38 results about "Electrostatic lens" patented technology

Described are an apparatus for generating and collecting nanospray reactive droplets and a method for analyzing a protein digestion. The apparatus includes a capillary, counter electrode, collection vessel, electrostatic lenses, and voltage control module. The capillary receives a mixture that includes a protein and an enzyme and has an outlet disposed in the aperture to dispense the mixture. The collection vessel has a concave surface to receive a nanospray plume emitted from the capillary outlet. The counter electrode and electrostatic lenses are disposed along a nanospray path defined between the capillary outlet and the collection vessel. Each electrostatic lens is formed of an electrically conductive plate having an aperture therein to pass a nanospray reactive plume. The voltage control module is in electrical communication with and is configured to independently control the voltage of the capillary, the counter electrode, the collection vessel and each of the electrostatic lenses.

This invention provides a gas cluster ion beam apparatus capable of planarizing a material substrate by irradiating it with a neutral beam. A neutral gas introduction device (26) is provided for a vacuum container (2). By introducing neutral gas from the neutral gas introduction device (26), the gas cluster ion beam (11) traveling along the beamline in the beam delivery system (BT) collides with the neutral gas, undergoing dissociation and neutralization to form a high-energy neutral beam (25). Furthermore, a reflective electrode (28) is provided between an electrostatic lens (9b) and the material substrate (15), and a high voltage equal to the accelerating voltage is applied to the reflective electrode.

The application discloses a photochemical ionization time-of-flight mass spectrometry VOCs atmospheric on-line monitoring device and method, which comprises a complete ion generation and analysis system formed by a plurality of gas mixing cavities, photochemical ionization cavities, differential vacuum cavities, radio frequency quadrupole cavities, electrostatic lens cavities and TOF detection zones in series, and is equipped with an automatic gas path control system; the application integrates an intelligent closed-loop control system; the system uses a three-dimensional ion detection system to acquire time and space quality parameters of an ion beam in real time, combines with a current hardware state of the instrument, and calculates 12-dimensional hardware parameter adjustment instructions in real time through a convolutional neural network model; the application solves the performance drift problem of a traditional mass spectrometer caused by environmental changes through the construction of an intelligent closed loop of sensing-diagnosis-decision-execution, realizes the autonomous optimization, long-term stable and high-precision operation of the instrument, and significantly improves the automation level, accuracy and reliability of atmospheric VOCs on-line monitoring.

The present application provides a charged particle beam device and a control method thereof, and a composite charged particle beam device, which can obtain a distortion-free, size-accurate, and scanned image of a sample surface equivalent to that before switching or changing, in the case of switching an acceleration mode and a deceleration mode of an objective lens or changing an applied voltage of an enhancer electrode constituting the objective lens. The charged particle beam device includes: a charged particle source that generates charged particles; a plurality of scanning electrodes that generate an electric field for deflecting the charged particles, the charged particles being emitted by applying an acceleration voltage to the charged particle source and an extraction voltage to an extraction electrode that extracts the charged particles; an electrostatic lens that is disposed between the plurality of scanning electrodes and a sample stage, and converges the charged particle beam deflected by the scanning electrodes; and a processing unit that acquires measurement conditions, and sets scanning voltages applied to the plurality of scanning electrodes based on the acquired measurement conditions, respectively.

A charged particle beam system includes a charged particle source and a charged particle beam column to focus charged particles into a charged particle beam having a landing energy. A magnetic lens is formed in the charged particle beam column along the axis based on magnetic lens excitation in the coil. The magnetic lens focuses the charged particle beam at a first intersection on the axis. An electrostatic lens is formed in the charged particle beam along the axis based on a voltage applied to the enhancement tube. The electrostatic lens focuses the charged particle beam at a first intersection on the axis. The first intersection point is excited based on a magnetic lens. An additional cross point is introduced, so that the limitation on the maximum working distance under the conditions of very small landing energy and the maximum field of view is overcome.

