80 results about "Magnetic lens" patented technology

A fine-adjustable electromagnetic lens for a charged-particle optical apparatus comprises a magnetic circuit assembly including one or more ring magnets, and a sleeve insert of generally rotational symmetry around a longitudinal axis. The sleeve insert surrounds a passage opening extending along the longitudinal axis, and comprises several electrically conductive electrode elements configured to generate an electrostatic field within the passage opening. The ring magnets are arranged circumferentially around an inner yoke shell and surrounded by an outer yoke shell; the inner yoke shell in turn surrounds a central portion of the sleeve insert. The ring magnets are magnetized such that the two magnetic poles are oriented towards the inner and outer yoke shell, respectively. The inner and outer yoke shell together with the ring magnets form a magnetic circuit having at least one gap, in order to generate a magnetic field reaching inwards into the passage opening and spatially overlapping with the electrostatic field generated by the sleeve insert.

The invention provides a scanning electron microscope objective lens system and a detection method, and relates to the technical field of scanning electron microscopes. The magnetic lens device is used for focusing an incident electron beam; the deflection device, the anastigmator, the Wien analyzer group and the detection device are all located in an accommodating space in the magnetic lens device; the deflection device, the anastigmator and the Wien analyzer group are arranged along the optical axis of the incident electron beam and are arranged around the optical axis; the deflection device and the anastigmator are respectively used for adjusting the movement direction and shape of the incident electron beam so as to scan a to-be-tested sample through the incident electron beam, so that the to-be-tested sample generates signal electrons; the Wien analyzer group is used for adjusting the movement direction of the signal electrons to enable the signal electrons to enter the detection device; the detection device is located on the side, close to the magnetic lens device, of the deflection device, the anastigmator and the Wien analyzer set and used for generating a detection signal according to the signal electrons and achieving surface imaging of the to-be-detected sample. The imaging precision and the detection efficiency of the objective lens system are improved.

A method for the passive adjustment of a pole shoe for a magnetic lens of a particle beam system is disclosed, comprising the following steps: providing a reference pole shoe with a predefined minimum magnetic homogeneity in a measuring device; releasably arranging the pole shoe to be adjusted relative to the reference pole shoe in a predefined reference position and thereby assembling a magnetic lens in the measuring device; exciting the magnetic lens in the measuring device; measuring characteristics of the magnetic field generated by the magnetic lens; determining a deviation of the characteristics of the generated magnetic field from corresponding characteristics of a predefined reference magnetic field; and mechanically changing the pole shoe based on the determined deviation to adjust the magnetic field that can be generated by the magnetic lens.

The invention discloses a scanning electron microscope three-dimensional shape measurement method and a measurement system thereof, which are characterized in that the method adopts a directional focusing method to perform separated focusing and measurement on the top and the bottom of a target structure, and three-dimensional shape parameters of the target structure are obtained through a definition evaluation function; the system comprises a displacement sample stage system, an electron beam imaging system and an image processing algorithm, the electron beam imaging system is composed of an electron source, an electromagnetic lens, an electron detector and an imaging module, and the electron beam imaging system generates a focused electron beam and obtains a secondary electronic signal image; the image processing algorithm is integrated in an electron beam imaging module in the CD-SEM, and accurate positioning, feature recognition and precise measurement of a target structure are achieved. Compared with the prior art, the method has the advantages that directional focusing of the top or the bottom is achieved by analyzing the gradient distribution characteristics of the image profile curve, and the measurement problem of separating and quantifying key three-dimensional parameters such as the side wall angle, the bottom key size and the structure depth is effectively solved.

The invention provides a method for measuring the magnetic moment of a transition metal material based on XPS, and the method comprises the steps: selecting a to-be-tested material single crystal, and transferring a single crystal sample into an X-ray photoelectron spectrometer; selecting an X-ray source; setting a test point position, and setting scanning parameters including energy passing, scanning step length, beam spot size and a magnetic lens mode; selecting a peak value of a 2p orbit high-resolution narrow spectrum corresponding to the transition metal contained in the to-be-detected sample as a fixed-height reference signal, and etching the surface of the sample to remove surface pollution; determining the position of a 3s orbit characteristic peak according to a broad spectrum, and collecting a 3s orbit high-resolution narrow spectrum of transition metal contained in the sample; collecting a valence band spectrum or a C1s orbit high-resolution narrow spectrum for correcting a broad spectrum and a 3s orbit high-resolution narrow spectrum; correcting the binding energy by adopting a correction reference, carrying out peak-dividing fitting through XPS peak-dividing fitting software, and extracting characteristic parameters of a 3s orbit spin exchange split peak; and calculating to obtain the magnetic moment of the transition metal material.

