261 results about "Microplasma" patented technology

An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20-200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.

A medical diagnostic method utilizes a surface plasmon resonance apparatus provided with a sensing surface. A tear sample from an eye of a patient is placed into contact with the sensing surface. The surface plasmon resonance apparatus is then operated to determine osmolarity of the tear sample.

A sterilization and decontamination system in which a non-thermal plasma discharge device is disposed upstream of a suspension media (e.g., a filter, electrostatic precipitator, carbon bed). The plasma discharge device generates a plasma that is emitted through apertures (e.g., capillaries or slits) in the primary dielectric. Plasma generated active sterilizing species when exposed to contaminants or undesirable particulate matter is able to deactivate or reduce such matter in contaminated fluid stream and/or on objects. Thus, the undesirable contaminants in the fluid to be treated are first reduced during their exposure to the plasma generated active sterilizing species in the plasma region of the discharge device. Furthermore, the plasma generated active sterilizing species are carried downstream to suspension media and upon contact therewith deactivate the contaminants collected on the suspension media itself. Advantageously, the suspension media may be cleansed in situ. To increase the sterilization efficiency an additive, free or carrier gas (e.g., alcohol, water, dry air) may be injected into the apertures defined in the primary dielectric. These additives increase the concentration of plasma generated active sterilizing agents while reducing the byproduct of generated undesirable ozone pollutants. Downstream of the filter the fluid stream may be further treated by being exposed to a catalyst media or additional suspension media to further reduce the amount of undesirable particulate matter.

A medical device (100) for tissue welding is provided that comprises at least one processor (161) configured to regulate cold plasma production in a plasma head (102) by controlling an RF power source (141) to supply RF plasma-producing power to the plasma head.

A wire bonding apparatus for manufacturing, for instance, semiconductor devices, including a cleaning case in which a microplasma generating section comprised of a plasma torch, which has a plasma nozzle 38 at the end, and capacitive coupling electrodes composed of an outer electrode and an inner electrode is fixed to the bottom of the cleaning case. The plasma nozzle is provided such that its center line is in alignment with the longitudinal center line of the capillary. Microplasma is ejected from below the capillary to clean its tip within the cleaning case. A shutter is provided on the top of the cleaning case and the wasted gas produced as a result of cleaning is exhausted out of the cleaning case through an exhaustion port of the cleaning case.

A microplasma emission spectrometer is described that includes a chamber for confining a sample volume of gas. A microplasma source that includes a resonant antenna structure generates a microplasma in the chamber from the sample volume of gas. A RF power supply provides power to the resonant antenna structure that generates the microplasma from the sample volume of gas. A spectrally sensitive detector is optically coupled to the microplasma. The entrance of the spectrally sensitive detector has dimensions and is positioned so that emissions from at least one-tenth of a total volume of the microplasma are transmitted through the entrance of the spectrally sensitive detector.

A microplasma spray coating apparatus includes a microplasma apparatus with an anode, cathode, and an arc generator for generating an electric arc between the anode and cathode. An arc gas emitter injects inert gas through the electric arc. The electric arc is operable for ionizing the gas to create a plasma gas stream. A powder injector nozzle extends through the anode and injects powdered material into the plasma stream for transfer to the workpiece.

The present invention facilitates improvements in laser ablation of solid samples to be analyzed by an external inductively coupled plasma (ICP) emission spectrometer, ICP/mass-spectrometer (ICP-MS), or flowing afterglow (FAG) mass spectrometer (FAG-MS) for elemental analysis (ICP and ICP-MS) or molecular analysis (FAG-MS). A novel invention mirror-with-hole beam combiner eliminates chromatic aberration in the invention sample view and allows rad-hardening the laser ablation invention for use in a radiation hot cell for analysis of high activity nuclear waste. Many other novel invention rad-hardening attributes facilitate a comprehensive rad-hardened laser ablation system (the world's first). In other embodiments, invention novelties include unusually large homogeneous focused laser spot diameters, unusually long laser objective lens focal length, wide range operationally variable laser path length with built-in re-alignment, operationally variable demagnification ratio and diameter of the focused laser spot, the use of significantly higher powered SMR lasers in a large spot diameter to facilitate high sensitivity bulk analysis of solid samples, a demountable and gravitationally self-sealing stack assembly laser ablation cell, and the world's first auto-samplers (mechanized sample changers) for analytical laser ablation.

A low-temperature, atmospheric-pressure microplasma generator comprises at least one strip of metal on a dielectric substrate. A first end of the strip is connected to a ground plane and the second end of the strip is adjacent to a grounded electrode, with a gap being defined between the second end of the strip and the grounded electrode. High frequency power is supplied to the strip. The frequency is selected so that the length of the strip is an odd integer multiple of ¼ of the wavelength traveling on the strip. A microplasma forms in the gap between the second end of the strip and the grounded electrode due to electric fields in that region. A microplasma generator array comprises a plurality of strongly-coupled resonant strips in close proximity to one another. At least one of the strips has an input for high-frequency electrical power. The remaining strips resonate due to coupling from the at least one powered strip. The array can provide a continuous line or ring of plasma. The microplasma generator can be used to alter the surface of a substrate, such as by adding material (deposition), removal of material (etching), or modifying surface chemistry.

A system and method for synthesizing nanopowder which provides for precursor material ablation from two opposing electrodes that are substantially axially aligned and spaced apart within a gaseous atmosphere, where a plasma is created by a high power pulsed electrical discharge between the electrodes, such pulse being of short duration to inertially confine the plasma, thereby creating a high temperature and high density plasma having high quench and/or reaction rates with the gaseous atmosphere for improved nanopowder synthesis.