A GCIB apparatus that can change the energy of ions to be irradiated onto a substrate without changing the electrode arrangement of the GCIB apparatus that have an extraction electrode arrangement optimized for a specific voltage or a permanent magnet type magnet that effectively removes singly charged monomer ions at that voltage, or the magnetic field strength of the permanent magnet type magnet. A separated high voltage power supply that generates a positive or negative high voltage in addition to the first high voltage power supply, the second high voltage power supply and the third high voltage power supply, and a separated high voltage application circuit that applies a positive or a negative separated high voltage supplied from the separated high voltage power supply to the ground electrode of the extraction electrode and the ground electrode portions of the one or more electrostatic lenses.

This invention relates to a zero-space electrostatic beam focusing device, comprising a front focusing structure and a rear focusing structure. The front focusing structure is disposed at the front end of the accelerating tube, and the rear focusing structure is disposed behind the front focusing structure. The front focusing structure includes a lens flange, a high-voltage terminal, a first electrode, a second electrode, and a first dish electrode, thereby forming a symmetrical electrostatic field distribution at the front end of the accelerating tube, constituting an equivalent three-film electrostatic lens structure, realizing the pre-focusing function before the beam enters the accelerating tube. The rear focusing structure includes at least one focusing unit, which includes a second dish electrode, a third dish electrode, and a fourth dish electrode, thereby forming an equivalent three-film electrostatic lens structure inside the accelerating tube, realizing the beam shaping function transmitted inside the tube. Without increasing the longitudinal dimension of the accelerator system and without introducing additional independent focusing devices, the beam focusing function is integrated into the accelerating structure in an embedded manner, thereby saving system space and reducing system power consumption.

The invention discloses an ion transmission device, which realizes optimization of air pressure difference and ion transmission through the design of a differential radio frequency multipole and realizes connection of a low-vacuum inflation radio frequency multipole and a high-vacuum electrostatic lens group, and the permeability of the differential radio frequency multipole can effectively improve the transmission efficiency of ions compared with the permeability of an existing pore structure. The loss of ions in the transmission process is reduced; the sealing area achieves large difference of air pressure, a section of pipeline is formed through radial sealing, large pipe resistance is achieved, and therefore the large difference of the air pressure is achieved. The radio frequency voltage amplitude is reduced in an equal-proportion square manner, so that the edge radio frequency electric field is remarkably reduced, the reheating phenomenon of ions in the transmission process is avoided, the low-energy state of the ions after cooling is favorably kept, and the mass spectrometry precision is improved; the shielding area effectively shields the electric field of the electrostatic lens, and the ions are prevented from being accelerated in a high-pressure area, so that the randomness of ion kinetic energy is reduced, and the resolution and sensitivity of mass spectrometry are improved.

The invention discloses a high-voltage direct-current power supply output monitoring device which comprises a monitoring module, an electrostatic lens and a high-voltage metering module, an electrostatic lens electrode is arranged in the electrostatic lens, the monitoring module is connected to a high-voltage direct-current power supply and the high-voltage metering module through cables, and the monitoring module is connected with the electrostatic lens electrode in an inserted mode; the high-voltage direct-current power supply, the monitoring module and the electrostatic lens electrode form a high-voltage direct-current power supply output detection circuit; an actual voltage value U1 monitored by the high-voltage metering module is compared with an output voltage value U0 set by the high-voltage direct-current power supply, so that the output quality of the high-voltage direct-current power supply is judged. The electrostatic lens has the advantages of being compact in structure, convenient to use, high in reliability and the like, the quality of voltage output by loading a high-voltage direct-current power supply on each electrode is monitored in real time, the difference between a power supply set output value and an actually detected and controlled output value is obtained through comparison, then correction adjustment is conducted, and the function of the electrostatic lens is stable.

The optical scanning device comprises a light source, a polygon mirror 15, an fθ lens 19, and a BD sensor. The fθ lens is configured such that the region emitting light from the light source to expose the surface of the photosensitive body and the region emitting light from the light source to reach the BD sensor are continuous.The light emitted from the light source discharges static electricity from areas outside both ends of the actual printing region in the main scanning direction on the photosensitive surface.The fθ lens includes: a first region that transmits light reaching the actual printing region; a second region provided at both longitudinal ends of the first region; and a third region provided at both longitudinal ends of the second region. The light reaching the BD sensor from the polygon mirror is configured to pass through the third region.

