The invention discloses a
temperature control method for
processing graphite by using double
plasma sources, and relates to the technical field of
plasma material
processing, in particular to a
temperature control method for
processing graphite by using double
plasma sources, which comprises the following steps: adopting a cylindrical reactor, and arranging a plasma source I and a plasma source II up and down along the axial direction on two sides of the cylindrical reactor, and an outlet of the
powder feeding mechanism directly faces a core high-temperature area of the plasma source I, so that
graphite powder directly enters a heating area. The two sources are connected in series up and down to construct a continuous
relay type high-temperature path. The center distance between the
powder feeding port and the source I is limited
not to exceed half of the outlet
diameter of the reactor, the center distance between the two sources is 1-2.5 times of the outlet
diameter, and the center distance between the source II and the outlet is larger than 5 times of the
diameter; the flow of the
second source is 1.2-1.8 times that of the first source, the temperature of the core area is maintained to be 8000-10000 K by adjusting the
flow ratio, and the total power does not exceed 100 kilowatts. The total
retention time of the graphite powder in a two-source high-temperature area is longer than 0.2 second, the diameter of an outlet of the reactor is 100-400 mm, the reactor is made of high-temperature-resistant stainless steel or graphite, and accurate control over the graphite treatment temperature is achieved.