440 results about "Projection optics" patented technology

The utility model discloses a three-color micro-projection optical system, the three-color micro-projection optical system is provided with an object side and an image side which are correspondingly arranged along an optical axis direction, the three-color micro-projection optical system comprises a diaphragm, a lens group and a color combination prism assembly which are sequentially arranged from the object side to the image side; the color combination prism assembly comprises a color combination prism, a red light-emitting chip, a green light-emitting chip and a blue light-emitting chip; the focal length of the three-color micro projection optical system is f, 5.9 mlt; flt; the thickness is 6.4 mm; the distance from the diaphragm to the image surface is the total optical length TTL and TTLlt of the three-color micro-projection optical system; and the thickness is 10.2 mm. By means of the arrangement, in the environment temperature range of 20-60 DEG C, the optical system does not defocus during working, the MTF full frequency is higher than 0.5, the total length of the optical system can be controlled within 10.2 mm, and the working performance is more stable.

To provide technology suitable for performing highly precise measurement of optical characteristics.SOLUTION: An evaluation method for evaluating an optical characteristic of a projection optical system is provided. The evaluation method includes a measurement step of illuminating a test reticle having a test pattern disposed on an object plane of the projection optical system, and measuring an amount of positional deviation of an image of the test pattern formed on an image plane of the projection optical system, and an estimation step of estimating the optical characteristic of the projection optical system based on a result of the measurement, wherein in the estimation step, the optical characteristic is estimated using a polynomial model including a regularization term.SELECTED DRAWING: Figure 2

A head-up display that projects an image onto an object capable of transmitting or reflecting light, and forms a virtual image on a side opposite an observer relative the object, is a head-up display that includes: an image generation device that projects the image; and a projection optical system that guides the image projected onto the object, and forms the virtual image. The projection optical system includes a first optical element and a second optical element provided in order along a light path on which the image generation device projects the image. The virtual image is inclined to cause an upper side of the virtual image, in an up-and-down direction of the virtual image as viewed by the observer, to appear farther away. An intensity of combined power in a left-and-right direction of the virtual image as viewed by the observer is greater than that of the up-and-down direction.

The invention provides a projection optical system. The projection optical system comprises a lens barrel and a color combination prism assembly which are sequentially arranged from the imaging side to the image source side in the optical axis direction. A lens group and a spacing assembly are accommodated in the lens barrel; the lens group comprises a first lens, a second lens, a third lens and a fourth lens which are sequentially arranged from the imaging side to the image source side in the optical axis direction. The spacing assembly comprises first, second and third spacing elements; the color combination prism assembly comprises a color combination prism, a red light-emitting chip, a green light-emitting chip and a blue light-emitting chip; a blue light band-pass filtering film and a red light band-pass filtering film are respectively arranged on two diagonal surfaces of the color combination prism; the green light-emitting chip is perpendicular to the optical axis, and the red light-emitting chip and the blue light-emitting chip are parallel to the optical axis; the projection optical system also satisfies the following conditions: (CT1 + CT2) / CP1 is more than 0.90 and less than 1.65; 4.90 < d2m / (T23 + CT3) < = 7.30; and 5.50 < d3s / T34 < 9.80.

A method for installing an optical element (102) for use with radiation (8) having a wavelength of 365 nm in a projection optics (4), comprising the following steps: a) installing (S100) the optical element (102), which is accommodated in an auxiliary mount (118), in the projection optics (4), b) adjusting (S200) the projection optics (4) together with the optical element (102), c) removing (S300) the optical element (102) together with the auxiliary mount (118) from the projection optics (4), d) correcting (S400) optical properties of the optical element (102) by machining a front side (104) of the optical element (102) using an ion bombardment method, e) removing (S500) the optical element (102) from the auxiliary mount (118), f) coating (S600) the front side (104) with a hot coating, and g) installation (S700) of the optical element (102) into the projection optics (4).

