314 results about "Projection optics" patented technology

The utility model discloses a three-color micro-projection optical system, the three-color micro-projection optical system is provided with an object side and an image side which are correspondingly arranged along an optical axis direction, the three-color micro-projection optical system comprises a diaphragm, a lens group and a color combination prism assembly which are sequentially arranged from the object side to the image side; the color combination prism assembly comprises a color combination prism, a red light-emitting chip, a green light-emitting chip and a blue light-emitting chip; the focal length of the three-color micro projection optical system is f, 5.9 mlt; flt; the thickness is 6.4 mm; the distance from the diaphragm to the image surface is the total optical length TTL and TTLlt of the three-color micro-projection optical system; and the thickness is 10.2 mm. By means of the arrangement, in the environment temperature range of 20-60 DEG C, the optical system does not defocus during working, the MTF full frequency is higher than 0.5, the total length of the optical system can be controlled within 10.2 mm, and the working performance is more stable.

To provide technology suitable for performing highly precise measurement of optical characteristics.SOLUTION: An evaluation method for evaluating an optical characteristic of a projection optical system is provided. The evaluation method includes a measurement step of illuminating a test reticle having a test pattern disposed on an object plane of the projection optical system, and measuring an amount of positional deviation of an image of the test pattern formed on an image plane of the projection optical system, and an estimation step of estimating the optical characteristic of the projection optical system based on a result of the measurement, wherein in the estimation step, the optical characteristic is estimated using a polynomial model including a regularization term.SELECTED DRAWING: Figure 2

The invention provides a projection optical system. The projection optical system comprises a lens barrel and a color combination prism assembly which are sequentially arranged from the imaging side to the image source side in the optical axis direction. A lens group and a spacing assembly are accommodated in the lens barrel; the lens group comprises a first lens, a second lens, a third lens and a fourth lens which are sequentially arranged from the imaging side to the image source side in the optical axis direction. The spacing assembly comprises first, second and third spacing elements; the color combination prism assembly comprises a color combination prism, a red light-emitting chip, a green light-emitting chip and a blue light-emitting chip; a blue light band-pass filtering film and a red light band-pass filtering film are respectively arranged on two diagonal surfaces of the color combination prism; the green light-emitting chip is perpendicular to the optical axis, and the red light-emitting chip and the blue light-emitting chip are parallel to the optical axis; the projection optical system also satisfies the following conditions: (CT1 + CT2) / CP1 is more than 0.90 and less than 1.65; 4.90 < d2m / (T23 + CT3) < = 7.30; and 5.50 < d3s / T34 < 9.80.

A wearable display system includes one or more nanowire LED micro-displays. The nanowire micro-LED displays may be monochrome or full-color. The nanowire LEDs forming the arrays may have an advantageously narrow angular emission profile and high light output. Where a plurality of nanowire LED micro-displays is utilized, the micro-displays may be positioned at different sides of an optical combiner, for example, an X-cube prism which receives light rays from different micro-displays and outputs the light rays from the same face of the cube. The optical combiner directs the light to projection optics, which outputs the light to an eyepiece that relays the light to a user's eye. The eyepiece may output the light to the user's eye with different amounts of wavefront divergence, to place virtual content on different depth planes.

The invention relates to a method for reducing long-term changes (ΔP) in a pass (P) of an optical surface (25a) of an optical element (Mi), preferably a mirror, in particular an EUV mirror. The method comprises processing the optical element (Mi), preferably a substrate (25) of the optical element (Mi), outside the optical surface (25a) to reduce surface damage, in particular to reduce surface roughness R. a, of the optical element (Mi) outside the optical surface (25a). During processing, material is preferably removed from the substrate (25) of the optical element (Mi) by brushing with at least one brush tool (27). The invention also relates to an optical element (Mi) comprising: an optical surface (25a), preferably for reflecting radiation, in particular for reflecting EUV radiation. The optical element (Mi), preferably a substrate (25) of the optical element (Mi) that is particularly transparent, has a surface roughness R on one or more partial surfaces outside the optical surface (25a). aof 5 µm or less, preferably of 3 µm or less, particularly preferably of 1.5 µm or less, and / or the partial surface or the multiple partial surfaces are transparent. The invention also relates to a semiconductor lithography system comprising at least one such optical element (Mi), which is preferably arranged in a projection optic (10).

