53 results about "Plasma confinement" patented technology

The invention discloses a multi-mode magnetic field intelligent closed-loop plasma confinement system and method. The system comprises a multi-mode magnetic field generation module, a multi-dimensional plasma diagnosis module and a layered intelligent closed-loop control module. The multi-mode magnetic field generation module generates a steady-state, pulse and alternating composite magnetic field to realize adjustable space gradient; the multi-dimensional diagnosis module synchronously acquires electrical, optical and particle parameters, and ensures the accuracy through data fusion; and the hierarchical intelligent closed-loop control module generates an adjusting instruction to realize closed-loop optimization based on dynamic threshold and multi-algorithm scheduling. According to the method, the constraint performance is improved through the steps of initialization, data acquisition, state evaluation and closed-loop adjustment in combination with parameter self-optimization and three-level fault protection. According to the scheme, the plasma constraint time exceeds 300 s, the escape rate is lower than 5%, the adjustment response is smaller than or equal to 10 ms, the method adapts to multiple working conditions and can be popularized to the fields of nuclear fusion experiments and plasma processing, and the problems that a traditional system is poor in stability and lags in response are solved.

A computer-implemented method is disclosed for designing magnetic field geometries in magnetically confined plasmas, such as stellarators, to minimize energy or particle transport due to plasma turbulence. The method utilizes machine learning (ML) models trained on datasets of gyrokinetic simulations. These models predict turbulent transport based on geometric features derived from the magnetic configuration, which influence solutions of the gyrokinetic equation in ballooning representation. The input features include both raw geometrical quantities-such as field strength, curvature drifts, and perpendicular wavenumbers-and engineered features derived therefrom. The models may incorporate translational invariance and be implemented as convolutional neural networks or via solutions to parameterized differential equations. The resulting ML-driven target functions are computationally efficient and suitable for use in optimization algorithms to identify magnetic geometries that enhance plasma confinement.

A computer-implemented method is disclosed for designing magnetic field geometries in magnetically confined plasmas, such as stellarators, to minimize energy or particle transport due to plasma turbulence. The method utilizes machine learning (ML) models trained on datasets of gyrokinetic simulations. These models predict turbulent transport based on geometric features derived from the magnetic configuration, which influence solutions of the gyrokinetic equation in ballooning representation. The input features include both raw geometrical quantities—such as field strength, curvature drifts, and perpendicular wavenumbers—and engineered features derived therefrom. The models may incorporate translational invariance and be implemented as convolutional neural networks or via solutions to parameterized differential equations. The resulting ML-driven target functions are computationally efficient and suitable for use in optimization algorithms to identify magnetic geometries that enhance plasma confinement.

The invention discloses an ultra-low temperature vacuum system of a Tokamak or star imitator adaptive to nuclear fusion, and relates to the technical field of nuclear fusion equipment, the ultra-low temperature vacuum system comprises a vacuum chamber, a plasma state sensor is embedded in the inner wall of the vacuum chamber, the outer end of the vacuum chamber is provided with a sealing interface, the outer end of the sealing interface is provided with a primary filter, and the primary filter is provided with a secondary filter. A getter bin is installed at the outer end of the primary filter, an auxiliary pump is installed at the outer end of the getter bin, a stop valve is installed at the outer end of the auxiliary pump, a cold trap is installed at the outer end of the stop valve, the side wall of the cold trap is connected with a refrigerating machine through a pipeline, and a main pump is installed at the outer end of the cold trap. By arranging a series of structures, the pain point of decoupling of a traditional system and plasma operation is thoroughly solved, all the components cooperate to guarantee the ultrahigh vacuum environment, interference of impurity gas on plasma constraint is greatly reduced, and the stability and success rate of a nuclear fusion experiment are remarkably improved.

A system and method for forming a film that includes generating a plasma in a processing volume of a processing chamber to form the film on a substrate. The processing chamber includes a plasma confinement system. The plasma confinement system includes a chamber wall liner having a ring shaped body. The chamber wall liner has an inner wall, a slit opening formed through the inner wall and sized for a substrate to pass therethrough the slit opening, and a first cavity having a back wall. The plasma confinement system includes a plasma confinement assembly. The plasma confinement assembly has a first magnet disposed in the first cavity adjacent the back wall, and a first window disposed in the first cavity between the first magnet and the inner wall, wherein the first window seals the first magnet from an outside environment.

