54 results about "Projection optics" patented technology

The HMD comprises a head-mountable frame and an optical projection assembly supported by the frame. The optical projection assembly comprises a microdisplay supported by the frame. The microdisplay has a two-dimensional array of pixels. Each pixel contains a group of emitters configured to emit image light. The microdisplay further comprises a projection optical system configured to receive image light from each group of emitters in the array of pixels at the entrance pupil and project the focused image light from the exit pupil. The microdisplay further comprises a two-dimensional array of optical collimators positioned between the microdisplay and the projection optical system. The steerable optical collimators are further configured to redirect the emission profiles of the corresponding groups of emitters toward the center of the entrance pupil of the projection optical system.

Embodiments of this disclosure relate to a measurement tool for inspecting structures on an object, the measurement tool comprising: a projection optics; a detection optics; a detector array; and a controller. The projection optics are arranged to project radiation onto the structure, and the detection optics are arranged to receive radiation scattered by the structure. The detector array includes a plurality of detector elements. The controller is operable to: control the detector array to determine at least one image; and determine one or more parameters of interest based on the at least one determined image. The controller can be configured such that each pixel of the at least one determined image indicates the total dose of radiation received by one of the detector elements during a plurality of discrete time intervals during a measurement time interval, the pixel value being read from the corresponding detector element at the end of the measurement time interval.

The present disclosure provides an exposure apparatus and an article manufacturing method. The exposure apparatus exposes a substrate to light. The exposure apparatus includes a projection optical system configured to project a pattern image of a master onto the substrate, a supply unit configured to supply a gas to a space between the projection optical system and the substrate, a measurement unit configured to measure a position of the substrate, and a controller configured to control the supply of the gas by the supply unit to change a flow rate of the gas passing between the measurement unit and the substrate.

An optical module, a lighting device, and a motor vehicle are provided. The optical module includes a first light source and a first optical element, as well as a second light source and a second optical element, wherein the first and second optical elements collect light emitted by the first and second light sources such that the light emitted by the first and second light sources enters the first and second optical elements respectively and is redirected. A projection optical system is configured to project the redirected light from the first and second optical elements. The first optical element has a total reflection surface disposed on its surface, the total reflection surface reflecting at least some of the light rays within the first optical element according to a cutoff line profile. The second optical element has at least one total reflection surface to change the direction of light emitted from the second light source such that the light exits from the light-emitting surface of the second optical element. The optical focus of the projection optical system is disposed at or near the edge of the total reflection surface along the light propagation direction of the first light source.

The invention relates to an optical system and a method for reducing the resolution of an aerial image of a photolithography mask (14) without reducing the signal-to-noise ratio, the method comprising: capturing an aerial image of the photolithography mask (14) using an optical system (10'), wherein structures of the photolithography mask (14) are illuminated by a light source (12) and projected onto an image sensor (20) of a camera by means of a projection optic (17), thereby generating an aerial image, wherein a pixel size of the image sensor (20) of the camera is below a Nyquist limit defined by the resolution limit of the optical system (10'); applying an anti-aliasing filter to the captured aerial image; and downsampling the filtered aerial image to obtain an aerial image with reduced resolution.

A projection optical system has a reduction conjugate point and a magnification conjugate point, and has an intermediate imaging position inside. The projection optical system includes: a first sub-optical system; and a second sub-optical system. The first sub-optical system includes a plurality of lenses. The second sub-optical system includes a prism. The prism includes: a first transmission surface located closest to the first sub-optical system on an optical path between the first sub-optical system and the magnification conjugate point; a second transmission surface located closest to the magnification conjugate point; and a reflective surface group including a second reflective surface located closest to the second transmission surface on the optical path between the first transmission surface and the second transmission surface. All or a part of the intermediate imaging position is present inside the prism. The second reflective surface is formed with a dielectric multilayer film including no metal layer.

A light field display system comprises an array of light field projector devices capable of shifting the ray path of light rays at a redirection angle based on a distance of the light ray from the hogel center ray, to produce a seamless light field image. Each light field projector device comprises a projection optical system comprising a light source and a light field optical system to create a plurality of hogels, each hogel having an associated light field image. The output of each of the plurality of hogels in each light field projector device may be redirected according to the redirection angle toward the outer edge of each projector body to enable seamless tiling of the projector devices in the light field display system to create a seamless light field.