A method for operating a projection exposure system (1) comprises the following steps: providing a projection exposure system (1) with a radiation source (1) for generating illumination radiation (3), an illumination optic (11) for transferring the illumination radiation (3) from the radiation source (2) to an object field (8) extending in a scan direction (y) and a cross-scan direction (x), wherein the illumination optic (11) has at least one faceted mirror (6, 7) with a plurality of individual mirrors, and wherein at least a subset of the individual mirrors is configured such that they only partially illuminate the object field (8) in the scan direction (y), and a projection optic (10) for imaging a reticle (12) arranged in the object field (8) of the illumination optic (11) onto a wafer (19) arranged in an image field (17) of the projection optic (10), and specifying a set of at least one element of field-dependent aberrations. (Ai(x, y);i=(1..M)), specification of a target vector (Z(x) = (Z1(x), ..., Z; M (x) T ) for the target values ​​Z i (x) of the aberrations Ai(x, y) after averaging over the scan direction (y), dividing the extent of the object field (8) in the scan direction (y) into j ≥ 2 intervals ([y0; y1], ..., [y j-1 ; y j ]) and determining scan weights (gi(x, y)) which characterize a dependence of an illuminance at a location x in the cross-scan direction in the object field () on a position in the scan direction (y) such that a deviation of a weighted aberration vector A weighted ( x ) → : = ∑ gi A l → is reduced from the target vector (Z(x)).

A lighting device for vehicles including a light source, a transparent light guide body with a light coupling area and a projection optics device. The shape of the lower light deflection surface deviates from the shape of a base surface. The shape of the base surface is such that if the lower light deflection surface would not deviate from the shape of the base surface in form of the first facet, the light reflected from the base surface would be projected from the projection optics device into a non-deviation region of the light distribution, wherein the non-deviation region contains a defined point of the light distribution. The first surface element is inclined with respect to the base surface such that light totally reflected by the first surface element is imaged in the light distribution by the projection optics device into an “eraser region” region below the defined point.

A wearable display system includes one or more emissive micro-displays, e.g., micro-LED displays. The micro-displays may be monochrome micro-displays or full-color micro-displays. The micro-displays may include arrays of light emitters. Light collimators may be utilized to narrow the angular emission profile of light emitted by the light emitters. Where a plurality of emissive micro-displays is utilized, the micro-displays may be positioned at different sides of an optical combiner, e.g., an X-cube prism which receives light rays from different micro-displays and outputs the light rays from the same face of the cube. The optical combiner directs the light to projection optics, which outputs the light to an eyepiece that relays the light to a user's eye. The eyepiece may output the light to the user's eye with different amounts of wavefront divergence, to place virtual content on different depth planes.

The invention relates to a method and system for identifying a projectable area of a projector. The method comprises the steps of establishing a coordinate system taking the center of a projector lens as a base point based on boundary contour parameters of the projector, generating corresponding contour line data by utilizing the boundary contour parameters, and projecting contour lines on a projection surface to identify a movable axis range and / or a variable focus range of the projector lens. The system comprises a projection optical module, a boundary detection unit, a contour generation unit, and an independent contour projection unit and a control unit which are arranged on a shell. According to the scheme, the contour line data is generated based on the boundary contour parameters and is projected on the projection surface, so that a user can intuitively perceive the adjustable limit range, blind adjustment is avoided, the risks of image distortion, dark corners and content missing are reduced, the adjustment efficiency and accuracy are improved, practicability and flexibility are both achieved, and the user experience is improved. The usability of the projector and the user interaction experience can be effectively improved, and the defect of lack of visual boundary prompt in the prior art is overcome.

An optical system (100) for a projection exposure system (1), comprising an optical element (104, 106, 108), and a mount (132) which supports the optical element (104, 106, 108), wherein the mount (132) has a displacement device (138) which is configured to displace the optical element (104, 106, 108) linearly along exactly one spatial direction (152, 154, 156) in the event of a heat-induced deformation of the mount (132).

The invention relates to a projection optical system which comprises a lens barrel and a color combination prism assembly which are sequentially arranged from an imaging side to an image source side in the optical axis direction, a first lens, a second lens, a third lens and a fourth lens are arranged in the lens barrel, and a spacing element is arranged between every two adjacent lenses in the lens barrel. The color combination prism assembly comprises a color combination prism and red, green and blue light-emitting chips, the green light-emitting chip is arranged perpendicular to the optical axis, the red and blue light-emitting chips are arranged parallel to the optical axis, the diagonal surfaces of the color combination prism are respectively provided with a blue light band-pass filter film and a red light band-pass filter film, and the projection optical system meets the following conditions: d3s / R6 is more than 1.05 and less than 3.05; 1.43 < = EP23 / CT3 < = 2.70.

