181 results about "Electron optics" patented technology

The invention discloses a system and method for detecting the performance of an electromagnetic element and a storage medium, and relates to the technical field of electron optics, and the system comprises a first support arm, a second support arm, a cylindricity instrument probe, a gauss meter probe and a processing unit. The first support arm and the second support arm are connected with each other and form a specific angle; the cylindricity instrument probe is arranged below the first support arm and is used for acquiring coordinate data of different positions on the surface of the electromagnetic element; the gauss meter probe is arranged below the second support arm and is used for acquiring magnetic field data of the electromagnetic element; and the processing unit is connected to the cylindricity instrument probe and the gauss meter probe and is used for receiving the coordinate data and the magnetic field data and detecting the performance of the electromagnetic element according to the coordinate data and the magnetic field data. Through the system, the performance of the electromagnetic element can be accurately and comprehensively measured and evaluated.

The invention provides an argon ion beam scanning electron microscope double-beam system and an in-situ sample analysis method, an electron optical lens barrel of the system generates a high-energy electron beam for scanning the surface of a sample for imaging; the ion optical lens cone generates a high-energy argon ion beam for sample surface polishing; the sample chamber is used for accommodating samples and providing a vacuum environment; the sample table is used for accurately controlling the position and angle of a sample; and the detector is used for collecting signals generated by interaction of the electron beam and the sample for imaging analysis. According to the invention, a sample transfer step is eliminated, so that the sample preparation and analysis efficiency is greatly improved; a millimeter-scale large-size sample can be treated, and a sample with a flat and smooth surface can be obtained; sample polishing and imaging are carried out in the same vacuum environment, so that sample pollution is reduced to the greatest extent, and the accuracy of an analysis result is improved; by combining argon ion beam polishing and scanning electron microscope imaging technologies, efficient, high-precision and in-situ analysis of the sample is realized, so that more comprehensive and more accurate microstructure information is obtained.

The utility model belongs to the technical field of heat dissipation of electronic optical equipment, and discloses a heat dissipation structure for multi-hotspot heat dissipation of a high-density electronic device and the electronic optical equipment. The heat dissipation structure comprises a shell and a fluid dredging piece, the shell is provided with a cavity used for containing the fluid dredging piece and a plurality of heating components, the surface of the shell is provided with a fluid inlet and a fluid outlet, the inner wall face of the cavity is provided with a plurality of heat dissipation through grooves, and the heat dissipation through grooves are connected to the corresponding heating components in a heat transfer mode. The two ends of each heat dissipation through groove communicate with the fluid inlet and the fluid outlet correspondingly, and the fluid dredging pieces are arranged on heat dissipation paths of the heat dissipation through grooves. Under the driving of the fluid dredging piece and the guiding of the heat dissipation through groove, the heat conduction fluid can efficiently flow in the heat dissipation through groove, and heat is discharged from the fluid outlet, so that heat dissipation and rapid cooling of multiple hot spots can be accurately, rapidly and effectively realized, the use performance, the safety and the stability of a high-density electronic device are improved, and the service life of the electronic device is prolonged. And meanwhile, the production cost and the manufacturing difficulty can be reduced.

The invention discloses a preparation method and a preparation device of nano indium oxide powder, and belongs to the technical field of nano material preparation. The method comprises the following steps: melting an indium block under a vacuum condition, and then atomizing into indium liquid mist; and introducing carrier gas to blow the indium liquid mist into the quartz rotating tube for microwave heating, then rotating the quartz rotating tube, introducing oxygen to react with the indium liquid mist, and after the reaction is completed, cooling to obtain indium oxide powder. By controlling the oxygen concentration and the indium liquid mist flow rate in the reaction chamber and accurately regulating and controlling parameters such as the rotation speed of the quartz tube, the microwave reaction temperature and the gas flow, regulation and control on the morphology and purity of indium oxide are realized, and the obtained indium oxide has the advantages of high purity, high crystallinity, specific morphology and controllable grain size; the method can be widely applied to the fields of electronics, optics, new energy and the like.

