A high density plasma reactor

A plasma, plasma source technology, applied in the direction of plasma, semiconductor/solid-state device manufacturing, discharge tube, etc., can solve problems such as the reduction of electron energy
CN1809911AActive Publication Date: 2006-07-26HELYSSEN
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Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Applications(China)
Current Assignee / Owner
HELYSSEN
Publication Date
2006-07-26

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Abstract

The high density RF plasma source of this invention uses a special antenna configuration to launch waves at frequency such as 13,56MHz. The tunability of this antenna allows to adapt actively the coupling of the RF energy into an evolutive plasma as found in plasma processings in semiconductor manufacturing. This plasma source can be used for the following applications : plasma etching, deposition, sputtering systems, space propulsion, plasma - based sterilization , plasma abatement systems. In another embodiment, the plasma source is in conjunction with one or several process chambers , which comprise an array of magnets and RF coils too . These elements can be used, on one hand, for plasma confinement or the active plasma control (Plasma rotation ) thanks to feedback control approach , and one the other hand, for in situ NMR Monitoring or analysis such as moisture monitoring inside a process chamber , before or after the plasma process, or for in situ NMR Inspection of wafers or others workpieces.
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Description

technical field

[0001] The present invention relates to methods and apparatus for enhancing plasma sources and related processes. Background technique

[0002] Helicon-wave discharges are known to efficiently generate high-density plasmas and have been used as high-density plasma tools in semiconductor processing (etching, deposition, sputtering...) [cf. Plasma Discharge by Lieberman M.A. and Lichtenberg A.J. Principles and Handling of Materials, New York, 1994 by J.Wiley & Sons Press], Space Engines, and Basic Plasma Experiments. Plasma is usually generated in a cylindrical vacuum vessel located in a longitudinal uniform magnetic field of 100-300G or higher. Electromagnetic energy is transferred to a plasma source at a frequency of 1-50 MHz, typically 13.56 MHz for plasma processing operations. With the help of specially shaped antennas, helical waves are generated in the plasma column.

[0003] The most common antenna used to excite the helicon wave is the Nagoya III an...

Claims

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