A method for depositing at least one material on a substrate is described. The method comprises a first deposition, wherein the first deposition comprises sputtering from a first rotating target and a second rotating target through an aperture, the aperture being adjustable and having a size smaller than a first size. The first rotating target has a first magnet assembly providing plasma confinement in a first direction toward a second rotating target. The second rotating target has a second magnet assembly providing plasma confinement in a second direction toward a first rotating target. The first direction and the second direction deviate from being parallel to the substrate plane of the substrate by an angle less than a first value. The method comprises a second deposition on the top of the first deposition. The second deposition comprises sputtering from a first rotating target and a second rotating target through an aperture, the aperture having at least a second size, the second size being larger than the first size. The first magnet assembly provides plasma confinement in a third direction. The second magnet assembly provides plasma confinement in a fourth direction. At least one of the third or fourth directions deviates from being parallel to the substrate plane by at least an angle of the second value, and the second value is greater than the first value.

The present disclosure relates to a stellarator (1) comprising: a plurality of non-planar, superconducting coils, for generating a magnetic field for confining a plasma inside a plasma vessel; and a coil support structure (30, 40, 50) comprising: a first structural arrangement (30) arranged between a center (20) of the stellarator and the plasma vessel and configured to balance a radial force exerted by the magnetic field on the plurality of coils; a second structural arrangement (40, 50) configured to balance local forces exerted by the magnetic field on one or more coil segments of the plurality of coils; wherein the local forces cause at least a toroidal motion and / or a toroidal deformation of the one or more segments of the plurality of coils.

The present invention addresses a problem in which a metal is easily corroded by rust when water is used as a plasma confinement layer in a laser peening method utilized as a metal surface modification method.　This laser processing method comprises a step of applying or affixing a gel-like substance to a processing region of an object to be processed, and a step of repeatedly irradiating the processing region with a laser. Because the laser processing method allows use of a gel-like substance containing no water as the plasma confinement layer, corrosion of the metal, which is the object to be processed, due to rust can be avoided. The gel-like substance is suitably used as a physical gel.

This invention relates to the field of intelligent welding simulation and control, and particularly to a method for constructing an AI welding composite energy field model based on a dynamic coupling mechanism. The method includes: firstly, constructing an asymmetric rotating-tilted body laser energy field model, an arc energy field model considering plasma constraints, and a dynamically coupled enhanced energy field model; simultaneously acquiring multimodal sensor data including current and voltage signals and molten pool images; then, using a pre-trained AI deep inversion network, mapping the extracted multimodal feature vectors and process parameters to accurate plasma compressibility factors and synergistic effect coupling coefficients; finally, updating the heat flux density distribution through back substitution and superimposing it to construct the overall composite energy field distribution, which is then input into a multiphysics solver for transient hydrodynamic calculations. This invention achieves the inversion and real-time dynamic coupling of key heat source parameters, improving the simulation optimization efficiency of the composite welding energy field model and the accuracy of weld morphology prediction.

A plasma lining structure is used in a process chamber to block direct line-of-sight for plasma generated within to grounded surface. The plasma lining structure includes a plurality of sections to cover at least one or more portions of an inside surface of a plasma confinement structure disposed in the process chamber. The sections of the plasma lining structure are positioned between a plasma region and the sidewall of the plasma confinement structure, when the plasma lining structure and the plasma confinement structure are disposed in the plasma chamber, such that the sections directly face the plasma region.

A closed-field magnetic confinement device for plasma with a polyhedral central chamber surrounded by electromagnetic coils on the faces of the polyhedron, such that edge-adjacent coils have different

An intelligent plasma stabilization system for a fusion reactor, consisting of: a plasma diagnostic acquisition module for acquiring real-time plasma operating data from a variety of reactor sensors; a real-time plasma state analysis module for generating dynamic plasma state models based on the acquired operating data; an AI-based instability prediction module for predicting plasma instability events using machine learning algorithms; a dynamic magnetic field optimization module for autonomously adjusting the magnetic confinement parameters in response to predicted plasma instability events; and a central intelligent fusion control module for coordinating the operation of the plasma stabilization system to maintain plasma confinement stability in the fusion reactor.

The application discloses a machining method of a high-depth-diameter-ratio micro-hole structure and application thereof. The machining method of the high-depth-diameter-ratio micro-hole structure comprises the following steps: forming a prefabricated micro-hole on a sample surface; forming a reflecting structure on the sample surface, the reflecting structure being adjacent to the prefabricated micro-hole, and the reflecting structure being capable of reflecting incident light and preventing the micro-hole entrance from being ablated; forming an absorbing structure on the bottom of the prefabricated micro-hole, and forming a light-transmitting constraint structure on the absorbing structure; and irradiating the constraint structure with laser, the laser irradiating on the absorbing structure through the constraint structure, the absorbing structure being capable of absorbing the energy of the laser and instantaneously expanding and exploding to generate plasma, and the constraint structure being capable of constraining the plasma to etch the sample in the longitudinal direction of the prefabricated micro-hole downwards until the target micro-hole is obtained. The application realizes the machining of the diamond jet micro-hole without taper and with large depth-diameter ratio, guarantees that the jet micro-hole entrance will not generate surface defects due to excessive ablation when machining at a large depth, and ensures that the micro-jet port can withstand high-pressure jet.