A wearable display system includes one or more nanowire LED micro-displays. The nanowire micro-LED displays may be monochrome or full-color. The nanowire LEDs forming the arrays may have an advantageously narrow angular emission profile and high light output. Where a plurality of nanowire LED micro-displays is utilized, the micro-displays may be positioned at different sides of an optical combiner, for example, an X-cube prism which receives light rays from different micro-displays and outputs the light rays from the same face of the cube. The optical combiner directs the light to projection optics, which outputs the light to an eyepiece that relays the light to a user's eye. The eyepiece may output the light to the user's eye with different amounts of wavefront divergence, to place virtual content on different depth planes.

The invention relates to a method for reducing long-term changes (ΔP) in a pass (P) of an optical surface (25a) of an optical element (Mi), preferably a mirror, in particular an EUV mirror. The method comprises processing the optical element (Mi), preferably a substrate (25) of the optical element (Mi), outside the optical surface (25a) to reduce surface damage, in particular to reduce surface roughness R. a, of the optical element (Mi) outside the optical surface (25a). During processing, material is preferably removed from the substrate (25) of the optical element (Mi) by brushing with at least one brush tool (27). The invention also relates to an optical element (Mi) comprising: an optical surface (25a), preferably for reflecting radiation, in particular for reflecting EUV radiation. The optical element (Mi), preferably a substrate (25) of the optical element (Mi) that is particularly transparent, has a surface roughness R on one or more partial surfaces outside the optical surface (25a). aof 5 µm or less, preferably of 3 µm or less, particularly preferably of 1.5 µm or less, and / or the partial surface or the multiple partial surfaces are transparent. The invention also relates to a semiconductor lithography system comprising at least one such optical element (Mi), which is preferably arranged in a projection optic (10).

A projection optics unit (10), in particular an EUV projection optics unit, with a housing structure (128), wherein the housing structure (128) has: an interior space (140) which the housing structure (128) encloses at least in sections, and support sections (146, 148, 150, 152) which extend out of the housing structure (128) facing away from the interior space (140), wherein an optical element (102) of the projection optics unit (10) can be arranged at least in sections within the interior space (140), wherein the housing structure (128) is a one-piece component, and wherein the housing structure (128) has a dimension of at least 2,900 mm in at least one spatial direction (x, y, z).

A method for operating a projection exposure system (1) comprises the following steps: providing a projection exposure system (1) with a radiation source (1) for generating illumination radiation (3), an illumination optic (11) for transferring the illumination radiation (3) from the radiation source (2) to an object field (8) extending in a scan direction (y) and a cross-scan direction (x), wherein the illumination optic (11) has at least one faceted mirror (6, 7) with a plurality of individual mirrors, and wherein at least a subset of the individual mirrors is configured such that they only partially illuminate the object field (8) in the scan direction (y), and a projection optic (10) for imaging a reticle (12) arranged in the object field (8) of the illumination optic (11) onto a wafer (19) arranged in an image field (17) of the projection optic (10), and specifying a set of at least one element of field-dependent aberrations. (Ai(x, y);i=(1..M)), specification of a target vector (Z(x) = (Z1(x), ..., Z; M (x) T ) for the target values ​​Z i (x) of the aberrations Ai(x, y) after averaging over the scan direction (y), dividing the extent of the object field (8) in the scan direction (y) into j ≥ 2 intervals ([y0; y1], ..., [y j-1 ; y j ]) and determining scan weights (gi(x, y)) which characterize a dependence of an illuminance at a location x in the cross-scan direction in the object field () on a position in the scan direction (y) such that a deviation of a weighted aberration vector A weighted ( x ) → : = ∑ gi A l → is reduced from the target vector (Z(x)).

The invention relates to the technical field of projection optical systems, and discloses a speckle eliminating device which is arranged in a projection optical system and comprises a polarization conversion element and a vibration mechanism. Wherein the polarization conversion element is provided with at least two sub-regions, and at least one sub-region can convert the polarization state of the first light beam incident on the sub-region, so that the polarization conversion element outputs the first light beam with at least two different polarization states. The vibration mechanism is connected with the polarization conversion element and used for driving the polarization conversion element to vibrate. The speckle effect of the projection picture can be reduced, and the watching experience of a user is enhanced. The invention further discloses a projection optical system and projection equipment.