The application discloses a cold cathode micro-focus X-ray tube based on double electrostatic lenses, and belongs to the technical field of X-ray tubes.The cold cathode micro-focus X-ray tube comprises a shell, a window, an anode assembly and a cathode electron gun assembly.The anode assembly comprises an anode target.The cathode electron gun assembly comprises a cathode cylinder, a cathode, a grid, a first focusing electrode, a second focusing electrode, a third focusing electrode, an electrode core column, an electrode lead and field emission material in the cathode cylinder.The field emission material generates electrons under the action of field emission, the formed electron beam is converged for the first time under the action of the first electrostatic lens, a first focus is formed, the electron beam is converged for the second time under the action of the second electrostatic lens, a second focus is formed, and finally the anode target is bombarded to generate X-rays.The cold cathode micro-focus X-ray tube improves the converging compression capacity of the electron beam by forming double electrostatic lenses, the size of the converging focus is reduced without affecting the emission area, and the resolution of the X-ray tube is improved.

A charged particle beam system includes a source of charged particles and a charged particle beam column to focus the charged particles into a charged particle beam having a landing energy. A magnetic lens is formed in the charged particle beam column along an axis based on a magnetic lens excitation in the coils. The magnetic lens focuses the charged particle beam at a first crossover on the axis. An electrostatic lens is formed in the charged particle beam column along the axis based on a voltage applied to the booster tube. The electrostatic lens focuses the charged particle beam at a second crossover on the axis. The first crossover is based on the magnetic lens excitation. The introduction of an extra crossover overcomes previous limitations of the maximum working distance at very small landing energies and maximum field of view.

Provided is an electron microscope that does not require adjustment of an electron image formation position, even when electrons are accelerated / decelerated. An electron microscope according to the present invention comprises a first transmission lens that transmits electrons according to a fixed condition, an incidence-side electrostatic lens that decelerates or accelerates the electrons transmitted by the first transmission lens, a trajectory alteration part that alters the trajectory of the electrons decelerated or accelerated by the incidence-side electrostatic lens, an emission-side electrostatic lens that decelerates or accelerates the electrons that have had the trajectory thereof altered by the trajectory alteration part, and a second transmission lens that transmits the electrons decelerated or accelerated by the emission-side electrostatic lens according to a fixed condition. The electron microscope is characterized in that the emission-side electrostatic lens has a first lens and a second lens and in that the first lens focuses the electrons that have had the trajectory thereof altered by the trajectory alteration part onto the center point of the second lens.

Disclosed is a focused ion beam-based spatial electrode preparation method, in which a metal wire is drawn into a plurality of electrode wires of a predetermined length and diameter, the electrode wires are fixed to an auxiliary electrode wire winding device, the auxiliary electrode wire winding device is rotated counterclockwise for multiple turns and then clockwise for multiple turns, and the front ends of the electrode wires are cut off to form thin wires; a plurality of groups of insulating sleeves are aligned and fixed to an electrode support, the thin wires are respectively inserted through the insulating sleeves, the front ends of the thin wires are aligned, the ends of the thin wires are respectively connected to connector interfaces and fixed by soldering, an ion beam is focused into a micro-cutting beam by using an electrostatic lens to punch the thin wires, a local cylindrical surface of the electrode wire is exposed as a contact point, and the end of the wire is closed by using a photosensitive resin; the connector interfaces and the electrode support are fixed, the punched thin wires are respectively inserted into polyacrylamide tubes and fixed at the rear ends, the thin wires close to the connector interfaces are unwound, the insulating sleeve layers are peeled off, one end of each thin wire is inserted through a REF hole of a PCB and welded.

