22 results about "Electron optics" patented technology

The present application relates to a kind of shutter wheel remote sensing wide imaging system and imaging method, including multiple optical camera lenses, motor drive mechanism, wheel shutter mechanism, multiple lens shared electronic optical sensor device, wherein, the wheel shutter mechanism is placed between camera lens and electronic optical sensor device, the shutter rotation of wheel shutter mechanism is driven by motor drive mechanism to control the light transmission of different camera lenses to electronic optical sensor device in turn, realize the wide imaging of area array camera lens.The present application provides the imaging method of the above-mentioned imaging system, improves the imaging width under the condition of not upgrading camera lens configuration, only uses a set of electronic device to reduce the development cost and installation difficulty.

A display device including a display area and an optical area overlapping an electronic optical device disposed below optical area; a plurality of light emitting devices disposed in the display area and the optical area; a first pixel circuit disposed in the display area and outside of the optical area and electrically connected to first light emitting devices disposed in the optical area and configured to provide a driving current to the first light emitting devices disposed in the optical area; and a second pixel circuit disposed in the display area and outside of the optical area and electrically connected to second light emitting devices disposed in the display area and configured to provide a driving current to the second light emitting devices disposed in the display area.

The utility model relates to a kind of detector components, including detector, diaphragm and adjusting mechanism.Detector is used to detect signal electron beam, diaphragm is located in the side of detector receiving signal electron beam, the center is provided with through-hole, adjusting mechanism can adjust the area of through-hole and / or the distance between diaphragm and detector.In addition, the utility model also discloses an electron-optical system, including electron beam source, beam separator and detector component.Electron beam source emits main electron beam to sample along main optical axis, and generates signal electron beam on sample surface;Beam separator is coaxially arranged with main optical axis, located between electron beam source and sample, for deflecting signal electron beam.Through adjusting the area of diaphragm through-hole and the distance between diaphragm and detector, the signal electron beam detection of different diffusion angle can be realized, meet the accurate detection demand of different aspect ratio characteristics, applicable to the characterization of complex topography sample.

This invention discloses a high-speed loading and unloading device for electronic optical products and a rotary printing equipment. The loading and unloading device includes a jig disk moving assembly and a loading and unloading rotating assembly. The jig disk moving assembly includes a jig disk fixing component connected to a spatial three-axis moving module. The loading and unloading rotating assembly includes a rotating support rod connected to a rotary drive module. With the rotation axis of the rotating support rod as the center of symmetry, picking heads are respectively set at symmetrical positions at both ends of the rotating support rod via picking lifting components. One picking head of the loading and unloading rotating assembly picks up the electronic optical product to be loaded from the product jig disk at the loading position, while the other picking head simultaneously picks up the electronic optical product that has completed the execution process from the execution station. The high-speed loading and unloading device for electronic optical products of this invention has fast loading and unloading speed and precise positioning, and, in conjunction with the rotary printing equipment, realizes a high-precision, high-speed, and automated printing process for electronic optical products.

This invention discloses an optical auxiliary positioning system for an electron beam scanning imaging device. Located between the electron optical system and the optical camera, it includes an optical structure that shortens the offset between the electron beam scanning area and the optical detection area. The optical structure comprises a focusing module, a lens module, and a base module. Light generated by the light source is absorbed and reflected by the base module before illuminating the wafer. The wafer generates imaging light carrying texture information, which, after being reflected twice by the lens module and the base module, enters the optical camera for imaging. The system allows for rapid and accurate adjustment of the focal length to adapt to the surface morphology of wafers with different thicknesses, ensuring stable detection performance of the electron beam scanning imaging device under complex process conditions.

This disclosure relates to electron optical systems and associated methods. In one arrangement, the system includes an electron beam element comprising a substrate defining at least one aperture for a corresponding electron beam to pass through. The aperture includes an incident opening and an exit opening. The cross-section of the incident opening has an incident shape distorted relative to a target shape. The cross-section of the exit opening also has an exit shape distorted relative to the target shape. When scaled to have the same cross-sectional area, the incident and exit shapes have opposite signs of deviation relative to the target shape along at least one direction perpendicular to the aperture axis.

The invention relates to an electro-optical system (1) having an electrical system part (2) and an optical system part (3). These system parts (2, 3) are arranged relative to one another such that light (9) can pass from the electrical system part (2) into the optical system part (3) through a coupling region (6). The system (1) further comprises at least one shielding element (7) surrounding the coupling region (6) for electromagnetic shielding, which forms an electrically conductive connection of the two system parts (2, 3) to one another. Here, the shielding element (7) is arranged between the two system parts (2, 3) in order to mechanically decouple them and is configured to be able to deform flexibly. The invention also relates to a laser system having such an electro-optical system (1).