The invention discloses a surface nickel plating process for quartz glass, and aims to improve the adhesive force, uniformity and functional performance of a nickel plating layer, simplify the process flow and meet the environmental protection requirement. The process comprises the following steps: firstly, cleaning and roughening the surface of quartz glass, removing surface impurities through a 2% sodium hydroxide solution and a 10% hydrofluoric acid solution, and forming a microscopic rough structure; then treating in a sensitizing solution composed of stannous chloride and hydrochloric acid to enable the surface to adsorb stannous ions; then treating in an activating solution composed of palladium chloride and hydrochloric acid to form a catalytic active layer; then carrying out nickel plating reaction in a chemical nickel plating solution with the temperature of 85 DEG C and the pH value of 4.5, wherein the thickness of a plating layer is 5-10 microns; and finally, the waste liquid is neutralized and flocculated to realize environment-friendly discharge. The process is simple and convenient to operate, and the generated nickel coating is uniform and compact, has excellent conductivity and corrosion resistance, and can be widely applied to the fields of electronics, optics and chemistry.

The present invention relates to a method for producing a composite structure, the method comprising: (a) forming a temporary substrate (3') comprising a carrier substrate (3), wherein a plurality of tile portions (P'1-P'3) or a layer of interest (20) made of a first material are arranged on the carrier substrate (3); (b) forming a removable interface (5) arranged between the carrier substrate (3) and the tile portions or the layer of interest, or in or on the tile portions or the layer of interest; (c) assembling the temporary substrate (3') with a receiver substrate (4) made of a second material that is different from the first material, via the tile portions or the layer of interest; and (d) removing the carrier substrate (3) by dismantling the removable interface (5) so as to transfer at least one portion of the tile portions (P'1-P'3) or of the layer of interest (20) to the receiver substrate (4) to form the composite structure.

A stack of planar elements for a charged particle optical module configured to project charged particles along a beam path, the stack comprising an adjacent pair of planar elements arranged across the beam path, where one of the planar elements comprises an alignment reference, and the alignment reference is configured to project the charged particles along the beam path. And another one of the planar elements comprises a monitoring aperture; wherein the pair of planar elements are positioned relative to each other such that the alignment reference and the monitoring aperture are aligned with each other in a direction substantially perpendicular to the planes of the planar elements.

The invention relates to the technical field of electronic scanning imaging, in particular to a scanning electron microscope and an electron optical structure thereof. According to the scheme, the anode of the electron gun is arranged behind the focusing lens and in front of the scanning coil, and the acceleration structure is arranged between the cathode and the anode, so that the acceleration structure is connected with the power supply during application, the acceleration structure is used as the acceleration electrode, and electrons can be accelerated between the cathode and the acceleration electrode after being emitted from the cathode, so that the acceleration effect is improved. The electron optical structure is arranged between the accelerating electrode and the anode, the electron decelerates between the accelerating electrode and the anode, high energy is kept in the accelerating structure, it is guaranteed that electrons are kept at a high speed in the propagation process, and unexpected deflection of the electrons in the electron optical structure is reduced; therefore, the electron beam falling on the surface of the sample has relatively low energy, so that the anti-interference performance of the electron beam in the propagation process can be ensured, and the low-voltage imaging of the electron beam on the surface of the sample can also be ensured.

The invention discloses an electron beam exposure machine and a write field distortion correction method thereof. The correction method comprises the following steps: confirming a mark position on a wafer; generating first scanning data comprising coordinates of a plurality of ideal points, and generating a plurality of moving positions of the wafer moved by the displacement table based on the mark position and the parameters of the writing field; the displacement platform successively moves the wafer according to a plurality of moving positions, after the wafer is moved each time, an electron beam is emitted according to the scanning voltage of one ideal point in the first scanning data, and a distortion point corresponding to the ideal point is formed by scanning and imaging in a writing field on the wafer; a plurality of distortion points are formed by scanning in a writing field on the wafer after the displacement table moves successively according to the plurality of moving positions and is scanned and imaged successively, and the coordinates of the plurality of distortion points are in one-to-one correspondence with the coordinates of the plurality of ideal points; one writing field is divided into a plurality of correction units, and each correction unit at least comprises four distortion points located at corners; for each correction unit, based on a preset correction algorithm, calculating a correction parameter set according to the coordinates of the four distortion points at the four corners and the coordinates of the corresponding ideal points; the displacement table moves the wafer, so that the exposure area of the wafer is aligned with the electronic optical system; obtaining coordinates of each target point on the layout in a writing field; on the basis of a correction algorithm, coordinates of scanning points corresponding to the target points are calculated according to the coordinates of the target points and a correction parameter set of a correction unit, and second scanning data are formed; and emitting electron beams according to the second scanning data to form the layout.

