31409 results about "Treatment system" patented technology

Provided are methods, data processing systems, recovery components and computer programs for recovering from storage failures affecting data repositories. At least a part of the recovery processing is performed while the data repositories are able to receive new data and to allow retrieval of such new data. Although new data items may be received into the repository and retrieved therefrom during recovery processing, updates to the data repository which were performed before the failure and which are then restored to the repository by the recovery processing are restored within a recovery unit of work and are inaccessible to processes other than the recovery process until successful completion of the recovery unit of work. The recovery processing ensures that the recovered repository is consistent with the state of the repository at the time of the failure, but is available for addition and retrieval of new data items before completion of the recovery processing.

A treatment tool for performing a treatment for a curative procedure with ultrasonic waves, high frequency current and so on is provided with an identifier formed of a resistor or the like for indicating the type of the treatment tool. A medical instrument such as an ultrasonic wave output apparatus discriminates the type of a treatment tool connected thereto from the identifier to automatically set operating parameters such as an output value suitable for the treatment tool and to associatively operate an ancillary medical instrument such as a perfusion / aspiration apparatus depending on the treatment tool, thereby reducing extra work such as manual setting to allow for a smooth treatment.

A system for reprocessing flexible endoscopes having lumen therein. The reprocessing system deploys steam to disinfect and / or sterilize the endoscopes, and designs, components, and methods for reducing or balancing the reprocessing cycle time and the effects of thermal expansion and contraction on the endoscopes.

A tissue closure treatment system and method are provided with an external patient interface. A first fluid transfer component FTC.1 comprises a strip of porous material, such as rayon, with liquid wicking properties. FTC.1 can be placed directly on a suture line for transferring fluid exuded therethrough. An underdrape is placed over FTC.1 and includes a slot exposing a portion of same. FTC.2 comprises a suitable hydrophobic foam material, such as polyurethane ether, and is placed over the underdrape slot in communication with FTC.1. Negative pressure is applied to FTC.2 through a connecting fluid transfer component FTC.3. A negative pressure source can comprises a manual device or a power-operated suction device. The tissue closure method includes a manual operating mode using a manual suction device with an automatic shut off for discontinuing suction when a predetermined volume of fluid has been drained. An automatic operating mode utilizes a microprocessor, which can be preprogrammed to respond to various patient and operating conditions. The method proceeds through several phases with different components in place and different patient interface functions occurring in each.

A system for treating a septal defect having a suture-like implantable treatment apparatus and devices for delivering the implantable treatment apparatus and methods for treating a septal defect are provided. The suture-like apparatus is preferably implantable through a septal wall or portion thereof. The treatment system can include a flexible elongate body member, a delivery device configured to deliver the suture-like apparatus, a stabilization device configured to stabilize the delivery device and a positioning device configured to position the delivery device in a desired location. The suture-like device can include a suture body coupled with one or more lock devices or anchor devices.

A method, computer readable medium, and system for treating a substrate in a process space of a processing system that is vacuum isolated from a transfer space of the processing system is described. A sealing device is disposed between a first chamber assembly configured to define the process space and a second chamber assembly configured to define the transfer space. When the sealing device is engaged, vacuum isolation is provided between the process space and the transfer space. The sealing device comprises two or more contact ridges with one or more pockets formed therebetween. When the sealing device is engaged between the first chamber assembly and the second chamber assembly, gas is trapped in the one or more pockets. This trapped gas assists the release of the sealing device upon disengagement of the sealing device between the first chamber assembly and the second chamber assembly.

An apparatus and related method for distributing process gas in a vapor deposition system is described. The gas distribution system includes a vertically movable piston within its plenum, and the movement of the piston controls the flow rate of process gas through the vapor distribution plate of the gas distribution system. The piston can be used to accommodate changes in processing parameters that affect flow characteristics and to create edge-enhanced, uniform, and center-enhanced profiles of deposited material on a substrate without the need to replace the vapor distribution plate.

An apparatus and related method for distributing process gas in a vapor deposition system is described. The gas distribution system includes a vertically movable piston within its plenum, and the movement of the piston controls the flow rate of process gas through the vapor distribution plate of the gas distribution system. The piston can be used to accommodate changes in processing parameters that affect flow characteristics and to create edge-enhanced, uniform, and center-enhanced profiles of deposited material on a substrate without the need to replace the vapor distribution plate.

