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568 results about "Installed base" patented technology

Installed base (also install base, install[ed] user base or just user base) is a measure of the number of units of a product or service that are actually in use, especially software or an Internet or computing platform, as opposed to market share, which only reflects sales over a particular period. Although the install base number is often created using the number of units that have been sold within a particular period, it is not necessarily restricted to just systems, as it can also be products in general. For products which are in use on some machines for many years, the installed base count will be higher than sales over a given period. Some people see it as a more reliable indicator of a platform's usage rate.

Ion implantation ion source, system and method

InactiveUS20070278417A1Maximizing flow of electronHigh extracted currentMaterial analysis by optical meansIon beam tubesDevice materialDose rate
Various aspects of the invention provide improved approaches and methods for efficiently: Vaporizing decaborane and other heat-sensitive materials via a novel vaporizer and vapor delivery system; Delivering a controlled, low-pressure drop flow of vapors, e.g. decaborane, into the ion source;
    • Ionizing the decaborane into a large fraction of B10Hx+; Preventing thermal dissociation of decaborane;
    • Limiting charge-exchange and low energy electron-induced fragmentation of B10Hx+; Operating the ion source without an arc plasma, which can improve the emittance properties and the purity of the beam; Operating the ion source without use of a strong applied magnetic field, which can improve the emittance properties of the beam; Using a novel approach to produce electron impact ionizations without the use of an arc discharge, by incorporation of an externally generated, broad directional electron beam which is aligned to pass through the ionization chamber to a thermally isolated beam dump; Providing production-worthy dosage rates of boron dopant at the wafer; Providing a hardware design that enables use also with other dopants, especially using novel hydride, dimer-containing, and indium- or antimony-containing temperature-sensitive starting materials, to further enhance the economics of use and production worthiness of the novel source design and in many cases, reducing the presence of contaminants; Matching the ion optics requirements of the installed base of ion implanters in the field; Eliminating the ion source as a source of transition metals contamination, by using an external and preferably remote cathode and providing an ionization chamber and extraction aperture fabricated of non-contaminating material, e.g. graphite, silicon carbide or aluminum; Enabling retrofit of the new ion source into the ion source design space of existing Bernas source-based ion implanters and the like or otherwise enabling compatibility with other ion source designs; Using a control system in retrofit installations that enables retention of the installed operator interface and control techniques with which operators are already familiar; Enabling convenient handling and replenishment of the solid within the vaporizer without substantial down-time of the implanter; Providing internal adjustment and control techniques that enable, with a single design, matching the dimensions and intensity of the zone in which ionization occurs to the beam line of the implanter and the requirement of the process at hand; Providing novel approaches, starting materials and conditions of operation that enable the making of future generations of semiconductor devices and especially CMOS source/drains and extensions, and doping of silicon gates.
Owner:SEMEQUIP

Rotating type rigidity-changing flexible joint

ActiveCN104608142AAchieve stiffnessVariable stiffness flexible joint with compact sizeJointsOptical axisEngineering
The invention discloses a rotating type rigidity-changing flexible joint which comprises a driven rigidity-changing mechanism and a driving flexible drive mechanism. The rotating type rigidity-changing flexible joint is characterized in that the driven rigidity-changing mechanism mainly comprises an output plate of the joint, a first drive plate of the joint, a second drive plate of the joint, a first cam set, a second cam set, a first cam set installing base, a second cam set installing base, a bare shaft, a supporting base of the bare shaft, a rigidity adjusting installing plate, a linear bearing and a spring. The first drive plate of the joint is fixedly connected with the second drive plate of the joint. The second drive plate of the joint and the output plate of the joint are provided with cam grooves with the same outline. By means of the outlines, the equivalent rigidity of the joint can change along with the flexible deformation angle of the joint. Cams of the first cam set and the second cam set can make contact with the second drive plate and the output plate of the joint at the same time. The driving flexible drive mechanism mainly comprises a trapezoidal lead screw, a lead screw supporting base, a lead screw nut, a lead screw bearing, a direct-current servo motor, a motor installing base, a coupler, a rigidity-changing adjusting base, a linear bearing and a spring.
Owner:HEBEI UNIV OF TECH

Method and apparatus for determining compatibility of computer programs

An information processing apparatus performs predetermined processing by executing a computer program. A program memory stores two boot addresses #1 and #2, each of which serves as an address from which a basic program including a boot program for performing a booting operation is stored. In installing a basic program, the boot addresses #1 and #2 are alternately selected to store the basic program. In starting an apparatus, an error of the computer program stored in the program memory is detected, and upon detection, one of the boot addresses #1 and #2 is selected, and the basic program stored from the selected address is executed. The version compatibilities of a basic program or an application program are described in the basic program or the application program. Upon upgrading the version of the application program, it is determined whether the version of the application program is compatible with the version of the basic program, and vice versa. The application program is then installed based on the result of the determination. With this arrangement, even if the installation of the basic program has failed, the apparatus can be started properly. It is also possible to prevent the installation of an application program whose version is incompatible with the OS and to prevent the installation of an OS whose version is incompatible with the application program.
Owner:SONY CORP