The present application relates to a kind of shutter wheel remote sensing wide imaging system and imaging method, including multiple optical camera lenses, motor drive mechanism, wheel shutter mechanism, multiple lens shared electronic optical sensor device, wherein, the wheel shutter mechanism is placed between camera lens and electronic optical sensor device, the shutter rotation of wheel shutter mechanism is driven by motor drive mechanism to control the light transmission of different camera lenses to electronic optical sensor device in turn, realize the wide imaging of area array camera lens.The present application provides the imaging method of the above-mentioned imaging system, improves the imaging width under the condition of not upgrading camera lens configuration, only uses a set of electronic device to reduce the development cost and installation difficulty.

The utility model relates to the technical field of electron beam lithography, in particular to an electron emitter. The electron emitter comprises a patterned light source, a lens unit and a photoelectric material unit; the patterned light source comprises a light source and a pattern generator, the lens unit is arranged between the pattern generator and the photoelectric material unit, and the pattern generator is used for modulating light beams emitted by the light source; after a light beam emitted by the light source is modulated by the pattern generator, an optical pattern with light and shade changes is generated, the optical pattern is irradiated on the surface of the photoelectric material unit after being amplified and imaged by the lens unit so as to generate an external photoelectric effect, and an electron beam with the optical pattern is formed. According to the electron beam lithography device, electron beams with optical patterns can be sent into the electron optical system to directly carry out patterning electron beam lithography treatment, and exposure carried out in a point-by-point electron beam scanning mode in the prior art is not needed, so that the electron beam lithography efficiency is greatly improved by the electron beam lithography device.

The present application relates to the technical field of electron-optical imaging, and particularly relates to a backscattered electron scintillator detector device and a detection method, which comprises a backscattered electron receiving sensor, an optical condensing group, an optical transmission group, a photoelectric conversion system and a detector protection mechanism. By using a scintillator as a sensor, a backscattered electron signal generated by an industrial electron gun electron beam is received, and then the electronic information carried by the backscattered electron is converted into an optical signal and transmitted to an area far away from the workpiece. Finally, a high signal-to-noise ratio voltage analog signal is formed by the photoelectric conversion system, avoiding the influence of spatial noise and other interference signals on weak signal transmission in the existing analog signal transmission process. For detailed topographic features, a backscattered electron image with high resolution can be displayed.

An electronic sock having visual and readable digital display for wellness and limb protection, which comprises a limb protection sleeve (X10) and a visual dynamic apparatus (X80). The limb protection sleeve (X10) is shaped having two ends and is worn around a limb of a human body. The limb protection sleeve (X10) is made of an extensible textile, fiber, or elastic material, or fiber which can be formed by weaving, or an integrally formed breathable material. For the visual dynamic apparatus (X80), in particular, a plurality of light-emitting diodes or visual and readable dynamic display elements are embedded on the limb protection sleeve (X10), or can be made of a material which can have a flexible, visual and readable electron optical display effect or can be woven from fiber having an optical function, so that the limb protection sleeve (X10) has a dynamic visual display effect on the limbs of the human body, in particular, enhancing aesthetics of female legs. According to needs, the limb protection sleeve (X10) can be designed to wrap around limbs or other parts of a human body, such as the soles, lower legs, thighs, and arms, or simultaneously wrap a plurality of parts of the body serving as electronic sensing and visually readable sites.

The invention relates to a charged particle optical plate for a charged particle optical device for projecting a charged particle beam along a beam path to a sample location. A charged particle optical plate includes: a substrate having a crystal structure having a crystal symmetry line; a plurality of channels configured for passing a plurality of beam paths of a beam grid through the substrate; and a plurality of multipoles associated with a respective channel, each multipole comprising a plurality of electrodes for the associated channel, where the electrodes are arranged such that a geometric symmetry line of the multipole is parallel to a respective crystal symmetry line of the crystal structure.

