382 results about "Plasma flow" patented technology

The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate or work piece is placed in the gas flow downstream of the electrodes, such that said substrate or work piece is substantially uniformly contacted across a large surface area with the reactive gases emanating therefrom. The invention is also embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate or work piece placed in the gas flow downstream of the electrodes, such that said substrate or work piece is contacted by the reactive gases emanating therefrom. In one embodiment, the plasma flow device removes organic materials from a substrate or work piece, and is a stripping or cleaning device. In another embodiment, the plasma flow device kills biological microorganisms on a substrate or work piece, and is a sterilization device. In another embodiment, the plasma flow device activates the surface of a substrate or work piece, and is a surface activation device. In another embodiment, the plasma flow device etches materials from a substrate or work piece, and is a plasma etcher. In another embodiment, the plasma flow device deposits thin films onto a substrate or work piece, and is a plasma-enhanced chemical vapor deposition device or reactor.

A movable plasma confinement structure configured for confining plasma in a plasma processing chamber during plasma processing of a substrate is provided. The movable plasma confinement structure includes a movable plasma-facing structure configured to surround the plasma. The movable plasma confinement structure also includes a movable electrically conductive structure disposed outside of the movable plasma-facing structure and configured to be deployed and retracted with the movable plasma-facing structure as a single unit to facilitate handling of the substrate. The movable electrically conductive structure is radio frequency (RF) grounded during the plasma processing. The movable plasma-facing structure is disposed between the plasma and the movable electrically conductive structure during the plasma processing such that RF current from the plasma flows to the movable electrically conductive structure through the movable plasma-facing structure during the plasma processing.

An apparatus for coating surfaces of a workpiece is configured to establish a pressure gradient within internal passageways through the workpiece, so that the coating within the internal passageways exhibits intended characteristics, such as those relating to smoothness or hardness. The coating apparatus may include any or all of a number of cooperative systems, including a plasma generation system, a manipulable workpiece support system, an ionization excitation system configured to increase ionization within or around the workpiece, a biasing system for applying a selected voltage pattern to the workpiece, and a two-chamber system that enables the plasma generation to take place at a first selected pressure and the deposition to occur at a second selected pressure.

The present invention provides a standard interface for providing mechanical location, mechanical orientation, electrical connections, and water chamber seals for the exchange of a variety of plasma forming nozzles each associated with a specific plasma plume characteristic. The flexibility of the nozzle attachment is improved over prior designs by providing a standard exterior nozzle configuration and nozzle clamping assembly on the plasma gun so that multiple nozzles configurations (giving different plasma flow properties) can easily be used with the same devices. The joining of the nozzle to the receptacle forms a channel for cooling liquid to flow from the plasma gun through the nozzle to a return path in the plasma gun and creates an electrical contact between the plasma gun and the nozzle.

A device and a method for plasma spraying are disclosed. The device comprises, a cathode, an anode, a plasma channel formed by the anode and intermediate electrodes, and one or more flowable material injectors. The plasma channel has a throttling portion that divides the plasma channel into a high pressure portion near the cathode formed by at least one intermediate electrode and a low pressure portion near the anode. During operation, a plasma generating gas is heated by the arc maintained between the cathode and the anode, forming plasma. When the plasma passes through the throttling portion, its speed increases to a supersonic speed, and at the same time its static pressure drops. Flowable materials are injected in the plasma flow in the low pressure portion. The particles in the flowable materials are heated by the plasma and the resultant heated particles and plasma are output from the outlet of the plasma channel.

A diffuser system for a compressor for a gas turbine engine includes a diffuser and a plasma actuator. The diffuser comprises a first wall and a second wall. The first and second walls form a diffuser flow passage therebetween. The plasma actuator is disposed at least partially proximate the second wall. The plasma actuator is adapted to generate an electric field to ionize a portion of air flowing through the flow passage.