A lighting device for vehicles including a light source, a transparent light guide body with a light coupling area and a projection optics device. The shape of the lower light deflection surface deviates from the shape of a base surface. The shape of the base surface is such that if the lower light deflection surface would not deviate from the shape of the base surface in form of the first facet, the light reflected from the base surface would be projected from the projection optics device into a non-deviation region of the light distribution, wherein the non-deviation region contains a defined point of the light distribution. The first surface element is inclined with respect to the base surface such that light totally reflected by the first surface element is imaged in the light distribution by the projection optics device into an “eraser region” region below the defined point.

A wearable display system includes one or more emissive micro-displays, e.g., micro-LED displays. The micro-displays may be monochrome micro-displays or full-color micro-displays. The micro-displays may include arrays of light emitters. Light collimators may be utilized to narrow the angular emission profile of light emitted by the light emitters. Where a plurality of emissive micro-displays is utilized, the micro-displays may be positioned at different sides of an optical combiner, e.g., an X-cube prism which receives light rays from different micro-displays and outputs the light rays from the same face of the cube. The optical combiner directs the light to projection optics, which outputs the light to an eyepiece that relays the light to a user's eye. The eyepiece may output the light to the user's eye with different amounts of wavefront divergence, to place virtual content on different depth planes.

The invention relates to a method and system for identifying a projectable area of a projector. The method comprises the steps of establishing a coordinate system taking the center of a projector lens as a base point based on boundary contour parameters of the projector, generating corresponding contour line data by utilizing the boundary contour parameters, and projecting contour lines on a projection surface to identify a movable axis range and / or a variable focus range of the projector lens. The system comprises a projection optical module, a boundary detection unit, a contour generation unit, and an independent contour projection unit and a control unit which are arranged on a shell. According to the scheme, the contour line data is generated based on the boundary contour parameters and is projected on the projection surface, so that a user can intuitively perceive the adjustable limit range, blind adjustment is avoided, the risks of image distortion, dark corners and content missing are reduced, the adjustment efficiency and accuracy are improved, practicability and flexibility are both achieved, and the user experience is improved. The usability of the projector and the user interaction experience can be effectively improved, and the defect of lack of visual boundary prompt in the prior art is overcome.

An optical system (100) for a projection exposure system (1), comprising an optical element (104, 106, 108), and a mount (132) which supports the optical element (104, 106, 108), wherein the mount (132) has a displacement device (138) which is configured to displace the optical element (104, 106, 108) linearly along exactly one spatial direction (152, 154, 156) in the event of a heat-induced deformation of the mount (132).

The invention relates to a projection optical system which comprises a lens barrel and a color combination prism assembly which are sequentially arranged from an imaging side to an image source side in the optical axis direction, a first lens, a second lens, a third lens and a fourth lens are arranged in the lens barrel, and a spacing element is arranged between every two adjacent lenses in the lens barrel. The color combination prism assembly comprises a color combination prism and red, green and blue light-emitting chips, the green light-emitting chip is arranged perpendicular to the optical axis, the red and blue light-emitting chips are arranged parallel to the optical axis, the diagonal surfaces of the color combination prism are respectively provided with a blue light band-pass filter film and a red light band-pass filter film, and the projection optical system meets the following conditions: d3s / R6 is more than 1.05 and less than 3.05; 1.43 < = EP23 / CT3 < = 2.70.

A tabletop device forms a thin upward-facing fog screen above its housing. Projection optics cast dynamic images onto the screen to create a free-floating avatar. Integrated microphones, speaker, camera and AI control circuitry interpret voice commands and emotional cues, generating synchronized visual and verbal responses for therapeutic and assistive interaction.

The invention discloses an off-axis catadioptric miniature projection optical lens group suitable for near-to-eye display of a one-dimensional waveguide, which comprises an optical prism and an optical lens which are sequentially arranged from an exit pupil position side to an image source side, and is characterized in that image light emitted by an image source is propagated to the exit pupil position through the optical lens and the optical prism; according to the projection optical lens group provided by the invention, the optical prism and the optical lens are preferably selected to be in a free-form surface form, so that the size and the weight of the whole device are more suitable for the whole integrated glasses form of a waveguide system, and the size and the weight of the whole device are more suitable for the whole integrated glasses form of the waveguide system. The earphone is more suitable for daily wearing and use.