The embodiment of the application provides an electrostatic lens for reducing a defocus distance, a multi-beam charged particle system with the electrostatic lens, and relates to the technical field of electron optics. The electrostatic lens comprises a first lens through which a first charged particle beam passes and a second lens through which a second charged particle beam passes, the first lens and the second lens both comprise a first electrode layer and a second electrode layer which are stacked and insulated, in addition, the first electrode layer of the first lens protrudes outward of the electrostatic lens relative to the first electrode layer of the second lens, so that if the electrostatic lens is applied in a multi-beam charged particle system, for example, in an electron beam exposure machine, by setting the protruding structure, the defocus distance of the first charged particle beam and the second charged particle beam can be reduced, and then the focusing plane of the multi-beam charged particle system can be a plane, so that the drawing efficiency of the electron beam exposure machine is improved.

An optical system configured to focus multiple primary beams in a multi-beam device is described. The optical system includes: a first multipole arrangement having a plurality of first multipoles to provide a first astigmatism; and a second multipole arrangement having a plurality of second multipoles to provide a second astigmatism, wherein the first astigmatism and the second astigmatism compensate for each other. The optical system further includes: three or more electrodes forming a plurality of electrostatic lenses for the plurality of primary beams, each electrode having: an electrode body and a plurality of openings in the electrode body for guiding one of the primary beams through one of the openings; and an electrical connection for providing a potential to the electrode body at the openings.

An electrostatic lens for a charged particle-optical device comprises: an upbeam charged particle-optical element in which are defined a plurality of upbeam apertures for respective beams of a plurality of beams of charged particles; a macroscopic charged particle-optical element in which is defined a macroscopic aperture for the plurality of beams; and a downbeam charged particle-optical element in which are defined a plurality of downbeam apertures for respective beams of the plurality of beams; wherein the macroscopic charged particle-optical element is located between the upbeam charged particle-optical element and the downbeam charged particle-optical element.

Described is an angle-resolving photoelectron spectrometer comprising an electrostatic lens system having a first end and a second end, and arranged to form a beam of electrons emitted from a measurement area on a sample surface, and to transport the electrons to the second end, wherein the first lens element is configured to be arranged at a positive voltage in relation to the sample. The spectrometer comprises at least a first shielding electrode with a limiting aperture, arranged such that the angle between the optical axis and any point on the limiting aperture is larger than 45° and smaller than 70, and at least one compensation electrode which is arranged around the optical axis at a larger distance from the measurement area than the first lens element. The compensation electrode is configured to be arranged at a negative voltage in relation to the sample.

The application discloses a photochemical ionization time-of-flight mass spectrometry VOCs atmospheric on-line monitoring device and method, which comprises a complete ion generation and analysis system formed by a plurality of gas mixing cavities, photochemical ionization cavities, differential vacuum cavities, radio frequency quadrupole cavities, electrostatic lens cavities and TOF detection zones in series, and is equipped with an automatic gas path control system; the application integrates an intelligent closed-loop control system; the system uses a three-dimensional ion detection system to acquire time and space quality parameters of an ion beam in real time, combines with a current hardware state of the instrument, and calculates 12-dimensional hardware parameter adjustment instructions in real time through a convolutional neural network model; the application solves the performance drift problem of a traditional mass spectrometer caused by environmental changes through the construction of an intelligent closed loop of sensing-diagnosis-decision-execution, realizes the autonomous optimization, long-term stable and high-precision operation of the instrument, and significantly improves the automation level, accuracy and reliability of atmospheric VOCs on-line monitoring.

Vacuum electron devices (VEDs) are produced having a plurality of two-dimensional layers of various materials that are bonded together to form one or more VEDs simultaneously. The two-dimensional material layers are machined to include features needed for device operation so that when assembled and bonded into a three-dimensional structure, three-dimensional features are formed. The two-dimensional layers are bonded together using brazing, diffusion bonding, assisted diffusion bonding, solid state bonding, cold welding, ultrasonic welding, and the like. The manufacturing process enables incorporation of metallic, magnetic, and ceramic materials required for VED fabrication while maintaining required positional accuracy and multiple devices per batch capability. The VEDs so produced include a combination of magnetic and electrostatic lenses for electron beam control.

