131 results about "Particle source" patented technology

Quantum Phased Array(s) of emitters and receivers that generate, modulate, emit, receive, and detect any quantum field. Quantum phased arrays include particle source(s) sourcing any quantum field, transmit modulator element(s) modulating any quantum observable and the associated quantum field, emitting elements radiating one or more quantum fields spatiotemporally, a propagation medium with one or more modulator elements for complete control of the quantum field, receiver(s) receiving one or more quantum fields, receive modulator element(s) modulating any quantum observable and the associated quantum field, detector(s) resolving one or more received quantum fields. Quantum metrology, communication and computing systems including quantum phased arrays are detailed for leveraging quantum field engineering functionality (complete control of one or more wavefunctions of one or more particles in any one or more orthonormal bases) of quantum phased arrays for quantum metrology, communication and computing applications.

Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

The embodiment of the invention provides a particle source assembly and particle beam equipment, relates to the technical field of charged particle beam processing and detection equipment, and is used for improving the degree of freedom of beam state adjustment of charged particle beams. The particle source assembly comprises a particle source, an adjustable diaphragm and a collimating lens device which are arranged along a first direction. Wherein the particle source is used for generating a charged particle beam which is emitted towards the adjustable diaphragm along a first direction; the adjustable diaphragm is positioned in a transmission path of the charged particle beam, and the size of a diaphragm hole is adjustable, so that the beam size of the charged particle beam is adjusted; the collimating lens device is used for collimating the charged particle beam emitted from the adjustable diaphragm, and the position of the collimating main plane in the first direction is adjustable. The particle source assembly can be applied to particle beam equipment.

The invention relates to the technical field of particle deposition and semiconductor anti-radiation analysis, and discloses an alpha particle energy deposition calculation method based on a Monte Carlo particle transport simulation tool, which sequentially comprises the steps of material and particle source setting, energy deposition score indicator use, single particle event statistics, soft error rate calculation and output and data analysis. By adopting the method and the device, the requirements of field experiments are greatly reduced, and the time and the cost required by the experiments are saved. Moreover, through the simulation method, designers can more efficiently calculate the energy deposition of the alpha particles in the semiconductor device and obtain the soft error rate of the alpha particles, and radiation hardening design of the semiconductor device can be carried out according to the data, so that the radiation resistance and reliability of the device are improved.

A multi-beam particle microscope with a rapidly replaceable particle source is disclosed. To this end, the multi-beam particle microscope comprises specific dual-sealing and column separation modules. By means of the dual-seal and column separation module, a replacement module with a particle source can be replaced more quickly, and potentially sensitive component parts of a particle optical assembly of the multi-beam particle microscope can be protected from contamination.

A multi-beam particle microscope having a quickly replaceable particle source, the microscope comprising a double seal-off and column separation module. Using the double seal-off and column separation module, a replacement module with a particle source can be replaced relatively quickly. Potentially sensitive constituent parts of the particle optics of the multi-beam particle microscope can be protected from contamination.

Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a charged-particle source configured to generate primary charged particles, the primary charged particles forming a primary charged-particle beam along a primary optical axis, and a charged-particle detector comprising a plurality of con-centric segments of a charged-particle sensitive material configured to detect charged particles emitting from a sample after interaction of the primary charged-particle beam with the sample, wherein each segment of the plurality of concentric segments is configured to collect the emitted charged particles having a range of energy levels and a dominant energy level.

This invention relates to the field of neutron source technology, and particularly to a controllable isotope neutron source device based on ion migration and a method for generating neutrons. The device includes a casing, inside which are a target material module, a target ion migration system, a safety module, and an alpha particle source term. The target material module provides target nuclide ions. The alpha particle source term includes alpha radioactive nuclide material and target nuclide intercalation material. The safety module is composed of target nuclide intercalation material. The target ion migration system is connected to an external control field. Target nuclide ions migrate through the target ion migration system within the safety module and the alpha particle source term. This invention enables active controllability of the isotope neutron source, significantly improving safety. By ensuring sufficient contact between alpha particles and target nuclides to form a molecular intercalation structure, the (α,n) reaction efficiency is greatly improved. Furthermore, this neutron source can be used in combination with multiple modules according to application requirements, effectively increasing the neutron output flux.