A microplasma source and a sterilization system including the same are disclosed. The microplasma source includes: a microplasma-generating unit including: a gas transmission chamber having a first inlet and a first outlet wherein the first inlet is used to import a first gas; a protection and heat dissipation chamber of which a side is connected to the inner wall of the first outlet; a dielectric inner tube having a second inlet and a second outlet and penetrating through the protection and heat dissipation chamber, wherein the second inlet is communicated to the gas transmission chamber; an electrode arranged outside at the second outlet and located in the protection and heat dissipation chamber; and a hollow metal tube disposed in the gas transmission chamber and the dielectric inner tube and having a third inlet and a third outlet, wherein the third inlet is used to import a second gas.

An embodiment of the invention is a microcavity plasma device that can be controlled by a low voltage electron emitter. The microcavity plasma device includes driving electrodes disposed proximate to a microcavity and arranged to contribute to generation of plasma in the microcavity upon application of a driving voltage. An electron emitter is arranged to emit electrons into the microcavity upon application of a control voltage. The electron emitter is an electron source having an insulator layer defining a tunneling region. The microplasma itself can serve as a second electrode necessary to energize the electron emitter. While a voltage comparable to previous microcavity plasma devices is still imposed across the microcavity plasma devices, control of the devices can be accomplished at high speeds and with a small voltage, e.g., about 5V to 30V in preferred embodiments.

The present invention provides a method and apparatus for precleaning a patterned substrate with a plasma comprising a mixture of argon, helium, and hydrogen. Addition of helium to the gas mixture of argon and hydrogen surprisingly increases the etch rate in comparison to argon/hydrogen mixtures. Etch rates are improved for argon concentrations below about 75% by volume. RF power is capacitively and inductively coupled to the plasma to enhance control of the etch properties. Argon, helium, and hydrogen can be provided as separate gases or as mixtures.

Microcavity plasma devices and arrays of microcavity plasma devices are provided that have a reduced excitation voltage. A trigger electrode disposed proximate to a microcavity reduce the excitation voltage required between first and second electrodes to ignite a plasma in the microcavity when gas(es) or vapor(s) (or combinations thereof) are contained within the microcavity. The invention also provides symmetrical microplasma devices and arrays of microcavity plasma devices for which current waveforms are the same for each half-cycle of the voltage driving waveform. Additionally, the invention also provides devices that have standoff portions and voids that can reduce cross talk. The devices are preferably also used with a trigger electrode.

An apparatus and method for monitoring diabetes through breath acetone detection and quantitation employs a microplasma source in combination with a spectrometer. The microplasma source provides sufficient energy to produce excited acetone fragments from the breath gas that emit light. The emitted light is sent to the spectrometer, which generates an emission spectrum that is used to detect and quantify acetone in the breath gas.

A self-magnetically confined lithium plasma that has an applied axial magnetic field is irradiated at sub-critical density by a perpendicularly oriented carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size. Lithium reflux is facilitated by ionization, electric field induced drift toward, and capture on surfaces intersected perpendicularly by the applied axial magnetic field.

The invention relates to a device and a method for the detection of heavy metal elements. The device comprises a hydride generator unit, a liquid negative electrode glow discharge spectrometer unit and a connection unit connected to the hydride generator unit and the liquid negative electrode glow discharge spectrometer unit. The hydride generator unit makes a sample to be measured generate heavy metal hydride to be measured ; the heavy metal hydride to be measured generated by the hydride generator unit is transported to a positive electrode of a hollow titanium tube via the connection unit, and is lead from the positive electrode of the titanium tube to a glow discharge microplasma, and is excited to generate a characteristic emission spectrum. The device has simple structure, the method is convenient for operation and low in cost, and can conveniently, timely detect heavy metal elements and improve the sensitivity and selectivity to heavy metal elements.

A method and system for desorbing and ionizing molecules from a sample for mass spectrometry using a microplasma device is disclosed. The system and method relies upon a microplasma device, or array of such devices, to partially ionize a gas to form a microplasma. The ionized gas can be a mixture of a noble gas, such as neon or argon, and hydrogen (H₂). The ionized gas can form a effluent stream directed onto the surface of a sample to desorb molecules from the remainder of the sample. The desorbed molecules can be ionized by the effluent stream as they leave the surface of the sample. The ionization process can include: photoionization, penning ionization, chemical ionization (proton transfer), and electron impact ionization. The ionized particles from the sample can be directed to a mass spectrometer for analysis. This can produce spatially-resolved mass spectral data, and can be conducted concurrently with another imaging system, such as a microscope.

An ionization apparatus according to the present invention has a mechanism for causing metal ions emitted from an ion emitter to attach to an introduced target gas so as to generate ions of the sample gas and emits the ions of the sample gas to a mass spectrometer. The mass spectrometer has a zone in which one or both of an electric field and magnetic field are formed. As the electrode for causing the generation of cleaning plasma in the ionization zone generating the ions of the sample gas, the ion emitter is used. The ion emitter causes the generation of plasma in connection with a hollow vessel and removes deposits on components facing the ionization zone by the plasma. The plasma cleaning process is performed consecutively at a suitable timing after the ionization process. Due to the above configuration, deteriorated performance in ionization can be restored in a short time, a memory effect can be prevented, and accurate mass spectrometry becomes possible. The ionization apparatus of the present invention is suitable for a mass spectrometry apparatus.