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199 results about "Environmental scanning electron microscope" patented technology
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The environmental scanning electron microscope or ESEM is a scanning electron microscope (SEM) that allows for the option of collecting electron micrographs of specimens that are "wet," uncoated, or both by allowing for a gaseous environment in the specimen chamber.
Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations
ActiveUS8716662B1Material analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeElectron
One embodiment relates to a method of reviewing defects using a scanning electron microscope (SEM). A defect location having a defect for review is selected, and the SEM is configured to be in a first imaging configuration. The selected defect location is imaged using the SEM to generate a first SEM image of the selected defect location. A determination is made as to whether the defect is visible or non-visible in the first SEM image. If the defect is non-visible in the first SEM image, then the SEM is configured to be into a second imaging configuration, the selected defect location is imaged using the SEM to generate a second SEM image of the selected defect location, and a further determination is made as to whether the defect is visible or non-visible in the second SEM image. Other embodiments, aspects and features are also disclosed.
Owner:KLA TENCOR TECH CORP
Focused ion beam system with coaxial scanning electron microscope
InactiveUS6900447B2Enhance the imageStability-of-path spectrometersMaterial analysis using wave/particle radiationIon beamLight beam
A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.
Owner:FEI CO
Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope
ActiveUS7714287B1Thermometer detailsStability-of-path spectrometersScanning tunneling microscopeImage contrast
An electron beam apparatus is configured for dark field imaging of a substrate surface. Dark field is defined as an operational mode where the image contrast is sensitive to topographical features on the surface. A source generates a primary electron beam, and scan deflectors are configured to deflect the primary electron beam so as to scan the primary electron beam over the substrate surface whereby secondary and / or backscattered electrons are emitted from the substrate surface, said emitted electrons forming a scattered electron beam. A beam separator is configured to separate the scattered electron beam from the primary electron beam. The apparatus includes a cooperative arrangement which includes at least a ring-like element, a first grid, and a second grid. The ring-like element and the first and second grids each comprises conductive material. A segmented detector assembly is positioned to receive the scattered electron beam after the scattered electron beam passes through the cooperative arrangement. Other embodiments, aspects and features are also disclosed. The apparatus is configured to yield good topographical contrast, high signal to noise ratio, and to accommodate a variety of scattered beam properties that result from different primary beam and scan geometry settings.
Owner:KLA TENCOR TECH CORP
Inspection system using scanning electron microscope
ActiveUS20130320211A1Low costIncrease productionMaterial analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeLarge size
An inspection system using a scanning electron microscope includes a scanning electron microscope chamber inspecting an object to be inspected by using an electron beam and maintaining a vacuum condition, a stage positioned below the scanning electron microscope chamber to be separated therefrom and mounted with the object to be inspected, and a transverse guide transferring the scanning electron microscope chamber on the stage. Atmospheric conditions are maintained between the scanning electron microscope chamber and the object to be inspected. Accordingly, object to be inspected a large size of an object to be inspected may be inspected without damage to the object to be inspected such that a cost reduction and a yield improvement may be realized.
Owner:SAMSUNG DISPLAY CO LTD
Environmental scanning electron microscope
InactiveUS20030168595A1Easy to detectExpand field of viewMaterial analysis using wave/particle radiationParticle separator tubesShock waveIon beam
The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.
Owner:DANILATOS GERASIMOS DANIEL
Environmental scanning electron microscope
InactiveUS6809322B2Easy to detectImprove efficiencyStability-of-path spectrometersThermometers using material expansion/contactionShock waveIon beam
The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.
Owner:DANILATOS GERASIMOS DANIEL
Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
ActiveUS8164057B2Easy to detectHigh resolution imageEngine sealsMaterial analysis using wave/particle radiationScanning tunneling microscopeThin membrane
An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
Owner:B NANO
Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope
InactiveUS6992300B2Minimum distanceHigh inspectionMaterial analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeLiving cell
A chamber suitable for use with a scanning electron microscope. The chamber comprises at least one aperture sealed with a membrane. The membrane is adapted to withstand a vacuum, and is transparent to electrons and the interior of the chamber is isolated from said vacuum. The chamber is useful for allowing wet samples including living cells to be viewed under an electron microscope.