Provided are a charged particle beam device management system and a charged particle beam device management method which are capable of achieving, in reducing a machine difference, optimal and planned device management according to the situation of a manufacturing site.　This charged particle beam device management system has at least one charged particle beam device and a device management device. The device management device comprises: an electron optical system simulation unit that obtains each of the states of a device to be evaluated and a target device that are the charged particle beam device; a device state correction candidate calculation unit that obtains a correction condition of a device component such that the device to be evaluated approaches the state of the target device; and a device state estimation unit that obtains a difference from the target device when the device to be evaluated is corrected in accordance with the correction condition. The device state correction candidate calculation unit obtains a cost when executing the correction on the device and outputs the difference between the obtained correction condition and the corrected target device and the correction cost.

The invention discloses a self-sealing isolation valve for an electron optical column. The self-sealing isolation valve comprises a valve body assembly, a valve element assembly, a driving assembly and a vacuumizing assembly. The valve body assembly comprises a valve cavity, the top of the valve cavity is connected with the upper portion of the electron optical column and located in an ultrahigh vacuum environment, and the bottom of the valve cavity is connected with the lower portion of the electron optical column and located in a high vacuum environment. The vacuumizing assembly is connected with the side portion of the valve cavity so that an ultrahigh vacuum environment can be formed in the valve cavity. The valve element assembly is arranged in the valve cavity and located above an air hole of the valve cavity, the driving assembly is arranged on the outer side of the valve cavity, and the output end of the driving assembly penetrates into the valve cavity in a sealed mode and is connected with the valve element assembly. Under driving of the driving assembly, the valve element assembly opens or closes the air hole so as to achieve connection or isolation of the upper portion and the lower portion of the electron optical column. The device has the characteristics of compact structure, convenience in operation, high stability and the like, and realizes isolation of different vacuum environments at the upper part and the lower part of the electron optical column.

A display device including a display area and an optical area overlapping an electronic optical device disposed below optical area; a plurality of light emitting devices disposed in the display area and the optical area; a first pixel circuit disposed in the display area and outside of the optical area and electrically connected to first light emitting devices disposed in the optical area and configured to provide a driving current to the first light emitting devices disposed in the optical area; and a second pixel circuit disposed in the display area and outside of the optical area and electrically connected to second light emitting devices disposed in the display area and configured to provide a driving current to the second light emitting devices disposed in the display area.

The invention provides a method, a device and equipment for realizing miniaturization of an electronic optical system of a klystron, which can be applied to the technical field of vacuum electronic devices. The method for realizing miniaturization of the electron optical system of the klystron comprises the following steps: acquiring a first target parameter of an electron gun and an initial permanent magnet focusing system; according to the first magnetic induction intensity, the magnetic induction intensity area range of the initial permanent magnet focusing system is adjusted, and a first magnetic induction intensity curve is obtained; adjusting the initial structure parameters by simulating a working state of embedding an electron gun corresponding to the initial structure parameters into the middle permanent magnet focusing system to obtain a second magnetic induction intensity curve; and embedding the electron gun corresponding to the target structure parameter corresponding to the second magnetic induction intensity curve into the target permanent magnet focusing system to obtain the electron optical system of the target speed regulation tube.

The invention relates to the field of electronic optical automatic design, in particular to a spline and topological optimization-based rapid design method for an axisymmetric electron gun. The design space of the axisymmetric electron gun is divided into a cathode region, an anode region, a focusing electrode region and a spacer region, the anode region and the focusing electrode region are uniformly divided into a plurality of rectangular pixel blocks by using a pixel division method, the anode region and the focusing electrode region are divided by using a cathode estimation method, scattered pixel points are randomly generated in the regions, and the pixel points are distributed in the regions. Connecting the scattering points through an NURBS spline, searching a pixel block through which a spline curve passes, extracting the outer contour of the pixel block, generating continuous and non-hollow electrodes, and combining the continuous and non-hollow electrodes into a complete electron gun; and the shape and voltage of the electrode are optimized by using an optimization algorithm, and finally, the electron gun meeting the design requirements is obtained. The problem of topological optimization design of an existing electronic gun is solved, the limitation of the problems of model defects and the like of an existing electronic gun design method is broken through, and automatic design of the electronic gun is achieved.

