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296results about How to "Increase electron density" patented technology

Novel dinuclear metal complex and pyrophosphate assay using the same

A novel coordination complex formed by dinuclear metal complexation is provided. The complex is a dinuclear metal complex of a compound, wherein the compound comprises a conjugation ring system substituted with: a) an electron donating group selected from —OH, —SH and —NH2; b) an indicating group selected from a chromogenic group, a fluorescent group and an electrochemical group; and c) two binding auxiliary groups, in combination with the electron donating group each of which being coordinated with the metal to provide an anion bonding site, wherein as the complex binds to a anion, the coordination of the electron donating group with the metal is weakened and electron donation of the electron donating group to the conjugation ring system is reinforced such that the reinforced electron donation by the electron donating group is transferred through the conjugation ring system to the indicating group to produce an indicating signal concomitant with the change of its electronic density. The coordination complex shows high sensitivity and high selectivity for pyrophosphate over other anions in an aqueous solvent over a wide pH range. Therefore, the complex is useful for pyrophosphate assay as a pyrophosphate sensor.
Owner:SEOUL NAT UNIV FOUND

High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process

The invention is embodied in a method of processing a semiconductor workpiece in a plasma reactor chamber, including supplying a polymer and etchant precursor gas containing at least carbon and fluorine into the chamber at a first flow rate sufficient of itself to maintain a gas pressure in the chamber in a low pressure range below about 20 mT, supplying a relatively non-reactive gas into the chamber at second flow rate sufficient about one half or more of the total gas flow rate into the chamber, in combination with the first flow rate of the precursor gas, to maintain the gas pressure in the chamber in a high pressure range above 20 mT, and applying plasma source power into the chamber to form a high ion density plasma having an ion density in excess of 1010 ions per cubic centimeter. In one application of the invention, the workpiece includes an oxygen-containing overlayer to be etched by the process and a non-oxygen-containing underlayer to be protected from etching, the precursor gas dissociating in the plasma into fluorine-containing etchant species which etch the oxygen-containing layer and carbon-containing polymer species which accumulate on the non-oxygen-containing underlayer. Alternatively, the high pressure range may be defined as a pressure at which the skin depth of the inductive field exceeds {fraction (1 / 10)} of the gap between the inductive antenna and the workpiece.
Owner:APPLIED MATERIALS INC

Experimental apparatus for acquiring large-area uniform discharge plasmas

The invention relates to an experimental apparatus for acquiring large-area uniform discharge plasmas, which belongs to the technical field of plasmas. The experimental apparatus comprises a bipolar nanosecond pulse power supply, a reactor, multi-needle-to-plate electrodes, a gas distribution system, a spectral measurement system and a discharge measurement system, wherein the bipolar nanosecond pulse power supply drives dielectric barrier discharge of air and other gas mixtures among the multi-needle-to-plate electrodes in the reactor, and the gas mixtures are input to the reactor through the gas distribution system; the spectral measurement system collects photonic information of plasma discharge in real time and inputs the photonic information to a computer for spectral analysis; and the discharge measurement system collects discharge voltage and current of the high-voltage nanosecond pulse power supply in real time, and the discharge voltage and current are displayed through a digital oscilloscope. By virtue of the bipolar nanosecond narrow-pulse power supply, the large-area discharge plasmas are generated without a magnetic field; and the generated plasmas are uniform, diffusive, high in electron density, high in energy utilization ratio, low in energy consumption and easy to control in a discharge process.
Owner:DALIAN UNIV OF TECH
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