The invention discloses an all-static miniaturized scanning electron microscope lens suitable for lunar surface in-situ detection, and belongs to the technical field of lunar detection. Comprising an electronic gun, a condenser module, a micro-channel plate detector and an objective lens system which are sequentially fixed along an axis. The lens adopts a full-electrostatic system, and through holes are formed in the collecting lens module and the objective lens system so as to introduce a natural vacuum environment on the lunar surface. A multifunctional electrode structure is innovatively designed in the collecting lens module, so that the collecting lens has a diaphragm function; and an electrostatic deflector capable of synchronously realizing scanning deflection and anastigmatism is integrated in the objective lens system. Through the full electrostatic design and the lunar surface vacuum introduction structure and function integration and compactness design, the magnetic flux leakage and heat loss of a traditional electromagnetic lens are effectively overcome, the dependence on complex vacuum equipment is reduced, the system integration degree is improved, the requirements of lunar surface detection loads on miniaturization and light weight are met, and the application prospect is wide. And meanwhile, the structural reliability of the system in emission vibration and lunar earthquake environments is improved.

The invention discloses an electron detection device and a scanning electron microscope, and relates to the technical field of scanning electron microscopes. The device comprises an objective lens, the objective lens comprises a first coil used for forming a magnetic lens and a second coil used for forming an immersion magnetic field, the first coil and the second coil are wrapped by a first pole shoe and a second pole shoe respectively in a non-closed mode, the first pole shoe is provided with an axial channel part, the second pole shoe is provided with a conical extension part, and a diaphragm hole is formed in the bottom of the conical extension part; the detector is arranged on the axial channel part or the conical extension part and is positioned above the diaphragm hole; and the first control electrode is arranged at the inner side of the diaphragm hole and is used for generating an electric field so as to cooperate with the immersion magnetic field generated by the second coil to guide or prevent the secondary electrons from reaching the detector. According to the electron detection device, through the arrangement of the first control electrode, secondary electrons can be guided to the detector, so that the collection efficiency of the secondary electrons can be improved, the secondary electrons can be prevented from reaching the detector, and the detector can conveniently collect backscattered electrons.

The present invention suppresses deterioration of beam characteristics and blank characteristics of multi-beams, and stabilizes the beam irradiation positions and dimensions and irradiation amounts. This multi-charged particle beam irradiation device comprises: a plurality of blankers that perform blanking deflection of each of multi-charged particle beams; a stopping aperture member that blocks the beams that are deflected to enter a beam-off state by means of the plurality of blankers; two or more stages of objective lenses that are composed of magnetic field lenses and align the focal points of the multi-charged particle beams onto a substrate to be irradiated; and three or more correction lenses that perform correction of the image-forming state of the multi-charged particle beams on the substrate. The three or more correction lenses include one magnetic field correction lens and two electrostatic correction lenses. The two electrostatic correction lenses are disposed in a lens magnetic field of a final stage objective lens closest to the substrate among the two or more stages of objective lenses.

A charged particle beam system includes a charged particle source and a charged particle beam column to focus charged particles into a charged particle beam having a landing energy. A magnetic lens is formed in the charged particle beam column along the axis based on magnetic lens excitation in the coil. The magnetic lens focuses the charged particle beam at a first intersection on the axis. An electrostatic lens is formed in the charged particle beam along the axis based on a voltage applied to the enhancement tube. The electrostatic lens focuses the charged particle beam at a first intersection on the axis. The first intersection point is excited based on a magnetic lens. An additional cross point is introduced, so that the limitation on the maximum working distance under the conditions of very small landing energy and the maximum field of view is overcome.

A multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the beam on a substrate, n (n≥3) correction lenses correcting an imaging state of the multi charged particle beam, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied. The electric field control electrode generates an electric field between the substrate and the electrode. The objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the beam. m (n≥m≥1) correction lenses of the n correction lenses are magnetic correction lenses placed in a lens magnetic field of the second objective lens. (n−m) correction lenses are placed upstream of the lens magnetic field of the second objective lens in the travel direction.

