37 results about "Beam dump" patented technology

The present application discloses embodiments of a laser beam dump assembly. In one embodiment, the laser beam dump assembly includes a beam dump housing having a housing body with a passage formed therein, wherein the passage is sized to allow an incident laser beam to propagate therethrough into an interior volume formed in the housing body. The laser beam dump assembly further includes a beam scattering member having curvilinear scattering surface configured to scatter or reflect a first portion of the incident laser beam and allow a second portion of the incident laser beam to be absorbed by the scattering member as thermal energy. A heat sink is coupled to the beam dump housing in thermal communication with the beam scattering member, wherein the heat sink is configured to absorb and dissipate the thermal energy from the beam scattering member.

The utility model discloses a femtosecond pulse laser filament control system, which comprises a laser transmitter, a power meter, a target chamber, a beam collector, a vacuum pump, an optical fiber probe and an optical fiber spectrometer, a reflecting mirror I and a diaphragm are arranged between the laser transmitter and the power meter; a convex lens I is arranged between the reflecting mirror II and the target chamber; one side of the target chamber is provided with a light hole, the light hole is opposite to the optical fiber probe, a convex lens II is arranged between the light hole and the optical fiber probe, the optical fiber probe is connected with an optical fiber spectrometer through an optical fiber, and the optical fiber spectrometer is used for being connected with an upper computer; wherein the vacuum pump is communicated with the interior of the target chamber. According to the utility model, the size of the laser beam can be adjusted, the length of the laser filament can be controllably adjusted, and the influence of different environments on the spectral signal-to-noise ratio can be obtained, so that a stable and reliable basis is provided for a subsequent controllable LIBS (Laser-induced Breakdown Spectroscopy) experiment.

The present application discloses various embodiments of an apparatus configured to measure characteristics of a beam of laser energy. In one embodiment, the apparatus includes a housing having a first compartment and a second compartment formed therein. Optical modules having optical sensors configured to measure characteristics of the beam of laser energy are mounted in the first compartment. A removable and replaceable beam dump configured to absorb most of the beam is positioned in the second compartment. The housing may include a housing member positioned between the first and second compartments, to reduce the transfer of thermal energy between them. The removability / replaceability of the beam dump enables operation of the apparatus without active cooling of the beam dump assembly, simplifying the apparatus and protecting the optical sensors in the first compartment.

An aperture for detecting a laser beam misalignment, the aperture comprising: a body including a first opening and defining a first axis; a beam dump; an optical element including a second opening wherein the first opening and the second opening are coaxial with the first axis, the optical element being configured to redirect a misaligned laser beam to a detector or to split a misaligned laser beam into at least two sub-beams; a laser beam detection system configured to detect laser light, wherein the optical element is configured to direct a first sub-beam to the beam dump, and to direct a second sub-beam to the laser beam detection system. Also described is an aperture including an enclosure, a method of detecting misalignment of a laser beam, a radiation source comprising such an aperture, a lithographic apparatus comprising such a radiation source or aperture, and the use of the same in a lithographic apparatus or method.

An apparatus includes a dichroic combiner array (106) configured to combine multiple input optical beams (104) and generate an output optical beam (108). The dichroic combiner array includes multiple mirrors (112) and multiple dichroic filters (110). A first mirror is configured to reflect a first input optical beam towards a first dichroic filter, which is configured to combine the first input optical beam and a second input optical beam. A second mirror is configured to reflect a combined optical beam from the first dichroic filter to a second dichroic filter. A last dichroic filter is configured to generate the output optical beam. The apparatus also includes a beam dump array having multiple beam dumps (116) configured to terminate stray optical energy. The stray optical energy includes at least one of: (i) optical energy reflecting from at least one of the dichroic filters and (ii) optical energy transmitted through at least one of the dichroic filters.

This relates to laser processing equipment and its components. [Solution] The laser processing apparatus includes a positioner positioned within a beam path through which a laser energy beam can propagate. A controller may be used to control the operation of the positioner to deflect the beam path within a first primary angular range and a second primary angular range, and to deflect the beam path to multiple angles within each of the first and second primary angular ranges. In other embodiments, the integrated beam dump system includes a frame and a pick-off mirror and beam dump connected to the frame. In yet another embodiment, the wavefront correction optical component includes a mirror having a reflective surface having a shape characterized by specific ratios of Fringe-Zernike terms Z4 and Z9. Many more embodiments are disclosed.

A laser for laser engraving and a method of assembling a laser for laser engraving. The laser has a housing, a galvo head for manipulating a laser beam in order to execute laser engraving with the laser beam, and a beam dump for dumping a part of the laser beam in order to control the power of the laser. Further, a cooling system is provided that is adapted to cool locally at least a portion of the galvo head and at least a portion of the beam dump.