Image processing enhances display quality by controlling both the image modulator and the light sources to produce the best possible visual images. The image processing system utilizes a combination of user inputs, system configuration, design information, sensor feedback, pixel modulation information, and lighting control information to characterize the display environment on a per pixel basis. This per pixel characterization information is combined with one or more frames of the incoming real time display data. The image processing system processes each incoming pixel and produces a modified corresponding output pixel. Each pixel of each frame is processed accordingly. In addition to producing modified output pixels, the image processing system produces control information for the light sources. The light source control information can control individual lamps, tubes or LEDs, or can control a block or subset of the light sources. The resulting display has improved image consistency, enhanced color gamut, higher dynamic range and is better able to portray high motion content.

A medical probe assembly, tissue treatment system, and method are provided for ablating tissue. The probe assembly comprises an elongated member and electrode elements mechanically coupled to the distal end of the elongated member. The electrode elements are configurable as two bipolar electrode pairs with a common electrode element. At least one of the electrode elements comprises a plurality of electrodes (such as, e.g., needle electrodes) radially extendable from the elongated member. An ablation source, such as a radio frequency source, can be connected to the probe assembly in order to convey ablation energy to the electrode pairs, either simultaneously or sequentially.

The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam.

A system for processing substrates in plasma chambers, such that all substrates transport and loading / unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.

A system and method for treating a deposition reactor are disclosed. The system and method remove or mitigate formation of residue in a gas-phase reactor used to deposit doped metal films, such as aluminum-doped titanium carbide films or aluminum-doped tantalum carbide films. The method includes a step of exposing a reaction chamber to a treatment reactant that mitigates formation of species that lead to residue formation.

A process-gas supply system 2 supplies a process gas diluted with a diluent gas to a gas using system 4. The process-gas supply system 2 includes a process gas tank 10, a diluent gas tank 12, a main gas duct 14 connecting the process gas tank 10 and the gas using system 4, and a diluent gas duct connecting the diluent gas tank 12 to the main gas duct. The respective main gas duct 14 and the diluent gas duct are provided with flow rate controllers FC1, FC2, and FC5. The diluent gas duct is connected to the main gas duct at a position on an immediately downstream side of one of a plurality of flow rate controllers other than the flow rate controller on the most downstream side. There is further provided a surplus-gas discharge duct 24 through which a surplus diluted process gas is discharged, the surplus-gas discharge duct 24 being connected to the main gas duct at a position on an immediately upstream side of one the flow rate controllers other than the flow rate controller on the most upstream side.

Disclosed is a heat treatment system for semiconductor devices. The heat treatment system is used in a heat treatment process for semiconductor devices, such as a crystallization process for an amorphous silicon thin film or a dopant activation process for a poly-crystalline silicon thin film formed on a surface of a glass substrate of a flat display panel including a liquid crystal display (LCD) or an organic light emitting device (OLED). The heat treatment system transfers a semiconductor device after uniformly preheating the semiconductor device in order to prevent deformation of the semiconductor device during the heat treatment process, rapidly performs the heat treatment process under the high temperature condition by heating the semiconductor device using a lamp heater and induction heat derived from induced electromotive force, and unloads the semiconductor device after uniformly cooling the semiconductor device such that the semiconductor device is prevented from being deformed when the heat treatment process has been finished. The heat treatment system rapidly performs the heat treatment process while preventing deformation of the semiconductor device by gradually heating or cooling the semiconductor device.

A fluid treatment system is provided, the system including a fluid treatment cartridge for treating fluid passing therethrough. The cartridge has an inlet through which untreated fluid enters the cartridge and an outlet from which treated fluid exits the cartridge. The cartridge also has a radio frequency identification (RFID) tag for storing data. The fluid treatment system also includes a connection manifold configured to detachably support the fluid treatment cartridge. The connection manifold has an inlet flow path for directing untreated fluid to the inlet of the cartridge and an outlet flow path for directing treated fluid from the outlet of the cartridge, and a data sensor for reading data stored on the RFID tag. The fluid treatment system further includes means for evaluating the data stored on the RFID tag and read by the data sensor, as well as means for deterring fluid treatment system use based upon the evaluation of the data stored on the RFID tag and read by the data sensor.