A system includes an electron source that generates an electron beam, a stage that holds a workpiece in a path of the electron beam, a magnetic objective lens disposed in a path of the electron beam, a focus element disposed in the path of the electron beam between the magnetic objective lens and the stage, and a backscattered electron detector disposed in the path of the electron beam between the focus element and the magnetic objective lens. Backscattered electrons, secondary electrons, and x-rays are emitted from the workpiece. The backscattered electrons are measured with the backscattered electron detector.

The present invention provides an improved electromagnetic lens, a method for producing it, and a lens antenna. The electromagnetic lens is a rolled body made of a strip material. The dielectric constant of the strip material changes gradually in both the transverse and longitudinal directions of the strip material. Once the strip material is rolled into a coiled body, the dielectric material is distributed over at least a predetermined, artificially defined three-dimensional space called the lens body within the coiled body. A portion of the coiled body other than the lens body is called the non-lens portion. The dielectric constant of the lens body is not less than the dielectric constant of the non-lens portion.The dielectric constant of the lens body decreases progressively in all directions from the inside to the outside of the lens body, and each direction from the inside to the outside of the lens body indicates a direction from a central area of ​​the lens body to a boundary of the lens body. The present invention has the following advantages: 1) good electromagnetic properties; 2) high product consistency; 3) high production efficiency; 4) applicable to a wide range of target sizes; 5) ability to achieve a compact and stable structure; and 6) ability to achieve a single entity with multiple lenses.

The present invention relates to an electrically adjustable, multi-frequency, multi-beam, stand-alone antenna comprising: a first electromagnetic lens, a second electromagnetic lens, a mounting plate, a reflector plate, oscillator units A1 to A32, oscillator units B1 to B8, and phase shifters C1 to C12. The first and second electromagnetic lenses are both cylindrical lenses. Oscillator units A1 to A32 operate at a higher frequency than oscillator units B1 to B8. The first electromagnetic lens, the second electromagnetic lens, the reflector plate, and the mounting plate are fixed together. Oscillator units A1 to A32 and oscillator units B1 to B8 are all mounted on a reflective surface of the reflector plate. Phase shifters C1 to C12 are all mounted on the mounting plate.Each set of four high-frequency oscillators and each set of two low-frequency oscillators are connected to a phase shifter. The present invention is characterized by a simple structure, scientific design, small size, flexible beam direction configuration, etc.

This disclosure provides information on an X-ray measurement system and a combined semiconductor inspection system. [Solution] The X-ray measurement system comprises a multi-axis sample stage, an X-ray generator, an X-ray optical element group, an X-ray detector, and a processing unit. The X-ray generator includes an electron beam generator, an electromagnetic lens group, an X-ray target material, and a vacuum chamber. The X-ray target material receives a focused incident electron beam and generates a measurement X-ray beam. The X-ray target material comprises a heat dissipation substrate and a plurality of excitation target materials dispersed and embedded in the heat dissipation substrate. The X-ray optical element group guides the measurement X-ray beam to the sample under test. The X-ray detector receives the X-ray measurement signal and generates X-ray spectral information. The processing unit performs a fitting analysis process based on the X-ray spectral information and obtains the structural parameters of the sample under test.

This invention discloses an electromagnetic lens based on a broadband tightly coupled structure and its dual-frequency dual-polarized lens antenna, belonging to the field of mobile communication. It includes an electromagnetic lens array and a dual-frequency dual-polarized feed antenna placed at the focal point of the lens array. The electromagnetic lens is positioned above the feed of the dual-frequency dual-polarized antenna. The broadband tightly coupled unit consists of two dipoles, two pairs of delay lines, a metal pillar, two metasurface matching layers, and a reflector; the overall structure is mirror-symmetrical about the reflector. This invention controls the phase of the control unit by adjusting the length of the phase delay lines of the broadband tightly coupled unit, performing phase compensation at different positions on the lens array, thereby realizing the design of the electromagnetic lens. This invention effectively avoids the narrow bandwidth defect of traditional dual-frequency metasurface lenses, achieving excellent dual-polarization and high-gain performance in both target frequency bands.