The present application discloses a nano-textured attenuator which includes a body defining an input aperture, a measurement aperture, and at least one beam dump aperture. At least one coupling fixture may be formed on or positioned on the body, a first nano-textured beamsplitter is positioned within the body and configured to transmit 85% to 99.9999% of an input beam therethrough while reflecting 0.0001% of the input beam to form a partially attenuated beam, at least a second nano-textured beamsplitter is also positioned within the body and is configured to transmit 85% to 99.9999% of the partially attenuated beam therethrough while reflecting 0.0001% of the partially attenuated beam to form an attenuated measurement beam, and at least one camera in communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement beam.

To provide an improvement in electron beam impact liquid metal jet X-ray sources.SOLUTION: A method includes: directing an electron beam to an interference region; stopping the electron beam at an electron beam dump 124 connected to ground potential for receiving the electron beam after the electron beam has traversed the interference region; scanning at least part of the interference region with the electron beam; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile.SELECTED DRAWING: Figure 3

The present application discloses embodiments of a laser beam dump assembly. In one embodiment, the laser beam dump assembly includes a beam dump housing having a housing body with a passage formed therein, wherein the passage is sized to allow an incident laser beam to propagate therethrough into an interior volume formed in the housing body. The laser beam dump assembly further includes a beam scattering member having curvilinear scattering surface configured to scatter or reflect a first portion of the incident laser beam and allow a second portion of the incident laser beam to be absorbed by the scattering member as thermal energy. A heat sink is coupled to the beam dump housing in thermal communication with the beam scattering member, wherein the heat sink is configured to absorb and dissipate the thermal energy from the beam scattering member.

Embodiments of a laser beam dump assembly are disclosed. In one embodiment, the laser beam dump assembly includes a beam dump housing having a housing body and a channel formed therein, wherein the channel is sized to allow an incident laser beam to propagate therethrough to an interior space formed in the housing body. The laser beam dump assembly further includes a beam scattering member having a curved scattering surface configured to scatter or reflect a first portion of the incident laser beam and allow a second portion of the incident laser beam to be absorbed by the scattering member as thermal energy. A heat sink is coupled to the beam dump housing and in thermal communication with the beam scattering member, wherein the heat sink is configured to absorb and dissipate the thermal energy from the beam scattering member.

A laser-processing apparatus is disclosed. In one embodiment, the laser-processing apparatus includes a debris removal system with an integrated beam dump system, the beam dump system operative to selectively position an absorber within the beam path of a beam of laser energy. The beam dump system may allow the beam of laser energy to propagate through the scan lens of the laser-processing apparatus, but prevent the beam of laser energy from processing a workpiece. The beam dump system may include an actuator assembly operative to retract the absorber from the beam path, thereby allowing the beam to propagate to the workpiece and for debris from laser processing to be drawn into a vacuum nozzle, thereby preventing damage to the scan lens. The beam dump system may further include a heat transfer system operative to control the rate of heat transferred away from the absorber.

The present invention relates to an apparatus and a method for an electron beam system for manufacturing a three-dimensional object by fusing successive layers of powder, said system having at least one lens for reshaping of said electron beam, an electron source and a powder bed, said method comprising the step: blocking a selected cross section of said electron beam for controlling the electron beam power. By interference between the electron beam and a beam blocking part a portion of the electron beam is prevented from reaching the powder bed.

A device includes a ceramic substrate formed of a first material, a polishable layer formed of a different material, and an interface between the ceramic substrate and the polishable layer. The interface is formed by infiltration of molten elemental silicon, and bonds the ceramic substrate and the polishable layer together. The device may include an optical device such as, for example, mirror or a beam dump. A method of making a device from a green-state structure and a polishable layer is also disclosed. The method includes infiltrating elemental silicon into and through the green-state structure, to form a substrate of a multi-phase ceramic material from the green-state structure, and to reactively bond the substrate and the polishable layer together.

Method and apparatus 10a for the harmonic generation of laser frequencies in which an input fundamental laser beam 20 is split into two orthogonal polarisations, each polarisation being directed around an independent optical path by at least one steering element 26b, 30b, 32b, 36b, prior to a series of harmonic crystals 40, 42, to optimise conversion efficiency. Independently controlling both polarisations of the fundamental laser beam provides independent alignment optimisation of phase-matching parameters without major cross- talk / coupling with other parameters. The invention allows for a compact arrangement, spatial and temporal walk-off compensation, separate temporal adjustment between the two fundamental polarised beams for temporal compensation in the third harmonic or fifth harmonic processes, adjustment of the photon ratio, single-pulse generation, reduction of fundamental depletion for generation of the third harmonic or fifth harmonic and use of a common beam dump 16 for unconverted light 54. [Fig. 5]

A light source for a lithography system includes an optical component and an aperture. The optical component includes a first side with first and second surfaces. The aperture is positioned on or adjacent to and parallel to the first surface of the first side of the prism. The aperture includes a first part and a second part. The first part of the aperture blocks light from entering the optical component, and can reflect a portion of an incoming beam towards a beam dump. The second part of the aperture allows a portion of a beam to enter and exit the first side of the optical component.