Owner:EL MUL TECH +1
Complex type microscopic device
InactiveUS20100091362A1Accurate observationMaterial analysis using wave/particle radiationElectric discharge tubesMicroscopic imageComplex type
A complex type microscopic device includes a slider unit moving a stage, an optical microscope, a scanning electron microscope with an electron axis intersecting with an optical axis of the optical microscope, an optical measurement / observation unit having a magnification between those of the scanning electron microscope and the optical microscope and co-using an objective lens with the optical microscope, and a control unit controlling the entire device, and a display unit having a display screen. During display of a low-magnification optical microscopic image, the control unit controls the display unit to display, on the image, a representation to designate an area to be observed at a magnification of the optical measurement / observation unit, and to display, on the image, another representation to designate an area to be observed at a magnification of the scanning electron microscope during display of a high-magnification optical microscopic image.
Owner:HORIBA LTD
Vacuumed device and a scanning electron microscope
ActiveUS20110210247A1Stability-of-path spectrometersMaterial analysis using wave/particle radiationBeam sourceScanning tunneling microscope
A vacuumed device that includes: a sealed housing, an electron beam source, an electron optic component, a thin membrane, and a detector. The thin membrane seals an aperture of the sealed housing. The sealed housing defines a vacuumed space in which vacuum is maintained. The electron beam source is configured to generate an electron beam that propagates within the vacuumed space, interacts with the electron optic component and passes through the thin membrane. A first portion of the sealed housing is shaped to fit a space defined by non-vacuumed scanning electron microscope components that are maintained in a non-vacuum environment.
Owner:B NANO
Device and method for the examination of samples in a non vacuum environment using a scanning electron microscope
InactiveUS6989542B2Minimum distanceMaterial analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeLiving cell
A chamber suitable for use with a scanning electron microscope. The chamber comprises at least one aperture sealed with a membrane. The membrane is adapted to withstand a vacuum, and is transparent to electrons and the interior of the chamber is isolated from said vacuum. The chamber is useful for allowing wet samples including living cells to be viewed under an electron microscope.
Owner:YEDA RES & DEV CO LTD +1
Method for preparing scanning electron microscope (SEM) sample or transmission electron microscope (TEM) sample protection layer by using focused ion beam (FIB) technology
ActiveCN103196728AImprove analysis qualityStrong contrastPreparing sample for investigationScanning tunneling microscopeProtection layer
The invention provides a method for preparing a scanning electron microscope (SEM) sample or a transmission electron microscope (TEM) sample protection layer by using a focused ion beam (FIB) technology, and is applied to samples of which target surfaces are made of metal. The method comprises the following steps of: selectively scanning a target region by an electronic beam; under the action of the electronic beam, depositing an organic material layer on the target region by gaseous organic impurities in an SEM or a TEM; and depositing a metal protection layer on the organic material layer. By using the method for preparing the SEM sample or the TEM sample protection layer by using the FIB technology, before the sample is prepared by using the FIB technology, the organic material layer is deposited on the target region by using the electronic beam, so that the surface of the target region serves as the sample made of the metal; a deposited organic material and a metal material on the surface of the target region are greatly contrasted, so that the interface definition of the metal surface of the SEM or TEM sample which is required to be precisely positioned is greatly improved; and the analysis quality of the SEM or TEM is improved.
Owner:SHANGHAI HUALI MICROELECTRONICS CORP
Scanning electron microscope
InactiveUS20080237465A1Efficient conductionImprove aberrationElectric discharge tubesMaterial analysis by transmitting radiationElectron sourceScanning tunneling microscope
A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
Owner:HITACHI HIGH-TECH CORP
Two-dimensional nanosheet and preparation method and usage thereof
InactiveCN110371932ALower synthesis costSuitable for large-scale industrial productionMaterial nanotechnologyTitanium sulfidesTransmittanceOrganic matter
The invention provides a two-dimensional nanosheet and a preparation method and usage thereof. Through a means of solution stripping, the two-dimensional nanosheet which is large in sheet layer size,high in quality and small in defect number and mainly takes a single layer is prepared. The morphology of the two-dimensional nanosheet is represented through an optical microscope, a scanning electron microscope, a transmission electron microscope and an atomic force microscope. A Raman spectrum is utilized to represent that the two-dimensional nanosheet obtained through solution stripping and atwo-dimensional nanosheet obtained through a chemical vapor deposition method have the equally high crystalline quality. An infrared transmittance spectrum is utilized to represent successful modification of organic matter to the two-dimensional nanosheet. Research results show that the two-dimensional nanosheet synthesized through the preparation method has the advantages of being large in size,high in quality, small in defect number, easy to modify and the like.