The utility model relates to a kind of detector components, including detector, diaphragm and adjusting mechanism.Detector is used to detect signal electron beam, diaphragm is located in the side of detector receiving signal electron beam, the center is provided with through-hole, adjusting mechanism can adjust the area of through-hole and / or the distance between diaphragm and detector.In addition, the utility model also discloses an electron-optical system, including electron beam source, beam separator and detector component.Electron beam source emits main electron beam to sample along main optical axis, and generates signal electron beam on sample surface;Beam separator is coaxially arranged with main optical axis, located between electron beam source and sample, for deflecting signal electron beam.Through adjusting the area of diaphragm through-hole and the distance between diaphragm and detector, the signal electron beam detection of different diffusion angle can be realized, meet the accurate detection demand of different aspect ratio characteristics, applicable to the characterization of complex topography sample.

The utility model provides a packaging box for electronic optical lens cones, which comprises a box body, a box cover, a box cover and a box cover, and an equipment cavity for accommodating the electronic optical lens cones is arranged in the box body; the controller is arranged on the box body and is configured to be electrically connected with a vacuumizing device of the electron optical lens cone so as to control the vacuumizing device; and the power supply device is arranged on the box body and is configured to supply power to the controller and the vacuumizing device. According to the packaging box, in the transportation process of electronic optical lens cones such as the electronic optical lens cones, on the basis that the safety of hardware structures is guaranteed, the influence of external interference on the lens cones, especially vibration interference, can be greatly reduced; in addition, the electronic optical lens cone can effectively guarantee high vacuum for a long time, so that a machine can be quickly reset at a client conveniently, the installation time is shortened, and the recognition degree at the client is enhanced.

The utility model relates to the technical field of antibacterial performance detection, in particular to a composite resin tooth antibacterial performance detection device which comprises a composite resin tooth detection box, a base is fixedly installed at the bottom of the inner side of the composite resin tooth detection box, a detection glass cup is placed on the upper side of the base, and a back plate is installed on the rear side of the composite resin tooth detection box. An antibacterial detection mechanism is mounted on the back plate; the antibacterial detection mechanism comprises a lampshade which is fixedly mounted on the inner side of the back plate, light supplementing lamps are fixedly mounted on the periphery of the inner side of the lampshade, two electronic optical microscopes are symmetrically and fixedly mounted in the middle of the inner side of the lampshade, and a control host is fixedly mounted on the outer side of the back plate. According to the utility model, the antibacterial detection mechanism is arranged, point electronic pictures fed back by the electron optical microscope are analyzed by utilizing the control host, and the ratio of the content of bacteria in a mixed solution of the composite resin teeth to the content of bacteria in a mixed solution of artificial teeth is calculated, so that the antibacterial performance of the composite resin teeth can be specifically obtained.

Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.

A charged particle-optical assembly configured to direct a plurality of beams of charged particles in a beam grid towards a sample location, the charged particle-optical assembly including: a planar charged particle-optical element configured to operate at a voltage on charged particle beams of a beam grid, the charged particle-optical element including a plurality of apertures for the paths of different beams of the beam grid; a conductive body electrically connected to the charged particle-optical element, wherein a recess is defined within the conductive body and is configured to provide a field free volume for insertion of an electrical coupling to electrically connect the charged particle-optical element via the electrical coupling with an electrical power source; and an electrical insulator covering at least part of a surface of the conductive body, the surface facing away from the charged particle-optical element.

