrial environments is solved.

The invention discloses a vector magnetic nozzle used for electric propulsion. The vector magnetic nozzle is composed of a permanent magnet arranged in front of a plasma flame-spraying nozzle and a plurality of non-concentric coils which are arranged at the back of the nozzle and form a dipole field. The permanent magnet and the non-concentric coils form a double-magnetic mirror tube so that plasmas can be in reciprocating motion in the double-magnetic mirror tube. The plasmas are heated in effect of ion cyclotron wave resonance under current modulation of the non-concentric coils. Proportion of current on the plurality of non-concentric coils when the plasmas are released from the magnetic nozzle is adjusted so that the vector direction of an external magnetic field of the plasma flame-spraying nozzle of a propeller deviates from the central axis of the propeller so as to guide the flow direction of external plasmas and further to change the thrust vector direction of the propeller. The vector magnetic nozzle can greatly reduce the quantity of the propellers of an attitude control system through vector propulsion, simultaneously greatly improves reliability of the attitude control system, enables vertical speed of the plasmas to be converted to parallel speed, improves parallel flow rate of external flow plasmas, and achieves the purpose of increasing thrust.

The invention discloses a linear plasma-enhanced chemical vapor deposition system with a remote magnetic-mirror field constraint. The linear plasma-enhanced chemical vapor deposition system comprises a deposition chamber, wherein the deposition chamber is divided into a plasma generation region and a material surface treatment region; a permanent magnet is arranged at each of the top end and two sides of the deposition chamber; upper and lower gas inlet pipes and a coaxial circular waveguide connected with a coaxial microwave source are arranged inside the plasma generation region of the deposition chamber; a substrate table is arranged inside the material surface treatment region of the deposition chamber; a vacuum unit is arranged at the bottom of the deposition chamber; the coaxial circular waveguide is utilized to stimulate a working gas to generate linear microwave plasma inside the deposition chamber under the condition of the linear magnetic-mirror field constraint generated by permanent magnet components; and the introduced working gas forms a film on the substrate surface of the substrate table under the effect of the linear microwave plasma. By adopting the linear plasma-enhanced chemical vapor deposition system, the large-size uniform deposition of a semiconductor film and a doped semiconductor film can be realized, fast and continuous deposition of the film is realized by remotely introducing a reaction gas, and industrial continuous production is easily realized.

The invention discloses a magnetic mirror field-confining plasma sealing window and a sealing method thereof. The plasma sealing window provided by the invention comprises a plasma sealing window body; a plasma channel is formed in the middle of the window body; a cathode is arranged at one end of the plasma channel and an anode is arranged at the other end of the window body; the cathode and the anode are connected with a sealing window power supply; a confining magnet is arranged outside the window body; and the plasma sealing window further comprises a magnet power supply for supplying power to the confining magnet, and a vacuum pump. According to the invention, the confining magnet is used for generating a magnetic mirror field to confine ions in the plasma sealing window; the structure of the magnetic mirror field is a magnetic field configuration with two higher sides and a lower middle part, so that plasmas in the plasma channel can be confined and only the ions and electrons which are higher than certain energy can leave the plasma channel. Therefore, the speed of the ions and the electrons in the plasma sealing window leaving from the plasma sealing window becomes slow, and the aims of increasing pressure difference of the plasma sealing window and reducing the power consumption of the plasma sealing window are achieved.

The invention discloses an efficient environment-friendly type beneficiation method for low-grade magnetic mirror iron ores. The efficient environment-friendly type beneficiation method is characterized in that iron ore concentrate which meets smelting requirements is obtained by adopting processes such as raw material three-stage crushing, large particle medium-magnetism and SLon strong-magnetismpre-selection, one-stage ore grinding and grading, one-stage weak magnetic-selecting and one-stage SLon strong magnetic-selecting, pre-grading and two-stage ore grinding and grading, two-stage weak magnetic-selecting and two-stage SLon strong magnetic-selecting and SL centrifugal machine selecting operation for the magnetic mirror iron ores. The efficient environment-friendly type beneficiation method can throw 21% of coarse-particle barren rocks through high-pressure roller-grinding, large-particle medium-magnetism pre-selecting and SLon strong-magnetism pre-selecting, and meets the beneficiation principle of preferably crushing instead of grinding and throwing as early as possible. A selecting process of roughing, cleaning and scavenging of a centrifugal machine is adopted, so that re-selecting operation completely replaces reverse flotation operation, and therefore, the efficient environment-friendly type beneficiation method is a pollution-free beneficiation method, is high in degree of automation, is great in processing amount, is liable to realize field operation and implementation, and greatly reduces manual operation.

A method and system are provided for reducing plasma loss from the main chamber of a magnetic mirror fusion reactor (MMFR). The MMFR includes a mirror magnet defining a throat region and main chamber magnets defining a main chamber region adjacent the throat region. The present invention generates a field reversed configuration (FRC) inside the MMFR and only between the mirror magnet and the main chamber magnet that is adjacent to the mirror magnet.

