41 results about "Plasma column" patented technology

The invention relates to a method and apparatus that can improve the lifetime and performance of an ion source in a cyclotron. According to one embodiment, the invention comprises an ion source tube for sustaining a plasma discharge therein. The ion source tube comprises a slit opening along a side of the ion source tube, wherein the slit opening has a width less than 0.29 mm. The ion source tube also comprises an end opening in an end of the ion source tube. The end opening is smaller than an inner diameter of the ion source tube and is displaced by 0–1.5 mm from a central axis of the ion source tube toward the slit opening. The plasma column is displaced 0.2 to 0.5 mm relative the slit opening. The ion source tube comprises a cavity that accommodates the plasma discharge. The invention also relates to a method for making an ion source tube.

The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles. The preionization discharge is triggered within a first electrode housing and the main discharge takes place between a narrowed output of the first electrode housing and a part of the second electrode housing close to the outlet opening of the discharge chamber. The plasma develops in a part of the second electrode housing covered by a tubular insulator and, as a result of the current-induced magnetic field, contracts to form a dense, hot plasma column, one end of which is located in the vicinity of the outlet opening of the second electrode housing.

An antenna assembly for forming a barrier coating on the inner surface of a tube by means of a sealed annular chemical-plasma-reaction chamber defined by the inner wall of the tube, two spaced elements slidingly and sealingly moveable inside the tube, and a quartz tube that interconnects the cylindrical elements. The coating is formed by a PE CVD process generated inside the chamber by a transversal RF antenna unit which creates a plasma column that participates in rotation simultaneously with linear motion thus providing uniform coating of the inner surface of the tube. The method of the invention consists of depositing a layer of silicon dioxide onto the inner surface of a plastic tube by means of the aforementioned antenna assembly. The plasma column is rotated by the RF magnetic field which is rotated by using two RF generators of different frequencies that energize two groups of specifically interconnected coils.

The present invention relates to a method and apparatus for improving the lifetime and performance of ion sources in cyclotrons. According to one embodiment, the invention includes an ion source conduit (300) for maintaining a plasma discharge therein. The ion source conduit (300) includes a slit opening (310) along a side of the ion source conduit (300), wherein the slit opening (310) has a width less than 0.29 mm. The ion source conduit (300) also includes an end opening (314) in an end of the ion source conduit (300). The end opening (314) is smaller than the inner diameter of the ion source conduit (300) and moves 0-1.5 mm from the central axis (316) of the ion source conduit (300) towards the slit opening (310). The plasma column moves 0.2 to 0.5 mm relative to the slit opening (310). The ion source conduit (300) includes a cavity (312) adapted for the plasma discharge. The invention also relates to a method for manufacturing an ion source conduit (300).

The invention is directed to an arrangement for monitoring the energy radiated by an EUV radiation source with respect to energy variations acting in an illumination beam path, wherein the radiation source has a plasma column emitting extreme ultraviolet radiation. The arrangement includes an energy monitoring unit, and a detection beam path. The detection beam path is separate from the illumination beam path and is arranged with the energy monitoring unit for detecting pulse energy, so that the illumination beam path is not impaired by the energy measurement. The detection beam path is matched to the illumination beam path with respect to bundle extension and optical losses.

A method and apparatus for producing soft x-ray laser radiation based on z-pinch compression of a rotating low pressure plasma column are disclosed. A rotating, low pressure plasma column is created by electric discharge or by laser excitation inside a containment tube. Rotation of the plasma may be induced by viscous drag caused by rotation of the tube, or by magnetically driven rotation of the plasma as it is created in a plasma gun in the presence of an axial magnetic field, or both. A high power electrical discharge is then passed axially through the rotating plasma column to produce a rapidly rising axial current, resulting in z-pinch compression of the rotating plasma column radially inwardly with resultant stimulated emission of soft x-ray radiation in the axial direction. A rotating containment tube used in combination with magnetically driven rotation of the plasma column results in a concave electron density profile that in turn results in reduced wall ablation and also reduced refraction losses of the resultant soft x-rays.

An example particle accelerator includes a coil to provide a magnetic field to a cavity; a particle source to provide a plasma column to the cavity; a voltage source to provide a radio frequency (RF) voltage to the cavity to accelerate particles from the plasma column, where the magnetic field causes particles accelerated from the plasma column to move orbitally within the cavity; an enclosure containing an extraction channel to receive the particles accelerated from the plasma column and to output the received particles from the cavity; and a structure arranged proximate to the extraction channel to change an energy level of the received particles.