Icon implantation ion source, system and method

Various aspects of the invention provide improved approaches and methods for efficiently: Vaporizing decaborane and other heat-sensitive materials via a novel vaporizer and vapor delivery system; Delivering a controlled, low-pressure drop flow of vapors, e.g. decaborane, into the ion source; Ionizing the decaborane into a large fraction of B10Hx+; Preventing thermal dissociation of decaborane; Limiting charge-exchange and low energy electron-induced fragmentation of B10Hx+; Operating the ion source without an arc plasma, which can improve the emittance properties and the purity of the beam; Operating the ion source without use of a strong applied magnetic field, which can improve the emittance properties of the beam; Using a novel approach to produce electron impact ionizations without the use of an arc discharge, by incorporation of an externally generated, broad directional electron beam which is aligned to pass through the ionization chamber to a thermally isolated beam dump; Providing production-worthy dosage rates of boron dopant at the wafer; Providing a hardware design that enables use also with other dopants, especially using novel hydride, dimer-containing, and indium- or antimony-containing temperature-sensitive starting materials, to further enhance the economics of use and production worthiness of the novel source design and in many cases, reducing the presence of contaminants; Matching the ion optics requirements of the installed base of ion implanters in the field; Eliminating the ion source as a source of transition metals contamination, by using an external and preferably remote cathode and providing an ionization chamber and extraction aperture fabricated of non-contaminating material, e.g. graphite, silicon carbide or aluminum; Enabling retrofit of the new ion source into the ion source design space of existing Bernas source-based ion implanters and the like or otherwise enabling compatibility with other ion source designs; Using a control system in retrofit installations that enables retention of the installed operator interface and control techniques with which operators are already familiar; Enabling convenient handling and replenishment of the solid within the vaporizer without substantial down-time of the implanter; Providing internal adjustment and control techniques that enable, with a single design, matching the dimensions and intensity of the zone in which ionization occurs to the beam line of the implanter and the requirement of the process at hand; Providing novel approaches, starting materials and conditions of operation that enable the making of future generations of semiconductor devices and especially CMOS source / drains and extensions, and doping of silicon gates.
Owner:SEMEQUIP

Virtualization system based on InfiniBand cloud computing network

The invention provides a virtualization system based on InfiniBand cloud computing network, comprising a client and an infiniBand cloud computing network. The client is connected to the InfiniBand cloud computing network through an Ethernet. The infiniBand cloud computing network comprises a file server, a bridge server, a storage server and a management monitor, all of which are connected via infiniBand. The management monitor utilizes a virtual machine manager to manage the hardware resource of the cloud computing network, a plurality of virtual machines are installed based on the hardware resources to form a virtual machine layer, and the virtual machines are isolated mutually. The file server is used to store operating system files and user profiles and configure an individualized virtual machine when the user logs in the virtual machine. The bridge server performs protocol transformation and connects the InfiniBand cloud computing network to an external Ethernet so as to achieve virtual table logging within a hyper-far distance. The solution of the invention utilizes the characteristic of an infiniBand cloud computing network, namely the dynamic resource allocation, to improve the resource utilization rate of a virtualization system.
Owner:南京斯坦德云科技股份有限公司

Ion implantation ion source, system and method

InactiveUS20070107841A1Maximizing flow of electronHigh extracted currentSemiconductor/solid-state device manufacturingIon beam tubesDevice materialDesign space
Various aspects of the invention provide improved approaches and methods for efficiently: Vaporizing decaborane and other heat-sensitive materials via a novel vaporizer and vapor delivery system; Delivering a controlled, low-pressure drop flow of vapors, e.g. decaborane, into the ion source;
Ionizing the decaborane into a large fraction of B10Hx+; Preventing thermal dissociation of decaborane;
Limiting charge-exchange and low energy electron-induced fragmentation of B10Hx+; Operating the ion source without an arc plasma, which can improve the emittance properties and the purity of the beam; Operating the ion source without use of a strong applied magnetic field, which can improve the emittance properties of the beam; Using, a novel approach to produce electron impact ionizations without the use of an arc discharge, by incorporation of an externally generated, broad directional electron beam which is aligned to pass through the ionization chamber to a thermally isolated beam dump;. Providing production-worthy dosage rates of boron dopant at the wafer; Providing a hardware design that enables use also with other dopants, especially using novel hydride, dimer-containing, and indium- or antimony-containing temperature-sensitive starting materials, to further enhance the economics of use and production worthiness of the novel source design and in many cases, reducing the presence of contaminants; Matching the ion optics requirements of the installed base of ion implanters in the field; Eliminating the ion source as a source of transition metals contamination, by using an external and preferably remote cathode and providing an ionization chamber and extraction aperture fabricated of non-contaminating material, e.g. graphite, silicon carbide or aluminum; Enabling retrofit of the new ion source into the ion source design space of existing Bernas source-based ion implanters and the like or otherwise enabling compatibility with other ion source designs; Using a control system in retrofit installations that enables retention of the installed operator interface and control techniques with which operators are already familiar; Enabling convenient handling and replenishment of the solid within the vaporizer without substantial down-time of the implanter; Providing internal adjustment and control techniques that enable, with a single design, matching the dimensions and intensity of the zone in which ionization occurs to the beam line of the implanter and the requirement of the process at hand; Providing novel approaches, starting materials and conditions of operation that enable the making of future generations of semiconductor devices and especially CMOS source/drains and extensions, and doping of silicon gates.
Owner:SEMEQUIP