An augmented reality system includes a projector and projection optics coupled to the projector. The augmented reality system also includes an eyepiece waveguide including hybrid diffractive structure including: one or more first nanofeatures having first material with a first index of refraction; and one or more second nanofeatures having a second material with a second index of refraction.

The invention relates to a lighting device (1) for a motor vehicle comprising: - a first (10) and a second (20) light modules, each module comprising a light source (100, 200) and a collector (101, 201), the sources emitting light in opposite directions; - a projection optic (30) common to said modules for projecting the beam reflected by the collectors; - a first optical element (40) for generating a virtual image (201a) of the second collector, with a rear area positioned at the focal point of the projection optic; the focal point of the projection optic (30) being located at a rear area of ​​the first collector (101), or the lighting device (1) comprising a second optical element (50) for generating a virtual image (101a) of the first collector (101) with a rear area positioned at the focal point (300) of the projection optic (30). Figure to be published with the abbreviation: Fig. 1

The objective is to provide an exposure apparatus, a measuring apparatus, a measuring method, and a component manufacturing method that, for high-precision exposure, can measure the operating state of a spatial light modulator with high precision within a short time during the exposure intervals using a spatial light modulator. The exposure apparatus includes: an exposure illumination optical system for illuminating the spatial light modulator, the spatial light modulator including a plurality of spatial light modulating devices having reflective surfaces arranged on an array surface; a projection optical system for projecting light from the spatial light modulator onto a substrate to be exposed; a first detection unit for detecting light from the reflective surfaces; a second detection unit for detecting light from the reflective surfaces, and having a wider detection field than the first detection unit; and a position changing mechanism that positions the first and second detection units relative to the spatial light modulator such that the spatial light modulator faces the first detection unit, and the spatial light modulator faces the second detection unit, respectively.

A projector according to the present disclosure includes: an exterior housing; a light source unit configured to emit illumination light; an image forming unit configured to generate image light; a projection optical unit configured to project the image light generated by the image forming unit; a first heat exchanger for heat absorption configured to absorb heat generated by the light source unit; a second heat exchanger for heat absorption configured to absorb heat generated by the image forming unit; a first heat exchanger for heat dissipation configured to dissipate heat transferred from the first heat exchanger for heat absorption; a second heat exchanger for heat dissipation configured to dissipate heat transferred from the second heat exchanger for heat absorption; and a heat exchanger fan configured to supply an air flow to the first heat exchanger for heat dissipation and the second heat exchanger for heat dissipation.

The invention relates to a method for reducing a long-term change (∆P) in a form (P) of an optical surface (25a) of an optical element (Mi), preferably a mirror, in particular an EUV mirror. The method comprises processing the optical element (Mi), preferably an in particular transparent substrate (25) of the optical element (Mi), outside the optical surface (25a) in order to reduce surface damage, in particular in order to reduce a surface roughness Ra, of the optical element (Mi) outside the optical surface (25a). During processing, material is removed from the substrate (25) of the optical element (Mi) preferably by brushing by means of at least one brushing tool (27). The invention also relates to an optical element (Mi), comprising: an optical surface (25a), preferably for reflecting radiation, in particular for reflecting EUV radiation. The optical element (Mi), preferably an in particular transparent substrate (25) of the optical element (Mi), has a surface roughness Ra of 5 µm or less, preferably of 3 µm or less, particularly preferably of 1.5 µm or less, on a partial surface or on multiple partial surfaces outside the optical surface (25a) and / or the partial surface or the multiple partial surfaces are transparent. The invention also relates to an system for semiconductor lithography, which has at least one optical element (Mi) of this type, which is preferably arranged in a projection optical unit (10).