Systems and methods for simulating laser energy density simulate a laser treatment process to be performed on a part by a laser processing system and determine simulated energy density values ​​at points on the surface of the part to be treated. The simulated energy density value is determined at each point on the surface of the part to be treated by virtually measuring the light distance to each point and the light angle at each point during the simulation of the laser treatment process. The light distance and light angle are virtually measured based on the origin of the light rays associated with an optical assembly used to deliver the laser to the surface. The optical assembly may include a scanning optics assembly that scans the laser beam on the surface or a projection optics assembly that projects the laser beam onto the surface. The simulated energy density value determined by the simulation can be used to optimize the actual laser treatment process.

The invention relates to a method for operating a projection exposure system (1) for microlithography. In the method according to the invention, during a first exposure phase, illumination radiation (16) is generated by means of an illumination optic (4) according to a first illumination setting, and the illumination radiation (16) is directed to an image field (11) of the projection optic (10) by means of a projection optic (10). During a second exposure phase, illumination radiation (16) is generated by means of the illumination optic (4) according to a second illumination setting, which differs from the first illumination setting, and the illumination radiation (16) is directed to the image field (11) of the projection optic (10) by means of the projection optic (10).During an exposure interval between the first and second exposure phases, illumination radiation (16) is generated according to the second illumination setting using the illumination optics (4). This illumination radiation (16) strikes an optical element (M2) of the projection optics (10), but is not directed to the image field (11) of the projection optics (10).

An exposure apparatus that transfers a pattern of an original to a substrate is provided. The apparatus include a shutter configured to switch blocking and passing of an optical path of exposure light by operating a plurality of light shielding members, a projection optical system configured to project a pattern of the original onto the substrate by the exposure light, and an adjuster configured to adjust a defocus amount which represents a distance between a best focus position in a direction of an optical axis of the projection optical system and a position of a surface of the substrate. The plurality of light shielding members have rotational symmetricity with respect to the optical axis.

An optical module, a lamp device, and a motor vehicle are provided. The optical module includes a first optical unit including at least one first light source and at least one first light collector configured to collect and reflect a first light beam from the first light source, a second optical unit including at least one second light source and at least one second light collector configured to collect and reflect a second light beam from the second light source, wherein the first light beam and the second light beam have different functions, and a projection optical system configured to project the first light beam reflected by the first light collector and the second light beam reflected by the second light collector along an optical axis of the projection optical system, wherein the first light collector and the second light collector are offset from each other at least in a direction of the optical axis of the projection optical system and a perpendicular direction, and wherein an optical focal point of the projection optical system is disposed apart from a reflecting surface of the second light collector.

This projector provides a device that can reduce color unevenness in projected images while miniaturizing the device configuration. [Solution] The projector of the present invention comprises a light source device that emits first and second light, first and second light modulators that modulate the first and second light, respectively, a first adjusting means for adjusting the optical path of the first light in a first light guide optical system that guides the first light to the first light modulator, a second adjusting means for adjusting the optical path of the second light in a second light guide optical system that guides the second light to the second light modulator, a photosynthesis element that synthesizes the light emitted from each light modulator, and a projection optical device that projects the synthesized light. The first light guide optical system includes an optical member conjugate to the first light emission surface of the light source device and an optical member not conjugate to it. The second light guide optical system includes an optical member conjugate to the second light emission surface of the light source device and an optical member not conjugate to it. The first adjusting means adjusts the illumination area of ​​the first light by adjusting the position of each optical member, and the second adjusting means adjusts the illumination area of ​​the second light by adjusting the position of each optical member.

An imaging system for generating virtual images with multiple depths on a screen (22) of a head-up display, wherein the imaging system comprises: an image realization device (14) for generating a source image, projection optics (18) for reproducing a display image on the screen (22), wherein the display image is a virtual image corresponding to the source image, and wherein the image realization device comprises: a light structuring device having a surface (42), wherein the light structuring device is configured to simulate a first lens with a first focal length on the surface (42), wherein the surface (42) and an image realization surface are arranged such that a first source image formed on a first region of the image realization surface and projected by the projection optics generates the display image on the screen (22) at a first apparent depth (24).wherein the light structuring device is further configured to simulate a second, different lens on the surface (42), the second lens having a second focal length, and wherein a second source image formed on the second lens and projected by the projection optics (18) produces a second display image on the screen (22) at a second apparent depth (26); and wherein the light structuring device is further configured to simulate the first and second lenses on the surface (42) of the light structuring device in different areas on the surface (42) and to display the first and second lenses simultaneously.