Owner:INST OF CHEM CHINESE ACAD OF SCI +1
Scanning electron microscope and method for processing an image obtained by the scanning electron microscope
ActiveUS20080251719A1Accurate calculationThermometer detailsMaterial analysis using wave/particle radiationImaging conditionScanning tunneling microscope
In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated on the basis of an imaging condition or specimen information, and an image restoration is performed by using a resolving power deterioration factor other than the beam intensity distribution as a target of a deterioration mode, so that a high resolving power image can be acquired under various conditions. In the scanning electron microscope for semiconductor inspections and semiconductor measurements, the restored image is used for pattern size measurement, defect detections, defect classifications and so on, so that the measurements can be improved in precision and so that the defect detections and classifications can be made high precise.
Owner:HITACHI HIGH-TECH CORP
Stable cold field emission electron source
ActiveUS8736170B1Improved emission stabilityReduce noiseMagnetronsTransit-tube electron/ion gunsConventional transmission electron microscopeDesorption
A cold field emission (CFE) electron source for a focused electron beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), or scanning electron microscope (SEM) is disclosed. The source employs an emitter enclosure electrode behind the CFE tip which, in conjunction with the extractor electrode, defines a closed volume that can be thoroughly cleaned by electron impact desorption (EID) and radiative heating from a heated filament located between the emitter enclosure electrode and extractor electrode. The extractor electrode may have a counterbore which restricts backscattered electrons generated at the extractor from reaching portions of the source and gun which have not been cleaned by EID. Pre-cleaning of the emitter enclosure electrode and extractor electrode prior to cold field emission substantially improves both source emission stability and frequency noise characteristics, enabling source operation over time intervals adequate for application to TEMs, STEMs, and SEMs.
Owner:FEI CO
Scanning electron microscope
InactiveUS6872944B2Reduce chargeReduce overall chromatic aberrationMaterial analysis using wave/particle radiationPhotoelectric discharge tubesElectron sourceScanning tunneling microscope
The present invention relates to a scanning electron microscope employing a deceleration field forming technology (retarding), more particularly a scanning electron microscope which separates and detects secondary electrons at high efficiency.The object of the present invention is accomplished by providing an electron source, a lens for condensing the primary electron beam which is emitted from said electron source, a detector for detecting electrons which are generated by radiation of the primary electron beam onto a specimen, a first deceleration means for decelerating the primary electron beam which is radiated onto said specimen, a second deceleration means for decelerating electrons which are generated on the specimen, and a deflector for deflecting said electrons which are decelerated by said second decelerating means.
Owner:HITACHI LTD
Scanning electron microscope
InactiveUS20040173747A1Easy to useMaterial analysis using wave/particle radiationElectric discharge tubesElectron probe microanalysisScanning tunneling microscope
There is provided a reconfigurable scanning electron microscope (RSEM) (100) comprising: (a) a gun assembly (110) and an associated electron optical column (120) for generating an electron beam (600), for demagnifying the electron beam (600) to generate an electron probe (C3) and for scanning the probe (C3) across a sample (190); (b) an electron detector (550) for detecting emissions from the sample (190) in response to scanned electron probe irradiation thereof and for generating a corresponding detected signal (Sd) indicative of the magnitude of the emissions; and (c) a display (170) for receiving the detected signal (Sd) and scanning signals (x, y) indicative of the position of the probe (C3) relative to the sample (190) for generating the image of the sample (190). The RSEM (100) is distinguished in that it further includes aperture bearing members (500, 520), each member (500, 520) including an associated electon-beam transmissive aperture, for at least partially gaseously isolating the gun assembly (110) and the electron optical column (110) from the sample (190), thereby enabling the RSEM (100) to be reconfigurable as a high-vacuum scanning electron microscope and also as an environmental scanning electron microscope, the RSEM (100) being reconfigurable to include no aperture members, one aperture member (500, 750) and a plurality of aperture members (500, 750; 520 850, 860).
Owner:CARL ZEISS SMT LTD
Scanning electron microscope
InactiveUS6885001B2Improve throughputImprove accuracyMaterial analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeImage resolution
The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.