A method for manufacturing integrated circuits uses an atmospheric magnetic mirror plasma etching apparatus to thin a semiconductor wafer. In addition the process may, while thinning, both segregate and expose through-die vias for an integrated circuit chip. To segregate, the wafer may be partially diced. Then, the wafer may be tape laminated. Next, the backside of the wafer may be etched. As the backside material is removed, the partial dicing and through-die vias may be exposed. As such, the method reduced handling steps and increases yield. Furthermore, the method may be used in association with wafer level processing and flip chip with bump manufacturing.

The invention discloses a low light level detector which is based on a second generation inverting image intensifier and performs local gating at normal temperature. The low light level detector comprises a detector shell, wherein the detector shell is divided into an upper cavity body and a lower cavity body; a light measurement CCD, a video acquisition module, a field programmable gate array, a liquid crystal driving module, a power supply and a display screen are sequentially arranged in the upper cavity body; one end, which is connected with the light measurement CCD, outside the upper cavity is provided with a lens A; the other end of the upper cavity is provided with a pushbutton; a liquid crystal board, a magnetic mirror array image intensifier, an optical fiber taper and an imaging CCD are sequentially arranged in the lower cavity; one end, which is connected with the liquid crystal board, outside the lower cavity is provided with a lens B; and the lens A and the lens B are parallelly arranged. The detector changes the mode of the prior CCD to the integration of optical signals, adopts the HTPS liquid crystal board simultaneously, automatically performs local gate control on light intensity, has wider dynamic application range, and can normally work and clearly image within the light intensity range of between 10<-8> and 10<5>lx.

The invention discloses a controllable nuclear fusion device of a dumbbell-shaped structure. A high-temperature plasma constraining apparatus of the device comprises a magnetic mirror apparatus part and annular magnetic constraining apparatus parts. The device is characterized in that the magnetic mirror apparatus part is located at the center of the high-temperature plasma constraining apparatus; the magnetic mirror apparatus part is a magnetic mirror of a hollow cylindrical structure, or consists of multiple cylindrical magnetic mirror bodies which are uniformly arranged at the periphery; the annular magnetic constraining apparatus parts are located at two ends of the high-temperature plasma constraining apparatus; the magnetic mirror apparatus part and the annular magnetic constraining apparatus parts are combined to enable high-temperature plasmas to be communicated with each other to form the dumbbell-shaped structure. The device is effective in magnetic constraining, is simple in structure, and is low in cost.

Spreading of an ion beam when passing through a dipole magnet is reduced or suppressed by electrostatic ion beam confinement which supplements magnetic confinement which may be provided. The magnetic confinement is enhanced by the provision of a magnetic mirror through concentration and localized increase of the dipole field with a concave profile of the pole pieces faces and/or provision of permanent magnets or localized regions of material of increased permeability to form magnetic cusps. Pitch and geometry of convex portions of the pole piece faces are adjusted to increase the mirror ratio and the location of the maximum mirror field relative to the thickness of a graphite or insulating liner which may be employed. Electrostatic confinement elements in the form of negatively charged electrodes and/or electrically isolated electrodes or insulators which assume a negative charge. Ionization of plasma between the pole pieces may be enhanced by application of a VHF/UHF field having a frequency of about 40 MHz to 100 MHZ or higher.

The invention discloses a opposite-target non-equilibrium magnetron spattering system with magnetic mirror field restriction, which is mainly used in technique field of surfacial project. It is characterized in that: Two electrified coaxial coils are set opposite two permanent-magnet magnetron targets. They can form a complete closed magnetic mirror field which is coaxial with magnetron targets. To control magnetic mirror field based on regulating current in coils, and adjust state, deposit parameter of discharging plasma subtly. Magnetic coils enhance cathode discharging, increase plasma derivation in cathode zone and advance plasma density in deposit zone. Applying coaxial magnetic mirror field to restrain plasma with adding coaxial coils can enlarge adjusting range of deposit parameter. Compared with routine magnetron spattering technique, non-equilibrium magnetron spattering technique has adjustable plasma state, high plasma leaving rate and high ion-atom arrival rate etc.

The image enhancer includes photo cathode, electron lens, micro-channel plate, and phosphor screen. Characters are that a magnetic mirror is nearly setup between the photo cathode and the electron lens. The magnetic mirror adopts micro-channel electronic bottle-plate structure, or simple magnetic mirror plus electron focusing lens structure. Being applied to micro light detecting and imaging system, the magnetic mirror device regulates speed of electrons escaped from photo cathode so as to reduce system noise. Moreover, focusing electrons, the magnetic mirror device plays function of electron lens, and increases time of accumulating light signal effectively. Under normal temperature, the disclosed image enhancer is capable of detecting weak image signal with lower illumination so as to reach purpose of improving detection limit of faint light imaging system.