The invention relates to a device for producing novel plasma photonic crystal with five refractive indexes and a method for producing the novel plasma photonic crystal with five refractive indexes. The discharging condition is that the thickness of a discharging gap is 2.0mm, impressed voltage is 3.5-5.1kV, frequency is 55-60kHz, discharging gas is 99.1%-99.9%Ar, the remainder is air, air gap pressure is 0.6-0.8atm, temperature range is 285-320K, and humidity range is 70%-90%. According to the device and method, the conditions of the discharging gap, the impressed voltage amplitude and frequency, the content of argon and the like are changed, while the size of a water electrode is optimized, a temperature control adjusting device and a humidity control adjusting device are added, and four types of plasma channels formed by a plasma sheet, a thick plasma column and two types of plasma columns are obtained. The novel plasma photonic crystal structure with the five refractive indexes is formed by the plasma channels and a periodic arrangement self-organization in a non-discharging area. The novel plasma photonic crystal structure is more complex and has wider application prospects.

A method and apparatus for producing soft x-ray laser radiation. A low pressure plasma column is created by electric discharge or by laser excitation inside a rotating containment tube. Rotation of the plasma is induced by viscous drag caused by rotation of the tube, or by magnetically driven rotation of the plasma as it is created in a plasma gun in the presence of an axial magnetic field, or both. A high power electrical discharge is then passed axially through the rotating plasma column to produce a rapidly rising axial current, resulting in z-pinch compression of the rotating plasma column, with resultant stimulated emission of soft x-ray radiation in the axial direction. A rotating containment tube used in combination with magnetically driven rotation of the plasma column results in a concave electron density profile that results in reduced wall ablation and also reduced refraction losses of the soft x-rays.

The invention discloses a generation method and device of a Z-pinch shell plasma column. The device comprises a vacuum plasma target chamber, a pulse current generator, an annular laser spot generation device and a digit delay generator, wherein a load high-voltage electrode and a load ground electrode matched with the load high-voltage electrode are installed inside the vacuum plasma target chamber; a hole is formed in the load ground electrode; a transparent window is formed in the wall of the vacuum plasma target chamber; the load high-voltage electrode, the hole in the load ground electrode and the transparent window are coaxially arranged; the pulse current generator and the input end of the annular laser spot generation device are connected with the digit delay generator; the output end of the pulse current generator is connected with the load high-voltage electrode; a light outlet of the annular laser spot generation device and the transparent window are coaxially arranged. The method and device avoid an uneven structure and the like of a guide plasma caused in the process of forming the shell plasma column through cold and solid materials, and at the same time, the load structure is simpler, installation is convenient, and parameters are adjusted conveniently.

An electron-beam induced plasmas is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

The invention provides a method for depositing a high-quality diamond coating on the inner wall of a tubular workpiece. The method comprises the steps that firstly plasmas are formed inside the tubular workpiece by utilizing electric arc discharge, and then the high-quality diamond coating is deposited on the inner wall of the tubular workpiece by utilizing a strong direct current arc stretching plasma chemical vapor deposition technology. The device involved in the method comprise a diamond coating deposition system composed of a vacuum chamber (1), a ceramic workpiece frame (2), the tubularworkpiece (3), an anode (4), a plasma column (5), a cathode (6) and electromagnetic coils (7), wherein the ceramic workpiece frame (2) is used for insulating the tubular workpiece (3) from the vacuumchamber (1). According to the method for depositing the high-quality diamond coating on the inner wall of the tubular workpiece, the high-density plasmas are formed through arc discharge in the tubular workpiece, so that the surface of the inner wall of the tubular workpiece can form and maintain high-concentration atomic hydrogen; and the high-concentration atomic hydrogen exists so that a sp2 bond of carbon can be completely converted into an SP3 bond, formation of the diamond phase is promoted, and finally the high-quality diamond coating on the inner wall of the tubular workpiece is deposited.

The present invention discloses a programmable plasma dielectric antenna. The antenna comprises a patch antenna and a dielectric resonator. The dielectric resonator comprises at least two layers of solid-state FR-4 dielectrics, wherein the solid-state FR-4 dielectrics are arranged in an up-and-down manner; and multiple gas-state plasma column dielectrics. An upper layer FR-4 dielectric is provided with at least two upper layer FR-4 dielectric perforations, a lower layer FR-4 dielectric is provided with at least two lower layer FR-4 dielectric perforations, the plasma column dielectrics are embedded in the upper layer FR-4 dielectric perforations and the lower layer FR-4 dielectric perforations, and each of the upper layer plasma column dielectrics and lower layer plasma column dielectrics is connected with an excitation power supply via control lines separately. By using a double terminal excitation mode controlled by an independent power supply, excitation states of every plasma column dielectric are controlled; voltages of every excitation power supply are changed to control plasma frequency of the plasma column dielectrics, so that the reconstruction of the working state and frequency of the programmable plasma dielectric antenna is realized. The programmable plasma dielectric antenna has the advantages of simple structure, easiness for mass production, adjustable frequency and unlimited working bandwidth.

