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377 results about "Plasma flow" patented technology

Low-temperature compatible wide-pressure-range plasma flow device

The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate or work piece is placed in the gas flow downstream of the electrodes, such that said substrate or work piece is substantially uniformly contacted across a large surface area with the reactive gases emanating therefrom. The invention is also embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate or work piece placed in the gas flow downstream of the electrodes, such that said substrate or work piece is contacted by the reactive gases emanating therefrom. In one embodiment, the plasma flow device removes organic materials from a substrate or work piece, and is a stripping or cleaning device. In another embodiment, the plasma flow device kills biological microorganisms on a substrate or work piece, and is a sterilization device. In another embodiment, the plasma flow device activates the surface of a substrate or work piece, and is a surface activation device. In another embodiment, the plasma flow device etches materials from a substrate or work piece, and is a plasma etcher. In another embodiment, the plasma flow device deposits thin films onto a substrate or work piece, and is a plasma-enhanced chemical vapor deposition device or reactor.
Owner:RGT UNIV OF CALIFORNIA

Method of processing a substrate

The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate or work piece is placed in the gas flow downstream of the electrodes, such that said substrate or work piece is substantially uniformly contacted across a large surface area with the reactive gases emanating therefrom. The invention is also embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate or work piece placed in the gas flow downstream of the electrodes, such that said substrate or work piece is contacted by the reactive gases emanating therefrom. In one embodiment, the plasma flow device removes organic materials from a substrate or work piece, and is a stripping or cleaning device. In another embodiment, the plasma flow device kills biological microorganisms on a substrate or work piece, and is a sterilization device. In another embodiment, the plasma flow device activates the surface of a substrate or work piece, and is a surface activation device. In another embodiment, the plasma flow device etches materials from a substrate or work piece, and is a plasma etcher. In another embodiment, the plasma flow device deposits thin films onto a substrate or work piece, and is a plasma-enhanced chemical vapor deposition device or reactor.
Owner:RGT UNIV OF CALIFORNIA

Electrosurgical device to generate a plasma stream

An electrosurgical device to generate a plasma stream and method to perform endoscopic or laparoscopic surgery within a patient's body comprising an electrosurgical generator coupled to a electrical power source to supply power to the electrosurgical device and a plasma generator including an electrode operatively coupled to the electrosurgical generator to receive electrical energy therefrom and concentrically disposed within an inner noble gas conduit to form a plasma channel coupled to a noble gas source to feed noble gas to the inner noble gas conduit and an outer electronegative gas conduit disposed in surrounding coaxial relation relative to the inner noble gas conduit to cooperatively form an electronegative gas channel therebetween coupled to a gas source to feed electronegative gas to the electronegative gas channel or an outer aspiration conduit disposed in surrounding coaxial relation relative to the inner noble gas conduit to cooperatively form an aspiration channel therebetween coupled to a negative pressure source such that the electrode heats the noble gas to at least partially ionize the noble gas to generate the plasma stream to be directed to the surgical site to perform the surgical procedure while the electronegative gas sustains the plasma stream at the surgical site and dilutes the noble gas adjacent the surgical site or the negative pressure source removes fluid and solid debris from the surgical site respectively.
Owner:BOVIE MEDICAL CORPORATION

Method of processing a substrate

The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate or work piece is placed in the gas flow downstream of the electrodes, such that said substrate or work piece is substantially uniformly contacted across a large surface area with the reactive gases emanating therefrom The invention is also embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate or work piece placed in the gas flow downstream of the electrodes, such that said substrate or work piece is contacted by the reactive gases emanating therefrom. In one embodiment, the plasma flow device removes organic materials from a substrate or work piece, and is a stripping or cleaning device. In another embodiment, the plasma flow device kills biological microorganisms on a substrate or work piece, and is a sterilization device. In another embodiment, the plasma flow device activates the surface of a substrate or work piece, and is a surface activation device. In another embodiment, the plasma flow device etches materials from a substrate or work piece, and is a plasma etcher. In another embodiment, the plasma flow device deposits thin films onto a substrate or work piece, and is a plasma-enhanced chemical vapor deposition device or reactor.
Owner:RGT UNIV OF CALIFORNIA

Deflagration-non-equilibrium plasma magnetohydrodynamics power generating method and device

The invention provides a deflagration-non-equilibrium plasma magnetohydrodynamics power generating method and a device used by the method, which can generate a low-temperature non-equilibrium plasma flow which flows through magnetic fields to form a magnetic fluid power generating system. The method comprises the following steps: 1, deflagrating fuel, wherein an oxidant and the fuel are mixed in a ratio of 1.05 to 1.5 times of chemical reaction equivalent weight, and the mixture enters a fuel deflagration chamber for continuous deflagration so as to form high-pressure gas of which the pressure is between 0.5 and 2 MPa; 2, generating the jet plasma, wherein the high-pressure gas obtained in the first step enters a plasma generating pipe of which the voltage is between 5 and 50 kV and the frequency is between 10 kHz and 1 MHz at a speed of between 20 and 200 m / s so as to generate the non-equilibrium jet plasma which has the characteristics of the magnetic fluid and of which the conductivity is between 10 and 20 S / m and the temperature is between 1,000 and 1,200 K; and 3, generating power by the magnetic fluid, wherein the non-equilibrium jet plasma enters the magnetic fields of a normal conducting electromagnet of which the magnetic induction is between 0.5 and 2.5 T at a speed of between 20 and 200 m / s, and moves to generate electromotive force.
Owner:SOUTHEAST UNIV
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