The invention discloses a rear-mounted magnetic-mirror field high-current ion acceleration tube. The rear-mounted magnetic-mirror field high-current ion acceleration tube comprises an external insulating magnetic ring, a grading ring and an internal inlet flange, an inlet beam-limiting conical cylinder, an ultra-thin heat tube, an acceleration electrode, shielding electrodes, weak correcting magnets, an outlet conical cylinder, a magnetic mirror apparatus and an outlet flange; the outer surface of the insulating magnetic ring is waveform and plated with glaze; the ultra-thin heat tube is arranged on the periphery of the inlet beam-limiting conical cylinder; the two shielding electrodes in the middle are provided with the weak correcting magnets respectively; and the magnetic mirror apparatus is mounted on the outlet flange. By virtue of the rear-mounted magnetic-mirror field high-current ion acceleration tube provided by the invention, the high-voltage ignition risk of the accelerationtube is lowered, and high-current ion beam acceleration stability is improved.

The invention relates to a structure for enhancing an ion beam focusing of a magnetic focusing type hall thruster and a design method of the structure thereof, and relates to the field of spaceflightelectric propulsion hall thruster beam focusing control, and aims to solve the problem that the focused ion beam can be damaged by an external field. A magnetic field is constructed in the external field of the hall thruster, a magnetic partition interface of the magnetic field formed by the magnetic field of the outer field and the magnetic field formed by an inner coil of the hall thruster is ofa straight cylinder type, and a cathode small hole is located in the inner magnetic mirror area. According to the invention, the radial dispersion of a passive plasma beam can be effectively restrained, so that the effect of beam focusing is enhanced.

The sea water desalting magnetic mirror device includes water pump, magnetic mirror and spiral water pipe. The magnetic mirror generates gradient magnetic field, the spiral water pipe is set inside the gradient magnetic field, and the water pump drives water to move inside the spiral water pipe from weak field to strong field. The salt ion is separated from water molecule by means of the gradient magnetic field, which reflects salt ion and not the water molecule, to realize desalting sea water. The water outlet is provided with water separating board to separate the water outlet into fresh water outlet and salt water outlet for fresh water and salt water to flow out separately. The present invention has simple equipment, low investment, low running cost and low fresh water cost. The present invention may be also used in treatment of ion containing solution.

The invention discloses a ground simulation device and method for simulating large-scale magnetopause magnetic reconnection, and relates to the technical field of application of low temperature plasmas. The problem of the lack of a device which can directly reflect structural characteristics of an interplanetary magnetic field at present is solved. An upper magnetic-mirror field coil and a lower magnetic-mirror field coil located in the same vertical direction are of the same structure and are elliptic coils, the ellipse length-diameter ratio is greater than or equal to 1.5, an electron cyclotron resonance plasma source is used for injecting electromagnetic waves into a dipole magnetic field, so that at a resonant magnetic field surface generated by the dipole magnetic field, the electromagnetic waves ionize working gas in a vacuum chamber to generate plasmas in a simulated space, the upper magnetic-mirror field coil and the lower magnetic-mirror field coil are used for generating a magnetic-mirror field magnetic field to simulate a uniform interplanetary magnetic field, and magnetic zeros exist between the dipole magnetic field coil and the upper magnetic-mirror field magnetic field and the lower magnetic-mirror field magnetic field. The ground simulation device and method are used for simulating a magnetopause magnetic reconnection process.

The related amplifier for ADC comprises: a first differential input part, a cascade current mirror between the output of last part and a first reference potential, a first amplification part for cascade current source between the first input part and a second reference potential, a second differential input part connected with the first input part, and a second amplification part of a second current magnetic mirror.

The invention discloses a follow-up coil wiring device used under high-vacuum and high-voltage conditions, and relates to a pulse power supply wiring device. In order to solve the problems that a pulse power supply outside a vacuum cabin and two magnetic mirror field coils in the vacuum cabin need to be reliably connected in an insulating manner, the requirement for a series connection mode of the two magnetic mirror field coils needs to be met, and meanwhile, a connecting circuit needs to move along with the two independent magnetic mirror field coils. The device comprises an upper follow-up coil wiring device, a lower follow-up coil wiring device and a guide column. The upper follow-up coil wiring device is connected with the lower follow-up coil wiring device through a series coaxial cable, the lower follow-up coil wiring device is connected with a vacuum cabin outer pulse power supply through an output coaxial cable, and the upper follow-up coil wiring device and the lower follow-up coil wiring device can move in the radial direction of the guide column. The high-vacuum high-voltage follow-up coil is suitable for follow-up coil wiring occasions under high-vacuum high-voltage conditions.

The invention discloses a low light level detector which is based on a third generation proximity image intensifier and performs local gating at normal temperature. The low light level detector comprises a detector shell, wherein the detector shell is divided into an upper cavity and a lower cavity; a light measurement CCD, a video acquisition module, a field programmable gate array, a liquid crystal driving module, a power supply and a display screen are sequentially arranged in the upper cavity; one end, which is connected with the light measurement CCD, outside the upper cavity is provided with a lens A; a pushbutton is arranged outside the other end of the upper cavity; a liquid crystal board, a third generation proximity type magnetic mirror array image intensifier, an optical fiber taper and an imaging CCD are sequentially arranged in the lower cavity; one end, which is connected with the liquid crystal board, outside the lower cavity is provided with a lens B; and the lens A and the lens B are parallelly arranged. The detector automatically performs local gate control on light intensity, has wider dynamic application range, and can normally work and clearly image within the light intensity range of between 10<-8> and 10<5>lx.