The invention provides a crystal diffraction imaging accelerated reconstruction system based on a robust deformation convolutional neural network, and the system is characterized in that a crystal diffraction imaging module enables a high-frequency pulse electron beam to be focused through a grating and a magnetic lens, irradiates a crystal sample at a low dose, and captures a diffraction image of a crystal; the phase acquisition module adopts a phase recovery algorithm to perform phase recovery on the diffraction image of the crystal to obtain a noise-containing phase of the crystal; the phase denoising module removes noise in the noisy phase through a robust deformation convolutional neural network to obtain a denoised phase of the crystal; the robust deformation convolutional neural network comprises a multi-scale variable convolution module, a channel attention module and a residual denoising module; the multi-scale variable convolution module comprises a plurality of deformable convolution branches, and spatial features of noise-containing phases are extracted through the parallel deformable convolution branches; a channel attention module extracts channel features of a noisy phase; and the residual denoising module compresses the dimensions of the spatial features and the channel features and outputs a denoising phase of a single channel.

The invention relates to a method for passively aligning a pole shoe for a magnetic lens of a particle beam system, including the following steps: providing a reference pole shoe with a predefined minimum magnetic homogeneity in a measuring device; releasably arranging the pole shoe to be aligned relative to the reference pole shoe in a predefined reference position and thereby assembling a magnetic lens in the measuring device; exciting the magnetic lens in the measuring device; measuring characteristics of the magnetic field generated by the magnetic lens; determining a deviation of the characteristics of the generated magnetic field from corresponding characteristics of a predefined reference magnetic field; and mechanically modifying the pole shoe on the basis of the ascertained deviation in order to adapt the magnetic field that can be generated by the magnetic lens.

The application discloses a microstructure testing method for metal filaments, thin strips or platings, and applies to the technical field of material physical and chemical detection. The method uses an ion beam with a specific beam intensity after being focused by an electromagnetic lens and accelerated by a specific intensity electric field to continuously scan a sample testing surface at a specific scanning speed and scanning times. The ion beam has a stripping effect on atoms in the nanometer-thickness surface layer of the sample testing surface and excites a secondary electron signal. The principle of obtaining a contrast image containing crystal orientation information by using the characteristics that the stripping effect and the secondary electron signal excitation intensity are influenced by different crystal face orientations of polycrystalline metal materials is used to obtain the microstructure information of the sample testing surface. The microstructure information of the metal filaments, thin strips and platings which is difficult to obtain by traditional metallographic corrosion methods can be directly, quickly and accurately obtained, the detection difficulty of the microstructure of commonly used bonding wires, connecting pieces and platings in the microelectronic field is solved, and the blank of the testing method is filled.

The application provides a combined PCM magnetic lens heat storage and damping system and application, and comprises the following steps: determining a temperature variation interval of a working state of a magnetic lens heat source; selecting different phase change temperature PCMs as first PCMs, second PCMs and third PCMs according to the temperature variation interval; melting the PCMs into a molten state respectively, and embedding the magnetic lens heat source in the PCMs with the phase change temperature changing from high to low in the radial direction through the mode of immersion and solidification of the magnetic lens heat source in sequence; adjusting the volume ratio between the combined PCMs by evaluating the change of the working temperature of the magnetic lens before and after the action of the combined PCMs; the system introduces a phase change heat transfer mechanism into the structure of the magnetic lens, provides a uniform and temperature-controllable heat dissipation effect for the magnetic lens, and enhances the thermal stability and mechanical stability of the magnetic lens in the mode of filling with multiple layers of PCMs.

A charged particle beam system includes a source of charged particles and a charged particle beam column to focus the charged particles into a charged particle beam having a landing energy. A magnetic lens is formed in the charged particle beam column along an axis based on a magnetic lens excitation in the coils. The magnetic lens focuses the charged particle beam at a first crossover on the axis. An electrostatic lens is formed in the charged particle beam column along the axis based on a voltage applied to the booster tube. The electrostatic lens focuses the charged particle beam at a second crossover on the axis. The first crossover is based on the magnetic lens excitation. The introduction of an extra crossover overcomes previous limitations of the maximum working distance at very small landing energies and maximum field of view.