The invention relates to a plasma vapor deposition material two-sided-locally-growing device and a method. The device comprises a vacuum reaction chamber, a plasma power supply, two water electrodes, two insulator frames and one or two material growing substrates. The insulator frames are disposed between the water electrodes, thereby defining a discharge gap thickness and a discharge zone. The discharge gap thickness or the discharge area can be adjusted by changing the insulator frames. After injection of discharge gas and gas needed for chemical vapor deposition into the vacuum reaction chamber, the plasma power supply is switched on, plasma columns are formed in discharge gaps by discharging, and local growth of thin-film materials in the material growing substrates can be achieved. According to the device and the method, by configuration of the two discharge gaps, material local growth can be performed on both sides of each of the substrates. The device and the method have advantages of simple operation, convenience and efficiency, and work efficiency that can be doubled. Identical or different thin-film materials can be formed at a time. The device and the method have a wide application prospect in industry.

An electron-beam induced plasma is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

The invention provides a plasma column compressor. The plasma column compressor comprises a compression system and a matched cutting system, wherein the compression system comprises a compression current source, a compression sleeve and a compression lead, and is used for compressing an original plasma column; the matched cutting system comprises an original cutting current source, a cutting lead, a cutting torch and a workpiece, and is used for cutting a metal tube plate. Since the plasma column can be thinned by compressing, and energy is centralized, the advantages of high response speed, narrower notch, reliability and stability in running and the like are realized, and the cutting quality is closer to the lower limit level of precision cutting and laser-like cutting.

An electron-beam induced plasma is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

An electron-beam induced plasmas is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

Method for producing ultraintense laser pulses in which Stimulated Raman Back-Scattering (SRBS) amplifies and compresses a seed pulse, as well as an inventive compact plasma device which may implement the method. SRBS may be achieved by counter-propagating the seed pulse and a pump pulse through a few millimeter-long plasma having a plasma frequency equal to the difference between the pump and the seed pulse frequencies. Dichroic mirrors may be arranged to provide two amplifying and compression passes through the plasma, allowing greater seed pulse amplification by mitigating Landau damping within the plasma that would occur in a single pass of a plasma of double the length. Alternate examples provide for 2n number of amplification and compression passes by providing n short plasma columns, where n≥2, and additional, appropriately arranged dichroic mirrors. The compact size of the device, and the ultraintense, ultrashort pulses it emits, suit the device to dermatological applications.

Method for producing ultraintense laser pulses in which Stimulated Raman Back-Scattering (SRBS) amplifies and compresses a seed pulse, as well as an inventive compact plasma device which may implement the method. SRBS may be achieved by counter-propagating the seed pulse and a pump pulse through a few millimeter-long plasma having a plasma frequency equal to the difference between the pump and the seed pulse frequencies. Dichroic mirrors may be arranged to provide two amplifying and compression passes through the plasma, allowing greater seed pulse amplification by mitigating Landau damping within the plasma that would occur in a single pass of a plasma of double the length. Alternate examples provide for 2n number of amplification and compression passes by providing n short plasma columns, where n≥2, and additional, appropriately arranged dichroic mirrors. The compact size of the device, and the ultraintense, ultrashort pulses it emits, suit the device to dermatological applications.

An example particle accelerator includes the following: a voltage source to provide a radio frequency (RF) voltage to a cavity to accelerate particles from a plasma column, where the cavity has a magnetic field causing particles accelerated from the plasma column to move orbitally within the cavity; an extraction channel to receive the particles accelerated from the plasma column and to output the received particles from the cavity; and a regenerator to provide a magnetic field bump within the cavity to thereby change successive orbits of the particles accelerated from the plasma column so that, eventually, particles output to the extraction channel. The magnetic field is at least 6 Tesla and the magnetic field bump is at most 2 Tesla.

The invention relates to a device for producing novel plasma photonic crystal with five refractive indexes and a method for producing the novel plasma photonic crystal with five refractive indexes. The discharging condition is that the thickness of a discharging gap is 2.0mm, impressed voltage is 3.5-5.1kV, frequency is 55-60kHz, discharging gas is 99.1%-99.9%Ar, the remainder is air, air gap pressure is 0.6-0.8atm, temperature range is 285-320K, and humidity range is 70%-90%. According to the device and method, the conditions of the discharging gap, the impressed voltage amplitude and frequency, the content of argon and the like are changed, while the size of a water electrode is optimized, a temperature control adjusting device and a humidity control adjusting device are added, and four types of plasma channels formed by a plasma sheet, a thick plasma column and two types of plasma columns are obtained. The novel plasma photonic crystal structure with the five refractive indexes is formed by the plasma channels and a periodic arrangement self-organization in a non-discharging area. The novel plasma photonic crystal structure is more complex and has wider application prospects.