1. The name of the design product: medical imaging equipment beam light device (DR). 2. The use of the design product: for positioning and controlling the X-ray irradiation range. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view 1.

The present disclosure is directed to a beam dump for trapping and absorbing a first portion of a laser beam, and for reflecting a second portion of the laser beam to a power meter to estimate power of the laser beam in a free-space optical communication (FSOC) terminal. The beam dump can encounter the laser beam as an artifact that was passed through, reflected, or deflected by another component of the FSOC terminal, such as at an antireflection coating. The beam dump can trap and absorb a first portion of the laser beam (e.g., through total internal reflection and its doped semiconductor qualities), while the antireflection coating can reflect the second portion of the laser beam (e.g., 1%) to the power meter. In some implementations, multiple beam dump-power meters assemblies can be included in the FSOC terminal for comparison of measurements and to ensure operability of the FSOC terminal.

Numerous embodiments are disclosed. In one, a laser-processing apparatus includes a positioner arranged within a beam path along which a beam of laser energy is propagatable. A controller may be used to control an operation of the positioner to deflect the beam path within first and second primary angular ranges, and to deflect the beam path to a plurality of angles within each of the first and second primary angular ranges. In another, an integrated beam dump system includes a frame; and a pickoff mirror and beam dump coupled to the frame. In still another, a wavefront correction optic includes a mirror having a reflective surface having a shape characterized by a particular ratio of fringe Zernike terms Z4 and Z9. Many more embodiments are disclosed.

A device includes a ceramic substrate formed of a first material, a polishable layer formed of a different material, and an interface between the ceramic substrate and the polishable layer. The interface is formed by infiltration of molten elemental silicon, and bonds the ceramic substrate and the polishable layer together. The device may include an optical device such as, for example, mirror or a beam dump. A method of making a device from a green-state structure and a polishable layer is also disclosed. The method includes infiltrating elemental silicon into and through the green-state structure, to form a substrate of a multi-phase ceramic material from the green-state structure, and to reactively bond the substrate and the polishable layer together.

The invention belongs to the technical field of quantum optics, and particularly relates to a system and method for generating a space compression light array by using Laguerre Gaussian beams, and the system comprises a laser, a first half-wave plate, a first polarization splitting prism, a first beam collector, a second half-wave plate, a second polarization splitting prism, a small reflector, and a spatial light modulator. The system comprises two large reflectors, a third half-wave plate, two third polarization splitting prisms, a second beam collector, a rubidium atom chamber, two quarter-wave plates, two fourth polarization splitting prisms and two balance zero-beat detectors. The first light beam collector and the second light beam collector are arranged on one side of the first polarization beam splitting prism and one side of the third polarization beam splitting prism respectively, the small reflector is arranged on one side of the second polarization beam splitting prism, and the spatial light modulator is in wired connection with the display controller. And the crosstalk problem of the traditional scheme is avoided.

The invention provides a polarization-tunable extreme ultraviolet pulse laser generating device, and the device comprises a fiber laser which is used for generating fundamental frequency laser; the light beam direction stabilizing system is used for stabilizing the output direction of the fundamental frequency laser; the frequency conversion module is used for performing frequency tripling operation on the fundamental frequency laser to obtain frequency tripled linear polarization laser and first residual laser; the dichroic mirror is used for separating the triple-frequency linear polarization laser and the residual laser; the first light beam collector is used for collecting first residual laser; the frequency tripling reflector is used for reflecting the frequency tripling linear polarization laser to the polarization tuning module; the polarization tuning module is used for performing polarization tuning on the triple-frequency linear polarization laser; the inert gas frequency conversion module is used for performing frequency tripling operation on the tuned frequency tripling linear polarization laser to obtain extreme ultraviolet laser and second residual laser; and the focusing-monochromatic-detection module is used for separating the extreme ultraviolet laser and the second residual laser.

The present application discloses an apparatus configured to measure characteristics of high power beams of laser energy used in material processing. In one embodiment, the apparatus includes a housing having a first compartment and a second compartment separated from each other to reduce the transfer of thermal energy between them. Optical modules having optical sensors configured to measure characteristics of the high power beam are mounted in the first compartment. An optical window operative to allow a significant portion of the beam to propagate therethrough is mounted in an intermediate housing member separating the first and second compartments. A removable and replaceable beam dump configured to absorb most of the high power beam is positioned in the second compartment. The removability / replaceability of the beam dump enables operation of the apparatus without active cooling of the beam dump assembly, simplifying the apparatus and protecting the optical sensors in the first compartment.