The application discloses a plasma confinement device and a plasma processing device thereof. The plasma confinement device is arranged between a cavity sidewall of a vacuum reaction cavity and a lower electrode assembly. The plasma confinement device comprises an upper confinement ring and a lower confinement ring below the upper confinement ring. The upper confinement ring comprises a plurality of first spacers surrounding the lower electrode assembly. The lower confinement ring comprises a plurality of second spacers surrounding the lower electrode assembly. Each of the first spacers and each of the second spacers are staggered. A gas passage is formed between the first spacers and the second spacers adjacent to the first spacers. The plasma confinement device has the advantages that the staggered combination of the upper confinement ring and the lower confinement ring can ensure sufficient confinement ability to the plasma, reduce the hindering effect on the gas flow, improve the reaction cavity conductance, and help to realize the synergistic optimal adjustment of process conditions.

The invention discloses a plasma thruster which comprises a ceramic isolator, an anode coil, an anode discharge cylinder and a cathode. One end of the ceramic isolator is open, and the other end of the ceramic isolator is closed by the cylinder bottom wall; an inclined gas pipeline is arranged on the side wall of the ceramic isolation body; the anode coil is spirally wound on the outer side of the cylinder body of the ceramic isolator; the anode discharge cylinder is fixed at a port at the top end of the ceramic isolator cylinder, and one end of the anode coil is conductively connected with the anode discharge cylinder. According to the invention, plasma is restrained through vortex airflow and an axial magnetic field, and heat dissipation protection is carried out on the ceramic isolator and the anode discharge cylinder; in addition, the magnetic field accelerates the vortex motion of the plasma.

A method of depositing material on a substrate is described. The method includes sputtering at least one component of the material from a first rotating target having a first magnet assembly and a second magnet assembly. The first magnet assembly provides a first plasma confinement region in a first direction facing a second rotating target, at least three poles of the first magnet assembly facing the first plasma confinement region. The second magnet assembly provides a second plasma confinement region in a second direction facing a third rotating target, at least three poles of the second magnet assembly facing the second plasma confinement region.

Methods and systems are provided for Z-pinch plasma and other plasma confinement utilizing various electrode compositions and configurations. In one example, a plasma confinement system includes a plurality of electrodes, each electrode of the plurality of electrodes arranged coaxially with respect to an assembly region of the plasma confinement system and positioned so as to be exposed to the assembly region, wherein one or more electrodes of the plurality of electrodes includes an electrode material which releases hydrogen gas above a threshold temperature. In an additional or alternative example, a plasma confinement system includes an electrode body including a nosecone, and a liquid metal, a portion of the liquid metal forming a protective film between a surface of the nosecone and an exterior of the nosecone during operation of the plasma confinement system.

Apparatus for treating materials with plasma, comprising a microwave generator (15), a waveguide (20) and a tubular torch (30), comprising three coaxial tubes (33, 35, 37) and a central section (30.2) connected to the waveguide (20) by means of a body (50) having a cavity (52) through which the tubes pass. A plasma containment chamber is defined in the outer tube (35) at the cavity (52) of the body (50).

The invention belongs to the technical field of remote plasma sources, and discloses a magnetic confinement microwave remote plasma source device, a system and a use method, and the magnetic confinement microwave remote plasma source device comprises a plasma reaction cavity; the microwave generation and transmission assembly is used for generating microwaves and coupling the microwaves into the plasma reaction cavity; the gas homogenizing part is used for homogenizing the process gas input into the plasma reaction cavity; the magnetic field confinement assembly comprises at least three coil units which are arranged at intervals in the axial direction of the plasma reaction cavity, and the coil units are arranged outside the plasma reaction cavity in a surrounding mode; the magnetic field confinement assembly is used for inputting current to each coil unit to form symmetrical power configuration, so that a magnetic confinement ring is formed in the plasma reaction cavity, and plasma is confined in a central area of the plasma reaction cavity; therefore, the plasma density is improved, physical sputtering corrosion is reduced, the process uniformity is improved, and the service life of equipment is prolonged.