An internal treatment apparatus for a patient having a flexible tubular body to be introduced into a patient includes a center opening for inserting therethrough an endoscope for observing a target site, the center opening being circular in cross section and disposed at a center of an end face of the flexible tubular body; and a plurality of circumferential apertures through which surgical instruments are inserted for performing a surgical procedure on the target site, the plurality of circumferential apertures being provided in the flexible tubular body at equi-angular intervals around the center opening.

A computer-assisted surgery system for planning / guiding alterations to a bone in surgery, comprises a trackable member adapted to be secured to the bone. The trackable member has a first inertial sensor unit producing orientation-based data for at least two degrees of freedom in orientation of the trackable member A positioning block is adapted to be secured to the bone, with at least an orientation of the positioning block being adjustable once the positioning block is secured to the bone to reach a selected orientation at which the positioning block is used to guide tools in altering the bone. The positioning block has a second inertial sensor unit producing orientation-based data for at least two degrees of freedom in orientation of the positioning block. A processing system providing an orientation reference associating the bone to the trackable member comprises a signal interpreter for determining an orientation of the trackable member and of the positioning block from the orientation-based data. A parameter calculator calculates alteration parameters related to an actual orientation of the positioning block with respect to the bone as a function of the orientation reference and of the orientation of the positioning block.

A system for curing a low dielectric constant (low-k) dielectric film on a substrate is described, wherein the dielectric constant of the low-k dielectric film is less than a value of approximately 4. The system comprises one or more process modules configured for exposing the low-k dielectric film to electromagnetic (EM) radiation, such as infrared (IR) radiation and ultraviolet (UV) radiation.

A system for processing semiconductor substrates includes a front-end with at least two vertical levels of input / output ports for transferring substrate cassettes into or out of the housing of the processing system. The front-end also includes at least one level of storage positions, e.g., two levels of storage positions, which can be disposed between the two vertical levels of the input / output ports. The two vertical levels of storage positions can each be provided with two storage positions and each of two levels of input / output ports can be provided with accommodations for two cassettes, allowing for a total of eight cassettes to be accommodated at the front-end of the processing system. Inside the housing of the processing system, interior storage positions can be provided adjacent a wafer handling chamber and spaced apart from a cassette store having rotary platforms for housing cassettes. A single cassette handler can be used to access cassettes at each of the input / output ports and the interior storage positions.

A physiological status monitoring system includes a shirt and a stretchable circumferential band attached to the shirt. The stretchable band includes a respiration detector subsystem and signal transmission conductors. One or more sensors on the band are electrically connected to a signal transmission conductor. At least one sensor has an exposed electrode inside the shirt. The system includes a cover over the band and / or the one or more sensors. A connection subsystem on the band is electrically connected to the respiration detector subsystem and the signal transmission conductors and includes signal traces therefrom to a first connector accessible from outside the shirt. An electronics module is releasably attached to the shirt and includes a second connector which mates with the first connector. The electronics module includes a processing system and a transmitter. The remote display unit includes a receiver, a display, and a processing system.

Systems, assemblies, and methods to treat pulmonary diseases are used to decrease nervous system input to distal regions of the bronchial tree within the lungs. Treatment systems damage nerve tissue to temporarily or permanently decrease nervous system input. The treatment systems are capable of heating nerve tissue, cooling the nerve tissue, delivering a flowable substance that cause trauma to the nerve tissue, puncturing the nerve tissue, tearing the nerve tissue, cutting the nerve tissue, applying pressure to the nerve tissue, applying ultrasound to the nerve tissue, applying ionizing radiation to the nerve tissue, disrupting cell membranes of nerve tissue with electrical energy, or delivering long acting nerve blocking chemicals to the nerve tissue.

Systems, assemblies, and methods to treat pulmonary diseases are used to decrease nervous system input to distal regions of the bronchial tree within the lungs. Treatment systems damage nerve tissue to temporarily or permanently decrease nervous system input. The treatment systems are capable of heating nerve tissue, cooling the nerve tissue, delivering a flowable substance that cause trauma to the nerve tissue, puncturing the nerve tissue, tearing the nerve tissue, cutting the nerve tissue, applying pressure to the nerve tissue, applying ultrasound to the nerve tissue, applying ionizing radiation to the nerve tissue, disrupting cell membranes of nerve tissue with electrical energy, or delivering long acting nerve blocking chemicals to the nerve tissue.

An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.