The invention relates to a particle source model training method and a dose distribution determining method of a radiotherapy system, and the method comprises the steps: obtaining an off-axis ratio calculation curve corresponding to a particle source based on input energy and a preset source model; acquiring an off-axis ratio measurement curve and an output factor measurement value of the radiotherapy system under the action of input energy; based on the difference between the off-axis ratio calculation curve in the radiation field and the off-axis ratio measurement curve in the radiation field, adjusting model parameters used for determining probability densities at different off-axis positions in a preset source model until the difference is in a preset error range; determining a correction factor of the output factor based on the output factor measurement value and the adjusted preset source model; and correcting the adjusted preset source model based on the correction factor to obtain a particle source model.

The application discloses a method and device for identifying the source of atmospheric single particles based on topography, particle size and composition, and the method comprises the following steps: acquiring the image, composition data and particle size parameters of single particles by analyzing the sample of a set pollution source through a computer-controlled scanning electron microscope, constructing a single particle data set, and randomly dividing the single particle data set into a first data set and a second data set; constructing a source analysis model according to a residual network model and an extreme gradient boosting model; training the source analysis model through the first data set and the second data set; and obtaining the probability value of a target single particle belonging to the set pollution source through the trained source analysis model, and determining the source of the target single particle. The application can fully excavate the topography, particle size and composition characteristics of particulate matters, identify the source of the particulate matters, and be helpful to further study the physical and chemical properties of atmospheric particulate matters and the source analysis of the atmospheric particulate matters.

The invention provides a cyclotron electrostatic deflection plate beam loss heat source reconstruction method, and relates to the technical field of particle accelerator thermal analysis and multi-physics field coupling calculation, and the method comprises the steps: 1, configuring beam dynamics simulation parameters, multi-particle tracking is carried out under a three-dimensional field graph containing a central area electromagnetic field, a harmonic coil magnetic field and an electrostatic deflection electric field, and a particle loss list is generated; step 2, transferring the particle loss list into a beam source file of a Monte Carlo radiation transport program, configuring Monte Carlo parameters including a deflection plate material, a boundary, a particle type and an energy spectrum, executing particle transport simulation, and obtaining a three-dimensional energy deposition matrix on an electrostatic deflection plate element; according to the method, high-resolution heat source reconstruction is realized, the peak temperature rise calculation error of the deflection plate can be reduced, a temperature field solving result can be fed back to optimize the particle source, and a reliable basis is provided for thermal structure design and cooling optimization of the electrostatic deflection plate.

An etch pattern generation system (1) and method comprising-an incident particle beam (21) having a most probable wavelength (lambda) from a particle source (2); and-a reticle (4) comprising through-holes (3) arranged in the incident particle beam (21). The etch pattern generation system (1) generates a single nano feature size pattern (51), and wherein the through-holes (3) are arranged aperiodically in the reticle. A computer-implemented method for generating a model of an etch reticle (4) is also disclosed.

The invention relates to a device for treating solid and / or liquid waste, in particular to a device for treating waste by means of an ion-electron disruption method. The invention relates to obtaining the technical result of expanding the range of a device for treating waste, which has an expanded region formed by a corona discharge current, and avoiding the necessity of using a high-voltage pulse source. The technical result is achieved by means of a device for ion-electron disruption of waste. The device comprises a waste supply unit, a charged substance particle source, a suction air fan, an output pipe and a reactor. The reactor is implemented in the form of a closed chamber having an input opening connected to a waste feed unit, an output opening connected to an output tube for removing gaseous disruption products, and an additional input opening connected to an outlet of a source of charged material particles.

The low-energy PVD coating device comprises a sputtering cathode, the sputtering cathode is loaded with a target material, the target material and a substrate are oppositely arranged, and the target material generates film material particles under the action of an electric field of the sputtering cathode; the energy adjusting plate is positioned between the substrate and the sputtering cathode and is provided with a via hole; the collision particle pipeline is connected with the collision particle source, the collision particle source is internally provided with preset inert gas, a gas outlet end opening of the collision particle pipeline is formed in the energy adjusting plate, and the conveyed inert gas moves towards the target material; the kinetic energy of the inert gas is smaller than that of the film material particles. As the inert gas has a relatively fixed flowing direction and is opposite to the incident direction of the film material particles, the energy of the film material particles is reduced from a high-energy state to a state close to the energy state of the just emitted gas particles through energy exchange of elastic collision, so that the film material particles with very low energy are obtained, and stable low-energy deposition coating is realized.

A hydrocarbon gas, which is a precursor of contamination, is dissociated by electron irradiation of a cleaner using electrons, carbon is deposited on members in a sample chamber and on a surface of a sample, and components inside the sample chamber are contaminated. Therefore, a device is provided that includes a sample chamber 101 connected to a lens barrel 112 having a charged particle source 113, an electron source 102 disposed in a sample chamber 101, and a shield plate 105 disposed in front of the electron source 102. An inside of the sample chamber is cleaned by secondary electrons emitted when primary electrons emitted from the electron source collide with the shield plate.