A tabletop device forms a thin upward-facing fog screen above its housing. Projection optics cast dynamic images onto the screen to create a free-floating avatar. Integrated microphones, speaker, camera and AI control circuitry interpret voice commands and emotional cues, generating synchronized visual and verbal responses for therapeutic and assistive interaction.

The invention relates to a lighting device (1) for a motor vehicle comprising: - a first (10) and a second (20) light modules, each module comprising a light source (100, 200) and a collector (101, 201), the sources emitting light in opposite directions; - a projection optic (30) common to said modules for projecting the beam reflected by the collectors; - a first optical element (40) for generating a virtual image (201a) of the second collector, with a rear area positioned at the focal point of the projection optic; the focal point of the projection optic (30) being located at a rear area of ​​the first collector (101), or the lighting device (1) comprising a second optical element (50) for generating a virtual image (101a) of the first collector (101) with a rear area positioned at the focal point (300) of the projection optic (30). Figure to be published with the abbreviation: Fig. 1

The objective is to provide an exposure apparatus, a measuring apparatus, a measuring method, and a component manufacturing method that, for high-precision exposure, can measure the operating state of a spatial light modulator with high precision within a short time during the exposure intervals using a spatial light modulator. The exposure apparatus includes: an exposure illumination optical system for illuminating the spatial light modulator, the spatial light modulator including a plurality of spatial light modulating devices having reflective surfaces arranged on an array surface; a projection optical system for projecting light from the spatial light modulator onto a substrate to be exposed; a first detection unit for detecting light from the reflective surfaces; a second detection unit for detecting light from the reflective surfaces, and having a wider detection field than the first detection unit; and a position changing mechanism that positions the first and second detection units relative to the spatial light modulator such that the spatial light modulator faces the first detection unit, and the spatial light modulator faces the second detection unit, respectively.

The invention relates to a method for reducing a long-term change (∆P) in a form (P) of an optical surface (25a) of an optical element (Mi), preferably a mirror, in particular an EUV mirror. The method comprises processing the optical element (Mi), preferably an in particular transparent substrate (25) of the optical element (Mi), outside the optical surface (25a) in order to reduce surface damage, in particular in order to reduce a surface roughness Ra, of the optical element (Mi) outside the optical surface (25a). During processing, material is removed from the substrate (25) of the optical element (Mi) preferably by brushing by means of at least one brushing tool (27). The invention also relates to an optical element (Mi), comprising: an optical surface (25a), preferably for reflecting radiation, in particular for reflecting EUV radiation. The optical element (Mi), preferably an in particular transparent substrate (25) of the optical element (Mi), has a surface roughness Ra of 5 µm or less, preferably of 3 µm or less, particularly preferably of 1.5 µm or less, on a partial surface or on multiple partial surfaces outside the optical surface (25a) and / or the partial surface or the multiple partial surfaces are transparent. The invention also relates to an system for semiconductor lithography, which has at least one optical element (Mi) of this type, which is preferably arranged in a projection optical unit (10).

The HMD comprises a head-mountable frame and an optical projection assembly supported by the frame. The optical projection assembly comprises a microdisplay supported by the frame. The microdisplay has a two-dimensional array of pixels. Each pixel contains a group of emitters configured to emit image light. The microdisplay further comprises a projection optical system configured to receive image light from each group of emitters in the array of pixels at the entrance pupil and project the focused image light from the exit pupil. The microdisplay further comprises a two-dimensional array of optical collimators positioned between the microdisplay and the projection optical system. The steerable optical collimators are further configured to redirect the emission profiles of the corresponding groups of emitters toward the center of the entrance pupil of the projection optical system.

This invention discloses a projection optical structure, a projection optical mirror adjustment method, and a projection lens, relating to the field of optical technology. The projection optical structure includes a light source and a first lens and a second lens arranged sequentially in the light-emitting direction of the light source. The first lens includes a first light-incident surface facing the light source, a first light-emitting surface facing the second lens, and a side surface located between the first light-incident surface and the first light-emitting surface. The second lens includes a second light-incident surface facing the first lens and a second light-emitting surface facing away from the first lens. A first stray ray emitted from the light source passes sequentially through the first light-incident surface, the side surface, the first light-emitting surface, the second light-incident surface, and the second light-emitting surface to form a first image point in the second lens. A second stray ray emitted from the light source passes sequentially through the first light-incident surface, the side surface, the first light-emitting surface, the second light-incident surface, and the second light-emitting surface to form a second image point at the bottom of the first image point.