The present invention relates to improved Raman spectroscopy flow cells and integrated systems for in situ analysis of fluid samples under enclosed conditions. Two novel flow cell designs are disclosed: a Z-design, featuring an angled optical path with a beam dump cavity lined with non-reflective, non-fluorescent material to reduce optical noise, and a T-design, featuring a horizontal flow channel with vertical optical access through a window, sealed using standard O-rings. Both designs isolate the Raman probe from direct fluid contact, minimize dead volume, and facilitate efficient beam management for enhanced signal-to-noise ratio. The invention also covers integrated systems comprising a Raman spectrometer, probe, and the improved flow cells, enabling real-time, high-accuracy fluid analysis in industrial and laboratory environments. These designs improve optical performance, manufacturability, and adaptability across a range of Raman spectroscopy applications.

An apparatus includes a dichroic combiner array configured to combine multiple input optical beams and generate an output optical beam. The dichroic combiner array includes multiple mirrors and multiple dichroic filters. A first mirror is configured to reflect a first input optical beam towards a first dichroic filter, which is configured to combine the first input optical beam and a second input optical beam. A second mirror is configured to reflect a combined optical beam from the first dichroic filter to a second dichroic filter. A last dichroic filter is configured to generate the output optical beam. The apparatus also includes a beam dump array having multiple beam dumps configured to terminate stray optical energy. The stray optical energy includes at least one of: (i) optical energy reflecting from at least one of the dichroic filters and (ii) optical energy transmitted through at least one of the dichroic filters.

An additive manufacturing system having multiple components includes a high power laser to form a laser beam. A beam dump with a fluid chamber having at least one laser transparent window into which the laser beam is directed is provided. A heat exchanger is connected to the fluid chamber, with the heat exchanger acting to provide useful energy to at least one of the multiple components of the additive manufacturing system. An absorbing fluid can be circulated through both the fluid chamber and the heat exchanger.

The present application discloses an apparatus configured to measure a property of a high power laser energy beam used in material processing. In one embodiment, the apparatus includes a housing having a first compartment and a second compartment separated from each other to prevent transfer of thermal energy therebetween. An optical module having an optical sensor configured to measure a property of the high power beam is disposed in the first compartment. An optical window capable of transmitting a substantial portion of the beam is disposed in an intermediate housing member separating the first and second compartments. A removable and replaceable beam dump configured to absorb a majority of the high power beam is disposed in the second compartment. The removable / replaceable beam dump allows operation of the apparatus without active cooling of the beam dump assembly, simplifying the apparatus and protecting the optical sensor in the first compartment.

A neutron shielding apparatus has a shield member made of a neutron attenuation material. The shield member has a cavity defining an entrance with an entrance width for accepting an ion beam along a beam path. A target structure intercepts the ion beam within the cavity at a predetermined distance from the entrance, where the predetermined distance is greater than approximately one-half the entrance width, and where the ion beam emits neutron radiation in all directions. The neutron attenuation material attenuates the neutron radiation to a predetermined radiation exposure limit at one or more regions beyond a predetermined periphery of the target structure. The cavity can be a blind hole extending a predetermined depth from the entrance, or a passageway extending through the shield member defining the entrance and an exit. A positioning apparatus can selectively position the target structure at a target position within the cavity.

The utility model relates to a compact optical pickup device, include: light receiving part, between optical equipment fixed as optical pickup quick detachable interface, light beam collector is used for collecting light beam, light beam adapter is connected with light beam collector at one end, adjusting frame is equipped with mirror in it, and mirror is obliquely arranged, connecting piece is for light inlet end, and the light to be collected passes through mirror reflection and is collected to light beam collector in connecting piece place. The compact optical pickup device, the light to be collected enters from the light inlet end of connecting piece, and the angle of mirror is adjusted through the threaded pair on adjusting frame to realize that the light beam comes in is reflected to the center of light beam collector, can reduce the space of optical pickup since the change of the direction of light path propagation, in addition, the mode that top screw and swallow-tailed groove are used between light beam collector, light beam adapter, adjusting frame, mirror and connecting piece, and the dismounting is convenient and fast, can greatly save time.

An accessory that is attachable to a device comprises an image sensor and a beam splitter having a first surface and a second surface. The beam splitter is configured to impinge light upon the first surface, and split the light impinging upon the first surface into at least a first beam, a second beam, and a third beam. The first beam travels from a first opening of the device to a second opening of the device along an optical path when the accessory is attached to the device, the second beam travels from the first surface to the image sensor, and the third beam travels from the second surface to the image sensor or a beam dump.