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2121results about "Discharge tube/lamp details" patented technology

Carbon nanotube hybrid system using carbide-derived carbon, a method of making the same, an electron emitter comprising the same, and an electron emission device comprising the electron emitter

A carbon nanotube hybrid system includes: a carbide-derived carbon prepared by reacting a carbide compound and a halogen group containing gas to extract elements of the carbide compound except carbons; metals supported on the carbide-derived carbon or remaining in the carbide-derived carbon; and carbon sources from which carbon nanotubes are grown from the carbide-derived carbon. A method of preparing the carbon nanotube hybrid system includes preparing the carbide-derived carbon, extracting elements therefrom, and growing carbon nanotubes from the carbide-derived carbon. The carbon nanotube hybrid system has excellent uniformity and a long lifetime. An electron emitter having improved electron emitting properties can be inexpensively prepared using the carbon nanotube hybrid system compared to conventional carbon nanotubes. An electron emission device having excellent electron emitting properties can be prepared using the electron emitter.
Owner:SAMSUNG SDI CO LTD

Method for treating a target volume with a particle beam and device implementing same

The invention concerns a method for treating a target volume with a particle beam, in particular a proton beam, which consists in generating said particle beam using an accelerator and in producing from said beam a narrow spot directed towards the target volume, characterized in that said spot sweeping speed and the particle beam intensity are simultaneously varied.
Owner:ION BEAM APPL

Semiconductor processing system and methods using capacitively coupled plasma

ActiveUS20130082197A1Conducive to environmental controlPrecise control of etchRadiation/particle handlingElectrode and associated part arrangementsCapacitanceSemiconductor
Substrate processing systems are described that have a capacitively coupled plasma (CCP) unit positioned inside a process chamber. The CCP unit may include a plasma excitation region formed between a first electrode and a second electrode. The first electrode may include a first plurality of openings to permit a first gas to enter the plasma excitation region, and the second electrode may include a second plurality of openings to permit an activated gas to exit the plasma excitation region. The system may further include a gas inlet for supplying the first gas to the first electrode of the CCP unit, and a pedestal that is operable to support a substrate. The pedestal is positioned below a gas reaction region into which the activated gas travels from the CCP unit.
Owner:APPLIED MATERIALS INC

Physiological parameter detector

InactiveUS20090095926A1Improving electromagnetic noise immunityImprove electromagnetic immunityRadiation/particle handlingElectrode and associated part arrangementsOptical radiationElectromagnetic interference
A pulse oximetry sensor has an emitter adapted to transmit optical radiation into a tissue site and a ceramic detector adapted to receive optical radiation from the emitter after tissue site absorption. The detector is surrounded by shielding material to reduce undesirable electromagnetic interference.
Owner:JPMORGAN CHASE BANK NA

Particle therapy system

A particle therapy system is provided which can simply and quickly correct a beam orbit. In a particle therapy system provided with an irradiation facility comprising a first beam transport system for receiving a beam and transporting the beam to the patient side, and an irradiation nozzle for forming an irradiation field of the beam, the particle therapy system comprises first beam position monitors for detecting a position upstream of the irradiation nozzle at which the beam passes, second beam position monitors for detecting a position downstream of the irradiation nozzle at which the charged-particle beam passes, and first and second steering magnets. Correction bending amounts for causing the beam to be coincident with a predetermined orbit after the correction are determined in accordance with detected results from the first and second beam position monitors, and first and second steering magnets are excited under control so that the determined correction bending amounts are obtained.
Owner:HITACHI LTD

Device for varying the energy of a particle beam extracted from an accelerator

A device for varying the energy of a particle beam extracted from a fixed-energy particle accelerator includes a block of energy degrading material positioned in the path of the particle beam. The block of energy degrading material is preferably in the form of a ring arranged on a wheel. The ring is of a staircase configuration, having discrete steps defining a thickness between parallel entry and exit faces. According to one aspect of the invention, the block is configured so that the particle beam energy variation reaches a maximum at the edges of each step. This upper limit is also the lower limit of the next step. Thus, continuous energy variation is possible despite the fact that the thickness of the block varies in discrete steps.
Owner:ION BEAM APPL

Rotating irradiation apparatus

A rotating irradiation apparatus includes a rotating gantry 3 including a front ring 19 and a rear ring 20 and is provided with a beam delivery device 11 and an irradiation device 4. The beam delivery device 11 delivers an ion beam used for particle radiotherapy. Radial support devices 61A and 61B support the front ring 19 and radial support devices 61A and 61B support the rear ring 20. Each radial support device includes a linear guide 41, an upper support structure disposed above the linear guide 41, and a lower support structure disposed below the linear guide 41. The upper support structure is movably mounted on the lower support structure and is movable in the direction of the rotational axis of the rotating gantry 3.
Owner:HITACHI LTD

Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays

An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and / or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.
Owner:USHIO DENKI KK

