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40 results about "Plasma column" patented technology

Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge

The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles. The preionization discharge is triggered within a first electrode housing and the main discharge takes place between a narrowed output of the first electrode housing and a part of the second electrode housing close to the outlet opening of the discharge chamber. The plasma develops in a part of the second electrode housing covered by a tubular insulator and, as a result of the current-induced magnetic field, contracts to form a dense, hot plasma column, one end of which is located in the vicinity of the outlet opening of the second electrode housing.
Owner:USHIO DENKI KK

Method for depositing high-quality diamond coating on inner wall of tubular workpiece

The invention provides a method for depositing a high-quality diamond coating on the inner wall of a tubular workpiece. The method comprises the steps that firstly plasmas are formed inside the tubular workpiece by utilizing electric arc discharge, and then the high-quality diamond coating is deposited on the inner wall of the tubular workpiece by utilizing a strong direct current arc stretching plasma chemical vapor deposition technology. The device involved in the method comprise a diamond coating deposition system composed of a vacuum chamber (1), a ceramic workpiece frame (2), the tubularworkpiece (3), an anode (4), a plasma column (5), a cathode (6) and electromagnetic coils (7), wherein the ceramic workpiece frame (2) is used for insulating the tubular workpiece (3) from the vacuumchamber (1). According to the method for depositing the high-quality diamond coating on the inner wall of the tubular workpiece, the high-density plasmas are formed through arc discharge in the tubular workpiece, so that the surface of the inner wall of the tubular workpiece can form and maintain high-concentration atomic hydrogen; and the high-concentration atomic hydrogen exists so that a sp2 bond of carbon can be completely converted into an SP3 bond, formation of the diamond phase is promoted, and finally the high-quality diamond coating on the inner wall of the tubular workpiece is deposited.
Owner:北京沅瀚环境科技有限公司

Programmable plasma dielectric antenna

The present invention discloses a programmable plasma dielectric antenna. The antenna comprises a patch antenna and a dielectric resonator. The dielectric resonator comprises at least two layers of solid-state FR-4 dielectrics, wherein the solid-state FR-4 dielectrics are arranged in an up-and-down manner; and multiple gas-state plasma column dielectrics. An upper layer FR-4 dielectric is provided with at least two upper layer FR-4 dielectric perforations, a lower layer FR-4 dielectric is provided with at least two lower layer FR-4 dielectric perforations, the plasma column dielectrics are embedded in the upper layer FR-4 dielectric perforations and the lower layer FR-4 dielectric perforations, and each of the upper layer plasma column dielectrics and lower layer plasma column dielectrics is connected with an excitation power supply via control lines separately. By using a double terminal excitation mode controlled by an independent power supply, excitation states of every plasma column dielectric are controlled; voltages of every excitation power supply are changed to control plasma frequency of the plasma column dielectrics, so that the reconstruction of the working state and frequency of the programmable plasma dielectric antenna is realized. The programmable plasma dielectric antenna has the advantages of simple structure, easiness for mass production, adjustable frequency and unlimited working bandwidth.
Owner:NANJING UNIV OF POSTS & TELECOMM +1

Tunable optical switch based on array plasma columns

The invention relates to a tunable optical switch based on array plasma columns. The tunable optical switch based on the array plasma columns solves the technical problems that Fano resonance frequency is uncontrollable and the adjustable degree of freedom is small when Fano resonance is adjusted through geometric parameters, so that the optical switch can realize continuous dynamic adjustabilityof a resonance peak without changing the structural geometric parameters, and a multi-threshold optical switch is realized. The tunable optical switch based on the array plasma columns adopts a technical scheme that the tunable optical switch comprises a super surface with the thickness being less than the working wavelength, the super surface is in a regular geometric shape, and at least three plasma columns are distributed in the super surface in parallel at equal intervals; the plasma columns are made of a cladding quartz tube and filled inert gas; and a Mie scattering coefficient of a single plasma column is obtained by using a Mie scattering theory so as to determine the Mie resonance frequency, then the plasma columns are arrayed to obtain Bragg scattering, and the Mie scattering andthe Bragg scattering are enabled to interfere with each other to generate a Fano resonance phenomenon. The tunable optical switch based on the array plasma columns solves the problems well, and can be applied to the field of optical switches.
Owner:GUILIN UNIV OF ELECTRONIC TECH

A Novel Plasmonic Metamaterial Notched Metasurface

The invention discloses a novel trapped-wave metasurface of a plasma metamaterial. The metasurface comprises a bottom reflecting plate, a dielectric substrate arranged on the reflecting plate, solid-state plasma resonance units arranged on the dielectric substrate, trapezoids and rectangular rings, and six rectangular plasma resonance units arranged at the bottom, wherein the trapezoids and rectangular rings are arranged in the dielectric substrate in an up-down symmetric manner at two layers. Besides, plasma columns are arranged to connect the upper layer and the lower layer; and the plasma at the same layer is connected by resistors. The trapped-wave metasurface can absorb the TE well and reflect the TM eave well. Excitation of different resonance units is realized by controlling excitation areas of the resonance units formed by the solid-state plasma in a programming manner; and ultra-wideband absorption of the TE wave and the reflection of the TM wave by the trapped-wave metasurface can be realized. With the trapped-wave metasurface, absorption of the lower-frequency electromagnetic waves is realized under the small physical size; and polarized separation of the TE wave and theTM wave is realized by the trapped-wave metasurface on the condition of the proper excitation area.
Owner:NANJING UNIV OF POSTS & TELECOMM +1
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