The invention discloses a module for internal combustion engine combustion supporting through a hydrogen generator. The hydrogen generator mainly uses a plasma column to help air and a hydrogen-containing substance to be subjected to the plasma chemical reaction, so that the hydrogen-containing substance decomposes to obtain hydrogen components, and the hydrogen components are conveyed to an internal combustion engine. Thus, the combustion supporting effect can be achieved under the combustion action of the internal combustion engine.

The invention relates to a tunable optical switch based on array plasma columns. The tunable optical switch based on the array plasma columns solves the technical problems that Fano resonance frequency is uncontrollable and the adjustable degree of freedom is small when Fano resonance is adjusted through geometric parameters, so that the optical switch can realize continuous dynamic adjustabilityof a resonance peak without changing the structural geometric parameters, and a multi-threshold optical switch is realized. The tunable optical switch based on the array plasma columns adopts a technical scheme that the tunable optical switch comprises a super surface with the thickness being less than the working wavelength, the super surface is in a regular geometric shape, and at least three plasma columns are distributed in the super surface in parallel at equal intervals; the plasma columns are made of a cladding quartz tube and filled inert gas; and a Mie scattering coefficient of a single plasma column is obtained by using a Mie scattering theory so as to determine the Mie resonance frequency, then the plasma columns are arrayed to obtain Bragg scattering, and the Mie scattering andthe Bragg scattering are enabled to interfere with each other to generate a Fano resonance phenomenon. The tunable optical switch based on the array plasma columns solves the problems well, and can be applied to the field of optical switches.

A module applying a hydrogen generating device for supporting combustion of an internal combustion engine is provided. A hydrogen generating device of the module primarily utilizes a plasma column to assist air and a hydrogen-containing substance to produce a plasma chemical reaction, such a hydrogen component is decomposed from the hydrogen-containing substance and transported into an internal combustion engine. Thus, combustion of the internal combustion engine can be promoted.

The invention relates to a plasma vapor deposition material two-sided-locally-growing device and a method. The device comprises a vacuum reaction chamber, a plasma power supply, two water electrodes, two insulator frames and one or two material growing substrates. The insulator frames are disposed between the water electrodes, thereby defining a discharge gap thickness and a discharge zone. The discharge gap thickness or the discharge area can be adjusted by changing the insulator frames. After injection of discharge gas and gas needed for chemical vapor deposition into the vacuum reaction chamber, the plasma power supply is switched on, plasma columns are formed in discharge gaps by discharging, and local growth of thin-film materials in the material growing substrates can be achieved. According to the device and the method, by configuration of the two discharge gaps, material local growth can be performed on both sides of each of the substrates. The device and the method have advantages of simple operation, convenience and efficiency, and work efficiency that can be doubled. Identical or different thin-film materials can be formed at a time. The device and the method have a wide application prospect in industry.

The invention discloses a novel trapped-wave metasurface of a plasma metamaterial. The metasurface comprises a bottom reflecting plate, a dielectric substrate arranged on the reflecting plate, solid-state plasma resonance units arranged on the dielectric substrate, trapezoids and rectangular rings, and six rectangular plasma resonance units arranged at the bottom, wherein the trapezoids and rectangular rings are arranged in the dielectric substrate in an up-down symmetric manner at two layers. Besides, plasma columns are arranged to connect the upper layer and the lower layer; and the plasma at the same layer is connected by resistors. The trapped-wave metasurface can absorb the TE well and reflect the TM eave well. Excitation of different resonance units is realized by controlling excitation areas of the resonance units formed by the solid-state plasma in a programming manner; and ultra-wideband absorption of the TE wave and the reflection of the TM wave by the trapped-wave metasurface can be realized. With the trapped-wave metasurface, absorption of the lower-frequency electromagnetic waves is realized under the small physical size; and polarized separation of the TE wave and theTM wave is realized by the trapped-wave metasurface on the condition of the proper excitation area.

The invention provides a microplasma photonic crystal for reflecting, transmitting and / or storing incident electromagnetic energy includes a periodic array of elongate microtubes confining microplasma therein and having a column-to-column spacing, average electron density and plasma column diameter selected to produce a photonic response to the incident electromagnetic energy entailing the increase or suppression of crystal resonances and / or shifting the frequency of the resonances. The crystal also includes electrodes for stimulating microplasma the elongated microtubes Electromagnetic energy can be interacted with the periodic array of microplasma to reflect, transmit and / or trap the incident electromagnetic energy.