Particle beam irradiation system

It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle.
Owner:HITACHI LTD

Particle beam irradiation system

A particle beam irradiation system capable of ensuring a more uniform dose distribution at an irradiation object even when a certain time is required from output of a beam extraction stop signal to the time when extraction of a charged particle beam from an accelerator is actually stopped. The particle beam irradiation system comprises a synchrotron, an irradiation device including scanning magnets and outputting an ion beam extracted from the synchrotron, and a control unit. The control unit stops the output of the ion beam from the irradiation device in accordance with the beam extraction stop signal, controls the scanning magnets to change an exposure position in a state in which the output of the ion beam is stopped, and after the change of the exposure position, starts the output of the ion beam from the irradiation device again. The control unit further outputs a next beam extraction stop signal when an increment of dose integrated from the time of a preceding beam extraction stop signal as a start point reaches a setting dose stored in advance.
Owner:HITACHI LTD

Light emitting device

A light emitting device that emits light of various colors by blending lights emitted by two or more kinds of fluorescent materials which are substantially directly excited by the light emitted by an excitation source having principal emission peak in a range from 250 nm to 500 nm. Each of the fluorescent material is of a direct-transition type.
Owner:NICHIA CORP

Particle beam irradiation equipment and particle beam irradiation method

Particle beam irradiation equipment and a method of adjusting irradiation nozzle, which can ensure a long range and high dose uniformity at any field size are provided. The particle beam irradiation equipment comprises charged particle beam generation equipment and an irradiation nozzle for irradiating a charged particle beam extracted from the charged particle beam generation equipment to an irradiation target. The irradiation nozzle comprises a first scatterer device including a first scatterer for spreading out the charged particle beam into a Gaussian-like distribution, and multiple stages of second scatterer devices including second scatterers for producing a uniform intensity distribution of the charged particle beam having been spread out into a Gaussian-like distribution by the first scatterer. For forming irradiation fields having sizes different from each other, the second scatterer devices are disposed downstream of the first scatterer device in the direction of travel of the charged particle beam at the spacing depending on the difference in the field size.
Owner:HITACHI LTD

Method for patterning carbon nanotube coating and carbon nanotube wiring

A method for making a nanocomposite electrode or circuit pattern includes forming a continuous carbon nanotube layer impregnated with a binder and patterning the binder resin using various printing or photo imaging techniques. An alternative method includes patterning the carbon nanotube layer using various printing or imaging techniques and subsequently applying a continuous coating of binder resin to the patterned carbon nanotube layer. Articles made from these patterned nanocomposite coatings include transparent electrodes and circuits for flat panel displays, photovoltaics, touch screens, electroluminescent lamps, and EMI shielding.
Owner:EIKOS

Shaped biocompatible radiation shield and method for making same

A radiation applicator system is structured to be mounted to a radiation source for providing a predefined dose of radiation for treating a localized area or volume, such as the tissue surrounding the site of an excised tumor. The applicator system includes an applicator and an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along the radiation producing probe. The applicator includes a shank and an applicator head, wherein the head is located at a distal end of the applicator shank. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the applicator head, which is adapted for engaging and / or supporting the area or volume to be treated with a predefined does of radiation. The applicator can include a low energy radiation filter inside of the applicator head to reduce undesirable low energy radiation emissions. A biocompatible radiation shield may be coupled to the outer surface of the applicator head to block radiation emitted from a portion of the radiation probe, in order to shield an adjacent location or vital organ from any undesired radiation exposure. A plurality of applicators having applicator heads and radiation shields of different sizes and shapes can be provided to accommodate treatment sites of various sizes and shapes.
Owner:CARL ZEISS STIFTUNG DOING BUSINESS CARL ZEISS

Charged particle irradiation system

ActiveUS7838855B2Improving the accuracy in irradiation position of a charged particle beamReduce the possibilityElectrode and associated part arrangementsMaterial analysis by optical meansExcitation currentParticle physics
A charged particle irradiation system that positions the beam at a target position to avoid irradiation of normal tissue includes an acceleration system 6 for extracting a charged particle beam, scanning magnets 24 and 25, and charged particle beam position monitors 26 and 27. On the basis of signals received from the charged particle beam position monitors 26 and 27, the control unit 70 calculates a beam position at a target position and then controls the scanning magnets 24 and 25 so that the charged particle beam is moved to a desired irradiation position at the target position. The control unit 70 corrects the value of an excitation current applied to each of the scanning magnets 24 and 25 on a specified cycle basis on the basis of information about the position and the angle of the charged particle beam.
Owner:HITACHI LTD

Carbon nanotube particulates, compositions and use thereof

A method for making carbon nanotube particulates involves providing a catalyst comprising catalytic metals, such as iron and molybdenum or metals from Group VIB or Group VIIIB elements, on a support material, such as magnesia, and contacting the catalyst with a gaseous carbon-containing feedstock, such as methane, at a sufficient temperature and for a sufficient contact time to make small-diameter carbon nanotubes having one or more walls and outer wall diameters of less than about 3 nm. Removal of the support material from the carbon nanotubes yields particulates of enmeshed carbon nanotubes that retain an approximate three-dimensional shape and size of the particulate support that was removed. The carbon nanotube particulates can comprise ropes of carbon nanotubes. The carbon nanotube particulates disperse well in polymers and show high conductivity in polymers at low loadings. As electrical emitters, the carbon nanotube particulates exhibit very low “turn on” emission field.
Owner:UNIDYM