The invention provides a three-stage electrostatic coupling magnetic lens system and a transmission electron microscope, and belongs to the technical field of electron microscopes, and the system comprises a magnetic lens assembly, a magnet exciting coil and an electrostatic lens group which are arranged along an electron optical axis; the magnetic lens assembly comprises an upper magnetic lens part and a lower magnetic lens part, the upper magnetic lens part comprises a first upper pole shoe and a first lower pole shoe, and the lower magnetic lens part comprises a second upper pole shoe and a second lower pole shoe; the excitation coil applies excitation current in a first direction to the first upper pole shoe and the first lower pole shoe and applies excitation current in an opposite second direction to the second upper pole shoe and the second lower pole shoe, so that a magnetic field counteracting region is formed at an object plane between the upper magnetic lens part and the lower magnetic lens part; the electrostatic lens group is arranged on the electronic optical axis, the magnetic lens assembly and the electrostatic lens group form a three-stage electrostatic lens assembly, and the three-stage electrostatic lens assembly is used for generating an electrostatic field to focus electrons. According to the invention, high resolution is maintained while the magnetic field intensity of a sample area is reduced.

A multi-particle beam system is disclosed, comprising a multi-beam generator for generating a multitude of charged first single-particle beams and a magnetic lens, in particular an objective lens, which is collectively penetrated by the charged first single-particle beams. An electrostatic lens system is arranged within the magnetic lens. This electrostatic lens system is electrically contacted by means of a specially shaped multi-part contacting device, which is also arranged inside the magnetic lens.

A charged particle beam system includes a source of charged particles and a charged particle beam column to focus the charged particles into a charged particle beam having a landing energy. A magnetic lens is formed in the charged particle beam column along an axis based on a magnetic lens excitation in the coils. The magnetic lens focuses the charged particle beam at a first crossover on the axis. An electrostatic lens is formed in the charged particle beam column along the axis based on a voltage applied to the booster tube. The electrostatic lens focuses the charged particle beam at a second crossover on the axis. The first crossover is based on the magnetic lens excitation. The introduction of an extra crossover overcomes previous limitations of the maximum working distance at very small landing energies and maximum field of view.

The invention relates to the technical field of photoelectricity, in particular to a multi-beam charged particle source device with an error correction function. In the invention, the charged particle emission source, the collimating lens, the beam splitting plate and the electrostatic lens assembly are adopted to realize beam splitting of the charged particle beam, and meanwhile, the electrostatic deflector and the displacement table are also arranged to improve the influence of multi-beam spot inconsistency caused by assembly errors on the multi-beam charged particle source.

The application discloses a kind of electrostatic lens focusing aerosol printing systems, it is related to 3D printing equipment technical field, including: printing platform, printing platform includes fixed plate, heating table and fixed bottom electrode of plate shape that are laid on the top surface of heating table are set on fixed plate;Print head, print head includes sequentially communicating atomizing device, aerosol charging device and electrostatic focusing nozzle;Electrostatic focusing nozzle includes first shell, top in first shell is provided with upper electrode, the side wall of first shell is provided with side wall electrode, the bottom end of first shell is detachably connected with lens aperture plate electrode, and through hole is provided on lens aperture plate electrode as lens aperture;Bottom electrode is located below lens aperture plate;Drive mechanism is used to drive print head to move in three-dimensional space.The application realizes printing by using liquid material through electrostatic lens focusing aerosol printing technology.

The invention provides an electrode plate, an electrostatic lens and a charged particle system. The electrode plate comprises a core pattern area and an edge area surrounding the core pattern area. A plurality of main holes are formed in the core graph area, and an avoiding window is arranged at the lower part of the core graph area; on a plane parallel to the upper surface of the electrode plate, the projection of the core pattern area is located in the projection of the avoiding window. In some specific technical schemes, the distance between the edge of the projection of the core pattern area and the edge of the projection of the avoidance window is greater than or equal to 20 times of the height of the electrode plate; the diameter of the main holes is larger than or equal to the height difference between the electrode plates and the avoiding windows. According to the electrode plate provided by the invention, the charge effect of the electrode plate can be weakened, so that the electrostatic lens keeps a relatively high focusing resolution in long-time work.

