Method for depositing high-quality diamond coating on inner wall of tubular workpiece

A diamond coating, high-quality technology, applied in metal material coating process, coating, gaseous chemical plating, etc., can solve problems such as low electron concentration, low atomic hydrogen concentration, pollution, etc., to eliminate the existence of graphite phase , The effect of uniform plasma density and axial uniformity

Inactive Publication Date: 2018-07-13
北京沅瀚环境科技有限公司
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Problems solved by technology

First, due to the lower concentration of electrons produced by the hot-filament method, a lower concentration of atomic hydrogen is formed
This leads to imperfect etching of atomic hydrogen during diamond nucleation and growth, resulting in more sp in the coating. 2 Hybrid graphitic phase, resulting in poor qu

Method used

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  • Method for depositing high-quality diamond coating on inner wall of tubular workpiece

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Embodiment 1

[0026] The strong DC arc stretching plasma chemical vapor deposition device for depositing high-quality diamond coating on the inner wall of the tubular workpiece includes: vacuum chamber 1, ceramic workpiece holder 2, tubular workpiece 3, anode 4, plasma column 5, cathode 6, and electromagnetic coil 7 Composition of diamond deposition system. Wherein, the tubular workpiece 3 is a molybdenum tube with an inner diameter of 100 mm, a wall thickness of 3 mm, and a length of 600 mm. The ceramic workpiece holder 2 positions the tubular workpiece 3 at the center of the vacuum chamber 1 and plays the role of insulating the tubular workpiece 3 and the vacuum chamber 1 . The cathode 6 is located at the center of the top of the vacuum chamber 1 , and the anode 4 is located at the center of the bottom of the vacuum chamber 1 . The ceramic workpiece holder 3 can rotate to ensure the uniformity of diamond coating deposition. The electromagnetic coil 7 is divided into upper and lower grou...

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Abstract

The invention provides a method for depositing a high-quality diamond coating on the inner wall of a tubular workpiece. The method comprises the steps that firstly plasmas are formed inside the tubular workpiece by utilizing electric arc discharge, and then the high-quality diamond coating is deposited on the inner wall of the tubular workpiece by utilizing a strong direct current arc stretching plasma chemical vapor deposition technology. The device involved in the method comprise a diamond coating deposition system composed of a vacuum chamber (1), a ceramic workpiece frame (2), the tubularworkpiece (3), an anode (4), a plasma column (5), a cathode (6) and electromagnetic coils (7), wherein the ceramic workpiece frame (2) is used for insulating the tubular workpiece (3) from the vacuumchamber (1). According to the method for depositing the high-quality diamond coating on the inner wall of the tubular workpiece, the high-density plasmas are formed through arc discharge in the tubular workpiece, so that the surface of the inner wall of the tubular workpiece can form and maintain high-concentration atomic hydrogen; and the high-concentration atomic hydrogen exists so that a sp2 bond of carbon can be completely converted into an SP3 bond, formation of the diamond phase is promoted, and finally the high-quality diamond coating on the inner wall of the tubular workpiece is deposited.

Description

technical field [0001] The invention belongs to the field of diamond coating preparation and relates to a new method for depositing a high-quality diamond coating on the inner wall of a tubular workpiece. Background technique [0002] As we all know, diamond has extremely excellent physical and chemical properties. It is widely used in the fields of machining, wear resistance, corrosion resistance, acoustics, optics and heat conduction. The cost of diamond single crystal is very high, and diamond coating with similar performance has more room for development due to its high cost performance. [0003] The diamond coating is deposited using the plasma chemical vapor deposition technology, which is different from the ordinary plasma-assisted chemical vapor deposition technology in that sufficient atomic hydrogen must exist during the deposition of the diamond coating. This is mainly due to the steady-state sp 2 The hybridized carbon atoms will preferentially form a graphite ...

Claims

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Application Information

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IPC IPC(8): C23C16/04C23C16/27C23C16/513
CPCC23C16/045C23C16/276C23C16/513
Inventor 徐健唐伟忠张云龙
Owner 北京沅瀚环境科技有限公司
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