A charged particle-optical element for a charged particle-optical module configured to direct charged particles along at least one beam path, the charged particle-optical element comprising: a substrate comprising at least one aperture for passage therethrough of the at least one beam path; at least one electronic component so as to provide a component surface of the substrate; and an electrical connector electrically connected to the at least one electronic component and extending through the substrate; wherein the substrate comprises a thicker portion and a thinner portion that is thinner than the thicker portion, and the electrical connector extends through the thinner portion.

This invention discloses a thin film with a multi-level microstructure surface, its preparation method, and its applications, belonging to the field of thin film microstructure construction technology. This invention is the first to apply the dynamic behavior of fluids during stretching motion to the construction of multi-level microstructures on a thin film surface. Compared to traditional microfabrication techniques, the stretch flow curing method's most significant advantage lies in its extremely simplified process flow and high flexibility. The entire preparation process includes only two key stages—stretch flow molding and curing—significantly reducing equipment complexity and operational difficulty. The stretch flow curing method not only provides a novel, efficient, and low-cost solution for surface microstructure fabrication but also demonstrates broad application potential in functional thin films, flexible electronics, optical coatings, biointerfaces, and microfluidic devices.

This invention provides a continuous stepless adjustment device, method, and application for electron beam based on the axial position control of the convergence point, belonging to the field of electron optics adjustment technology. The invention includes an anode body, an anode aperture, an electromagnetic focusing unit, and a fixed single-aperture main aperture, coaxially arranged along the electron beam propagation direction within the lens barrel of an electron optics system. This invention uses the axial position of the electron beam's convergence point relative to the fixed single-aperture main aperture as the control degree of freedom. The electromagnetic focusing unit continuously adjusts the displacement of the convergence point along the optical axis, achieving continuous stepless adjustment of the electron beam. By completely eliminating the mechanical moving parts of the aperture, this invention not only achieves continuous and smooth adjustment of the electron beam but also fundamentally avoids the vibration, contamination, and failure risks caused by mechanical movement. This significantly improves the reliability, repeatability, and long-term stability of the electron optics system, while simplifying the system structure and reducing manufacturing and maintenance costs.

This invention provides a method for separating single-walled carbon nanotubes (SHU) based on a polyethylene glycol (PEG) / salt aqueous two-phase system, which can efficiently separate high-concentration, high-purity single-chiral and single-optically active SHU samples. Compared with commonly used PEG / polyacrylamide or PEG / dextran aqueous two-phase systems, the PEG / salt aqueous two-phase system formed by replacing unstable polyacrylamide and dextran with salts has advantages such as low viscosity, low interfacial tension, rapid phase separation, and low cost. Using the PEG / salt aqueous two-phase system, various high-purity single-chiral SHUs can be obtained in a single step. By switching the salt system, single-optically active SHUs can be obtained. The separated single-chiral and single-enantiomer SHUs can be used in electronics, optics, biology, medicine, and other fields.

A display device including a display having a plurality of subpixels on a substrate, in which the display includes an optical area overlapping an electronic optical device disposed below the substrate and includes a display area outside the optical area. The display device also includes a plurality of subpixel circuits disposed in the plurality of subpixels; a plurality of first direct current power lines extending in a first direction in the display area and electrically connected to corresponding first subpixel circuits disposed in the display area among the plurality of subpixel circuits; a plurality of second direct current power lines extending in the first direction in the display area and spaced apart from the first direct current power lines and electrically connected to corresponding second subpixel circuits disposed in the display area among the plurality of subpixel circuits; a first connection line extending in a second direction intersecting the first direction at a boundary between the optical area and the normal area and configured to electrically connect the first direct current power lines, wherein the first connection line is connected to each of the first direct current power lines; a second connection line extending in the second direction at the boundary between the optical area and the display area and spaced apart from the first connection line and configured to electrically connect the plurality of second direct current power lines, wherein the second connection line is connected to each of the second direct current power lines; a third connection line extending in the first direction across the optical area, electrically connected to the first connection line, and electrically connected to corresponding third subpixel circuits disposed in the optical area among the plurality of subpixel circuits; and a fourth connection line extending in the first direction in the optical area and spaced apart from the third connection line, electrically connected to the second connection line, and electrically connected to fourth corresponding subpixel circuits disposed in the optical area among the plurality of subpixel circuits.

The application discloses an ultralow-energy monochromatic electron beam generation and transmission device, and relates to the technical field of electron optical instruments, which comprises the following units arranged in sequence along an electron beam transmission path: an electron generation unit for generating an initial electron beam; an injection lens unit for receiving the initial electron beam generated by the electron generation unit; a monochromator unit having an inlet and an outlet and being used for energy screening of the electron beam from the injection lens unit to reduce energy spread thereof; and a deceleration and focusing lens unit for receiving the monochromatized electron beam output from the outlet of the monochromator unit. The device can output an ultralow-energy electron beam with a continuously adjustable energy of 0 eV to 5 eV through the cooperative work of the electron generation unit, the injection lens unit, the monochromator unit and the deceleration and focusing lens unit, and the energy spread is better than 90 meV, thereby improving beam monochromaticity and transmission efficiency.