An exposure apparatus includes: an illumination optical system; a spatial light modulator; a projection optical system that illuminates an exposure target with light emitted from the spatial light modulator; and a stage where the exposure target is placed, wherein by the stage moving the exposure target in a predetermined scan direction, the light illuminates the exposure target by the projection optical system scans on the exposure target, the spatial light modulator includes a plurality of mirrors that rotates around a tilt axis extending in a direction orthogonal to both the scan and an optical axis directions of the projection optical system, the mirrors become an ON state by adjusting a tilt of each mirror relative to the scan direction and thereby emit light to the system, and the exposure apparatus includes an angle adjustment mechanism that adjusts a tilt angle of the spatial light modulator relative to the scan direction.

This technology offers advantages in achieving both anti-fogging performance of the optical elements of a projection optical system and measurement accuracy of the substrate position. [Solution] An exposure apparatus for exposing a substrate includes a projection optical system that projects an image of the pattern of a master plate onto the substrate, a supply unit that supplies gas to the space between the projection optical system and the substrate, a measurement unit that measures the position of the substrate, and a control unit that controls the supply of gas by the supply unit so as to change the flow velocity of the gas passing between the measurement unit and the substrate.

In a laser processing apparatus equipped with a dust collection device, an airflow capable of effectively removing debris is created within the dust collection chamber. [Solution] The laser processing apparatus 100 is equipped with a dust collector 80 between the projection optical system 30 and the substrate W (processing stage 50). The dust collector 80 is equipped with a dust collection chamber 81, and insertion ports for the air supply nozzle 60 and exhaust duct 70 are formed as a first vent 82 and a second vent 84 at opposing positions on the housing 81C. A space area GA into which outside air can be drawn in during processing is provided between the first vent 82 and the air supply nozzle 60, and a space area GB into which outside air can be drawn in during processing is provided between the second vent 84 and the exhaust duct 70.

A projector according to the present disclosure includes: a light source unit; an image forming portion including a light modulation panel; a projection optical unit; a panel fan configured to flow an air flow to the light modulation panel; a first heat exchanger; an image forming unit housing the image forming portion, the first heat exchanger, and the panel fan arranged in order in a case thereof; a second heat exchanger; an exterior housing housing at least the light source unit, the image forming unit and the second heat exchanger to constitute an exterior. The light source unit is disposed on one side of a first direction with respect to the image forming unit in the exterior housing, and the second heat exchanger is disposed on the other side of the first direction with respect to the image forming unit in the exterior housing.

This invention relates to the field of semiconductor technology, disclosing a Micro-QLED chip for a projection optical engine, its fabrication method, and a projection optical engine, aiming to replace expensive Micro-LED chips and solve the problem of lead-based quantum dot materials easily polluting the environment. The solution mainly includes: a Micro-QLED chip for a projection optical engine, its fabrication method, and a projection optical engine. The Micro-QLED chip, from bottom to top, includes: a substrate with transparent electrodes, a hole injection layer, a hole transport layer, a quantum dot emitting layer, an electron transport layer, and a TFT driving circuit board with metal electrodes; the quantum dot emitting layer is made of lead-free copper-based mixed halide perovskite quantum dot material; the projection optical engine includes a three-color Micro-QLED chip, a light-combining prism, and a projection lens. This invention reduces chip fabrication costs through improved processes, enhances chip luminous efficiency and color purity, and avoids environmental pollution caused by lead-containing materials, making it suitable for projection display products.

1. The name of the design product: projection optical actuator. 2. The use of the design product: the design product is an actuator product used in an optical projection system. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view 1.

The invention relates to a method for operating a microlithographic projection exposure apparatus (1). In the method according to the invention, during a first exposure phase with the aid of an illumination optical unit (4) illumination radiation (16) according to a first illumination setting is formed and the illumination radiation (16) is fed to an image field (11) of a projection optical unit (10) with the aid of the projection optical unit (10). During a second exposure phase, with the aid of the illumination optical unit (4) illumination radiation (16) according to a second illumination setting, which differs from the first illumination setting, is formed and the illumination radiation (16) is fed to the image field (11) of the projection optical unit (10) with the aid of the projection optical unit (10). During an exposure pause between the first exposure phase and the second exposure phase, with the aid of the illumination optical unit (4) illumination radiation (16) according to the second illumination setting is formed. This illumination radiation (16) is incident on an optical element (M2) of the projection optical unit (10), but is not fed to the image field (11) of the projection optical unit (10).