The invention relates to the technical field of test equipment, in particular to a magnetic field test system of an electromagnetic lens. The magnetic field test system of the electromagnetic lens comprises a rotary table used for bearing the electromagnetic lens; the gauss meter probe is arranged on the side, away from the rotary table, of the electromagnetic lens and used for collecting magnetic field data of the electromagnetic lens; the detection device is used for acquiring the inclination degree of a gauss meter probe relative to a preset detection direction; and the position and posture adjusting device is used for installing the gauss meter probe and is configured to adjust the position and posture of the gauss meter probe according to the inclination degree, so that the gauss meter probe extends along a preset detection direction. According to the magnetic field testing system of the electromagnetic lens, the inclination degree of the gauss meter probe is obtained through the detection device, the pose of the gauss meter probe is adjusted through the pose adjusting device according to the inclination degree, pose calibration of the gauss meter probe is achieved, the measurement precision of the gauss meter probe is improved, the problem of insufficient precision is avoided, and the measurement accuracy of the electromagnetic lens is improved. Therefore, the magnetic field test accuracy is improved.

The invention discloses a multi-particle beam system, in particular a multi-beam particle microscope, comprising the following: a magnetic lens through which a plurality of individual charged particle beams pass; and a controller configured to control, in particular dynamically, the magnetic lens. The magnetic lens includes a coil (701), a winding body (702), in particular with a cooling line arrangement, and a pole shoe. The coil is arranged around the winding body, and the winding body is designed as a hollow body through which the plurality of individual particle beams pass. The coil (in combination with the winding body) is disposed within the pole shoe. The pole shoe has an opening through which a magnetic field generated by the magnetic lens appears from the pole shoe and interacts with a plurality of individual particle beams to achieve a lenticular effect. The winding body has electrical conductivity and has an interruption portion (710), whereby the electrical conductivity of the winding body is interrupted in a circumferential direction around the optical axis of the particles. When the magnetic lens is dynamically controlled, the eddy current generated in the winding body around the particle optical axis is reduced. Thus, the magnetic lens of the multi-particle beam system can be dynamically controlled with a large bandwidth up to 1500 Hz.

The present invention relates to the field of controlled nuclear fusion in nuclear energy applications. The title of the present invention is a positive-ion circular-collision nuclear fusion reactor. The technical problems to be solved by the present invention are: the nuclear fusion reaction times are short and the energy gains Q are less than 1. Our technical solution is: using an accelerator to accelerate hydrogen isotope positive ions to (0.1-3) Mev, and then inducing nuclear fusion reactions by circular collision. In the past, it was believed that the probability of inducing nuclear fusion by collision was less than 0.0001. We simultaneously employ five technical schemes to solve the problem of low probabilities of positive ion collision-induced nuclear reactions: 1. using the accelerator to accelerate the positive ions to (0.1-3) Mev; 2. using circular collision to induce nuclear fusion; 3. enabling collision in a collision area having a large cross section; 4. enabling collision in a long collision area; and 5. using a plurality of sets of electromagnetic lenses to focus ion beams to increase the ion density. In the present invention, energy generated by nuclear fusion is converted into heat energy in an energy conversion area, and then high-pressure steam is generated for power generation.

The invention provides a metamaterial electromagnetic lens, a preparation method thereof and a lens antenna. The metamaterial electromagnetic lens comprises a conductive metamaterial; the conductive metamaterial is provided with a three-dimensional space structure of at least one unit which is periodically distributed, and the three-dimensional space structure is composed of a conductive material. The three-dimensional space structure is of a mesh structure. The metamaterial electromagnetic lens is directly made of a conductive material and does not need to be arranged on other base materials, the performance is better, the effective dielectric constant can be conveniently and accurately designed, the metamaterial electromagnetic lens can be used for designing a lens antenna, the manufacturing complexity is reduced, meanwhile, the appearance size and the weight are small, and the metamaterial electromagnetic lens is more suitable for engineering installation in actual networking.