To realize larger and finer receptor substrates in a lift device and shorter tact time while maintaining high lift position accuracy.SOLUTION: A mechanism is constructed such that each stage group that moves while holding a donor substrate carrying an object to be lifted and / or a beam shaping optical system and a reduction projection optical system, and the stage group that holds the receptor substrate to be lifted is constructed on a separate solid bases, thereby minimizing vibrations caused by the relative scanning of each substrate with respect to the laser light and abnormalities in the synchronous position accuracy of the stages responsible for the scanning.SELECTED DRAWING: Figure 1A

To provide a technique advantageous for determining a baseline correction amount.SOLUTION: A method of determining a baseline correction amount of a baseline representing a distance between an optical axis of a first scope that detects a mark via a projection optical system that projects light from an original onto a substrate and an optical axis of a second scope that detects the mark without passing through the projection optical system, the method comprising: Provided is a determination method including: a second step of acquiring a baseline (Mn) from the results of detection performed by the first scope and the second scope a second number of times smaller than the first number of times; and a third step of determining a baseline correction amount (Xn) to be used in the n-th lot on the basis of the reference baseline acquired in the first step and the baseline (Mn) acquired in the second step.SELECTED DRAWING: Figure 2

Embodiments of this disclosure relate to a measurement tool for inspecting structures on an object, the measurement tool comprising: a projection optics; a detection optics; a detector array; and a controller. The projection optics are arranged to project radiation onto the structure, and the detection optics are arranged to receive radiation scattered by the structure. The detector array includes a plurality of detector elements. The controller is operable to: control the detector array to determine at least one image; and determine one or more parameters of interest based on the at least one determined image. The controller can be configured such that each pixel of the at least one determined image indicates the total dose of radiation received by one of the detector elements during a plurality of discrete time intervals during a measurement time interval, the pixel value being read from the corresponding detector element at the end of the measurement time interval.

The present disclosure provides an exposure apparatus and an article manufacturing method. The exposure apparatus exposes a substrate to light. The exposure apparatus includes a projection optical system configured to project a pattern image of a master onto the substrate, a supply unit configured to supply a gas to a space between the projection optical system and the substrate, a measurement unit configured to measure a position of the substrate, and a controller configured to control the supply of the gas by the supply unit to change a flow rate of the gas passing between the measurement unit and the substrate.

The invention provides an image projection apparatus capable of suppressing reduction in visibility and generation of glare due to reflection of external light. This image projection device (100) projects image light to a display unit (WS) for displaying a virtual image (P), and is provided with: an image irradiation unit (10) that irradiates the image light within the field of view; projection optical units (20, 30) that project image light to the display unit (WS); and a housing section (50) that houses the image irradiation section (10) and the projection optical sections (20, 30), in which a dust cover (60) is provided at a position for extracting the image light in the housing section (50), the dust cover (60) is provided so as to be inclined at an angle [beta] from the horizontal direction, and external light incident from the outside is reflected by the dust cover (60) and reaches a position above the upper end of the field of view.

To provide a technique advantageous in performing focus driving of a stage holding a substrate with high accuracy.SOLUTION: An exposure apparatus that exposes a substrate using the step-and-repeat method includes: a slider that moves on a surface plate; a fine movement stage that adjusts the tilt of the substrate on the slider; a stage that holds the substrate; a first measurement unit that measures the tilt of the fine movement stage relative to the surface plate to obtain a first measurement value; and a second measurement unit that measures the tilt of the fine movement stage relative to the slider to obtain a second measurement value; and a processing unit that calculates the inclination of the slider relative to the surface plate from the first measurement value and the second measurement value obtained during the step movement of the stage, and based on the inclination of the slider, calculates a correction value for correcting the position of the stage in an optical axis direction during focus drive to align the position of the substrate in the optical axis direction of a projection optical system with the focal plane of the projection optical system after the step movement of the stage.SELECTED DRAWING: Figure 1

The invention discloses a panoramic head-up display device based on double-LBS projection, and relates to the technical field of head-up display, the panoramic head-up display device comprises a double-LBS projection unit, a projection optical system, a glass projection surface and an image processing and control unit, the double-LBS projection unit is used for emitting two beams of three-color laser and performing two-dimensional deflection and modulation on the three-color laser; the glass projection surface comprises a glass substrate and an optical anti-reflection film located on the glass substrate, the scheme that the two LBS projection modules are spliced is adopted, the bottleneck that the field angle of a single LBS module is limited is fundamentally broken through, display of a panoramic large picture is successfully achieved, and meanwhile the effect that the field angle of the single LBS module is limited is achieved. The image processing and control unit is used for carrying out geometric correction and pixel-level brightness and chroma fusion on the overlapped region, so that the difficult-to-avoid splicing mark problems such as uneven brightness, chromatic aberration and geometric dislocation in the traditional multi-module splicing are effectively eliminated, and finally, a visual integrated, coherent and seamless high-quality virtual image is presented; and the impression immersion degree and the information display integrity are greatly improved.