The invention provides plasma processing equipment. The plasma processing equipment comprises a reaction cavity, a plasma confinement ring and a moving ring, a base for bearing a wafer is arranged in the reaction cavity; the plasma confinement ring is arranged between the base and the side wall of the reaction cavity, and is provided with a plurality of first air channels penetrating through the thickness of the plasma confinement ring; a first space is defined by the lower surface of the plasma confinement ring and the reaction cavity, the first air channel is communicated with the first space, and the first space is provided with a first extraction opening; the moving ring is arranged above the plasma confinement ring and the base, a plurality of second air channels penetrating through the thickness of the moving ring are formed in the moving ring, a second space is defined by the upper surface of the moving ring and the reaction cavity, and a second extraction opening is formed in the second space. According to the plasma processing equipment and the use method, the first air channel is arranged on the plasma confinement ring, the second air channel is arranged on the moving ring, and air is pumped through the first air channel and the second air channel, so that the air pumping speed is increased, and the edge deviation effect of air pumping can be reduced.

The invention discloses a long and thin pipe inner wall multilayer film continuous deposition device with a shielding cover and an axial splicing column target and a use method of the long and thin pipe inner wall multilayer film continuous deposition device. The method belongs to the field of surface treatment. The problems that multiple layers of films cannot be continuously prepared and different areas of a target surface pollute each other in the coating process in the existing slender tube are solved. The device comprises a magnetic control target, a shielding cover, a magnetic core, a to-be-plated tube, an insulating bracket and a guide rail, the magnetic control target is formed by splicing a plurality of cylindrical target materials with different components in the axial direction, the guide rail is parallel to the magnetic control target, the insulating support can drive the shielding cover and the to-be-plated pipe to slide up and down along the magnetic control target, the magnetic core is arranged in the magnetic control target and slides up and down along the magnetic control target, and plasma can be restrained in an area defined by the magnetic control target, the to-be-plated pipe and the shielding cover. The target material in a non-discharge area is protected from being polluted, and the target materials with different components can be switched. The device is simple and convenient to operate, the whole process is closely linked, the problems existing in other in-pipe coating methods are effectively solved, and large-scale popularization in industrial production is facilitated.

The application discloses a plasma processing device and an inner wall assembly thereof. The plasma processing device comprises a reaction cavity, an inner wall assembly arranged at the inner side wall of the reaction cavity, a plasma confinement ring arranged in the reaction cavity, and an exhaust device arranged at the bottom of the reaction cavity. The inner wall assembly comprises a cylindrical part which encloses a plasma environment processing space. The inner side wall of the cylindrical part is provided with a plurality of arc-shaped grooves which extend from the top to the bottom of the inner side wall. The plasma confinement ring has a plurality of downwardly inclined exhaust channels. The application forms a vortex structure of the gas flow exhausted from the inner side wall of the inner wall assembly and the plasma confinement ring. The tiny particles in the gas flow collide with each other to form large-particle pollutants which are exhausted from the reaction cavity, so that the accumulation of the particle pollutants on the surface of a substrate and parts around the substrate is prevented, and the cleanness of the etching environment is maintained.

The invention relates to the technical field of magnetic confinement fusion energy, and discloses a star simulator complex curved surface permanent magnet blocking method based on magnetization direction clustering. The method comprises the following steps: performing magnetic field inversion calculation according to plasma constraint requirements of a star simulator to establish a grid to obtain a grid point data set, setting a threshold value and a size upper limit through magnetization direction unit vector clamping angle quantity similarity, and dividing magnetic blocks according to magnetization direction similarity space connectivity and size constraint by adopting a clustering algorithm, and carrying out secondary segmentation on the over-limit magnetic block to calculate the average magnetization direction. The magnetic field precision and the manufacturing feasibility of the star simulator permanent magnet system are improved.

A plasma confinement screen system for a process chamber includes an inner plasma screen having an inner annular body with a central opening, the annular body including a plurality of first openings; and an outer plasma screen having an outer annular body with a central opening surrounding the inner plasma screen, the outer annular body including a plurality of second openings, wherein the outer plasma screen is configured for vertical movement relative to the inner plasma screen.