An angle-resolved photoelectron spectrometer and a method for using such a spectrometer are described. The spectrometer includes an electrostatic lens system (101) having a first end (1) and a second end (2), arranged to form an electron beam emitted from a measurement region (A) on a sample surface (Ss) of a solid sample (3) and to transfer electrons to the second end (2), wherein a first lens element (4) is configured to be arranged with a positive voltage relative to the sample (3). The spectrometer includes at least one first shielding electrode (17) and at least one compensation electrode (7), the first shielding electrode having a limiting aperture (18) arranged such that, viewed from a point on the sample surface (Ss) at the optical axis (6), the angle between the optical axis (6) and any point on the limiting aperture (18) is greater than 45° and less than 70°, the at least one compensation electrode being arranged around the optical axis (6) at a greater distance from the measurement region (A) than the first lens element (4). According to the method, the compensation electrode (7) is configured to be arranged with a negative voltage relative to the sample (3).

The invention discloses an EI source quadrupole mass spectrometer of an electrostatic lens and ion trap composite structure and a control method, and relates to the technical field of ion transmission, the EI source quadrupole mass spectrometer comprises an EI ion source, the electrostatic lens and ion trap composite structure, a quadrupole mass analyzer and a detector which are arranged in sequence, the EI ion source is used for generating and extracting ions, and the quadrupole mass analyzer is used for detecting the EI ion source. The electrostatic lens and ion trap composite structure comprises an electrostatic lens assembly and a miniature ion trap, and the electrostatic lens assembly is used for dynamically adjusting voltage according to the molecular weight of ions, forming a gradient electric field, achieving accurate collimation and focusing of ion beams and improving the ion transmission efficiency. The micro ion trap is used for temporarily storing and enriching ions and increasing the number of ions entering the quadrupole rod mass analyzer, the quadrupole rod mass analyzer is used for carrying out mass scanning and screening on the ions, and the detector is used for detecting the screened ions, so that the detection precision of a low-concentration trace organic matter sample is improved.

A mass spectrometry method includes storing a first ion packet within an ion storage device; transferring the first ion packet through a set of electrostatic lenses into an electrostatic trap mass analyzer, wherein during the transfer the lenses are operated in a first mode of operation or an injection voltage having a first predetermined magnitude is applied to electrodes of the mass analyzer; mass analyzing the first ion packet using the mass analyzer; storing a second ion packet within the ion storage device; transferring the second ion packet through the set of lenses into the mass analyzer, wherein during the transfer the lenses are operated in a second mode of operation or the injection voltage having a second predetermined magnitude is applied to the electrodes of the mass analyzer; and mass analyzing the second ion packet using the electrostatic trap mass analyzer.

The invention discloses a parallel electron beam imaging photoetching system based on a micro electrostatic lens array and a control method, and aims to solve the technical problems that the existing electron beam photoetching efficiency is low, the system is complicated, and flexible zooming cannot be realized. The system sequentially comprises a unified electron source, a micro electrostatic lens array, an electron zooming focusing unit, a diaphragm plate and a vacuum sample table along the movement direction of an electron beam, and further comprises a driving circuit, the uniform electron source provides large-area uniform electron beams, the micro electrostatic lens array realizes on-off control of the electron beams through focusing / deflecting electrodes of each unit, the electronic zoom focusing unit adjusts imaging magnification through voltage ratio of multi-stage electrostatic electrodes, the diaphragm plate blocks the electron beams in an off state, and the driving circuit synchronously controls on-off and zoom magnification of the array. According to the invention, scanning-free and one-frame parallel exposure is realized, the imaging scaling can be flexibly adjusted, and the device has the advantages of high integration level, good stability, high exposure efficiency and strong adaptability, and can be used for high-end nano manufacturing scenes such as mask preparation, quantum devices, advanced packaging and the like.