The invention relates to the technical field of imaging systems, and provides a time broadening scanning framing single-sight-line imaging method and system, and the system comprises a photoelectric cathode which is used for converting an incident light signal into an electron beam and transmitting a slope broadening pulse; the anode grid mesh and the photoelectric cathode jointly form an accelerating electric field; the long magnetic lens is used for focusing the electron beam after time broadening; the deflection scanning system is composed of two groups of deflection plate electrodes which are orthogonally arranged, each group of deflection plate comprises two parallel and opposite plate electrodes, and the deflection plate electrodes are used for applying a two-dimensional deflection electric field to the electron beams subjected to time broadening, so that the electron beams incident at different time are separated in space; the gating micro-channel plate detector is used for performing gating, multiplication and imaging on the electron beams after deflection separation; and the high-voltage pulse generator is used for generating a cathode slope broadening pulse and a micro-channel plate gating pulse. According to the invention, single-time multi-frame single-sight imaging with high spatial-temporal resolution can be well realized.

To obtain an electron microscope with a desired magnification and small off-axis aberrations, especially distortion aberrations, by using a permanent magnet lens whose position can be changed in the optical axis direction. [Solution] The intermediate lens system 11 following the objective lens OL is composed of lens units IL1 and IL2, each of which has two permanent magnets and a yoke supporting the magnets, with the north and south poles of the two permanent magnets reversed to minimize the magnetic field generated in the yoke. The lens units are mechanically adjustable in position, with the lens unit IL1 closer to the objective lens forming a real image that is reduced, equal to, or enlarged from the real image formed by the objective lens, and the lens unit IL2 farther from the objective lens forming an enlarged real image. The subsequent intermediate lens system 12 is configured similarly to the intermediate lens system 11, and both lens units form enlarged real images. The subsequent projection lens is composed of a single lens unit similar to the intermediate lens systems 11 and 12, and forms an enlarged real image from the real image formed by the objective lens.

The present invention provides an electron beam inspection device that can reduce the potential change of the positive electrode immediately after blanking is released. [Solution] The electron beam inspection apparatus includes an objective lens that images a primary electron beam onto a sample. A negative potential is applied to the sample. The objective lens has an electromagnetic lens that forms a magnetic field in the gap between the inner diameter end of the Wehnert electrode and the inner diameter end of the yoke, and has a Wehnert electrode positioned opposite the sample as viewed from the Wehnert electrode, to which a negative potential is applied, and a positive potential electrode positioned opposite the sample as viewed from the Wehnert electrode, to which a positive potential is applied, and a ground electrode positioned between the Wehnert electrode and the positive potential electrode to prevent backscattered electrons emitted from the sample from colliding with the positive potential electrode, and is electrically grounded.

The invention provides a three-stage electrostatic coupling magnetic lens system and a transmission electron microscope, and belongs to the technical field of electron microscopes, and the system comprises a magnetic lens assembly, a magnet exciting coil and an electrostatic lens group which are arranged along an electron optical axis; the magnetic lens assembly comprises an upper magnetic lens part and a lower magnetic lens part, the upper magnetic lens part comprises a first upper pole shoe and a first lower pole shoe, and the lower magnetic lens part comprises a second upper pole shoe and a second lower pole shoe; the excitation coil applies excitation current in a first direction to the first upper pole shoe and the first lower pole shoe and applies excitation current in an opposite second direction to the second upper pole shoe and the second lower pole shoe, so that a magnetic field counteracting region is formed at an object plane between the upper magnetic lens part and the lower magnetic lens part; the electrostatic lens group is arranged on the electronic optical axis, the magnetic lens assembly and the electrostatic lens group form a three-stage electrostatic lens assembly, and the three-stage electrostatic lens assembly is used for generating an electrostatic field to focus electrons. According to the invention, high resolution is maintained while the magnetic field intensity of a sample area is reduced.

To provide an X-ray measurement system and a combined semiconductor inspection system that solves the problem of an anode being damaged by an electron beam and affecting X-ray flux. [Solution] The X-ray metrology system 1 includes a multi-axis sample stage 10, an X-ray generator 12, an X-ray optical element group 14, an X-ray detector 16, and a processing device 18. The X-ray generator includes an electron beam generator 120, an electromagnetic lens group 122, an X-ray target material 124, and a vacuum chamber 126. The X-ray target material receives a focused incident electron beam and generates a measurement X-ray beam. The X-ray target material includes a heat dissipation substrate and multiple excitation target materials embedded and dispersed in the heat dissipation substrate. The X-ray optical element group guides the measurement X-ray beam to the test sample. The X-ray detector receives the X-ray test signal and generates X-ray spectrum information. The processing device performs a fitting analysis process to obtain structural parameters of the test sample.