Owner:HITACHI LTD
Three-dimensional reconstruction method for soil microstructure
ActiveCN104331922AThe method steps are simpleReasonable design3D modellingSoil scienceSoil microstructure
The invention discloses a three-dimensional reconstruction method for a soil microstructure. The three-dimensional reconstruction method comprises the following steps: I, acquiring a soil sample: acquiring the soil sample on which three-dimensional reconstruction is required to be performed, wherein the soil sample is a cylindrical soil sample; II, hierarchically scanning the soil sample: hierarchically scanning the soil sample from top to bottom by using a scanning electron microscope, wherein the soil sample is divided into a plurality of scanning surfaces from top to bottom, the scanning electron microscope is adopted during scanning of each scanning surface, and each scanning surface is divided into a plurality of regions for scanning, then a plurality of electron microscope scanning images acquired by scanning are spliced to acquire an entire electron microscope scanning image of the scanning surface; III, sorting the electron microscope scanning images; IV, positioning the images; V, performing three-dimensional reconstruction: calling a three-dimensional reconstruction module to process a plurality of entire electron microscope scanning images to acquire a three-dimensional space model of the soil. The method has the advantages of simple steps, rational design, convenience in implementation and good use effect, and the established soil three-dimensional space model can truly reduce the internal structure of the soil.
Owner:陕西安易特新新材料有限公司
Low-energy scanning electron microscope system, scanning electron microscope system and sample detection method
ActiveCN109300759AHigh-resolutionControl backscattered electronsMaterial analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeSecondary electrons
Owner:FOCUS E BEAM TECH BEIJING CO LTD
Portable scanning electron microscope
InactiveUS20070145267A1Material analysis using wave/particle radiationElectric discharge tubesCRTSElectron
One embodiment relates to a portable scanning electron microscope (SEM) system. The system includes a portable SEM device including a CRT-type gun and deflectors to generate and scan the electron beam. Another embodiment relates to a portable SEM device which includes a CRT-type gun and deflectors to generate and scan the electron beam, a chamber through which the electron beam is scanned, and a detector in the chamber for detecting radiation emitted as a result of scanning the electron beam. Another embodiment relates to a method of obtaining an electron beam image of a surface of a bulk specimen where a portable SEM device is moved to the bulk specimen. Other embodiments and features are also disclosed.
Owner:KLA TENCOR TECH CORP
Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device
ActiveUS7910895B2Quick responseHigh strengthThermometer detailsSpectrometer detectorsLuminous intensityFluorescence
A light-emitting body of rapid speed of response and high light emission intensity, and an electron beam detector, scanning electron microscope and mass spectroscope using this are provided. In the light-emitting body 10 according to the present invention, when fluorescence is emitted by a nitride semiconductor layer 14 formed on one face 12a of a substrate 12 in response to incidence of electrons, at least some of this fluorescence is transmitted through this substrate 12, whereby that fluorescence is emitted from the other face 12b of the substrate. The response speed of this fluorescence is not more than μsec order. Also, the intensity of emission of this fluorescence is almost identical to that of a conventional P47 phosphor. Specifically, with this light-emitting body 10, a response speed and light emission intensity are obtained that are fully satisfactory for application to a scanning electron microscope or mass spectroscope. In addition, a cap layer 16 contributes to improvement in the persistence rate of light emission in the nitride semiconductor layer 14, so, with this light-emitting body 10, not only high-speed response and high light emission intensity are obtained, but also an excellent persistence rate.
Owner:HAMAMATSU PHOTONICS KK
Method for measuring dimensions of sample and scanning electron microscope
InactiveUS7659508B2Inhibition of contractionAccurate dimension measurementMaterial analysis using wave/particle radiationElectric discharge tubesApproximation functionScanning tunneling microscope
The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
Owner:HITACHI LTD
Method for quantitative analysis on material organization through scanning electron microscope and energy disperse spectrometer
InactiveCN105067649AHigh resolutionHigh measurement accuracyMaterial analysis by measuring secondary emissionScanning tunneling microscopeMetallic materials
The invention discloses a method for quantitative analysis on material organization through a scanning electron microscope and an energy disperse spectrometer and belongs to the technical field of metal material detection. The method specifically includes the steps that a sample is prepared, wherein the surface of the sample is cleaned and polished; the sample is observed, wherein the prepared sample is put into an electron microscope sample room, and a clearly-focusing electronic image is obtained; data collecting and processing are conducted, wherein the area percentage of a tested phase in the field is displayed; thresholds are selected, wherein selection of the thresholds affects the measuring accuracy; data is output, wherein an experiment result is output in the mode of a color bitmap or a form report. The method has the advantages that the method is suitable for various metal materials, iron and steel products, minerals and fireproof materials and is fast in measuring operation and convenient to use.
