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1012 results about "Design space" patented technology

Ion implantation ion source, system and method

InactiveUS20070278417A1Maximizing flow of electronHigh extracted currentMaterial analysis by optical meansIon beam tubesDevice materialDose rate
Various aspects of the invention provide improved approaches and methods for efficiently: Vaporizing decaborane and other heat-sensitive materials via a novel vaporizer and vapor delivery system; Delivering a controlled, low-pressure drop flow of vapors, e.g. decaborane, into the ion source;
    • Ionizing the decaborane into a large fraction of B10Hx+; Preventing thermal dissociation of decaborane;
    • Limiting charge-exchange and low energy electron-induced fragmentation of B10Hx+; Operating the ion source without an arc plasma, which can improve the emittance properties and the purity of the beam; Operating the ion source without use of a strong applied magnetic field, which can improve the emittance properties of the beam; Using a novel approach to produce electron impact ionizations without the use of an arc discharge, by incorporation of an externally generated, broad directional electron beam which is aligned to pass through the ionization chamber to a thermally isolated beam dump; Providing production-worthy dosage rates of boron dopant at the wafer; Providing a hardware design that enables use also with other dopants, especially using novel hydride, dimer-containing, and indium- or antimony-containing temperature-sensitive starting materials, to further enhance the economics of use and production worthiness of the novel source design and in many cases, reducing the presence of contaminants; Matching the ion optics requirements of the installed base of ion implanters in the field; Eliminating the ion source as a source of transition metals contamination, by using an external and preferably remote cathode and providing an ionization chamber and extraction aperture fabricated of non-contaminating material, e.g. graphite, silicon carbide or aluminum; Enabling retrofit of the new ion source into the ion source design space of existing Bernas source-based ion implanters and the like or otherwise enabling compatibility with other ion source designs; Using a control system in retrofit installations that enables retention of the installed operator interface and control techniques with which operators are already familiar; Enabling convenient handling and replenishment of the solid within the vaporizer without substantial down-time of the implanter; Providing internal adjustment and control techniques that enable, with a single design, matching the dimensions and intensity of the zone in which ionization occurs to the beam line of the implanter and the requirement of the process at hand; Providing novel approaches, starting materials and conditions of operation that enable the making of future generations of semiconductor devices and especially CMOS source/drains and extensions, and doping of silicon gates.
Owner:SEMEQUIP

Icon implantation ion source, system and method

Various aspects of the invention provide improved approaches and methods for efficiently: Vaporizing decaborane and other heat-sensitive materials via a novel vaporizer and vapor delivery system; Delivering a controlled, low-pressure drop flow of vapors, e.g. decaborane, into the ion source; Ionizing the decaborane into a large fraction of B10Hx+; Preventing thermal dissociation of decaborane; Limiting charge-exchange and low energy electron-induced fragmentation of B10Hx+; Operating the ion source without an arc plasma, which can improve the emittance properties and the purity of the beam; Operating the ion source without use of a strong applied magnetic field, which can improve the emittance properties of the beam; Using a novel approach to produce electron impact ionizations without the use of an arc discharge, by incorporation of an externally generated, broad directional electron beam which is aligned to pass through the ionization chamber to a thermally isolated beam dump; Providing production-worthy dosage rates of boron dopant at the wafer; Providing a hardware design that enables use also with other dopants, especially using novel hydride, dimer-containing, and indium- or antimony-containing temperature-sensitive starting materials, to further enhance the economics of use and production worthiness of the novel source design and in many cases, reducing the presence of contaminants; Matching the ion optics requirements of the installed base of ion implanters in the field; Eliminating the ion source as a source of transition metals contamination, by using an external and preferably remote cathode and providing an ionization chamber and extraction aperture fabricated of non-contaminating material, e.g. graphite, silicon carbide or aluminum; Enabling retrofit of the new ion source into the ion source design space of existing Bernas source-based ion implanters and the like or otherwise enabling compatibility with other ion source designs; Using a control system in retrofit installations that enables retention of the installed operator interface and control techniques with which operators are already familiar; Enabling convenient handling and replenishment of the solid within the vaporizer without substantial down-time of the implanter; Providing internal adjustment and control techniques that enable, with a single design, matching the dimensions and intensity of the zone in which ionization occurs to the beam line of the implanter and the requirement of the process at hand; Providing novel approaches, starting materials and conditions of operation that enable the making of future generations of semiconductor devices and especially CMOS source / drains and extensions, and doping of silicon gates.
Owner:SEMEQUIP

Optimization design method for step stress accelerated degradation test based on Bayesian theory

ActiveCN102622473AAvoid the disadvantage of being prone to large deviationsTaking into account the amount of informationSpecial data processing applicationsAlgorithmOptimal test
The invention discloses an optimization design method for a step stress accelerated degradation test based on a Bayesian theory, and is applied to the technical field of the accelerated degradation test. The optimization design method comprises the steps as follows: firstly, determining product performance degradation and acceleration models, and based on the historical data, giving prior distribution of model parameters; secondly, determining an optimization design space, and forming a test scheme set; thirdly, creating an expected utility function or an expected loss function, determining optimization goals, and based on a Markov Chain Monte Carlo method, determining optimization goal values of designs in the test scheme set; and lastly, finding the optimal test scheme by using a curve fitting method. According to the optimization design method, the shortcoming of high possibility of larger deviation due to the implementation of the traditional (local) test optimization design method when the values of the model parameters are supposed to be known is avoided, and the optimization scheme obtained in the implementation of the test optimization design when the prior distribution of the model parameters is given is more reasonable and more actual.
Owner:BEIHANG UNIV