This charged particle beam device is characterized by comprising: a charged particle source (202) provided with a single crystal needle (204), a filament (205) connected to the single crystal needle, and an insulator (207) for holding the filament; a non-evaporable getter material (201); an extraction electrode (203); a first vacuum chamber (105) which is inside the extraction electrode and in which the charged particle source and the non-evaporable getter material are disposed; a heater (212) for heating the non-evaporable getter material; a second vacuum chamber (106) in which the heater and the extraction electrode are disposed and which has a pressure higher than that of the first vacuum chamber; and a heat absorption plate (250) connected to the extraction electrode and disposed so as to face the heater. The charged particle beam device is also characterized in that: the heater and the non-evaporable getter material are disposed in order with respect to a direction in which a charged particle beam is emitted from the charged particle source; and the non-evaporable getter material is disposed in the first vacuum chamber and the heater is disposed in the second vacuum chamber.

The application discloses a single-particle source intelligent analysis method and device based on scanning electron microscope energy spectrum analysis, and relates to the field of environmental protection. The method is characterized in that: a computer-controlled scanning electron microscope is applied to analyze collected samples of a set pollution source, to obtain images, element data and particle size parameters of single particles in the pollution source samples, and to construct a single-particle data set of the pollution source; a residual network model is used to mine the morphological features of the single-particle images, to obtain a preliminary probability value of the single particle belonging to the set pollution source; the preliminary probability value of the single particle is combined with the particle size parameters and the element data of the single particle, and is input into an extreme gradient boosting model, to obtain a probability value of the single particle belonging to the set pollution source; the probability value of the single particle is weighted according to the mass or quantity of the single particle, and is subjected to source-class summation calculation processing, to obtain the mass or quantity contribution / occupancy ratio of atmospheric particulate matters emitted by the set pollution source. The application can fully mine the morphological, particle size and component features of the particulate matters, identify the sources of the particulate matters, and quantitatively determine the contributions of different pollution sources.

The invention relates to a high-current pulse proton accelerator beam synchronous control system and method, belongs to the technical field of particle accelerator control, and solves the problem of high operation risk of a high-current pulse proton accelerator in the prior art. The beam synchronous control system comprises a beam control system, a particle source acceleration power supply system, a particle source extraction power supply system and each high-frequency acceleration cavity system; the beam control system determines a beam mode and a beam pulse width according to a received user beam output instruction, and synchronously sends a boost event code to the particle source acceleration power supply system and a turn-off event code to the particle source extraction power supply system; the particle source acceleration power supply system, the particle source extraction power supply system and each high-frequency acceleration cavity system respectively trigger hard interruption after receiving corresponding event codes, and execute corresponding events in the hard interruption to realize synchronization of beam current and high-frequency feedforward. And the operation risk is reduced.

The device for implanting particles into a substrate (12) comprises a particle source (2) and a particle accelerator (4) for generating an ion beam (10) comprising positively charged ions. The device further comprises a substrate holder (30) and an energy filter (20) which is arranged between the particle accelerator (4) and the substrate holder (30). The energy filter (20) is a microstructured film having a predetermined structural profile and is used to set the dopant depth profile and / or defect depth profile generated by the implantation process in the substrate (12). The device further comprises a passive braking element (22) for the ion beam (10), which is arranged between the particle accelerator (4) and the substrate holder (30) and is spaced apart from the energy filter (20).

A method for inspecting a specimen with four or more primary beamlets is described. The method includes generating a primary charged particle beam with a charged particle source and generating the four or more primary beamlets with a multi-aperture lens plate and two or more electrodes. A first, second, third, and fourth primary beamlet of the four or more primary beamlets are deflected with respect to each other with a collimator. An alignment system is controlled upstream of the collimator to minimize a measured current or maximize a signal from signal beamlets. The four or more primary beamlets are scanned over a surface of the specimen with a scanning deflector assembly. The four or more primary beamlets are focused on the specimen with an objective lens unit to generate four or more signal beamlets. The four or more signal beamlets are guided on detection surfaces.

A charged particle beam device is provided with: a charged particle gun (100) provided with a charged particle source (101); and a charged particle optical system that focuses a charged particle beam (110) from the charged particle gun (100) on a sample, the charged particle gun (100) being provided with a first electrode (102) positioned below the charged particle source (101) and an acceleration electrode (104) positioned below the first electrode (102), and an equipotential space being formed between the first electrode (102) and the acceleration electrode (104). The charged particle optical system is provided with a magnetic field lens (105) having an equipotential space that includes an optical axis and is equipotential with the potential of the first electrode (102) in the traveling direction of charged particles from the charged particle source (101), or has a fixed potential difference with respect to the potential of the first electrode (102), and the magnetic field lens (105) is disposed such that the main surface thereof crosses the equipotential space.