The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.

Electron beam application device comprising: a sample stage (101) on which a sample (20) is to be arranged, an electron-optical system comprising an objective lens (102) for generating an electronic image by electrons emitted from the sample (20) and whose optical axis (109, 305, 315, 503) is perpendicular to a sample holding surface of the sample stage (101), and a camera (108) that generates the electronic image, wherein the electron-optical system comprises: a mirror aberration corrector (106) arranged perpendicular to the optical axis (109, 305, 315, 503), several magnetic field sectors (104, 301, 302, 501) through which the path of the electrons passing through the objective lens (102) is directed away from the optical axis (109, 305, 315, 503). is deflected so that the electrons fall onto the mirror aberration corrector (106), and the path of the electrons emitted by the mirror aberration corrector (106) to the optical axis (109, 305, 315,503), and a doublet lens (105) is arranged between adjacent magnetic field sectors (104, 301, 302, 501) along the path of the electrons, wherein the several magnetic field sectors (104, 301, 302, 501) have the same deflection angle at which the path of the electrons is deflected, and the doublet lens (105) is arranged such that its object plane or image plane is the median plane (508) of the adjacent magnetic field sectors (104, 301, 302, 501) along the path of the electrons.

The application provides an electron optical and signal collection system and a scanning electron microscope and an electron beam exposure machine, and relates to the technical field of scanning electron microscopes.The electron optical system comprises an electron gun, a converging unit, a diaphragm, a beam spot quality monitoring mechanism, a correction unit, a scanning coil and an objective lens.The signal collection system comprises a backscattered electron detection assembly, a separation assembly and a secondary electron detector.According to the application, the electron beam can be effectively converged through the combination of various electric lenses, magnetic lenses and diaphragms, the beam spot shape, size and divergence angle can be controlled, and the beam spot quality and imaging effect can be monitored and improved in real time through the correction unit.The various detectors can be reasonably arranged, the secondary electrons and backscattered electrons can be effectively separated, and the multi-dimensional information such as the appearance, composition, chemical state, optical characteristics and microscopic defects of the sample can be efficiently obtained, so that the problems such as information fragmentation, low efficiency and sample interference in the multiple detection can be solved, and the depth, accuracy and efficiency of the analysis can be improved.

A light source system, preferably including one or more electron inputs, splitters, recombiners, and / or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and / or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and / or operating in a backup mode.

An electron microscope includes an electron optical system, and a control unit that controls the electron optical system. The control unit performs processing for determining a standard deviation of a brightness distribution of an electron microscope image; processing for determining an optimum value of a parameter of the electron optical system such that the standard deviation becomes the maximum, by Gaussian process regression; and processing for capturing the electron microscope image with setting a value of the parameter to the optimum value. The control unit repeats the processing for determining the standard deviation, the processing for determining the optimum value, and the processing for capturing the electron microscope image to determine a value of the parameter.

The application discloses an electron beam direct writing method and system based on a programmable integrated circuit pattern source, and relates to the technical fields of micro-nano processing and electron beam direct writing. The system comprises a programmable integrated circuit chip as a pattern emission source, an electron-optical control module, and a vacuum and workpiece table module. The integrated circuit chip is single-chip integrated with a pixel driving array and an electron emission unit, and can programmably output corresponding spatial distribution electron beam patterns according to a target layout; the electron beam patterns are micro-projected to a wafer surface through an electron-optical system, and patterns corresponding to the target layout are formed on the wafer. The application can inhibit the space charge effect by controlling the electron emission current, emission density or pulse emission mode, does not need a physical mask, can realize parallel and programmable electron beam direct writing, is compatible with the glue exposure and glue-free direct writing processes, has a simple system structure and strong universality, and can be used for micro-nano pattern processing of integrated circuits.

This utility model relates to the field of electro-optics technology, and in particular to a dustproof and sealed backlight with a light guide plate. It includes a mounting shell, a reflector plate mounted on the innermost side of the inner wall of the mounting shell, a light guide plate in front of the reflector plate, a ring of LED strips between the reflector plate and the light guide plate, a diffuser plate in front of the light guide plate, and a prism plate in front of the diffuser plate. It also includes a sealing strip, a mounting frame, a connecting frame, and a connecting rod. A sealing strip is provided between the light guide plate and the diffuser plate, and the sealing strip adheres to the edges of the light guide plate and the diffuser plate. The mounting frame is mated to the front of the mounting shell. This utility model, through the sealing strip between the light guide plate and the diffuser plate, and the action of a spring, presses the mounting frame towards the mounting shell, ensuring that the sealing strip can tightly adhere to the edges of each layer of optical materials, thereby effectively improving the sealing performance of the light guide plate and reducing the risk of dust ingress.