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Plasma device with double-hollow cathode and double-hollow cathode and applications

A plasma and double-hollow technology, applied in nuclear technology and application fields, can solve the problems of complex interaction and huge research cycle of research equipment, and achieve the effect of easy disassembly

Inactive Publication Date: 2012-06-13
PEKING UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the complexity of the interaction between the plasma and the wall, these research equipment are relatively large and the research period is long

Method used

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  • Plasma device with double-hollow cathode and double-hollow cathode and applications
  • Plasma device with double-hollow cathode and double-hollow cathode and applications
  • Plasma device with double-hollow cathode and double-hollow cathode and applications

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Embodiment Construction

[0019] Below in conjunction with accompanying drawing, through embodiment, further illustrate the present invention.

[0020] Such as figure 2 As shown, the core device of the magnetic mirror field-confined double hollow cathode plasma device of the present invention - the discharge chamber includes a filament 1, a hot cathode 2, an anode 3 and 5, a double hollow cathode 4, a cold cathode 6, and an air inlet 7 And 8, magnet 9 and vacuum chamber 11. Wherein the double hollow cathode 4 is a double-layer structure including an outer wall and an inner lining layer, and the outer wall and the inner lining layer are tightly fitted together to form a cylindrical structure.

[0021] Such as image 3 As shown, the outer wall in the double hollow cathode is a cylindrical structure composed of symmetrical left outer wall 12 and right outer wall 13, and the inner lining layer is a cylindrical structure composed of symmetrical left inner lining layer 14 and right inner lining layer 15 ...

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Abstract

The invention discloses a plasma device with a double-hollow cathode and a double-hollow cathode and applications. The device comprises filaments, a hot cathode, an anode, a double-hollow cathode, a cold cathode, a vacuum chamber and a magnet, wherein the double-hollow cathode comprises an outer wall and a lining layer and is of a double-layer structure. Due to the double-layer hollow cathode structure, the lining layer is easy to disassemble and change, so that the lining layer can be observed and analyzed properly, and simultaneously, the demand that single or multiple types of metal plasma is / are generated by a sputtering cathode in an arc chamber. On one hand, according to the plasma device, a double-hollow cathode plasma sputtering mode controlled by a magnetic mirror field is adopted for generating high-density plasma with the single or multi-element metal and plasma flow with high efficiency, and the plasma device is used for the modification on the surface of irradiation material of the metal plasma and research on the high-purity high-flow metal ion beam; and on the other hand, the plasma device is combined with various surface analyzing technologies to observe and analyze the inner surface of the double-hollow cathode, and used for researching the mutual action between the plasma and a machine wall in magnetic confinement fusion.

Description

technical field [0001] The invention belongs to the field of nuclear technology and application, and in particular relates to a double hollow cathode plasma device confined by a magnetic mirror field and its application. Background technique [0002] Plasma technology and application is an emerging discipline formed on the basis of interdisciplinary subjects such as physics, chemistry, electronics, and vacuum technology since the 1960s. The development and application of low-temperature plasma technology, such as surface treatment such as implantation and coating, has shown its important value in the semiconductor industry and machinery industry; various plasma devices are also the main technical support for advancing ion source and ion beam technology. As far as metal plasma devices are concerned, metal vacuum arc discharge (MEVVA) can generate high-density and large-volume metal plasma, but the arc discharge process on the electrode surface determines that the generated me...

Claims

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Application Information

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IPC IPC(8): H05H1/34
Inventor 付东坡赵渭江朱昆郭鹏丁杏芳刘克新
Owner PEKING UNIV
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