Owner:SHOUGANG CORPORATION
Charged particle beam apparatus, scanning electron microscope, and sample observation method using the same
InactiveUS20080121803A1Defective partReduce variationThermometer detailsMaterial analysis using wave/particle radiationScanning tunneling microscopeSecondary electrons
A charged particle beam apparatus for acquiring high-definition and highly contrasted observation images by detecting efficiently secondary signals without increasing aberration of the primary electron beam, detecting defects from observation images and thus increasing the inspection speed and enhancing the sensitivity of inspection. The desired area of the sample is scanned with a primary charged particle beam, and the secondary charged particles generated secondarily from the area by the irradiation of the primary charged particle beam are led to collide with the secondary electron conversing electrode, and then the secondary electrons generated by the first E×B deflector 31 arranged through an insulator on the surface of the secondary electron conversing electrode on the side of the sample is absorbed by the detector. At the same time, the deflection chromatic aberration that had been generated in the primary charged particle beam by the first E×B deflector is reduced by the second E×B deflector arranged on the first E×B deflector, to obtain high-definition and highly contrasted observation images free of shading.
Owner:HITACHI HIGH-TECH CORP
Composite system of scanning electron microscope and focused ion beam
ActiveUS7154106B2Possible to performComponent can be removedMaterial analysis using wave/particle radiationSemiconductor/solid-state device testing/measurementScanning tunneling microscopeScanning helium ion microscope
A composite system of a scanning electron microscope (SEM) and a focused ion beam apparatus (FIB) has an FIB lens barrel for irradiating a focused ion beam to an irradiating position on a sample surface and an SEM lens barrel for observing a machining state of the machined sample surface. The FIB lens barrel has an aperture defining at least one slit of a preselected pattern so that during irradiation of the sample surface with the focused ion beam, the aperture is irradiated by the focused ion beam with a width covering the slit to thereby machine the sample surface in the form of the preselected pattern of the slit.
Owner:HITACHI HIGH TECH SCI CORP
Three-dimensional reconstruction method for image of scanning electron microscope
The invention provides a three-dimensional reconstruction method for the image of a scanning electron microscope. The method comprises the steps of providing a micro-nano structure; obtaining the image of a scanning electron microscope of the micro-nano structure; according to the image of the scanning electron microscope, obtaining a rough graph of a three-dimensional structure; according to the image of the scanning electron microscope, constructing a reflection electron intensity database; according to the reflection electron intensity database, correcting the rough graph of the three-dimensional structure to obtain a corrected graph of the three-dimensional structure; obtaining the boundary information of the micro-nano structure and correcting the corrected graph of the three-dimensional structure based on the boundary information so as to obtain the fine graph of the three-dimensional structure.
Owner:北京中科微投资管理有限责任公司
Scanning Electron Microscope Having Time Constant Measurement Capability
ActiveUS20080116375A1Accurately and stably imageImage stabilizationMaterial analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeSecondary electrons
In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
Owner:HITACHI HIGH-TECH CORP
Scanning electron microscope
InactiveUS7755045B2Thermometer detailsMaterial analysis using wave/particle radiationIon currentScanning tunneling microscope
In a scanning electron microscope, a reflection plate at ground potential is provided in a specimen chamber and backscattering electrons given off from a specimen impinge on the reflection plate to generate subsidiary electrons. An electric field supply electrode applied with a positive voltage of +100 to +500V is arranged in a gap defined by the reflection plate and a specimen stage. A first detection electrode is arranged to detect ion current attributable to backscattering electrons and a second detection electrode is arranged to detect current representative of coexistence of ion currents attributable to secondary electron and backscattering electron. The scanning electron microscope constructed as above can achieve simultaneous separation / detection of secondary electron and backscattering electron.
Owner:HITACHI HIGH-TECH CORP
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