The invention discloses an electron beam focusing parameter adaptive calibration method based on regional recursive splitting and analytic field guidance, and belongs to the technical field of electron beam equipment precision control. In order to solve the problems of low full-field uniform sampling efficiency and poor sparse sampling precision in large-view-field electron beam processing, the invention provides a dual-drive adaptive sampling strategy. According to the method, a theoretical curvature distribution diagram is constructed by using an electron optical analytical field to serve as prior guidance, and a distortion sensitive area in a view field is identified according to a multi-dimensional feature fusion criterion of physical prior, differential field nonlinearity and an actual measurement form; a recursive regional geometric subdivision structure is adopted to perform recursive splitting and encrypted sampling on the sensitive region, and narrow window rapid search is realized in combination with a parameter inheritance strategy; and finally, reconstructing a full-field high-precision model based on a scattered data interpolation algorithm. According to the method, sparse sampling can be automatically carried out in the smooth field curvature change region, encryption sampling can be carried out in the severe distortion region, and the calibration efficiency is remarkably improved on the premise of ensuring high focusing precision.

A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: a plurality of control lenses, a plurality of objective lenses and a controller. The plurality of control lenses are configured to control a parameter of a respective sub-beam. The plurality of objective lenses are configured to project one of the plurality of charged-particle beams onto a sample. The controller controls the control lenses and the objective lenses so that the charged particles are incident on the sample with a desired landing energy, demagnification and / or beam opening angle.

An electron beam application apparatus includes: an optical system configured to irradiate a sample with excitation light; an electron optical system configured to project, onto a camera, a photoelectron image formed by photoelectrons emitted from the sample irradiated with the excitation light; and a control unit. The optical system includes a light source configured to generate the excitation light and a pattern forming unit. The excitation light forms an optical pattern on a surface of the sample when the pattern forming unit is turned on, and the excitation light is emitted to the sample without forming the optical pattern on the surface of the sample when the pattern forming unit is turned off. The control unit adjusts the electron optical system based on feature data of a bright and dark pattern formed by the optical pattern in the photoelectron image obtained by turning on the pattern forming unit.

The four-dimensional electron microscope comprises a light source assembly, an electron source, an electron optical assembly and a detector, and the light source assembly is used for emitting pulse laser. The electron source comprises an excitation optical fiber coupled with the light source assembly and an electron emission layer, the electron emission layer at least comprises an electron excitation layer, and the electron excitation layer is arranged on a light emitting path of pulse laser emitted by the excitation optical fiber so that the electron excitation layer can emit electron beams under excitation of the pulse laser; the electron excitation layer comprises at least one of a zero-dimensional material, a one-dimensional material and a two-dimensional material. The electron optical assembly is arranged on the electron beam emergent side of the electron source, the electron optical assembly is used for adjusting the deflection direction of an electron beam so that the electron beam can be incident on a sample, and the detector is arranged on one side of the sample and used for collecting a reflection electron signal of the electron beam incident on the sample or a transmission electron signal of the electron beam penetrating through the sample.

An industrial camera (20) comprises a printed circuit board (28) connected to an electrical connector (30). The printed circuit board (28) comprises at least a first circuit portion (28a-28e) configured to accommodate electronic optical control components, dedicated to controlling a deformable optical element (32), and at least a second circuit portion (28f-28i) configured to accommodate electronic interface components, which implement a serial interface. Some pins of the electrical connector (30) are connected to both the at least one first circuit portion and the at least one second circuit portion, so as to alternatively realize both control outputs of the deformable optical element (32) and control outputs of the serial interface.

The invention relates to a detection method for diaphragm positioning precision of electron beam detection equipment and a related product. The detection method comprises the following steps: acquiring a reference image and a reference centering coordinate of a diaphragm; the reference centering coordinate is a position coordinate of the diaphragm under the condition that the diaphragm and an electron optical system of the electron beam detection equipment are centered, and the reference image is a back scattering electron image obtained under the condition that the diaphragm and the electron optical system are centered; repeatedly executing the moving alignment process of the diaphragm to obtain a plurality of actually measured centering coordinates; the moving alignment process is configured as follows: the diaphragm is moved from a preset initial coordinate to a concentric position of the backscattered electron image and the reference image, and the actually measured centering coordinate is the coordinate of the diaphragm after moving alignment; and obtaining the positioning precision of the diaphragm according to the plurality of actual measurement centering coordinates and the reference centering coordinates. According to the scheme, the positioning precision of the diaphragm of the electron beam detection equipment can be quantitatively obtained, so that a basis is provided for judging whether the electron beam detection equipment meets the detection precision requirement or not.