The invention discloses an ionization chamber control method and device, and the method comprises the steps: calibrating the positioning distance of measurement equipment when the ionization chamber is in a connection state with the measurement equipment, carrying out the electric leakage measurement of the ionization chamber in the calibrated measurement equipment, guaranteeing that the ionization chamber meets the measurement standard, and carrying out the electric leakage measurement of the ionization chamber under the condition that the ionization chamber meets the measurement standard. And the ionization chamber is controlled by an automatic measurement program to automatically measure the water absorbed dose of the particle source.

A charged particle wire device is characterized by comprising: a charged particle source (202) consisting of a single crystal needle (204), a filament (205) connected to the single crystal needle, and an insulator (207) for holding the filament; a plurality of non-evaporating getter materials (201); an extraction electrode (203); and a housing (209) arranged around the axis of the electron wire emitted from the charged particle source; wherein a heater (212) for heating the plurality of non-evaporating getter materials is disposed at the extraction electrode, the plurality of non-evaporating getter materials are arranged side by side in the housing, the housing is connected to the extraction electrode, and an elastic member (250) is disposed between the non-evaporating getter materials and the housing, the elastic member (250) being configured to push the non-evaporating getter materials. This charged particle beam device comprises: a charged particle source 202 composed of a single crystal needle 204, a filament 205 connected to the single crystal needle, and an insulator 207 that holds the filament; a plurality of non-evaporation getter materials 201; a lead-out electrode 203; and a housing 209 disposed so as to surround the axis of an electron beam emitted by the charged particle source, the charged particle beam device being characterized in that a heater 212 for heating the plurality of non-evaporation getter materials is disposed in the lead-out electrode, the plurality of non-evaporation getter materials in the housing are disposed side by side, the housing is connected to the lead-out electrode, and elastic members 250 configured to press the non-evaporation getter materials are disposed between the non-evaporation getter materials and the housing.

A charged particle beam system includes a chamber; a charged particle source unit that has a charged particle source; a supporting member that is provided on a side wall of the chamber and detachably supports the charged particle source unit inside the chamber; and a chamber door that is provided on the side wall of the chamber for access to an interior of the chamber.

The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

A charged particle beam system includes: a chamber (202); a charged particle source unit that has a charged particle source (210); a supporting member (700) that is provided on a side wall of the chamber and detachably supports the charged particle source unit inside the chamber; and a chamber door (204) that is provided on the side wall of the chamber for access to an interior of the chamber.

The application discloses a kind of solar flare X-ray full-link simulation method and system based on Geant4, belong to space satellite detection and numerical simulation technical field.The method includes: build high-performance hybrid parallel computing platform based on Geant4;Based on the platform, construct layered magnetized solar atmosphere model, configure physical process list and generate high-energy electron particle source;Through light tracing algorithm and self-defined step action module, the transmission, scattering and polarization evolution of X-ray in layered magnetized solar atmosphere are tracked and simulated;Through pixelated imaging and data output module, photon information is mapped to multiple virtual detector imaging planes, and X-ray imaging, energy spectrum and polarization degree data of different observation angles are output.The application solves the problems of existing model and multi-satellite stereoscopic observation data mismatch, Compton scattering details missing, polarization information deficiency and low computing efficiency, and provides an effective tool for analysis and simulation of multi-satellite joint observation data.

The invention discloses a SiPM and CLYC combined detector performance optimization simulation method based on Geant4 and TCAD software. The method comprises the following steps: 1, constructing a numerical simulation model of a SiPM and CLYC combined detector in Geant4 software, simulating a change relation curve of luminous intensity of CLYC scintillators with different shapes along with scintillation photon wavelengths, and determining the optimal shape and the optimal size of the CLYC scintillators; 2, on the basis of the optimal shape and the optimal size of the CLYC scintillator, Geant4 software is used for simulating the change relation of the detector efficiency along with the thickness of the polyethylene moderator, and the optimal polyethylene thickness is obtained; and 3, constructing a numerical simulation model of the SiPM device by utilizing TCAD software, and simulating a time-varying curve of current generated by photons generated by excitation of neutrons and a gamma particle source in the SiPM device. According to the method, the detector structure is optimized, and a basis is provided for subsequent electronic design of the detector.