Ion radiation therapy system with variable beam resolution

An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and / or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity.
Owner:WISCONSIN ALUMNI RES FOUND

Activated gas injector, film deposition apparatus, and film deposition method

An activated gas injector includes a flow passage defining member partitioned into a gas activation passage and a gas introduction passage by a partition wall; a gas introduction port through which a process gas is introduced into the gas introduction passage; a pair of electrodes to be supplied with electrical power to activate the process gas, wherein the electrodes extend along the partition wall in the gas activation passage; through-holes formed in the partition wall and arranged along a longitudinal direction of the electrodes, wherein the through-holes allow the process gas to flow from the gas introduction passage to the gas activation passage; and gas ejection holes provided in the gas activation passage along the longitudinal direction of the electrodes, wherein the gas ejection holes allow the process gas activated in the gas activation passage to be ejected therefrom.
Owner:TOKYO ELECTRON LTD

Carbon annotate-based device and method for making carbon nanotube based device

A carbon nanotube-based device (40) includes a substrate (10), a number of alloyed, nano-sized catalytic particles (26) formed on the substrate, and an array of aligned carbon nanotubes (15) extending from the alloyed, nano-sized catalytic particles. The nanotube array bends in an arcuate configuation. A method for making the carbon nanotube-based device includes the steps of: providing a substrate; depositing a catalyst layer on the substrate; depositing two different layers of catalyst-doped materials on different areas of the catalyst layer for accelerating or decelerating the rate of synthesis of the aligned carbon nanotube array; annealing the catalyst and the catalyst-doped materials in an oxygen-containing gas at a low temperature; introducing a carbon source gas; and forming an array of aligned carbon nanotubes extending from the alloyed, nano-sized catalytic particles using a chemical vapor deposition method.
Owner:TSINGHUA UNIV +1

Particle beam irradiation system

A particle beam irradiation system which can increase an availability factor. An ion beam extracted from one proton beam linac is bent at 90 degrees by a switching magnet and is introduced to RI production equipment through a beam line. In the RI production equipment, a RI is produced using the introduced ion beam. An ion beam extracted from the other proton beam linac is bent at 90 degrees by the switching magnet and is introduced to a synchrotron through a beam line. The ion beam extracted from the synchrotron is irradiated to a patient from irradiation equipment. If one proton beam linac comes into an abnormal state, the one proton beam linac is stopped in operation and checked. During the check, the ion beam extracted from the other proton beam linac is selectively introduced to the RI production equipment and the synchrotron by the switching magnet.
Owner:HITACHI LTD

Method and apparatus for controlling electron beam current

InactiveUS7085351B2High emitted electron current densityHigh electron beam currentStatic indicating devicesNanoinformaticsHigh energyX-ray
An x-ray generating device includes a field emission cathode formed at least partially from a nanostructure-containing material having an emitted electron current density of at least 4 A / cm2. High energy conversion efficiency and compact design are achieved due to easy focusing of cold cathode emitted electrons and dramatic reduction of heating at the anode. In addition, by pulsing the field between the cathode and the gate or anode and focusing the electron beams at different anode materials, pulsed x-ray radiation with varying energy can be generated from a single device. Methods and apparatus for independent control of electron emission current and x-ray energy in x-ray tubes are also provided. The independent control can be accomplished by adjusting the distance between the cathode and anode. The independent control can also be accomplished by adjusting the temperature of the cathode. The independent control can also be accomplished by optical excitation of the cathode. The cathode can include field emissive materials such as carbon nanotubes.
Owner:THE UNIV OF NORTH CAROLINA AT CHAPEL HILL

Particle beam irradiation system

It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle.
Owner:HITACHI LTD

Alternative fuels for EUV light source

An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and / or Indium.
Owner:ASML NETHERLANDS BV

Particle beam therapeutic apparatus

A particle beam therapeutic apparatus can ensure the uniformity of dose distribution by overlapping the desired loci of the irradiation of a particle beam a reduced number of times. A flow of a particle beam transported so as to be irradiated to a diseased part is caused to deflect in two mutually orthogonal directions perpendicular to the direction of travel of the particle beam. The irradiation position of the particle beam is scanned, upon each period, in a manner to return to a position of irradiation located at the start of the period, whereby a plurality of loci drawn within one period are overlapped with one another thereby to irradiate a desired planned dose to the diseased part. The particle beam can be interrupted only at the end of the period.
Owner:MITSUBISHI ELECTRIC CORP

Method of modulating laser-accelerated protons for radiation therapy

Methods of optimizing a laser-accelerated proton radiation dose to a targeted region are disclosed. Disclosed methods include providing a plurality of modulated polyenergetic proton beamlets and irradiating the targeted region with the plurality of modulated beamlets.
Owner:INST FOR CANCER RES
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