The application belongs to the technical field of remote plasma source, and discloses a magnetic confinement microwave remote plasma source device, a system and a use method. The magnetic confinement microwave remote plasma source device comprises: a plasma reaction cavity; a microwave generation and transmission assembly for generating microwaves and coupling the microwaves into the plasma reaction cavity; a gas homogenizing component for homogenizing process gas input into the plasma reaction cavity; and a magnetic field confinement assembly comprising at least three coil units arranged along an axial direction of the plasma reaction cavity and arranged around the plasma reaction cavity. The magnetic field confinement assembly is used for forming a symmetric power configuration by inputting currents into the coil units, thereby forming a magnetic confinement ring in the plasma reaction cavity to confine plasma in a central region of the plasma reaction cavity, so as to improve plasma density, reduce physical sputtering corrosion, improve process uniformity and equipment service life.

This application provides a method for optimizing the quasi-isomagnetic field line symmetry configuration of a stellarator, comprising: obtaining the original magnetic field of the stellarator's quasi-isomagnetic field line symmetry configuration; extracting all original magnetic traps from the original magnetic field, performing a three-step transformation of flattening-stretching-rearrangement on each original magnetic trap to obtain a reference magnetic trap corresponding to each original magnetic trap, and combining all reference magnetic traps to form a reference magnetic field; obtaining the magnetic field parameters of the original magnetic field and the geometric parameters of the stellarator, and constructing an objective function for optimizing the stellarator's quasi-isomagnetic field line symmetry configuration based on the magnetic field parameters, geometric parameters, preset constraint parameters, and preset weighting coefficients; iteratively optimizing the objective function, and outputting the optimized stellarator configuration parameters. The optimization method of this application, by combining magnetic trap transformation, objective function construction, and precise constraint conditions, can output accurate configuration parameters and obtain a stellarator configuration with better plasma confinement performance and reasonable engineering parameters.

A magnetic mirror machine (200) comprises a first magnet system (1) comprising a first plurality of concentrically arranged circular-loop coils (11, 12), comprising a first coil (11) arranged to carry a current in a first direction; and a second coil (12) arranged to carry a current in a second direction opposite to said first direction; and a second magnet system (2) comprising a second plurality of concentrically arranged circular-loop coils (21, 22), arranged with mirror symmetry with respect to said first magnet system relative to a symmetry plane (P) located between said first magnet system (1) and said second magnet system (2), said first magnet system (1) and said second magnet system (2) being arranged as to create an annular plasma confinement area (206) at said symmetry plane (P) with a magnetic field normal to said symmetry plane (P) at said symmetry plane (P), said magnetic mirror machine further comprising a tandem magnet system (4, 4'), comprising a first tandem coil (41) located longitudinally outside said first coil (11, 21) of one of said first magnet system (1) or said second magnet system (2) and arranged to carry a current in said second direction, and a second tandem coil (42) located longitudinally outside said second coil (12, 22) of said one of said first magnet system (1) or said second magnet system (2) and arranged to carry a current in said first direction.

The present disclosure relates to a stellarator (1) comprising: a plasma vessel (10); a plurality of non-planar, superconducting coils (20) for generating a magnetic field for confining a plasma inside the plasma vessel; a plurality of stellarator modules (8), each stellarator module comprising a plasma vessel segment (10a, 10b) and a corresponding subset of the plurality of non-planar, superconducting coils; wherein neighboring stellarator modules are configured to be coupled to each other via a corresponding plasma vessel interface (30); wherein the plasma vessel interfaces are positioned with respect to the plurality of non-planar, superconducting coils such that at least one of the stellarator modules can be replaced with a replacement stellarator module to restore the plasma vessel and the plurality of coils.

The application discloses a plasma confinement ring, a plasma processing device and a method for processing a semiconductor. The plasma confinement ring is arranged in a reaction cavity of the plasma processing device. The plasma confinement ring comprises a ring-shaped side wall and a gas passage wall fixedly connected with the ring-shaped side wall. The ring-shaped side wall is arranged on a supporting ring which is fixed with a side wall of the reaction cavity. A heat insulation gap is arranged in the ring-shaped side wall and used for slowing down heat transfer from the gas passage wall to the side wall of the reaction cavity. The application can make the temperature of the plasma confinement ring reach a preset temperature and be kept, thereby achieving the purpose of preventing polymer deposition.

A system and method for forming a film that includes generating a plasma in a processing volume of a processing chamber to form the film on a substrate. The processing chamber includes a plasma confinement system. The plasma confinement system includes a chamber wall liner having a ring shaped body. The chamber wall liner has an inner wall, a slit opening formed through the inner wall and sized for a substrate to pass therethrough the slit opening, and a first cavity having a back wall. The plasma confinement system includes a plasma confinement assembly. The plasma confinement assembly has a first magnet disposed in the first cavity adjacent the back wall, and a first window disposed in the first cavity between the first magnet and the inner wall, wherein the first window seals the first magnet from an outside environment.