This technology offers advantages in achieving both anti-fogging performance of the optical elements of a projection optical system and measurement accuracy of the substrate position. [Solution] The exposure apparatus comprises a projection optical system, a supply unit that supplies gas to the space between the projection optical system and the substrate, a measurement unit that measures the position of the substrate, a detection unit that detects the height of the substrate, and a control unit that controls the supply of gas by the supply unit. The control unit controls the supply of gas by the supply unit during a first preparation period in which the detection unit detects the height of the substrate before exposure begins, so that the flow velocity of the gas passing between the measurement unit and the substrate is the same as the flow velocity during the exposure period. After the first preparation period and before exposure begins, during a second preparation period in which the measurement unit measures the position of the substrate, the control unit controls the supply of gas by the supply unit so that the flow velocity of the gas passing between the measurement unit and the substrate is smaller than the flow velocity during the exposure period.

This optical system (12, 13) comprises: a projection optical system (14) that projects light indicating an image generated by a display unit (11); and a light separation element (3) that is disposed between the display unit and the projection optical system and separates incident light (L1) incident from the display unit into a plurality of separated light beams (L11, L12) respectively having mutually different optical characteristics. The light separation element emits the plurality of separated light beams to the projection optical system such that the plurality of separated light beams are respectively projected to a plurality of projection positions (21, 22) via the projection optical system in accordance with incident light from the display unit to the light separation element.

This invention proposes a zoom projection optical system and projection device. Based on the field of optical imaging technology, the zoom projection optical system includes a first lens group with negative optical power, a second lens group with positive optical power, a third lens group with positive optical power, a fourth lens group with positive optical power, a fifth lens group with positive optical power, a sixth lens group with positive optical power, a galvanometer, a prism, a protective glass, and a light-emitting chip. The second, third, fourth, and fifth lens groups are movable along the optical axis to zoom the zoom projection optical system. The first lens group moves along the optical axis to focus the zoom projection optical system. The sixth lens group is fixed. The technical solution provided by this invention, by employing a six-element structure and rationally setting the optical power and materials of the fourteen lenses, achieves a zoom projection optical system with high magnification, large aperture, good thermal stability, and high image quality.

A light field display system comprises an array of light field projector devices capable of shifting the ray path of light rays at a redirection angle based on a distance of the light ray from the hogel center ray, to produce a seamless light field image. Each light field projector device comprises a projection optical system comprising a light source and a light field optical system to create a plurality of hogels, each hogel having an associated light field image. The output of each of the plurality of hogels in each light field projector device may be redirected according to the redirection angle toward the outer edge of each projector body to enable seamless tiling of the projector devices in the light field display system to create a seamless light field.

The present invention makes it possible to display an optical flow image that is easy to view without using a large display panel. 　An in-vehicle projection device 100: projects, via a projection optical system 220, display light emitted from a projector 200 housed in approximately the center of a dashboard of a vehicle onto a projection surface that is set to the front part of the vehicle, thereby allowing a viewer to view the display light; and comprises a processing unit 311 that generates an optical flow image which moves from approximately the center of a display 210 included in the projector 200 toward both left and right directions perpendicular to a travel direction of the vehicle, and that displays the generated optical flow image on the display, and projects the image as display light onto the projection surface via the projection optical system 220.

A projection device (1) for a motor vehicle for projecting optically perceptible patterns onto a surface, having a light source (2) suitable and for emitting a light beam and a pattern-generating element onto which at least a portion of the light beam emitted by the light source impinges, wherein the pattern-generating element has a first light-transmissive region (B1) which at least partially transmits the light beam emitted by the light source (2) and impinging onto the pattern-generating element and a second light-blocking region (B2) which blocks the light beam emitted by the light source and impinging onto the pattern-generating element. According to the invention, the second region is scattering and / or reflective for the light beam emitted from the light source and impinging onto the pattern-generating element (4), and the projection device (1) has a light guide device (6) which is suitable and / or for inputting at least a portion of the light beam reflected and / or scattered and / or transmitted by the pattern-generating element into a further light system.

The present disclosure concerns a testing device (500) comprising: a light-field projector display (100) sequentially emitting a plurality of light fields (101); a spatial light modulator (SLM) (3) controllable to modulate the light fields (101); projection optics (4) configured to project the modulated light fields (101) and form at least a virtual image (40) in a projection image plane (400); and wherein the SLM image pattern (61) is configured to add at least one refractive correction to said at least one virtual image (40). A human interface device (HID) (503) is configured to let a user select at least one of the virtual images (40) for which the user perceives as having the best image subjective quality input the refractive correction corresponding to the selected at least one of the virtual images (40) in a data storage unit (509). The present disclosure further concerns a computer-readable medium configured to perform a method for to assess the vision acuity of a user by using the testing device.