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Application of ebip to inspection, test, debug and surface modifications

A technology of electron beam induction and plasma, which is applied in the direction of plasma, circuit, discharge tube, etc., can solve the problems of large occupied area of ​​the factory, affecting the processing capacity, and high system cost

Inactive Publication Date: 2017-08-18
ORBOTECH LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This technique involves large vacuum enclosures and complex electro-optical components, resulting in higher system cost, larger factory footprint, and potential impact on throughput

Method used

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  • Application of ebip to inspection, test, debug and surface modifications
  • Application of ebip to inspection, test, debug and surface modifications
  • Application of ebip to inspection, test, debug and surface modifications

Examples

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Embodiment Construction

[0048] Various embodiments described below provide solutions based on high resolution, high sensitivity and compact atmospheric electron beam induced plasma detection technology. This technique essentially relies on the fact that the plasma generated by an impact ionization event and driven by an electron beam in air acts as a non-mechanical conductive contact, allowing the voltage on the device under test (DUT) to pass through the resulting The secondary plasma electron current is used for measurement. As the name implies, this technique does not require the DUT to be kept in a vacuum. Instead, only the electron emitter (cathode) and electron optics need be kept in the vacuum enclosure. Furthermore, implementations of this technique require only simple electron-optics configurations (eg, extraction grids and electrostatic lenses), keeping the cost of the gun low and its size (and thus the size of the enclosure) compact. The electron beam exits the vacuum enclosure housing t...

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Abstract

An electron-beam induced plasma is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

Description

[0001] Related Application Cross Reference [0002] This application claims priority to U.S. Provisional Patent Application No. 62 / 051,871, filed September 17, 2014, which claims U.S. Provisional Patent Application No. 61 / 886,625, filed October 3, 2013 Priority rights, and also with the No. W02013 titled "ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES" filed on July 10, 2012 / 012616 PCT patent application, the contents of which are incorporated herein by reference in their entirety. technical field [0003] Various embodiments of the invention generally relate to non-mechanical contact probing of electronic devices, and surface modification of devices and tissues. In particular, various embodiments relate to the use of electron beam induced plasma probes in metrology and surface modification. Background technique [0004] The ability to measure and apply voltage and current on patterned structures without having to establish mechanica...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
CPCH01J37/32825H05H2240/10
Inventor 尼德尔·萨利赫恩里克·斯特林丹尼尔·托伊特阿里·格雷泽罗恩·勒温格斯里拉姆·克里什娜斯瓦米
Owner ORBOTECH LTD
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