The application relates to the field of projection optical technology, in particular to an extreme ultraviolet lithography projection exposure optical system and method, and provides an ultraviolet lithography projection exposure optical system which comprises a light field uniformity adjusting module, the light field uniformity adjusting module is respectively connected with a light beam generating module and a light beam shaping module in signal connection; the light field uniformity adjusting module is used for acquiring extreme ultraviolet light beam intensity distribution data output by the light beam shaping module; is also used for adjusting the output power of the light beam generating module according to the light intensity distribution data, so that the lowest light intensity in the extreme ultraviolet light beam intensity distribution data output by the light beam shaping module after power adjustment is not lower than a target light intensity; and is also used for adjusting the light transmittance of a gradual attenuation piece in the extreme ultraviolet light beam shaping module according to the extreme ultraviolet light beam intensity distribution data output by the light beam shaping module after power adjustment, so that the light intensity difference of any two positions in the extreme ultraviolet light beam intensity distribution data output by the light beam shaping module after transmittance adjustment does not exceed a difference limited range.

A method for processing a workpiece by laser ablation includes: a) preparing a mask having at least one transparent pattern segment and at least one light-shielding pattern segment, the transparent pattern segment and the light-shielding pattern segment being along a pattern edge corresponding to a main scanning direction, b) scanning a line-shaped laser beam over the mask; c) projecting a pattern beam that passes through the mask onto a workpiece by using a projection optical system; and d) processing a processing area in the workpiece. The width or size of the transparent pattern segment and the light-shielding pattern segment are smaller than a resolution depending upon a wavelength of the line-shaped laser beam and a numerical aperture of the projection optical system.

A virtual image display device includes a first display element that is an image light generation device, a first projection optical system configured to project image light emitted from the first display element, and a first combiner disposed inclined with respect to an optical path portion of the image light emitted from the first projection optical system, the combiner including a transmissive mirror surface configured to transmit the image light. The transmissive mirror surface has a curved surface shape with identical sag amounts at effective area ends in vertical and lateral directions that are two directions orthogonal to each other.

In an embodiment a projection device includes an LED array on which a plurality of micro LEDs is arranged at regular intervals, projection optics spaced from the LED array and configured to receive light emitted from the LED array and to project the light onto a projection surface and a light collecting structure comprising individual protrusions, wherein the protrusions are optically coupled to individual LEDs of the LED array such that they restrict an angular space of light emitted by the individual LED and / or make an emission uniform.

The invention belongs to the technical field of electronic manufacturing, and particularly relates to a patterning preparation method of a flexible circuit board, which comprises the following steps of: pre-processing and precisely positioning a flexible substrate; through an integrated multi-point optical deformation sensing system, structured light projection and high-resolution image acquisition are utilized, and a substrate surface deformation field function is sensed and constructed in a real-time and high-resolution manner; calculating an inverse deformation field in real time and reconstructing a compensation pattern through a high-speed digital pattern compensation processor based on the deformation field function; a high-resolution micro-mirror array digital light processor (DMD) is adopted as a dynamic mask, an ultraviolet light source and a projection optical system are combined, and the compensated pattern is exposed to a photoresist layer on the flexible substrate in real time; and finally, carrying out post-treatment such as developing, etching and photoresist removing. The problem of inherent deformation of the flexible substrate is fundamentally solved, the patterning precision, the preparation reliability and the yield are remarkably improved, and the preparation requirements of complex patterns and large-area flexible circuit boards are met.

The invention relates to an optical assembly (30) of a system for semiconductor technology, comprising at least one optical component (31) and at least one fastening arrangement (32) by means of which the optical component (31) can be fixed, wherein the optical component (31) has a material-bonded connection with the fastening arrangement (32) by means of an joining material (33), wherein the surface (330) of the joining material (33) exposed to the environment (40) is at least partially covered with a protective layer (34). Furthermore, the invention relates to a projection optic and a semiconductor technology system with an optical assembly according to the invention.