Lathe control device (100; 100A; 100B) which includes: a current sensing unit (2) for sensing a lathe current (i u , i v i w ), which flows to a lathe (1); a position
estimation unit (4) for calculating an estimate (θ L ) a rotor position based on the lathe current (i u , i v , i w ), where the rotor position is position information about a rotor (1b) of the lathe (1); a current
control unit (5; 5B) for generating a first
voltage command (V u *, V v *, V w *) based on a measured value of the lathe current (i u , i v , i w ) and the estimated value (θ L ) the rotor position, where the first
voltage command (V u *, V v *, V w*) is a command value of a lathe
voltage for controlling the lathe (1); a position
estimation voltage generation unit (30; 30A) for generating a high-frequency voltage (V uh , V vh , V wh ) based on rotation information (ω L ; Rev) with respect to a direction of rotation of the rotor (1b), wherein the high-frequency voltage (V uh , V vh , V wh ) is a position
estimation voltage for estimating the rotor position, where the high-frequency voltage (V uh , V vh , V wh ) has a frequency higher than a frequency of the first voltage command (V u *, V v *, V w *) is; and a voltage application device (3) for applying a control voltage to the lathe (1) based on a second voltage command (V up *, V vp *, V wp *) , where the second voltage command (V up *, V vp *, Vwp *) is a voltage command resulting from a superposition of the position estimation voltage (V uh , V vh , V wh ) via the first voltage command (V u *, V v *, V w *) is obtained; wherein the position estimation voltage generation unit (30; 30A) generates the high-frequency voltage (V uh , V vh , V wh ) is generated, so that an upper
sideband is constantly generated.