Large pipeline inner wall welding tool

The invention discloses a large pipeline inner wall welding tool. The large pipeline inner wall welding tool comprises a rotating shaft, two vertical supporting rods, two transverse supporting rods and a supporting arm, wherein a fixed disc and two installing bases are rotationally connected to the rotating shaft in sequence, a fixed sleeve is fixed to one end of the rotating shaft, and the otherend of the rotating shaft penetrates through the fixed disc to be fixedly provided with a curved bar; and the vertical supporting rods are fixed to the two ends of one installing base separately, thetransverse supporting rods are fixed to the two ends of the other installing base separately, the bottom of the supporting arm is fixed to the fixed sleeve, and a welding rod clamping base is installed at the top end of the supporting arm. According to the large pipeline inner wall welding tool, the rotating shaft can be fixed at the axis of a pipeline through the transverse supporting rods and the vertical supporting rods, the transverse supporting rods and the vertical supporting rods are each of a telescopic structure and can adapt to pipelines which are different in size, and the practicability of the device is improved; and manual welding operation is simulated, the welding effect is guaranteed, welding rods are attached to the inner wall of the pipeline all the time, and therefore continuous welding can be conducted, and the welding efficiency is high.
Owner:WUXI ZHIGURUITUO TECH SERVICE CO LTD

Locomotive AC train power supply system and power supply control method thereof

The invention discloses a locomotive AC train power supply system and a power supply control method thereof, relates to the train power supply technology, and provides a locomotive AC train power supply system and a power supply control method thereof aiming at the defect in the prior art that the power energy demand is not ensured when a train breaks down. The technical points of the invention are that: a control signal input terminal, a microcomputer, a rotating speed sensor, and a train power supply cabinet are additionally installed based on an existing diesel engine, and an AV auxiliary generator for locomotive AC auxiliary transmission; the microcomputer is in signal connection with all of the control signal input terminal, the rotating speed sensor, the AV auxiliary generator, a diesel engine throttle control terminal, and the train power supply cabinet; the AV auxiliary generator supplies power to the train power supply cabinet, and a AC power supply output terminal of the train power supply cabinet is used to supply power to the train; the microcomputer adjusts the size of the output voltage of the AV auxiliary generator according to a rotating speed signal of the diesel engine outputted by the rotating speed sensor so as to ensure that the train power supply cabinet outputs stable 380 V three-phase AC power for the train.
Owner:CRRC ZIYANG CO LTD

Capacitance type minitype silicon microphone and preparation method thereof

The invention relates to a capacitance type minitype silicon microphone and a preparation method thereof. The capacitance type minitype silicon microphone comprises a base plate; a vibrating diaphragm is deposited in the central area of the base plate; an insulating material layer is also deposited on the surface of the base plate, which corresponds to an installed base plate; the insulating material layer covers the surfaces of the base plate and the vibrating diaphragm, and a cavity is formed between the insulating material layer and the vibrating diaphragm; the inner wall of the insulatingmaterial layer, which corresponds to the vibrating diaphragm, is provided with fixedly connected back pole plates, and a capacitance structure is formed by the back pole plates and the vibrating diaphragm; the outer wall of the insulating material layer, which corresponds to the vibrating diaphragm, is provided with a plurality of sound holes, and the sound holes are communicated with the cavity formed between the insulating material layer and the vibrating diaphragm; the lower part of the base plate, which corresponds to an installed vibrating diaphragm, is provided with a sound cavity, and the depth of the sound cavity extends from the surface of the base plate, which corresponds to the other end of the installed vibrating diaphragm, to the vibrating diaphragm. The invention has low manufacturing cost, high finished product ratio and easy process operation and meets the requirements for small dimension.
Owner:无锡芯感智半导体有限公司
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