A mammography apparatus includes: an imaging table; a radiation source; a compression plate that compresses the breast and is movable between the radiation source and the imaging table; a projector that includes a display displaying an image including first information projected onto a first surface facing the radiation source on the imaging table and second information projected onto a second surface facing the radiation source on the compression plate, and a projection optical system, in which a focus of the projection optical system is adjusted in accordance with a projection distance to the first surface; and a processor that is configured to control the display and change at least one of a display size or a display position of the second information in the image on an image display surface of the display in accordance with movement of the compression plate having the second surface independently of the first information.

The HMD comprises a head-mountable frame and an optical projection assembly supported by the frame. The optical projection assembly comprises a microdisplay supported by the frame. The microdisplay has a two-dimensional array of pixels. Each pixel contains a group of emitters configured to emit image light. The microdisplay further comprises a projection optical system configured to receive image light from each group of emitters in the array of pixels at the entrance pupil and project the focused image light from the exit pupil. The microdisplay further comprises a two-dimensional array of optical collimators positioned between the microdisplay and the projection optical system. The steerable optical collimators are further configured to redirect the emission profiles of the corresponding groups of emitters toward the center of the entrance pupil of the projection optical system.

This invention discloses a projection optical structure, a projection optical mirror adjustment method, and a projection lens, relating to the field of optical technology. The projection optical structure includes a light source and a first lens and a second lens arranged sequentially in the light-emitting direction of the light source. The first lens includes a first light-incident surface facing the light source, a first light-emitting surface facing the second lens, and a side surface located between the first light-incident surface and the first light-emitting surface. The second lens includes a second light-incident surface facing the first lens and a second light-emitting surface facing away from the first lens. A first stray ray emitted from the light source passes sequentially through the first light-incident surface, the side surface, the first light-emitting surface, the second light-incident surface, and the second light-emitting surface to form a first image point in the second lens. A second stray ray emitted from the light source passes sequentially through the first light-incident surface, the side surface, the first light-emitting surface, the second light-incident surface, and the second light-emitting surface to form a second image point at the bottom of the first image point.

To realize larger and finer receptor substrates in a lift device and shorter tact time while maintaining high lift position accuracy.SOLUTION: A mechanism is constructed such that each stage group that moves while holding a donor substrate carrying an object to be lifted and / or a beam shaping optical system and a reduction projection optical system, and the stage group that holds the receptor substrate to be lifted is constructed on a separate solid bases, thereby minimizing vibrations caused by the relative scanning of each substrate with respect to the laser light and abnormalities in the synchronous position accuracy of the stages responsible for the scanning.SELECTED DRAWING: Figure 1A

To provide a technique advantageous for determining a baseline correction amount.SOLUTION: A method of determining a baseline correction amount of a baseline representing a distance between an optical axis of a first scope that detects a mark via a projection optical system that projects light from an original onto a substrate and an optical axis of a second scope that detects the mark without passing through the projection optical system, the method comprising: Provided is a determination method including: a second step of acquiring a baseline (Mn) from the results of detection performed by the first scope and the second scope a second number of times smaller than the first number of times; and a third step of determining a baseline correction amount (Xn) to be used in the n-th lot on the basis of the reference baseline acquired in the first step and the baseline (Mn) acquired in the second step.SELECTED DRAWING: Figure 2

Embodiments of this disclosure relate to a measurement tool for inspecting structures on an object, the measurement tool comprising: a projection optics; a detection optics; a detector array; and a controller. The projection optics are arranged to project radiation onto the structure, and the detection optics are arranged to receive radiation scattered by the structure. The detector array includes a plurality of detector elements. The controller is operable to: control the detector array to determine at least one image; and determine one or more parameters of interest based on the at least one determined image. The controller can be configured such that each pixel of the at least one determined image indicates the total dose of radiation received by one of the detector elements during a plurality of discrete time intervals during a measurement time interval, the pixel value being read from the corresponding detector element at the end of the measurement time interval.

The present disclosure provides an exposure apparatus and an article manufacturing method. The exposure apparatus exposes a substrate to light. The exposure apparatus includes a projection optical system configured to project a pattern image of a master onto the substrate, a supply unit configured to supply a gas to a space between the projection optical system and the substrate, a measurement unit configured to measure a position of the substrate, and a controller configured to control the supply of the gas by the supply unit to change a flow rate of the gas passing between the measurement unit and the substrate.