Dynamics performance parameter optimizing method of high-speed train

The invention provides a dynamics performance parameter optimizing method of a high-speed train, relates to the field of parameter design optimizing based on the dynamics simulation analysis of the high-speed train, and aims at effectively replacing a dynamics simulation model of the high-speed train by a comprehensive target neural network agent model and combining the design analysis and the multi-target optimization algorithm of the high-speed train in the multi-disciplinary field to analyze and optimize the dynamics simulation approximation model of the high-speed train. The method specifically comprises the steps of building a multi-rigidity dynamics simulation model for the high-speed train; determining related important input/ output design spaces; selecting sampling strategy to obtain a design space sample set suitable for the dynamics performance analysis of the high-speed train; improving the generalization accuracy of the comprehensive target neural network by the bayesian regularization method; adjusting the number of nodes in a hidden layer to build the comprehensive target neural network agent network model of which the error is controlled to be within a certain of range; performing multi-target optimization through the intelligent differential evolution algorithm by using the improved comprehensive target neural network agent network model to obtain the optimized high-speed train design parameters. The method is mainly applied to the dynamics analysis and design optimization of the high-speed train.
Owner:成都天佑创软科技有限公司

Optimization design method based on self-adaptive radial basis function surrogate model for aircraft

InactiveCN102682173AImprove Global Approximation AccuracySave optimization design costSpecial data processing applicationsAnalytic modelGenetic algorithm
The invention provides an optimization design method based on a self-adaptive radial basis function surrogate model for an aircraft. The optimization design method comprises the following steps of: first, sampling an experimental design sample in a design space by adopting a latin square experimental design method and acquiring an aircraft high-precision analytical model response value corresponding to the experimental design sample; constructing an approximate aircraft high-precision analytic model of the radial basis function surrogate model; acquiring the global optimal solution of a current radial basis function surrogate model by utilizing a genetic algorithm; constructing an aircraft optimization design major sampling space according to current optimization flow information, increasing a few experimental design samples, and updating the radial basis function surrogate model; and acquiring the global optimal solution of the updated radial basis function surrogate model by utilizing the genetic algorithm again, judging whether an optimization flow is converged or not, stopping optimization if the optimization flow is converged, and reconstructing the aircraft optimization design major sampling space until the optimization is converged if the optimization flow is not converged. By using the optimization design method provided by the invention, the optimization efficiency is improved, and the optimization design cost of the aircraft is saved.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Optimized design method of overall static rigidity of machine

InactiveCN104156501AIncrease the static stiffness value at the end of the machineReduce stress deformationSpecial data processing applicationsReduced modelElement model
The invention discloses an optimized design method of overall static rigidity of a machine. The method includes the steps of establishing a simple machine model by Pro / E software; importing the simple machine model into SAMCEF software to establish a machine finite element model; parameterizing rigidity features of large structures of the machine to determine design parameters and a design space; selecting test sample points for finite element analysis by a central composite experiment design method; subjecting the test sample points to finite element analysis to obtain machine static rigidity response values of the test sample points; establishing a response surface model for large structure rigidity feature parameters and machine static rigidity; analyzing sensitivities of large structure rigidities to the machine static rigidity so as to determine a static rigidity weak link, and performing optimized design. The optimized design method of overall static rigidity of the machine has the advantages that the sensitivities of the structures of the machine to the machine static rigidity are effectively determined, the weak link restricting the improvement of the machine static rigidity is effectively found, and accordingly important basis for the optimized design of machine structure is provided to guide designers to optimally design the weak large structures of the machine.
Owner:TIANJIN UNIV

Three-point support optimization design method of machine tool bed based on response surface model

The invention discloses a three-point support optimization design method of a machine tool bed based on a response surface model. The method comprises the steps that a simplified model of a bed structure is established in CAD (Computer-Aided Design) software; three-point support limiting positions are found; a variable design space and an optimization objective are determined; test sample points for statics analysis are selected from the design space, and subjected to the statics analysis by finite element analysis software; a response value is calculated and extracted; a second-order response surface model, reflecting an input-output relation of structural design, of deformation at guide rails of the bed is established according to the response value; an optimal solution of the response surface model is acquired by a genetic algorithm; based on the established second-order response surface model, three-point support positions when the deformation of the guide rails is minimum are found; a practical model of the bed is subjected to the statics analysis; and the reliability of three-point support optimization design is verified. With the adoption of the method, the deformation of a machine tool is reduced; the machining precision of the machine tool is improved; the three-point support optimization efficiency and the optimization precision are improved; and the problems that the calculation amount is large, the efficiency is low, and an optimal result cannot be ensured easily in the existing optimization technique are solved.
Owner:TIANJIN UNIV

Antenna device

The invention provides an antenna device. The antenna device comprises a millimeter wave microstrip antenna, wherein the millimeter wave microstrip antenna is assembled on a shell of electronic equipment, the electronic equipment comprises a main antenna, the main antenna is arranged in the shell, an antenna gap is formed in the shell and is used for radiation/receiving of a radio frequency signal by the main antenna, the millimeter wave microstrip antenna comprises a plurality of unit antennas, the plurality of the unit antennas are arranged at intervals, and the plurality of the unit antennas and the shell are arranged at an interval and are arranged in the antenna gap in an array way. Compared with prior art, the antenna device provided by the invention has the advantages that the millimeter wave microstrip antenna is arranged in the antenna gap for radiation/receiving of the radio frequency by the main antenna, so that independent gap opening on the millimeter wave microstrip antenna is prevented, the same antenna clearance region can be shared with the main antenna, the design space of the millimeter wave microstrip antenna is saved, and the space utilization ratio is improved; and meanwhile, the radiation bandwidths of the unit antennas can also be effectively expanded, the gain is improved, the side lobe is suppressed, and the radiation efficiency of the antenna device is further improved.
Owner:AAC TECH PTE LTD
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